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Semi-quantitative study on the Staebler--Wronski effect of hydrogenated amorphous silicon films prepared with HW-ECR-CVD system 总被引:1,自引:0,他引:1 下载免费PDF全文
The method of numerical simulation is used to fit the relationship between
the photoconductivity in films and the illumination time. The generation and
process rule of kinds of different charged defect states during illumination
are revealed. It is found surprisingly that the initial photoconductivity
determines directly the total account of photoconductivity degradation of
sample. 相似文献
2.
A series of a-Si:H films are deposited by hot wire assisted microwave
electron cyclotron resonant chemical vapour deposition
(HW-MWECR-CVD), subsequently exposed under simulated illumination for
three hours. This paper studies the microstructure change during
illumination by Fourier Transformation Infrared (FTIR) spectra. There
are two typical transformation tendencies of microstructure after
illumination. It proposes a model of light induced structural change
based on the experimental results. It is found that all samples
follow the same mechanism during illumination, and intrinsic
structure of samples affect the total H content. 相似文献
3.
We have prepared hydrogenated nano-amorph silicon (na-Si:H) films by using a hot-wire-assisted microwave electron-cyclotron-resonance (HW-MWECR) chemical vapour deposition (CVD) system. The films are deposited in two steps: in the first 9rain, a hydrogenated amorphous silicon layer is deposited by using hydrogen-diluted silane with a concentration of SiH4/(SiH4 H2) = 20%, and then a nanocrystalline silicon (nc-Si) layer is deposited by using various highly hydrogen-diluted silane. The Raman TO-like mode peak of the films was found in the range 497-508cm^-1. When the silane concentration used for preparation of the nc-Si layer is 14.3%, the film has a large crystalline volume fraction of 65.4%, a wide optical band gap of 1.89eV and a low hydrogen content of 9.5 at.%. Moreover, the na-Si:H films rather than nc-Si possess high photosensitivity of about 10^5. 相似文献
4.
光吸收气体传感技术由于具有与人类嗅觉细胞相似的巨量并行、交叉敏感及广谱响应特性,适用于承担电子鼻核心的气体传感任务~([1])。而常规的光栅光谱仪存在着光谱范围与分辨率相互制约的缺陷,因此本文提出将同时兼顾宽光谱、高分辨特性的空间外差光谱技术(SHS)~([2])应用于气体传感,构建出一种新型的基于光吸收和SHS的可视化气体传感技术(V-GST)。为了验证方案的可行性,文章首先构建可视化气体传感技术的系统模型,并搭建相应的实验平台,然后利用该平台对不同光源、不同浓度的NO_2进行检测。 相似文献
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分别研究了磁场线圈电流为115.2和137.7A以及137.7A并在加热台下加放SmCo永磁体的方法,来改变单磁场线圈分散场MWECR CVD系统等离子体室及沉积室磁场形貌.用洛伦兹拟合定量地得到了三种磁场形貌的磁场梯度.研究了磁场梯度对沉积a-Si:H薄膜性能的影响.研究表明:在衬底附近,高的磁场梯度可以获得高的沉积速率;在温度不很高时,高的磁场梯度可得到光敏性较好的a-Si:H薄膜.
关键词:
梯度磁场
洛伦兹拟合
a-Si:H薄膜
MWECR CVD系统 相似文献
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Hydrogenated amorphous silicon (a-Si:H) films with high and same order of magnitude photosensitivity (-10^5) but different stability were prepared by using microwave electron cyclotron resonance chemical vapour deposition system under the different deposition conditions. It was proposed that there was no direct correlation between the photosensitivity and the hydrogen content (CH) as well as H-Si bonding configurations, but for the stability, they were the critical factors. The experimental results indicated that higher substrate temperature, hydrogen dilution ratio and lower deposition rate played an important role in improving the microstructure of a-Si:H films. We used hydrogen elimination model to explain our experimental results. 相似文献