排序方式: 共有13条查询结果,搜索用时 156 毫秒
1.
用射频磁控溅射法在80℃衬底温度下制备出MgxZn1-xO(x=0.16)薄膜,用X射线衍射(XRD)、光致发光(PL)和透射谱研究了退火温度对MgxZn1-xO薄膜结构和光学性质的影响.测量结果显示,MgxZn1-xO薄膜为单相六角纤锌矿结构,并且具有沿c轴的择优取向;随着退火温度的升高,(002)XRD峰强度、平均晶粒尺寸和紫外PL峰强度增大,(002)XRD峰半高宽(F
关键词:
xZn1-xO薄膜')" href="#">MgxZn1-xO薄膜
射频磁控溅射
退火 相似文献
2.
MgxZn1-xO thin films have been prepared on silicon substrates by radio
frequency magnetron sputtering at 60℃. The thin films have hexagonal
wurtzite single-phase structure and a preferred orientation with the c-axis
perpendicular to the substrates. The refractive indices of MgxZn1-xO films
are studied at room temperature by spectroscopic ellipsometry over the wavelength
range of 400--760\,nm at the incident angle of 70℃. Both absorption
coefficients and optical band gaps of MgxZn1-xO films are determined by
the transmittance spectra. While Mg content is increasing, the absorption edges of
MgxZn1-xO films shift to higher energies and band gaps linearly increase
from 3.24.eV at x=0 to 3.90\,eV at x=0.30. These results provide important
information for the design and modelling of ZnO/ MgxZn1-xO heterostructure
optoelectronic devices. 相似文献
3.
MgZnO薄膜及其量子阱和超晶格的发光特性 总被引:11,自引:4,他引:7
MgO和ZnO形成合金MgxZn1-xO的带隙可以在3.3~7.9eV之间变化,在制备紫外波段光电器件方面有着广阔的应用前景.由ZnO和MgZnO交替沉积而成的ZnO/MgxZn1-xO量子阱和超晶格在激光器、光探测器和其他光电器件方面也有潜在的应用价值.回顾最近几年对MgZnO薄膜材料发光特性的研究进展,介绍在不同衬底上用不同方法制备MgZnO合金薄膜的制备技术、发光特性以及发光特性与薄膜中Mg含量的关系;综述近年来在ZnO/MgxZn1-xO超晶格、量子阱研究上的成果,特别介绍了ZnO/MgxZn1-xO对超晶格、量子阱的发光特性、发光机理以及发光特性与势垒层镁含量、器件温度的关系. 相似文献
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用射频磁控溅射法在蓝宝石衬底上制备出ZnO薄膜,通过X射线衍射(XRD)、扫描电镜(SEM)和光致发光(PL)谱等研究了退火温度对ZnO薄膜结构和光学性质的影响。测量结果显示,所制备的ZnO薄膜为六角纤锌矿结构,具有沿c轴的择优取向;随着退火温度的升高,(002)XRD峰强度和平均晶粒尺寸增大,(002)XRD峰半高宽(FWHM)减小,光致发光紫外峰强度增强。结果证明,用射频磁控溅射法通过适当控制退火温度可得到高质量ZnO薄膜。 相似文献
7.
用射频磁控溅射法在80℃衬底温度下制备出MgxZn1-xO(x=0.16)薄膜,用X射线衍射(XRD)、光致发光(PL)和透射谱研究了退火温度对MgxZn1-xO薄膜结构和光学性质的影响.测量结果显示,MgxZn1-xO薄膜为单相六角纤锌矿结构,并且具有沿c轴的择优取向;随着退火温度的升高,(002)XRD峰强度、平均晶粒尺寸和紫外PL峰强度增大,(002)XRD峰半高宽(FWHM)减小.结果证明,用射频磁控溅射法通过适当控制退火温度可得到高质量MgxZn1-xO薄膜. 相似文献
8.
用射频磁控溅射法在80℃的衬底温度下制备出MgxZn1-xO(0≤x ≤030)薄膜.x射线 衍射(XRD)结果表明,MgxZn1-xO薄膜为单相六角纤锌矿结构, 没有形成任何显著 的MgO分离相,MgxZn1-xO薄膜的择优取向平行于与衬底垂直的 c轴;c轴晶格常数随着Mg含量的增加逐渐减小.在MgxZn1-xO薄膜的光透射谱中出现 锐利的吸收边,由透 射谱估算出MgxZn1-xO薄膜的带隙宽度由332eV(x=0)线性地 增加到396eV(x=030).
关键词:
xZn1-xO薄膜')" href="#">MgxZn1-xO薄膜
射频磁控溅射
Mg含量 相似文献
9.
用射频磁控溅射法在80℃的衬底温度下制备出MgxZn1-xO(0≤x≤0.30)薄膜.x射线衍射(XRD)结果表明,MgxZn1-xO薄膜为单相六角纤锌矿结构,没有形成任何显著的MgO分离相,MgxZn1-xO薄膜的择优取向平行于与衬底垂直的c轴;c轴晶格常数随着Mg含量的增加逐渐减小.在MgxZn1-xO薄膜的光透射谱中出现锐利的吸收边,由透射谱估算出MgxZn1-xO薄膜的带隙宽度由3.32eV(x=0)线性地增加到3.96eV(x=0.30). 相似文献
10.
MgxZn1-xO films (x = 0.23) have been prepared on silicon substrates by radio-frequency magnetron sputtering at 80℃. The structure properties of Mgx Zn1-xO films are studied using x-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM), x-ray photoelectron spectroscopy and Raman spectra. The analysis of XRD and HRTEM indicates that the Mgx Zn1-xO films have hexagonal wurtzite single-phase structures and a preferred orientation with the c axis perpendicular to the substrates. Raman spectra of ZnO and MgxZn1-xO films reveal that the MgxZn1-xO films have not only the hexagonal wurtzite structure but also higher crystalline quality than ZnO films. 相似文献