Fabrication and Characterization of Ni Thin Films Using Direct-Current Magnetron Sputtering

Ni films are deposited by using ultra high vacuum dc magnetron sputtering onto silicon substrates at room temperature, and the high-quality and high-density films are prepared. The parameters, such as thickness, density and surface roughness, are obtained by using small-angle x-ray diffraction (XRD) analyses with the Marquardt gradient-expansion algorithm. The deposition rate is calculated and the Ni single layer can be fabricated precisely. Based on the fitting results, we can find that the surface roughness of the Ni films is about 0.7nm, the densities of Ni films are around 97% and the deposition rate is 0.26nm/s. The roughness of the surface is also characterized by using an atomic force microscope (AFM). The changing trend of the surface roughness in the simulation of XRD is in good agreement with the AFM measurement.     

X射线Kirkpatrick-Baez显微镜用超反射镜的研制

 介绍了一种可应用于X射线Kirkpatrick-Baez（KB）显微镜的光学元件—X射线超反射镜。选用的W和B₄C作为镀膜材料，膜对数为20，采用单纯型调优的方法实现了X射线超反射镜设计，用磁控溅射的方法在Si基片上完成了W/B₄C X射线超反射镜的制备。采用高分辨率X射线衍射仪（8 keV）测量了X射线超反射镜的反射特性。制备的X射线超反射镜在掠入射角分别为1.052°和1.143°处，反射角度带宽为0.3°，反射率达到20%，可满足KB型显微镜的要求。     

北京同步辐射装置3W1B软X射线光束线偏振特性测量

应用自行研制的Mo/Si周期多层膜作为起偏器和检偏器的光学元件, 测量了北京同步辐射装置3W1B束线的偏振状态. 通过数据分析, 得到了3W1B软X射线的有关偏振参数, 在86—89eV能区经过起偏器后的偏振度超过98%, 圆偏振分量介于1%—3%之间.     

磁控溅射制备的W,WSi2,Si单层膜和W/Si,WSi2/Si多层膜应力

采用直流磁控溅射技术制备了厚度约100 nm的W,WSi2,Si单层膜和周期约为20 nm,Si膜层厚度与周期的比值为0.5的W/Si,WSi2/Si周期多层膜.利用台阶仪对镀膜前后基底表面的面形进行了测试,计算并比较了不同膜系的应力值.结果表明:W单层膜表现出较大的压应力,而W/Si周期膜则表现为张应力.WSi2单层...     

多层膜劳厄透镜对8keV X射线的聚焦性能模拟研究

基于多层膜技术的劳厄(Laue)透镜能实现硬X射线纳米级聚焦,在X射线微纳分析领域具有重要的应用前景.基于衍射动力学理论,分析了X射线在多层膜劳厄透镜中的传播,计算了不同结构的多层膜劳厄透镜对8 keVX射线的聚焦性能.结果表明,最外层厚度为5 nm的倾斜多层膜劳厄透镜可获得5.7 nm的聚焦光斑和26%的平均衍射效率...     

Multilayers with high-reflectivity at 19.5 nm and low-reflectivity at 30.4 nm

The multilayer （ML） mirror with high-reflectivity （HR） at a specific emission line of 19.5 nm （Fe line） and low-reflectivity （LR） at 30.4 nm （He line） is needed to be designed and fabricated for observing the image of sun. Based on a variety of optimizations utilized different structures, the design is performed and the final results demonstrate that the reflectivity at 30.4 nm does not achieve minimum value when the reflectivity at 19.5 nm reaches the maximum value. The tradeoff should be done between the HR at 19.5 nm and LR at 30.4 nm. One optimized mirror is fabricated by direct current magnetron sputtering and characterized by grazing-incident X-ray diffraction （XRD） and synchrotron radiation （SR）. The experimental results demonstrate that the ML achieves the reflectivity of 33.3% at 19.5 nm and of 9.6× 10-4 at 30.4 nm at the incident angle of 13°.     

组合刻蚀法制备窄带滤光片列阵

介绍了组合刻蚀法制备窄带滤光片列阵的基本原理和制备工艺,这是一种效率非常高的制备方法,只需N次刻蚀就可以完成2N通道窄带滤光片列阵的制备,而且可以用于制备不同波段窄带滤光片列阵。展示了可见-近红外波段32通道窄带滤光片列阵和中红外波段16通道窄带滤光片列阵的实验结果,其中32通道窄带滤光片列阵的带通峰位基本呈线性分布在774.7~814.2 nm之间,所有滤光片的半峰全宽都非常窄(δλ<1.5 nm),相应于δλ/λ<0.2%,半峰全宽最窄的滤光片达到0.8 nm,相应于δλ/λ<0.1%,其带通峰位λ=794.3 nm;各通道的带通透过率在21.2%~32.4%之间,大部分在30%左右。     

X射线天文望远镜的进展

综述了近年来X射线天文望远镜(如准直型望远镜、编码孔径望远镜、正入射周期多层膜望远镜、掠入射单层膜望远镜和掠入射非周期多层膜望远镜以及新型的“龙虾眼”型望远镜)的发展；阐述了各种X射线天文望远镜工作的原理和成像特点，指出各种X射线天文望远镜之间的性能是相互补充的；简要说明了国内近年来在X射线天文望远镜研究方面取得的进展，并展望了下一步工作．     

B_4C/Mo/Si high reflectivity multilayer mirror at 30.4 nm

The B4C/Mo/Si high reflectivity multilayer mirror was designed for He-Ⅱradiation (30.4 nm) using the layer-by-layer method. The theoretical peak reflectivity was up to 38.2% at the incident angle of 5℃. The B4C/Mo/Si multilayer was fabricated by direct current magnetron sputtering and measured at the National Synchrotron Radiation Laboratory (NSRL) of China. The experimental reflectivity of the B4C/Mo/Si multilayer at 30.4 nm was about 32.5%. The promising performances of the B4C/Mo/Si multilayer mirror could be used for the construction of solar physics instrumentation.     

激光驻波场中钠原子沉积图样的理论研究

原子在近共振激光驻波场中受光的作用力汇聚沉积，形成以激光半波长为周期的光栅结构. 利用半经典模型对钠原子束在不饱和驻波场中的运动行为进行了理论研究，用数值方法模拟出在考虑横向温度、纵向速度和自由飞程后钠原子沉积的光栅结构，通过半高宽、对比度对最终沉积图样进行表征，分析了这些因素对沉积的影响，为正在开展的原子光刻实验提供了必要的理论依据. 关键词： 原子沉积 半经典模型 激光驻波场