C-V characterization of Schottky- and MIS-gate SiGe/Si HEMT structures

Electrical properties of Schottky- and metal-insulator-semiconductor (MIS)-gate SiGe/Si high electron mobility transistors (HEMTs) were investigated with capacitance-voltage (C-V) measurements. The MIS-gate HEMT structure was fabricated using a SiN gate insulator formed by catalytic chemical vapor deposition (Cat-CVD). The Cat-CVD SiN thin film (5 nm) was found to be an effective gate insulator with good gate controllability and dielectric properties. We previously investigated device characteristics of sub-100-nm-gate-length Schottky- and MIS-gate HEMTs, and reported that the MIS-gate device had larger maximum drain current density and transconductance (g_m) than the Schottky-gate device. The radio frequency (RF) measurement of the MIS-gate device, however, showed a relatively lower current gain cutoff frequency f_T compared with that of the Schottky-gate device. In this study, C-V characterization of the MIS-gate HEMT structure demonstrated that two electron transport channels existed, one at the SiGe/Si buried channel and the other at the SiN/Si surface channel.     

Investigation of SOI Substrates Incorporated with Buried MoSi2 for High Frequency SiGe HBTs

Highly arsenic-doped Si-on-insulator （SOI） substrate incorporated with buried MoSi2 layers is fabricated aiming at decreasing the collector series resistance of SiGe heterojunction bipolar transistors （HBTs） on SOI, thereby enhancing cutoff frequency （fT） performance and increasing the maximum value of fT （fTMAX ）. The .fT performance at medium current is enhanced and current required for fT = 15 GHz is reduced by half The value of fTMAX is improved by 30%.     

Performance Improvement of GaN Based Schottky Barrier Ultraviolet Photodetector by Adding a Thin A1GaN Window Layer

We propose a new structure of GaN based Schottky barrier ultraviolet photodetector, in which a thin n-type A1GaN window layer is added on the conventional n^--GaN/n^＋-GaN device structure. The performance of the Schottky barrier ultraviolet photodetector is found to be improved by the new structure. The simulation result shows that the new structure can reduce the negative effect of surface states on the performance of Schottky barrier GaN photodetectors, improving the quantum efficiency and decreasing the dark current. The investigations suggest that the new photodetector can exhibit a better responsivity by choosing a suitably high carrier concentration and thin thickness for the A1GaN window layer.     

Sinusoidal Steady State Analysis on 4H--SiC Buried Channel MOSFETs

With the combined use of the drift-diffusion （DD） model, experiment measured parameters and small-signal sinusoidM steady-state analysis, we extract the Y-parameters for 4H-SiC buried-channel metal oxide semicon- ductor field effect transistors （BCMOSFETs）. Output short-circuit current gain G and Mason＇s invariant U are cMculated for extrapolating unity current gain frequency in the common-source configuration fT and the maximum frequency of oscillation fmax, respectively. Here fT = 800 MHz and fmax= 5 GHz are extracted for the 4H-SiC BCMOSFETs, while the field effect mobility reaches its peak value 87cm2/Vs when VGs = 4.5 V. Simulation results clearly show that the characteristic frequency of 4H-SiC BCMOSFETs and field effect mobility are superior, due to the novel structure, compared with conventional MOSFETs.     

Indentation Load Effect on Young＇s Modulus and Hardness of Porous Sialon Ceramic by Depth Sensing Indentation Tests

Depth sensing indentation （DSI） tests at the range of 200-1800mN are performed on porous sialon ceramic to determine the indentation load on Young＇s modulus and hardness values. The Young modulus and hardness （Dynamic and Martens） values are deduced by analysing the unloading segments of the DSI test load-displacement curves using the Oliver-Pharr method. It is found that Young＇s modulus ET, the dynamic hardness HD and the Martens hardness HM exhibit significant indentation load dependences. The values of Young＇s modulus and hardness decrease with the increasing indentation load, as a result of indentation load effect. The experimental hf /hm ratios lower than the critical value 0.7, with hm being the maximum penetration depth during loading and hf the final unloading depth, indicate that our sample shows the work hardening behaviour.     

A self-powered sensitive ultraviolet photodetector based on epitaxial graphene on silicon carbide

A self-powered graphene-based photodetector with high performance is particularly useful for device miniaturization and to save energy.Here,we report a graphene/silicon carbide(SiC)-based self-powered ultraviolet photodetector that exhibits a current responsivity of 7.4 m A/W with a response frequency of over a megahertz under 325-nm laser irradiation.The built-in photovoltage of the photodetector is about four orders of magnitude higher than previously reported results for similar devices.These favorable properties are ascribed to the ingenious device design using the combined advantages of graphene and SiC,two terminal electrodes,and asymmetric light irradiation on one of the electrodes.Importantly,the photon energy is larger than the band gap of SiC.This self-powered photodetector is compatible with modern semiconductor technology and shows potential for applications in ultraviolet imaging and graphene-based integrated circuits.     

Optimization of Metamorphic InGaAs Quantum Wells on GaAs Grown by Molecular Beam Epitaxy

We investigate the molecular beam epitaxy growth of metamorphic InxGal-xAs materials （x up to 0.5） on GaAs substrates systematically. Optimization of structure design and growth parameters is aimed at obtaining smooth surface and high optical qualdty. The optimized structures have an average surface roughness of 0.9-1.8 nm. It is also proven by PL measurements that the optical properties of high indium content （55%） InGaAs quantum wells are improved apparently by defect reduction technique and by introducing Sb as a surfactant. These provide us new ways for growing device quality metamorphic structures on GaAs substrates with long-wavelength emissions.     

基于GaN基HEMT结构的传感器件研究进展

GaN基高电子迁移率晶体管(HEMT)具有异质结界面处的高二维电子气(2DEG)浓度、宽禁带、高击穿电压、稳定的化学性质以及高的电子迁移率,这些特性使它发展起来的传感器件在灵敏度、响应速度、探测面、适应恶劣环境上具备了显著的优点。本文首先围绕GaN基HEMT的基本结构发展起来的两类研究成熟的传感器,对其结构、工作机理、工作进展以及优缺点进行了探讨与总结;而后,着重从改变器件材料及优化栅结构与栅上材料的角度,阐述了3种GaN基HEMT新型传感器的最新进展,其中,从材料体系、关键工艺、探测结构、原理及新机理方面重点介绍了GaN基HEMT光探测器;最后,探索了GaN基HEMT传感器件未来的发展方向。     

Performance of La2O3/InAlN/GaN metal—oxide—semiconductor high electron mobility transistors

We report on the performance of La2O3/InAlN/GaN metal-oxide-semiconductor high electron mobility transistors(MOSHEMTs) and InAlN/GaN high electron mobility transistors(HEMTs).The MOSHEMT presents a maximum drain current of 961 mA/mm at Vgs = 4 V and a maximum transconductance of 130 mS/mm compared with 710 mA/mm at Vgs = 1 V and 131 mS/mm for the HEMT device,while the gate leakage current in the reverse direction could be reduced by four orders of magnitude.Compared with the HEMT device of a similar geometry,MOSHEMT presents a large gate voltage swing and negligible current collapse.     

Device research on GaAs-based InAlAs/InGaAs metamorphic high electron mobility transistors grown by metal organic chemical vapour deposition

This paper applies a novel quad-layer resist and e-beam lithography technique to fabricate a GaAs-based InAlAs/InGaAs metamorphic high electron mobility transistor (HEMT) grown by metal organic chemical vapour deposition (MOCVD). The gate length of the metamorphic HEMT was 150~nm, the maximum current density was 330~mA/mm, the maximum transconductance was 470~mS/mm, the threshold voltage was -0.6~V, and the maximum current gain cut-off frequency and maximum oscillation frequency were 102~GHz and 450~GHz, respectively. This is the first report on tri-termination devices whose frequency value is above 400~GHz in China. The excellent frequency performances promise the possibility of metamorphic HEMTs grown by MOCVD for millimetre-wave applications, and more outstanding device performances would be obtained after optimizing the material structure, the elaborate T-gate and other device processes further.     

Sixth Harmonic of A Nd：YVO4 Laser Generation In KBBF for ARPES

We report that a deep ultraviolet （DUV） laser from the sixth harmonic of a 1064nm laser has been firstly used as light source in an ultrahigh energy-resolution angle-resolved photoemission spectroscopy （ARPES）. The wavelength is 177.3nm obtained by using the second harmonic KBe2BO3F2 crystal with a frequency tripled 1064nm Nd：YVO4 laser. The large flux （10^14 - 10^15 photons/s） and narrow line width （0.26 meV） are suitable for the ultrahigh-energy resolution ARPES. The laser-ARPES can be a powerful tool to study the electronic structure at and near the Fermi level of the superconductor and correlated materials. The laser-ARPES has worked more than 500 h already.     

Performance Improvement of Bulk Heterojunction Organic Photovoltaic Cellby Addition of a Hole Transport Material

A novel photovoltaic cell with an active layer of poly（phenyleneethynylene） （PPE）/C60/N,N＇-diphenyl-N,N＇-di-（m-tolyl）-p-benzidine （TPD） is designed. In the active layer, PPE is the major component; C60 and TPD are the minor ones. Compared with a control BHJ device based on PPE/C60, the short circuit current density Jsc is increased by 1 order of magnitude, and the whole device performance is increased greatly, however the open circuit voltage Voc is largely decreased. The possible mechanism of the improved performance may be as follows： In the PPE/C60/TPD device, PPE, C60, and TPD serve as the energy harvesting material, the electron transport material, and the hole transport material, respectively. As the TPD and C60 are spatially separated by PPE, the charge recombination is effectively retarded.     

Physical simulations and experimental results of 4H—SiC MESFETs on high purity semi-insulating substrates

In this paper we report on DC and RF simulations and experimental results of 4H--SiC metal semiconductor field effect transistors (MESFETs) on high purity semi-insulating substrates. DC and small-signal measurements are compared with simulations. We design our device process to fabricate n-channel 4H--SiC MESFETs with 100~μm gate periphery. At 30~V drain voltage, the maximum current density is 440~mA/mm and the maximum transconductance is 33~mS/mm. For the continuous wave (CW) at a frequency of 2~GHz, the maximum output power density is measured to be 6.6~W/mm, with a gain of 12~dB and power-added efficiency of 33.7％. The cut-off frequency (f_T) and the maximum frequency (f_max) are 9~GHz and 24.9~GHz respectively. The simulation results of f_T and f_max are 11.4~GHz and 38.6~GHz respectively.     

Effect of Vibration on Water Transport through Carbon Nanotubes

We study the response of water permeation properties through a carbon nanotube on the time-dependent mechanical signals. It is found that there is a critical frequency of vibrating fc （about 1333 GHz） which plays a significant role in the water permeation properties. The total water flow, the net flux, the number of hydrogen bonds and the dipole flipping frequency of the single-file water chain inside the nanotube are almost unchanged for the frequency of vibrating f 〈 fc. Simulation results show that the nanotube can be effectively resistant to the mechanical noise. Such excellent effect of noise screening is attributed to the exceptional property of water molecules connected by strong hydrogen bonds with each other and forming a one-dimensional water chain inside the nanotube. Our findings are important for the understanding of why biological systems can achieve accurate information transfer in an environment full of fluctuations.     

Narrowband ultraviolet photodetector based on MgZnO and NPB heterojunction

An ultraviolet photodetector was fabricated based on Mg_0.07Zn_0.93O heterojunction. N, N'-bis (naphthalen-1-y1)-N, N'-bis(pheny) benzidine was selected as the hole transporting layer. I-V characteristic curves of the device were measured in the dark and under the illumination of 340?nm UV light with density of 1.33 mW/cm². The device showed a low dark current of about 3×10^-10 A and a high photo-dark current ratio of 1×10⁵ at -2 V bias. A narrowband photoresponse was observed from 300 to 400?nm and centered at 340?nm with a full width at half-maximum of only 30?nm. The maximum peak response is at 340?nm, which is 0.192 A/W at the bias of -1 V.     

Electrical Characteristics of InGaN/AlGaN and InGaN/GaN MQW Near UV-LEDs

Electrical characteristics of In0.05 Ga0.95N/Al0.07Ga0.9aN and In0.05 Ga0.95N/GaN multiple quantum well （MQW） ultraviolet light-emltting diodes （UV-LEDs） at 400hm wavelength are measured. It is found that for InGaN/AlGaN MQW LEDs, both ideality factor and parallel resistance are similar to those of InGaN/GaN MQW LEDs, while series resistance is two times larger. It is suggested that the Al0.07Ga0.93N barrier layer did not change crystal quality and electrical characteristic of p-n junction either, but brought larger series resistance. As a result, InGaN/AlGaN MQW LEDs suffer more serious thermal dissipation problem although they show higher light output efficiency.     

High Power Continuous-Wave and Acousto-Optic Q-Switched Nd：GdVO4 Laser Operated at 912 nm

We present a high power and efficient operation of the ^4F3/2 → ^4I9/2 transition in Nd：GdVO4 at 912nm. In the cw mode, the maximum output power of 8.6 W is achieved when the incident pump power is 40.3 W, leading to a slope efficiency of 33.3% and an optical-optical efficiency of 21.3%. To the best of our knowledge, this is the highest cw laser power at 912nm obtained with the conventional Nd：GdVO4 crystal. Pulsed operation of 912nm laser has also been realized by inserting a small aeousto-optie （A-O） Q-Switch inside the resonator. As a result, the minimal pulse width of 20ns and the average laser power 1.43 W at the repetition rate of lOkHz are obtained, corresponding to 7.1 kW peak power. We believe that this is the highest laser peak power at 912nm. Furthermore, duration of 65ns has also been acquired when the repetition rate is 100 kHz.     

Fabrication of 160-nm T-gate metamorphic AlInAs/GaInAs HEMTs on GaAs substrates by metal organic chemical vapour deposition

The fabrication and performance of 160-nm gate-length metamorphic AlInAs/GaInAs high electron mobility tran-sistors (mHEMTs) grown on GaAs substrate by metal organic chemical vapour deposition (MOCVD) are reported. By using a novel combined optical and e-beam photolithography technology, submicron mHEMTs devices have been achieved. The devices exhibit good DC and RF performance. The maximum current density was 817 mA/mm and the maximum transconductance was 828 mS/mm. The non-alloyed Ohmic contact resistance Rc was as low as 0.02 Ω- mm. The unity current gain cut-off frequency (fT) and the maximum oscillation frequency (fmax) were 146 GHz and 189 GHz, respectively. This device has the highest fT yet reported for a 160-nm gate-length HEMTs grown by MOCVD. The output conductance is 28.9 mS/mm, which results in a large voltage gain of 28.6. Also, an input capacitance to gate-drain feedback capacitance ratio, Cgs/Cgd, of 4.3 is obtained in the device.     

Variation of Different Characteristic Parameters of Pentacene/Poly（Methyl Methacrylate） Transistors under Electric Stress

By investigating the variation of different characteristic parameters of pentacene/poly（methyl methacrylate） transistors suffered from electric stress in an environment without O2, H2O and light, we deduce lifetimes of the transistors by different criterion parameters. Defined by the time for the parameters changing one half, the lifetime is different from the minimum of 7h （using on/off current ratio as the criterion parameter） to the maximum of 2.38 ×10^8h （using transconductance as the criterion parameter）. We also find that, under our experimental conditions, the main reason that affects the stabilities of the device is the increase of shallow traps formed in the organic semiconductors.     

Numerical Calculation of SAW Propagation Properties at the x-Cut of Ferroelectric PMN-33%PT Single Crystals

Surface acoustic wave （SAW） properties at the x-cut of relaxor-based 0.67Pb（Mg1/3Nb2/3）O3-0.33PbTiO3 （PMN- 33%PT） ferroelectric single crystals are analyzed theoretically when poled along the [001]c cubic direction. It can be found that PMN-33%PT single crystal is a kind of material with a low phase velocity and high electromechanical coupling coefficient, and the single crystal possesses some cuts with zero power flow angle. The results are based on the material parameters at room temperature. The conclusions provide device designers with a few ideal cuts of PMN-33%PT single crystals. Moreover, choosing an optimal cut will dramatically improve the performance of SAW devices, and corresponding results for crystal systems working at other temperatures could also be figured out by employing the method.