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Transparent conducting ZnO:AI thin films with good adhesion and Iow resistivity have been prepared on organic substrates and Coming 7059 glass substrates by r.f. magnetron-sputtering technique at Iow substrate temperature (25-210℃). Structural and photoelectric properties of the deposited films are investigated. The deposited films are polycrystalline with hexagonal structure and a preferred orientation with the c-axis perpendicular to the substrate. Only the (002) peak is observed.High quality films with resistivity as Iow as 1.0 x 10- 3Ω@ cm and 8.4 x 10- 4Ω@ cm, the average transmittance over 74% and 85% in the wavelength range of the visible spectrum have been obtained on different substrates. 相似文献
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利用射频磁控溅射法在有机薄膜衬底和7059玻璃衬底上制备出了具有良好附着性的低电阻率的ZnO:Al透明导电膜,对在低温(25~210℃)下制备薄膜的结构和光电特性进行了比较研究. 铝掺杂的氧化锌薄膜是多晶膜,具有六角纤锌矿结构,最佳取向为(002)方向.薄膜的最低电阻率分别为1.0×10-3和8.4×10-4Ω·cm,在可见光区的平均透过率分别达到了72%和85%. 相似文献
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