用Laurent级数展开法化有理分式为部分分式

将函数Laurent展开定理及留数概念应用于有理分式得到将有理分式化为部分分式的一种行之有效的方法.     

Kuramoto-Sivashinsky与Karda-Parisi-Zhang模型中生长界面分形特性研究

在（2＋1）维情况下，利用数值模拟研究了Kuramoto-Sivashinsky (K-S)与Karda-Parisi-Z hang (KPZ)模型所决定的非平衡态界面生长演化过程.结果表明，KPZ与K-S模型都表现出明 显的时间和空间标度特性.相对于KPZ模型而言，K-S模型所对应的表面具有更明显的颗粒特 征，当生长时间较长时，生长界面呈现蜂窝状结构.通过数值相关分析得到了生长界面的粗 糙度指数、生长指数和动态标度指数等参数.从两种模型对应的表面形貌特征和表面参数来 看，在(2+1)维情况下，KPZ与K-S模型所决定的表面具有完全不同的动态标度行为，属于不 同的两类物理模型. 关键词： Kuramoto-Sivashinsky (K-S)模型 Karda-Parisi-Zhang(KPZ)模型 分形 数值模拟     

Effects of oxygen partial pressure on optical absorption edge and UV emission energy of ZnO films

ZnO, with a band-gap of 3.37 eV and a large exciton binding energy (about 60 meV) at room temperature, is a promising material for optoelectronic devices, field- emission displays, and gas sensors. Recently, the interest in short wavelength display device is on the increase. In this regard, ZnO is a promising material[1-6]. High quality ZnO films have been prepared by many methods such as sputtering[7], reactive thermal and electron-beam evaporation[8], pulse laser deposition[9], chemical v…     

磁控反应溅射法制备渐变折射率薄膜的模型分析

阐述了磁控反应溅射法制备渐变折射率薄膜的机理;探讨了磁控反应溅射法制备渐变折射率薄膜的理论模型,给出了渐变折射率薄膜的折射率与反应气体分压的关系,在一定的沉积参数下,由要得到的膜层折射率随膜层几何厚度的变化规律可推导出反应气体分压比随时间的变化规律;最后以制备折射率线性变化的薄膜为例说明了如何推导得到反应气体分压比随时间的变化规律. 关键词： 渐变折射率 磁控反应溅射 模型     

Wideband Antireflection Film Fabricated by Glancing Angle Deposition

Graded-index ZrO2 films has been fabricated on K9 glass by glancing angle deposition. Because the index mismatch at the interface has been reduced, the film results in wideband high-transmission antireflection. From 400nm to 1200nm, the film reflection is lower than 0.8% and the lowest value is 0.2% at 432nm.     

Antireflective characteristics of triangular shaped gratings

It is well known that conventional multi-layers are oftenused for antireflective coatings[1,2]. There are, however,only a handful of optical materials available, thus limit-ing the performance that could ideally be achieved. Onthe other hand, sub-wavelength structure surfaces, whichare surface-relief gratings with periods smaller than theincident wavelength, have been researched and foundto have antireflective properties[3,8]. Compared withstandard optical thin-film coating technologies, the h…     

Optical properties and structures of silver thin films deposited by magnetron sputtering with different thicknesses

A series of thin Ag films with different thicknesses grown under identical conditions are analyzed by means of spectrophotometer. From these measurements the values of refractive index and extinction coefficient are calculated. The films are deposited onto BK7 glass substrates by direct current (DC) magnetron sputtering. It is found that the optical properties of the Ag films can be affected by films thickness. Below critical thickness of 17 nm, which is the thickness at which Ag films form continuous films, the optical properties and constants vary significantly with thickness increasing and then tend to a stable value up to about 40 nm. At the same time, X-ray diffraction measurement is carried out to examine the microstructure evolution of Ag films as a function of films thickness. The relation between optical properties and microstructure is discussed.     

二极管伏安特性曲线测试电路的改进

指出了文献中所给出的伏安法测二级管特性曲线电路存在的问题，并给出了改进电路。     

基于交换耦合模型纳米双相(硬磁/软磁)自旋体系的磁性

采用MonteCarlo方法对由异类自旋组成混合Heisenberg自旋体系进行了数值计算,以模拟和预测基于交换耦合模型纳米双相(硬磁软磁)磁性体系的磁性.区别于以往所报道的那些直接针对硬磁NdFeB与软磁纳米αFe复合磁体的微磁学计算工作,着眼于符合Heisenberg模型的两类完全不同的原子自旋集团(硬磁自旋和软磁自旋)之间的直接交换耦合作用,模拟计算了由这两类自旋组成的复合自旋体系的内禀矫顽力Hc、剩余磁化强度Mr、最大磁能级(M×H)max等宏观磁性参量随软磁自旋集团的尺度和体积百分比、两类自旋集 关键词： Heisenberg模型 MonteCarlo模拟 纳米复合磁体 Nd-Fe-B