FeCoB-SiO2磁性纳米颗粒膜的微波电磁特性

采用交替沉积磁控溅射工艺制备了超薄多层的FeCoB SiO2 磁性纳米颗粒膜 .利用x射线衍射仪、扫描探针显微镜、透射电子显微镜分析了薄膜的微结构和形貌特征 .采用振动样品磁强计、四探针法、微波矢量分析仪及谐振腔法测量薄膜试样的磁电性能和微波复磁导率 .重点对SiO2 介质相含量、薄膜微结构对电磁性能产生重要影响的机理做了分析和探讨 .结果表明 :这类FeCoB SiO2 磁性纳米颗粒膜具有良好的软磁性能和高频电磁性能 ,2GHz时的磁导率 μ′高于 70 ,可以应用于高频微磁器件或微波吸收材料的设计     

纳米VOx薄膜在空气中的电学特性退化研究

采用射频磁控溅射法在氮化硅衬底上沉积纳米VO_x薄膜,利用X射线衍射、原子力显微镜分别对薄膜的结晶形态及表面形貌进行表征.研究了纳米VO_x薄膜在空气中长时间暴露后的方块电阻、热滞回线等电学特性的变化情况,并分析这些变化给器件带来的影响.利用X射线光电子能谱仪、傅里叶变换红外光谱仪分析对比新制与久置薄膜的组分及分子结构差异.研究表明,暴露在空气中的纳米VO_x薄膜方块电阻增大是因为低价钒离子被吸附氧原子氧 关键词： x薄膜')" href="#">纳米VO_x薄膜 磁控溅射 电学特性 退化     

扫描电子显微镜法测定金属衬底上石墨烯薄膜的覆盖度

利用化学气相沉积法生长在金属衬底上的石墨烯薄膜,由于其尺寸的可控性和转移的便利性,被广泛用作各种透明电极.石墨烯薄膜的方块电阻是衡量其品质的重要指标之一,而石墨烯覆盖完全是保证薄膜拥有优良导电性能的基本前提.本文通过研究评估不确定度的分量,提出利用扫描电子显微镜像素计算微区和宏观覆盖度的方法.考虑到石墨烯薄膜覆盖区域与未覆盖区域边界的确定,以及晶畴数目的选取这两个因素对覆盖度测定造成的误差.通过微区有效扫描电子显微镜图像的确定、宏观石墨烯薄膜有效扫描电子显微镜图像的测量数目以及宏观石墨烯薄膜覆盖均匀性的表达,系统研究了化学气相沉积法生长在金属衬底上的石墨烯薄膜的微区覆盖度、宏观覆盖度和覆盖均匀性.该方法通过获得有限次微区扫描电子显微镜图像,不仅可以计算宏观石墨烯薄膜的覆盖度,还可以给出覆盖均匀性,既节省了测量时间,同时也能保证测量有效性.     

微波近场显微镜及其在超导薄膜和衬底材料特性无损检测上的应用

高温超导薄膜的微波性能受制备工艺和衬底材料性能的影响,常常出现空间不均匀分布,因此,无损检测大面积超导薄膜及衬底材料的微波性能,研究影响局域微波性能的因素,是高温超导微波器件应用研究中的一个重要方面．我们设计和制造了一套同轴谐振腔型微波近场扫描显微镜,利用该显微镜研究了金属薄膜样品微波表面电阻和介质材料的介电常数的空间分布,给出了其空间分辨率并分析了影响空间分辨率的因素．利用这套微波近场扫描显微镜,对大面积ＬａＡｌＯ３单晶衬底材料介电常数的空间分布进行了测量,并分析了其测量精度．最后,利用这套微波近场扫描显微镜,研究了ＹＢａＣｕＯ薄膜平面微波器件的微波表面电阻的分布情况,对影响其局域微波性能的因素做了初步分析     

FeCoBSiO2磁性纳米颗粒膜的微波电磁特性

采用交替沉积磁控溅射工艺制备了超薄多层的FeCoBSiO2磁性纳米颗粒膜.利用x射线衍射仪、扫描探针显微镜、透射电子显微镜分析了薄膜的微结构和形貌特征.采用振动样品磁强计、四探针法、微波矢量分析仪及谐振腔法测量薄膜试样的磁电性能和微波复磁导率.重点对SiO2介质相含量、薄膜微结构对电磁性能产生重要影响的机理做了分析和探讨.结果 表明：这类FeCoBSiO2磁性纳米颗粒膜具有良好的软磁性能和高频电磁性能，2GHz时的 磁导率μ′高于70，可以应用于高频微磁器件或微波吸收材料的设计. 关键词： 磁性纳米颗粒膜 高频特性 复磁导率 磁控溅射     

原位退火温度对Mg_2Si薄膜结构及方块电阻的影响

采用磁控溅射法和原位退火工艺在钠钙玻璃衬底上制备Mg_2Si半导体薄膜.首先在钠钙玻璃衬底上依次溅射一定厚度的Si、Mg薄膜,冷却至室温后原位退火4h,在400~600℃退火温度下制备出一系列Mg_2Si薄膜样品.采用X射线衍射仪(XRD)、扫描电子显微镜(SEM)对Mg_2Si薄膜样品的晶体结构和表面形貌进行表征,利用四探针测试仪测试薄膜样品的方块电阻,讨论了原位退火温度对Mg_2Si薄膜结构、表面形貌及电学性能的影响.结果表明,采用原位退火方式成功在钠钙玻璃衬底上制备出单一相的Mg_2Si薄膜,退火温度为550℃时,结晶度最好,连续性和致密性最强,方块电阻最小.这对后续Mg_2Si薄膜器件的设计与制备提供了重要的参考.     

基于内嵌旋转银纳米方块圆形纳米腔的折射率传感器（英文）

本文设计了一个基于内嵌可旋转银纳米方块圆形纳米腔的金属-介质-金属波导滤波器,并用时域有限差分算法进行了表征。由于旋转的银纳米方块破坏了圆形纳米腔原有的对称稳态磁场分布,因而产生了一种新的振动模式。这种新的振动模式依赖于内嵌旋转银纳米方块的旋转角度和边长。与没有嵌入银纳米方块和嵌入银纳米方块没有旋转时的金属-介质-金属波导滤波器相比,内嵌入旋转的银纳米方块的金属-介质-金属波导滤波器对周围介质折射率的微小变化更加敏感。因此,该结构在生物传感器方面具有潜在应用。     

方块电阻法原位表征Cu薄膜氧化反应动力学规律

提出并建立了一种基于方块电阻测量的原位表征Cu薄膜氧化反应动力学规律的方法.利用Cu薄膜方块电阻随氧化时间的变化情况，得到氧化产物厚度与氧化时间的关系，反应动力学表征结果符合抛物线规律.还利用不同的氧化反应温度条件和对应的抛物线常数之间的关系得到体系的扩散激活能.结果表明，提出的表征方法适用于Cu薄膜氧化反应体系.     

非故意掺杂GaN薄膜方块电阻与载气中N2比例关系研究

利用金属有机气相外延方法研究了非故意掺杂GaN薄膜的方块电阻与高温GaN体材料生长时载气中N2比例的关系.研究发现,随着载气中N2比例的增加,GaN薄膜方块电阻急剧增加.当载气中N2比例为50%时,GaN薄膜方块电阻达1.1×108Ω/□,且GaN表面平整,均方根粗糙度为0.233 nm.二次离子质谱分析发现,载气中N2比例不同的样品中碳、氧杂质含量无明显差别.随着载气中N2比例的增加,GaN材料中螺型位错相关缺陷密度无明显变化,而刃型位错相关缺陷密度明显增加.结果表明,刃型位错的受主补偿作用是导致GaN薄膜方块电阻变化的主要原因.     

透明导电ZnO薄膜的电化学制备及性能研究

以修饰的ITO玻璃为衬底,以不同浓度Zn(NO3)2.6H2O作为电解质溶液,采用阴极恒流沉积法制备了不同纳米结构的ZnO薄膜。用X射线衍射(XRD)、场发射扫描电镜(FE-SEM)、四探针仪(RTS-8)、紫外-可见(UV-Vis)光谱仪、循环伏安等分别表征薄膜的晶相、形貌和厚度、方块电阻、紫外-可见光透过率和氧化还原电位。结果表明:低浓度溶液沉积得到的c轴取向1D ZnO纳米柱和高浓度溶液沉积得到的致密2D六方ZnO纳米片在可见光范围(400～900 nm)的透过率均可高达85%以上,方块电阻约为14.5Ω/□。两种结构的氧化还原电位有显著区别,纳米柱的为-0.54 V(vs.SCE),而纳米片的为-0.72 V(vs.SCE),说明纳米片状的ZnO薄膜具有更为良好的化学稳定性。     

Novel waveguide components based on complementary electrically small resonators

In this paper, we present a new class of waveguide components based on the use of complementary electrically small resonators etched on metallic sheets. We first show a rectangular-to-circular waveguide transition that allows to effectively match waveguides with different cross-sections and to transform the linearly polarized TE₁₀-mode of a rectangular waveguide into a circularly polarized TE₁₁-mode of a circular waveguide. Then, using similar structures, we present the design and the numerical results of two power dividers and of an orthomode transducer. All these components, employing only thin metallic sheets with properly shaped slits, can be integrated in waveguide transmission systems without increasing their space occupancy. A proper set of full-wave numerical simulations proves the validity of the proposed approach.     

基于金属掺杂ITO透明导电层的紫外LED制备

为降低ITO薄膜对紫外波段的光吸收,制备低电压高功率的紫外LED,研究了一种基于金属掺杂ITO透明导电层的365 nm紫外LED的制备工艺。利用1 cm厚的石英片生长了不同厚度ITO薄膜以及在ITO上掺杂不同金属的新型薄膜,并研究了在不同的退火条件下这种薄膜的电阻和透过率,分析了掺杂金属ITO薄膜的带隙变化。将这种掺杂的ITO薄膜生长在365 nm外延片上并完成电极生长,制备成14 mil×28 mil的正装LED芯片。利用电致发光（EL）设备对LED光电性能进行测试并对比。实验结果表明:掺Al金属的ITO薄膜能够相对ITO薄膜的带隙提高0.15 eV。在600℃退火后,方块电阻降低6.2 Ω/□,透过率在356 nm处达到90.8%。在120 mA注入电流下,365 nm LED的电压降低0.3 V,功率提高14.7%。ITO薄膜掺金属能够影响薄膜带隙,改变紫光LED光电性能。     

基于旋涂法和电子束蒸发法制备的V2O5/Ag/V2O5叠层透明导电薄膜

利用溶胶-凝胶技术与电子束蒸镀相结合的方法在常温下制备了叠层V₂O₅/Ag/V₂O₅（VAV）透明导电薄膜,研究了各层薄膜厚度对叠层结构光电特性的影响。用原子力显微镜、紫外-可见光分光光度计、四探针电阻仪及开尔文探针对样品的表面形貌、光电性能及功函数等性质进行了表征。实验结果表明,该薄膜具有良好的光学和电学性质,可见光（380~780 nm）平均透过率达75%,迁移率为16.89 cm²/（V·s）,载流子浓度为－1.043×10²² cm^-3,方块电阻值为15.1 Ω/□,功函数为5.17 eV。该制备方法降低了V₂O₅薄膜的工艺制备难度,为该材料在太阳能电池中的应用创造了良好的前期基础。     

Experimental studies of extraordinary light transmission through periodic arrays of subwavelength square and rectangular holes in metal films

We fabricate a series of periodic arrays of subwavelength square and rectangular air holes on gold films, and measure the transmission spectra of these metallic nanostructures. By changing some geometrical and physical parameters, such as array period, air hole size and shape, and the incident light polarization, we verify that both global surface plasmon resonance and localized waveguide mode resonance are influential on enhancing the transmission of light through nanostructured metal films. These two resonances induce different behaviours of transmission peak shift. The transmission through the rectangular air-hole structures exhibits an obvious polarization effect dependent on the morphology. Numerical simulations are also made by a plane-wave transfer-matrix method and in good consistency with the experimental results.     

Optical properties of ultrathin films: evidence for a dielectric anomaly at the insulator-to-metal transition

Optical properties of ultrathin layers (<50 A) of Au and Pb quench condensed on amorphous germanium (alpha-Ge) have been measured in situ at 10 K. The development of these films from an insulating state to a metallic state is traced as a function of the film thickness as well as the sheet resistance, R(square). Of particular interest is the regime of R(square) near 3000 Omega where there is an anomaly in the optical transmission. This anomaly is due to a singularity in the dielectric function when the system undergoes an electronic percolation or insulator-to-metal (I/M) transition.     

Effect of cross-linkable polymer on the morphology and properties of transparent multi-walled carbon nanotube conductive films

In this study, we fabricated optically transparent and electrically conductive multi-walled carbon nanotube (MWCNT) thin films using a spray-coating technique. The transparency and the electrical resistance of thin film are dependent on the nanotube content deposited on the polyethylene terephthalate (PET) substrate. Poly(acrylic acid) (PAA) and poly(N-vinyl pyrrolidone) (PVP) were used as adhesion promoters to improve MWCNT coating more significantly. The cross-linked polymer resulted in a superior bond between the MWCNTs and the substrates. The surface electrical resistance was significantly lower than the original sheet after nitric acid (HNO₃) treatment because of the removed surfactant and the increased interconnecting networks of MWCNT bundles, thus improving the electrical and optical properties of the films. Stronger interaction between the MWCNTs and the substrates resulted in lower decomposition of the polymer chain and less amounts of MWCNTs separated into the HNO₃ solution. The lower sheet electrical resistance of PVP/PAA-g-MWCNT conductive films on the PET substrate was because of a more complete conductive path with the cross-linked polymer than that without. Such an improved sheet of electrical resistance varied from 8.83 × 10⁴ Ω/□ to 2.65 × 10³ Ω/□ with 5.0 wt.% PVP/PAA-g-MWCNT sprayed on the PET after acid treatment.     

ZnO/Ag/ZnO multilayer films for the application of a very low resistance transparent electrode

Transparent conductive ZnO/Ag/ZnO multilayer electrodes having much lower electrical resistance than the widely used transparent electrodes were prepared by simultaneous RF magnetron sputtering of ZnO and DC magnetron sputtering of Ag. An Ag film with different thickness was used as intermediate metallic layers. The optimum thickness of Ag thin films was determined to be 6 nm for high optical transmittance and good electrical conductivity. With about 20-25 nm thick ZnO films, the multilayer showed high optical transmittance in the visible range of the spectrum and had color neutrality. The electrical and optical properties of the multilayers were changed mainly by Ag film properties. A high quality transparent electrode, having sheet resistance as low as 3 ohm/sq and high transmittance of 90% at 580 nm, was obtained and could be reproduced by controlling the preparation parameter properly. The above property is suitable as transparent electrode for dye sensitized solar cells (DSSC).     

Waveguide resonance of subwavelength metallic slits

The transmission characteristics of a metallic film with subwavelength periodic slits are investigated by using the two-dimensional finite-difference time-domain method (2D-FDTD). Two models are constructed to show the dependance of the transmission spectrum on the slit structure. A sandwiched structure is used to exhibit the contribution of the metallic wall inside slits to the extraordinary high transmission. And a filled slit structure is employed to reflect the relation between the average refractive index inside the slits and the transmission spectrum of the structure. The transmission characteristics of two structures can be explained well with the waveguide resonance theory.     

磁控溅射制备本征ZnO/Ag/ZnO透明导电薄膜的性质研究

室温下采用射频磁控溅射氧化锌（ZnO）粉末靶、银（Ag）靶,在玻璃衬底上制备ZnO/Ag/ZnO透明导电薄膜。首先,ZnO厚度为30 nm时,改变Ag厚度制备3层透明导电薄膜,研究Ag层厚度及膜层间配比对光电性能的影响;其次,按ZnO∶Ag厚度比为30∶11比例制备不同厚度的3层透明导电薄膜,研究多层厚度对薄膜光电性能的影响。结果表明：Ag厚度为8 nm及11 nm的ZnO/Ag/ZnO表面相对平整,结晶程度较好,在可见光范围内最高透过率达到90%及86%,并且方块电阻为6 Ω/□及3.20 Ω/□,具有优良的光电性;当按配比制备ZnO/Ag/ZnO 3层膜时,增加ZnO厚度对Ag层的增透作用反而减弱,同时增加Ag层厚度也会降低3层薄膜的整体光学性。     

Fabrication of textured SnO2:F thin films by spray pyrolysis

Transparent conductive SnO₂:F thin films with textured surfaces were fabricated on soda-lime-silica glass substrates by spray pyrolysis. Structure, morphology, optical and electrical properties of the films were investigated. Results show that the film structure, morphology, haze, transmittance and sheet resistance are dependent on the substrate temperature and film thickness. An optimal 810 nm-thick SnO₂:F film with textured surface deposited at 520 °C exhibits polycrystalline rutile tetragonal structure with a (2 0 0) orientation. The sheet resistance, average transmittance in visible region, and haze of this film were 8 Ω/□, 80.04% and 11.07%, respectively, which are suitable for the electrode used in the hydrogenated amorphous silicon solar cells.