Al2O3衬底上生长ZnO薄膜的结构和光学特性

用脉冲激光沉积法在Al2O3(0001)衬底上沉积了ZnO薄膜.衬底温度分别为300℃、400℃、500℃、600℃和700℃.利用X射线衍射(XRD)和光致发光谱(PL)对薄膜的结构和光学性能进行研究.X射线衍射的结果表明在不同温度下生长的ZnO薄膜均具有高度c轴择优取向,衬底温度400℃时,膜的应力较小质量较高.ZnO薄膜有很强的紫外发光峰,紫外发光峰的强度与衬底温度密切相关,并发现当衬底温度从300℃增到400℃时,紫外发射峰出现6nm的蓝移.     

成核层温度对非掺杂GaN外延薄膜结晶质量的影响

利用金属有机化学气相沉积系统(MOCVD),在蓝宝石的(0001)面采用不同的成核层生长温度,通过两步法获得不同质量的GaN外延薄膜.利用HALL测试仪,高分辨X射线衍射仪(HRXRD),原子力显微镜(AFM)和光致发光光谱仪(PL)对GaN薄膜的表面形貌,位错密度,光学性能等进行表征,研究不同的成核温度对GaN外延薄膜晶体质量的影响.结果表明,在成核层生长温度为650℃时,所得到的GaN外延薄膜表面粗糙度和位错密度均达到最低,并且同时具有最高的带边发光峰强度,最高的载流子迁移率以及最低的载流子浓度.过低或过高的成核温度都会导致GaN外延层的晶体质量和光电性能变差.     

在钛酸锶衬底上外延生长ZnO薄膜及其性能研究

用脉冲激光淀积法(PLD)在(111)面SrTiO3衬底上外延生长ZnO单晶薄膜.样品分别在衬底温度为350℃、500℃、600℃下外延生长.X射线衍射(XRD)的结果表明,所得的ZnO单晶薄膜结晶性能好,只出现(002)和(004)两个衍射峰,(002)峰的半高宽度(FWHM)为0.23°.在荧光光谱中我们只观察到来源于带边激子跃迁的强UV发射,并且随着生长温度的升高,紫外峰的强度逐渐增强.样品的SEM图像表明所得ZnO薄膜表面平整,晶粒均匀.衬底温度为600℃时,所得到的ZnO薄膜结构完整,晶粒尺寸最大,均匀;而且紫外发射最强.     

SDC/YSZ双层电解质薄膜的制备与特性

利用脉冲激光沉积技术(PLD)在MgO单晶片基底上制备Ce0.8Sm0.2O2-δ/ZrO2∶Y2O3 (SDC/YSZ)双层电解质薄膜.X射线衍射仪(XRD)和扫描电子显微镜(SEM)的结果显示SDC/YSZ双层电解质薄膜沿(111)方向择优生长,随着退火温度的升高,薄膜变得均匀致密,结晶度得到改善,(111)衍射峰强度变大,择优生长取向明显;电化学测量表明,SDC/YSZ双层电解质薄膜的离子电导率比单层YSZ薄膜的离子电导率高.     

金属有机物气相外延生长InAlGaN薄膜及其性能表征

在不同的生长温度和载气的条件下,采用低压金属有机物气相外延方法生长了系列的InAlGaN薄膜,通过能量色散谱(EDS),高分辨X射线衍射(HRXRD)和光致发光谱(PL)对样品进行表征与分析,研究了生长工艺对InAlGaN外延层结构和光学性能的影响.发现当以氮气做载气时,样品的发光很弱并且在550nm附近存在一个很宽的深能级发光峰;当采用氮气和氢气的混合气做载气时,样品中的深能级发光峰消失且发光强度明显提高.以混合气做载气,InAlGaN薄膜中铟的组分随生长温度的升高而降低,而薄膜的结构和光学性能却提高.结合PL和HRXRD的测试结果得到了较佳的生长参数:即载气为氢气和氮气的混合气以及生长温度在850℃到870℃.     

生长温度对L-MBE法制备的ZnO薄膜性能的影响

在蓝宝石C面上利用激光分子束外延(L-MBE)的方法,分别在250℃、300℃、350℃、400℃和450℃生长了高度C轴取向的ZnO薄膜.并进行了X射线衍射(XRD)、光致发光(PL)谱的分析.测试结果表明,较低温度时,随着生长温度的升高,薄膜的结晶及发光性能得到提高;但是当温度进一步升高,却有所变差.说明利用L-MBE系统制备ZnO薄膜存在一合适的温度范围,并对此机理进行了深入分析.     

蒸发电流对CdSe薄膜的结晶性能影响研究

采用真空热蒸发技术,选取系列蒸发电流在光学玻璃基底上制备出CdSe薄膜.利用X射线衍射仪、扫描电子显微镜和原子力显微镜对样品的结构和表面形貌进行了表征.结果显示:蒸发电流为75 A时,CdSe薄膜沿(002)方向择优生长,衍射峰较强,半峰宽较小,晶粒(约48 nm)分布较均匀,表面粗糙度低(5.58 nm),无裂纹.蒸发电流不改变薄膜的结晶取向,但电流过低时,薄膜的表面颗粒轮廓模糊且有间隙,结晶性差;电流高于75 A时,随电流升高,薄膜结晶性逐步降低,颗粒变小,半峰宽变大,部分样品表面晶粒生长不完整,表面出现裂纹.     

PECVD沉积硅薄膜退火性质的分析

利用等离子体增强化学气相沉积(PECVD)制备硅薄膜,对硅薄膜进行退火处理.通过X射线衍射谱,拉曼光谱以及傅里叶变换红外吸收光谱,研究了退火温度在550～ 700℃范围内,硅薄膜退火过程中的生长特性.实验表明:多晶硅的晶粒尺寸并不随着退火温度的提高而持续增大,当退火温度在550～650℃范围内,硅薄膜始终表现出(111)方向的择优生长取向.当退火温度高于650℃时,氧原子活性增强,硅-氧键增加.对于存在应变、已结晶的薄膜,由于内部应力的累积,薄膜更容易随着退火温度的升高而脱落.     

GaAs纳米薄膜的分步电沉积制备及表征

采用分步电化学沉积法,在FTO玻璃基底上成功制备出GaAs薄膜.采用高分辨X射线衍射仪(HRXRD)、场发射扫描电镜(FESEM)、紫外可见光光度计(UV-Vis)、荧光光度计(PL)对不同退火工艺下所制备的薄膜的晶体结构、形貌及光学性能进行表征.结果表明:GaAs薄膜为面心立方晶系,沿(111)方向择优生长.随着退火温度的升高,薄膜内颗粒逐渐增大,Ga与As原子量比发生变化,Eg值减小,光致发光峰为红外发射峰.同时对其形成机理进行了探讨.     

(111)择优取向ZnS薄膜的制备及特性研究

采用激光分子束外延技术在Al2O3衬底上成功外延生长了ZnS薄膜.用X射线衍射、扫描电子显微镜和光致发光谱表征了衬底温度对薄膜结构、形貌和光学特性的影响.结果表明所生长的ZnS薄膜为闪锌矿,具有(111)择优长向,随衬底温度的升高,X射线衍射峰的半高宽先减小后增大,在衬底温度为300℃时,半高宽最窄.薄膜结构致密,表面不平整度随衬底温度的升高而增大.薄膜的带隙随衬底温度的升高出现蓝移,可见光区域透射率最高达到98;,在360 nm激发波长下,观测到402 nm和468 nm两个发光带,衬底温度为300℃时,发光最强.     

A review of measurement of thermophysical properties of silicon melt

Measurements of thermophysical properties of Si melt and supplementary study of X-ray scattering/diffraction by the authors' group were reviewed. The values obtained differed variously from those of literature. Density was 2–3% larger, surface tension 20–30% smaller, viscosity up to 40% larger, electrical conductivity 8% smaller, spectral emissivity more or less in good agreement with literature values, and thermal diffusivity a few percent larger. An anomalous density jump was found near the melting point. Surface tension and viscosity also showed anomaly. A strange time-dependent change of density was observed over 3 h after melting. X-ray analyses suggested a slight change in local atom ordering, but showed no sign of cluster formation. An addition of 0.1 at% gallium caused the density jump to disappear, while that of boron caused no change. An EXAFS study of the former melt indicated a strong interaction between Ga and Si atoms as if molecules of GaSi₃ existed. The implications of the measured properties are a possibility of soft-turbulence in an Si melt in a relatively large crucible, a more complicated manner of intake of oxygen depleted molten Si from the free surface region to underneath the growing crystal, and a relaxation of the melt after melting arising from trapped gas species.     

原位氮化法制备TiN纳米粉体

用溶胶凝胶法合成的纳米TiO2粉体作为原料,将该粉体在氨气中进行原位氮化制备了TiN纳米粉体.用XRD,TEM,化学分析等手段对合成的TiN纳米粉体的物相组成、形貌、成分进行了分析.实验分析表明:在1000℃和1100℃下分别氮化5h,可以制备粒径大约为40nm和80nm的TiN粉体,其TiN的含量分别为95.40;和98.37;;而在1000℃条件下氮化时间减少到2h时,TiN的含量仅为58.36;.氮化温度和氮化时间是合成纳米TiN的重要因素,提高合成温度和延长氮化时间均可形成纯度较高的TiN纳米粉体,但延长氮化时间更有利于获得粒径小的氮化钛粉体.     

Mesomorphism Dependence on the Position of Substitution of a Pair of Esters

A novel homologous series of ethylene derivatives of thermotropic liquid crystals has been synthesized. The methoxy to octyloxy derivatives are nematogenic, the decyloxy to tetradecyloxy derivatives are smectogenic, in addition to nematogenic, and the hexadecyloxy homologue is smectogenic only. All the members of the series are enantiotropically mesogenic. Thermotropic behavior was determined by an optical polarizing microscope equipped with a heating stage and Differential Scanning Calorimetry (DSC) study. Analytical and spectral data confirm the molecular structures of homologues (infrared, nuclear magnetic resonance, mass spectra, X-ray, and DSC data). Textures of the nematic phase are threaded or Schlieren and that of smectic phase are focal conic fan-shaped of smectic A or C. Transition curves of the phase diagram behave in a normal manner except one or two deviations from the normal trend. The mesophase range (Sm+N) varies from 3°C to 44°C. The average thermal stability for smectic is 93°C and that for nematic 117.4°C. The LC behavior of the novel series is compared with a structurally similar known series.     

Effect of alumina on enthalpy of mixing of mixed alkali silicate glasses

The enthalpy of mixing of mixed alkali (Na₂O and K₂O) silicate glasses containing various concentrations of alumina was determined using an ion-exchange equilibrium method. For glasses with a constant alkali concentration, the enthalpy of mixing was found to become less negative with alumina addition. Consistent with our previous results on the enthalpy of mixing of alumina-free mixed alkali silicate glasses, the magnitude of enthalpy of mixing exhibited a good correlation with the molar volume mismatch of the corresponding two single alkali glasses as well as with the extent of conductivity mixed alkali effect, e.g. excess activation energy of conductivity, ΔE. The reduction of the magnitude of the enthalpy of mixing with alumina addition can be attributed to the reduction of non-bridging oxygen and ionic field strength. Combining the present results with results obtained earlier, the magnitude of the enthalpy of mixing for all mixed alkali (Na₂O and K₂O) silicate glasses with and without alumina was expressed by a simple function of a modified Tobolsky parameter, which takes into account the alkali concentration and the difference in cation-to-effective anion distances. The enthalpy of mixing data of the mixed alkali glasses was then compared with reported experimental data on the conductivity of mixed alkali aluminosilicate glasses. What appears to be conflicting experimental data can be understood in terms of the magnitude of the enthalpy of mixing and we can conclude that the mixed alkali effect is closely correlated with the negative enthalpy of mixing.     

On the influence of structural features of DNA on the possibility of metabolic transfer of electrons

Abstract

A fragment of a DNA molecule is considered as one of the channels of metabolic electron transfer. The heterogeneity of the complementary chains is effectively taken into account. This made it possible to find the speed of the electron injected into the DNA conduction band and the current density that it creates. Estimates of electron mobility in nucleic acid chains are made. They were an order of magnitude smaller than that of typical semiconductors. For the specific conductivity of nucleic acid chains, estimates provide a conductivity of one to two orders of magnitude lower than in graphite.     

电子显微分析在表征纳米晶体化学组分中的应用

纳米材料的化学组分及含量影响其光、电、声、热、磁等物理性能,电子显微分析是表征纳米晶体化学组分的重要方法之一.本文综述了X-射线能谱(EDS)、X-射线波谱(WDS)、电子能量损失谱(EELS)和选区电子衍射(SAED)等现代电子显微分析技术在表征纳米晶体化学组分、形貌、尺寸和结构等方面的应用及其研究进展,并比较了这些分析方法存在的差异,提出了其应用中存在的不足及今后的研发方向.     

立方晶系晶体本征铁弹相变序参量的选取

在本征铁弹相变的软模理论的基础上,依据弹性本构关系和居里原理,给出了立方晶系晶体所有可能的自发应变的种类,研究了立方晶系晶体本征铁弹相变序参量的选取问题.以Th群和Oh群为例,阐明了不同类的序参量导致晶体对称性变化相同的的原因,提出了该情况下序参量选取的“就少不就多”的原则.得到了发生本征铁弹相变时所有可能的序参量及晶体的对称性的变化.     

Ni-ZrO2纳米复合电铸层的制备及纳米颗粒分布均匀性研究

研究了在复合电铸过程中,当其它工艺参数一定时,复合电铸层的沉积速率及其厚度随时间的变化趋势, 以及复合电铸层表面微观形貌随电沉积时间的变化趋势.测定了复合电铸层的组织成分,并就纳米颗粒在复合电铸层表面和横截面上分布的均匀性进行了评价.结果表明,复合电铸层表面平整,组织均匀致密,其组成主要是镍和所复合的纳米颗粒,纳米颗粒较为均匀地分散在复合电铸层中.     

Evolution of the Defect Structure of Zinc-Oxide as a Consequence of Tribophysical Activation

Zinc-oxide powder was tribophysically activated in a high-energy vibro mill in a continual regime in air for 3, 30 and 300 minutes with the purpose of modifying the powders physico-chemical properties. By analyzing of data obtained by X-ray powder diffraction, electron diffraction and transmission electron microscopy, the values of distances between corresponding crystallographic planes, average domain sizes of coherent scattering, i.e. crystallites, width of diffraction lines due to the existence of microstrains, and microstrain values, minimal dislocation densities, dislocation density due to microstrain and real dislocation density, and also average distances between dislocations were determined. The dependence of these values on the activation time was established, which enabled analysis of the evolution of the defect structure of zinc-oxide powders during tribophysical activation by grinding in the described regime.     

PEG聚合度对氧化铝造粒粉的性能影响

为制备适用于干压成型的氧化铝造粒粉,研究了PEG聚合度对氧化铝造粒粉微观形貌、流动性和松装密度的影响.结果表明PEG的聚合度对氧化铝浆料粘度影响显著,PEG2000-6000是较为理想的粘结剂选择,造粒粉的流动性与环境温度及湿度相关.采用正交实验设计,以造粒粉的流动性和松装密度为评价指标,对PEG聚合度、粘结剂添加量和固含量进行了优选,其影响顺序为PEG聚合度＞固含量＞粘结剂添加量.以优选参数PEG6000、添加量为4wt;、固含量为80wt;,制备了性能优良的氧化铝喷雾造粒粉.