键合氢对GDa—Si:H薄膜光致发光性质的影响

测量了在不同衬底温度下制备的GDa-Si:H膜的光致发光谱和光吸收谱。实验发现键合氢含量的增加导致光致发光峰强度、发光峰能量、发光带半宽度、Stokes位移和热淬灭的增大。由此导出:(1)键合氢不仅能消除无辐射复合中心,而且能产生辐射复合中心;(2)随着键合氢含量的增加电子-声子相互作用增强,带尾宽度缓慢变窄。 关键词：     

High power all-solid-state quasi-continuous-wave tunable Ti:sapphire laser system

This paper reports a high power, all-solid-state, quasi-continuous-wave tunable Ti:sapphire laser system pumped by laser diode (LD) pumped frequency-doubled Nd:YAG laser. The maximum tuned output power of 4.2 W (797 nm) and tuned average power of 3.7 W were achieved when fixing the Ti:sapphire broadband output power at 5.0 W and applying 750-850 nm broadband coated mirror.     

Measurement of hyperfine structure and isotope shifts in the 580.56nm line of 142－145,146,148,150Nd+

Isotope shifts and hyperfine spectrum of singly ionized neodymium ion was measured by collinear fast-ion-beam laser spectroscopy. The hyperfine A constants and B constants are obtained for the (23230)9/2^0 level and 4f^45d ^6K9/2 level, respectively. The optical isotope shifts between seven isotopes in the 580.56 nm of^142-145,146,148,150Nd^ line are determined. The configuration admixtures for (23230)9/2^0 level were quantitatively analysed to be 4f^46p, 4f^35d^2, and 4f^35d6p with mixing coefficients of 67%, 5%, and 28%, respectively.     

退火温度对低温生长MgxZn1－xO薄膜光学性质的影响

用射频磁控溅射法在80℃衬底温度下制备出Mg_xZn_1-xO(x=0.16)薄膜，用X射线衍射(XRD)、光致发光(PL)和透射谱研究了退火温度对Mg_xZn_1-xO薄膜结构和光学性质的影响.测量结果显示，Mg_xZn_1-xO薄膜为单相六角纤锌矿结构，并且具有沿c轴的择优取向；随着退火温度的升高，(002)XRD峰强度、平均晶粒尺寸和紫外PL峰强度增大，(002)XRD峰半高宽(F 关键词： xZn_1-xO薄膜')" href="#">Mg_xZn_1-xO薄膜 射频磁控溅射 退火     

The optical properties of MgxZnl-xO thin films

Mg_xZn_1-xO thin films have been prepared on silicon substrates by radio frequency magnetron sputtering at 60℃. The thin films have hexagonal wurtzite single-phase structure and a preferred orientation with the c-axis perpendicular to the substrates. The refractive indices of Mg_xZn_1-xO films are studied at room temperature by spectroscopic ellipsometry over the wavelength range of 400--760\,nm at the incident angle of 70℃. Both absorption coefficients and optical band gaps of Mg_xZn_1-xO films are determined by the transmittance spectra. While Mg content is increasing, the absorption edges of Mg_xZn_1-xO films shift to higher energies and band gaps linearly increase from 3.24.eV at x=0 to 3.90\,eV at x=0.30. These results provide important information for the design and modelling of ZnO/ Mg_xZn_1-xO heterostructure optoelectronic devices.     

159TbII超精细结构光谱测量

利用具有光谱高分辨和选择性激发等特点的共线快离子束激光光谱学方法研究了^159TbⅡ亚稳态4f^95d^7H8^0和激发态4f^96p3/2(15/2,3/2)的超精细结构光谱，所有光谱线可以很好地分辨；并由实验测量得到的高分辨超精细结构光谱，给出了相应能级的超精细结构常数。     

~(159)TbII超精细结构光谱测量

利用具有光谱高分辨和选择性激发等特点的共线快离子束激光光谱学方法研究了159Tb II亚稳态 4 f95 d7H08和激发态 4 f96 p3 / 2 ( 1 5 /2 ,3/2 )的超精细结构光谱 ,所有光谱线可以很好地分辨 ;并由实验测量到的高分辨超精细结构光谱 ,给出了相应能级的超精细结构常数     

Characterization of ZnO:AI films deposited by r.f.magnetron-sputtering at low temperature

Transparent conducting ZnO:AI thin films with good adhesion and Iow resistivity have been prepared on organic substrates and Coming 7059 glass substrates by r.f. magnetron-sputtering technique at Iow substrate temperature (25-210℃). Structural and photoelectric properties of the deposited films are investigated. The deposited films are polycrystalline with hexagonal structure and a preferred orientation with the c-axis perpendicular to the substrate. Only the (002) peak is observed.High quality films with resistivity as Iow as 1.0 x 10- 3Ω@ cm and 8.4 x 10- 4Ω@ cm, the average transmittance over 74% and 85% in the wavelength range of the visible spectrum have been obtained on different substrates.     

Si(111)衬底GaN薄膜的制备与特性

用溅射后退火反应法在Si(111)衬底上制备的高质量GaN薄膜. XRD, XPS, SEM和PL测量结果表明该方法制备的GaN是六角纤锌矿结构的多晶. GaN的最大晶粒尺寸约为100 nm. 在354 nm处发现强室温光致发光峰, 带隙相对于体GaN发生了轻微蓝移.     

腔靶转换区辐射温度测量及定标关系

对近年来的激光腔靶实验的辐射温度作了综合分析和研究。对多种不同类型的柱型腔靶,在波长1.06μm的各种激光条件(不同的能量和脉宽)下,测量了腔靶转换区的辐射温度,并研究了辐射温度作为入腔激光能量、脉宽及腔靶转换区内表面积函数的定标关系。