InAs/GaSb量子阱的能带结构及光吸收

采用八能带K-P理论以及有限差分方法,研究了沿[001]方向生长的InAs/GaSb二类断带量子阱体系的能带结构、波函数分布和对[110]方向线性偏振光的吸收特性.研究发现,通过改变InAs或GaSb层的厚度,可有效调节该量子阱体系的能带结构及波函数分布.计算结果表明,当InAs/GaSb量子阱的导带底与价带顶处于共振状态时,导带基态与轻空穴基态杂化效应很小,且导带基态与第一激发态的波函数存在较大的重叠,导带基态与第一激发态之间在布里渊区中心处的跃迁概率明显大于导带底与价带顶处于非共振状态时的跃迁概率.研究结果对基于InAs/GaSb二类断带量子阱体系的中远红外波段的新型级联激光器、探测器等光电器件的设计具有重要意义.     

NiO透明导电薄膜的制备及在聚合物太阳能电池中的应用

采用磁控溅射法制备出透明导电氧化物NiO薄膜.椭偏(SE)测试表明NiO薄膜在可见光区域透光性良好,通过调节生长、退火温度可调控NiO的折射率.采用X射线衍射(XRD)、扫描电子显微镜(SEM)手段研究表明,通过退火、改变衬底温度等,可有效改变NiO薄膜的晶体结构以及表面形貌,实现对NiO导电性的调控. 采用优化后的NiO材料为阳极阻挡层制备出的聚合物太阳能电池器件的效率为2.26%,是同等条件下采用 PEDOT:PSS阻挡层的电池器件的3倍以上.     

Quantum dots-templated growth of strain-relaxed GaN on a c-plane sapphire by radio-frequency molecular beam epitaxy

We investigated the quantum dots-templated growth of a(0001) GaN film on a c-plane sapphire substrate.The growth was carried out in a radio-frequency molecular beam epitaxy system.The enlargement and coalescence of grains on the GaN quantum dots template was observed in the atom force microscopy images,as well as the more ideal surface morphology of the GaN epitaxial film on the quantum dots template compared with the one on the AlN buffer.The Ga polarity was confirmed by the reflected high energy electron diffraction patterns and the Raman spectra.The significant strain relaxation in the quantum dots-templated GaN film was calculated based on the Raman spectra and the X-ray rocking curves.Meanwhile,the threading dislocation density in the quantum dots-templated film was estimated to be 7.1×107cm-2,which was significantly suppressed compared with that of the AlN-buffered GaN film.The roomtemperature Hall measurement showed an electron mobility of up to 1860cm2 /V·s in the two-dimensional electron gas at the interface of the Al 0.25Ga0.75 N/GaN heterojunction.     

基于正交实验的100 mm4°偏轴SiC衬底外延均匀性研究

采用行星热壁式SiC外延炉对100 mm 4°偏轴4H-SiC衬底外延工艺进行了研究.分析了氢气预刻蚀工艺对4°偏轴衬底外延材料表面形貌的影响.采用双指标正交实验,通过极差分析的方法研究了C/Si比、Cl/Si比、主氢流量、生长温度、三路气体比等工艺参数对SiC外延厚度和掺杂浓度均匀性指标影响的主次顺序,并给出了优化的外延参数.采用该工艺条件制得的无台阶聚集形貌的SiC外延片片内厚度均匀性和浓度均匀性分别是1.23;和3.32;.     

高质量N型SiC单晶生长及其器件应用

采用物理气相传输法在(0001)面偏向<11-20>方向4°的籽晶上生长了掺氮低电阻率碳化硅(SiC)单晶.结合碳化硅邻位面生长机制,通过优化温场设计,在近平温场下生长出了晶型稳定、微管密度低、高结晶质量的低电阻率4H-SiC单晶.在加工的“epi-ready”SiC衬底上进行了同质外延,获得了光滑的外延层表面.利用该外延材料研制了600V/10 A SiC肖特基二极管,器件的直流性能与进口衬底结果相当,反向漏电成品率高达67;.另外研制了600 V/50 A SiC肖特基二极管,器件的直流性能也达到了进口衬底水平.