直流磁控溅射Cr-Cr2O3复合金属陶瓷薄膜光学特性研究

采用直流反应磁控溅射技术在不同靶电流条件下制备了Cr-Cr2O3金属陶瓷薄膜,并利用椭偏仪测量了薄膜的光学常数.采用修正的M-G(Maxwell-Gannett)理论对不同靶电流条件下沉积的Cr-Cr2O3金属陶瓷薄膜的光学常数进行了理论计算,并将理论计算结果与实验数据进行了比较.结果表明:随着靶电流的增加,膜层中金属微粒体积百分比增加,金属微粒的平均半径随之增加,且金属微粒逐渐趋于扁圆形,理论计算结果与实验结果吻合较好.     

Nd3+掺杂B2O3-Nb2O5-BaO-La2O3玻璃光谱性质的研究

 用高温熔融法制备了Nd³⁺(物质的量分数2％）掺杂40B₂O₃-(15-χ)Nb₂O₅-45BaO-χLa₂O₃玻璃，测量了样品的吸收光谱、发射光谱和差热分析（DTA）曲线。根据Nd3+光学跃起矩阵的特点，应用Judd-Ofelt理论，从吸收光谱获得了Nd³⁺光学跃起的强度参数。并计算了Nd³⁺离子的自发辐射跃迁几率、总自发辐射几率、荧光分支比、辐射能级寿命和受激发射截面。结果表明：该体系玻璃中，随着Nb₂O₅ 含量的增加和La₂O₃₂增大，说明材料的对称性降低；而Ω₆减小，说明Nd-O键的共价性和键强增强；受激发射截面减小。DTA实验表明，随着Nb₂O₅含量的增加，材料的热稳定性提高。     

SnO2:Zr薄膜对SO2气体的光学气敏特性研究

采用双靶反应溅射制得SnO₂:Zr薄膜,并对它作了150°C下SO₂气敏光学特性试验,首次发现在适当工艺条件下制得的SnO₂:Zr薄膜在近红外波段(1.7～3μm)对SO₂气体具有明显的光学气敏特性,在2.65μm附近透过率上升幅度达10%左右.Zr的引入增强了SnO₂薄膜对SO₂的吸附能力.用二次离子质谱对吸附SO₂前后的薄膜作了组分相对含量分析.本实验结果对今后研究高性能SO₂气敏传感器有一定的价值.     

高压高温下B2O3与Mg和Li3N的反应

 通过B₂O₃与Mg和Li₃N分别在不同温度压力条件下的反应，用X射线方法研究了生成物的物相。当采用Mg与B₂O₃为原料时，其产物是Mg₃B₂O₆；用Li₃N与B₂O₃反应时，产物中除了Li₃BO₃，还有立方氮化硼（cBN）生成。这表明，当原料中含有相同数量B₂O₃时，用Mg和Li₃N分别作触媒合成立方氮化硼，将得到不同的结果。     

高压下高温超导材料YBa2Cu3O7的电子结构

 本文选用拟合能带的Harrison参数构造紧束缚哈密顿矩阵，采取Recursion方法计算了YBa₂Cu₃O₇晶体在常压下与9 GPa高压下（此时晶格常数压缩3%）的电子结构。讨论了高压对于电子结构的影响。给出了高压下费米面移动，能带展宽和各晶位原子价变化的定量结果。     

光激励C2HCl3原子团对铜薄膜的微细刻蚀

本文主要讨论在由O₂携带的C₂HCl₃气氛中,利用准分子激光对铜薄膜印刷板进行微细刻蚀的机理和实验研究结果。     

Ba2-xLaxTi4O11在静高压下的拉曼振动光谱及软模相变研究

 本文测量了Ba_1.8La_0.2Ti₄O₁₁和Ba_1.6La_0.4Ti₄O₁₁在静高压下的拉曼振动谱，发现了软模的耦合模行为。通过比较Ba₂Ti₄O₁₁的热力学理论计算值和实验数据，确认这种耦合是软模和一个声学模间的耦合，发生的相变是一个由具有B_g对称性的带中心软光学声子驱动的二级铁弹相变。     

钙钛矿结构材料Sr8CaRe3Cu4O24压力效应的研究

 基于密度泛函理论,运用局域轨道密度近似+哈伯德相互作用和平均场方法,研究了新型钙钛矿结构材料Sr₈CaRe₃Cu₄O₂₄在不同压强下的机械、电磁性质,并探讨该材料的居里温度T_C随压强变化的规律。计算结果表明：T_C随着压强的增加而升高,费米面附近能隙逐渐减小。最后通过海森伯模型对此作出了较为合理的解释。     

稀土焦绿石化合物R2Fe4/3W2/3O7的高温高压稳定性研究和X射线相分析

 本文利用X射线粉末衍射和位敏探测技术，研究了R₂Fe_4/3W_2/3O₇（R=Er、Yb、Dy）化合物经高温高压处理后的变化情况。在3.7 GPa，1 200 ℃条件下，六方相R₂Fe_4/3W_2/3O₇化合物按两种方式分解，而直接由R₂O₃，Fe₂O₃和WO₃原料出发，经上述同样的高温高压条件合成所得的产物与六方相高温高压分解产物相同，均为R₂WO₆、RFeO₃、WO₃和Fe₂O₃的多相聚合物。同时给出了R₂Fe_4/3W_2/3O₇六方相高温高压下的稳定区范围。     

0212型Ca3Cu2O4+δCl2-y化合物高温高压合成与研究

 利用“顶角氧掺杂”机制，即以二价氧部分替代顶角一价氯，用Ag₂O做氧源，在高温高压下制备了单相的Ca₃Cu₂O_4+δCl_2-y样品。X射线衍射分析发现，随着Ag₂O含量的增加，Ca₃Cu₂O_4+δCl_2-y样品的晶格常数a逐渐变小，c逐渐增大，体现了空穴掺杂的本质。进行了电阻率和磁化率测量，没有发现超导性，可能是空穴载流子没有达到合适的浓度所致。     

Ag-MgF2复合纳米金属陶瓷薄膜的渗透阈研究

介绍了几种计算纳米金属颗粒镶嵌于陶瓷基体中而形成的复合纳米金属陶瓷薄膜渗透阈的理论方法，分析了理论方法中所运用模型的特点及其精度.并将Landauer有效介质理论和Priou渗透阈理论应用于Ag-MgF₂复合纳米金属陶瓷薄膜的渗透阈计算，所得值分别为0.08和0.14(Ag的体积分数)，按Priou渗透阈理论计算的结果与实验结果相符.最后讨论了影响复合金属陶瓷薄膜体系渗透阈的主要因素. 关键词： 2复合纳米金属陶瓷薄膜')" href="#">Ag-MgF₂复合纳米金属陶瓷薄膜 渗透阈理论 渗透阈     

Microstructure and optical absorption of Au-MgF2 nanoparticle cermet films

The microstructure and optical absorption of Au-MgF2 nanoparticle cermet films with different Au contents are studied. The microstructural analysis shows that the films are mainly composed of the amorphous MgF2 matrix with embedded fcc Au nanoparticles with a mean size of 9.8-21.4nm. Spectral analysis suggests that the surface plasma resonance （SPR） absorption peak of Au particles appears at λ=492-537nm. With increasing Au content, absorption peak intensity increases, profile narrows and location redshifts. Theoretical absorption spectra are calculated based on Maxwell-Garnett theory and compared with experimental spectra.     

Optical characterization of amorphous Ga50Se45S5 films

The transmission spectra of thermally evaporated Ga₅₀Se₄₅S₅ films were measured over the wavelength range 300–900 nm. A simple method, suggested by Swanepoel, was used for the determination of the optical constants and thickness of the films. Increasing the thickness of the film beyond 450 nm does not affect the optical constants. The dependence of the absorption coefficient on the photon energy (hν) at the edge of the absorption band is well described by the relation hν=β(hν−E_opt)² with an optical gap equals 2.4 eV. A good fit of the experimental points with Tauc relation indicates that non-direct transition is the most probable mechanism responsible for the photon absorption inside the investigated film.     

Structural, electronic and optical properties of orthorhombic distorted perovskite TbMnO3

This paper calculates the structural parameters, electronic and optical properties of orthorhombic distorted perovskite-type TbMnO3 by first principles using density functional theory within the generalised gradient approximation. The calculated equilibrium lattice constants are in a reasonable agreement with theoretical and experimental data. The energy band structure, density of states and partial density of states of elements are obtained. Band structures show that TbMnO3 is an indirect band gap between the O 2p states and Mn 3d states, and the band gap is of 0.48 eV agreeing with experimental result. Furthermore, the optical properties, including the dielectric function, absorption coefficient, optical reflectivity, refractive index and energy loss spectrum are calculated and analysed, showing that the TbMnO3 is a promising dielectric material.     

Au/SiO2纳米多层薄膜的制备及其性质表征

利用多靶磁控溅射技术制备了Au/SiO₂纳米颗粒分散氧化物多层复合薄膜.研究了在保持Au单层颗粒膜沉积时间一定时薄膜厚度一定、变化SiO₂的沉积时间及SiO₂的沉积时间一定而改变薄膜厚度时，多层薄膜在薄膜厚度方向的微观结构对吸收光谱的影响.研究结果表明：具有纳米层状结构的Au/SiO₂多层薄膜在560 nm波长附近有明显的表面等离子共振吸收峰，吸收峰的强度随Au颗粒的浓度增加而增强，在Au颗粒浓度相同的情况下，复合薄膜 关键词： 2纳米复合薄膜')" href="#">Au/SiO₂纳米复合薄膜 多靶磁控溅射 吸收光谱 有效介质理论     

Electronic properties of thin films of laser-ablated Al2O3

Laser ablation coupled to mass quadrupole spectrometry (LAMQS) has been used to prepare thin films of aluminum oxide deposited on Si substrates starting from commercial Al₂O₃ polycrystalline targets. X-ray photoemission (XPS) and reflection electron energy loss spectroscopy (REELS) have allowed the investigation of the electronic properties of the produced films. In particular, it was found that the Al/O atomic ratio assumes a value very near to 0.7 (stoichiometric ratio) only for films deposited normally with respect to the target surface, while films grown at larger deposition angles are more rich in oxygen content.The composition, the mass density, the optical energy gap, the complex dielectric function and refraction index of the films have been calculated and compared with the results obtained from our starting target material and with the literature. The morphology of the deposited samples has been analyzed by the AFM technique.     

基于透射光谱确定溶胶凝胶ZrO2薄膜的光学常数

基于溶胶凝胶ZrO₂薄膜的紫外/可见/近红外透射实验光谱,采用Swanepoel方法结合Wemple-DiDomenico色散模型,方便地导出了ZrO₂薄膜在200—1200nm波长范围内的光学常数,包括折射率、色散常数、膜层厚度、吸收系数及能量带隙.研究发现,溶胶凝胶ZrO₂薄膜具有高折射率(1.63—1.93,测试波长为632.8nm)、低吸收和直接能量带隙(4.97—5.63eV) 等光学特性,而且其光学常数对薄膜制备过程中的重要工艺 关键词： 光学常数 Swanepoel方法 2薄膜')" href="#">ZrO₂薄膜 热处理     

Formation of Ge35In8S57 amorphous films for optical applications

Thin films of In-doped Ge-S in the form of Ge₃₅In₈S₅₇ with different film thickness were deposited using an evaporation method. The X-ray diffraction studies demonstrate that the as-prepared films are amorphous in nature for these films. Some optical constants were calculated at a thickness of 150, 300, 450 and 900?nm and annealing temperature of 373, 413, 437 and 513?K. Our optical observations show that the mechanism of the optical transition obeys the indirect transition. It was found that the energy gap, E_g, decreases from 2.44 to 2.20?eV with expanding the thickness of the film from 150 to 900?nm. On the other hand, it was found that E_g increases with annealing temperature from 373 to 513?K. The increment in the band gap can be attributed to the gradual annealing out of the unsaturated bonds delivering a decreasing the density of localized states in the band structure. Using the single oscillator model, the dispersion of the refractive index is described. The dispersion constants of these films were calculated with different both thickness and annealing temperatures. Additionally, both of nonlinear susceptibility, χ⁽³⁾ and nonlinear refractive index, n₂ were calculated.     

Structure-related infrared optical properties of BaTiO3 thin films grown on Pt/Ti/SiO2/Si substrates

BaTiO₃ thin films with different thickness have been grown on Pt/Ti/SiO₂/Si substrates by a modified sol-gel method. X-ray diffraction analyses show that the BaTiO₃ thin films are polycrystalline. The crystalline quality of the films is improved with increasing thickness. The infrared optical properties of the BaTiO₃ thin films have been investigated using an infrared spectroscopic ellipsometry in the wave number range of 800-4000 cm⁻¹ (2.5-12.5 μm). By fitting the measured pseudodielectric functions with a three-phase model (Air/BaTiO₃/Pt), and a derived classical dispersion relation for the thin films, the optical constants and thicknesses of the thin films have been simultaneously obtained. The refractive index of the BaTiO₃ thin films increases and on the other hand, the extinction coefficient does not change with increasing thickness in the entirely measured wave number range. The dependence of the refractive index on the film thickness has been discussed in detail and was mainly due to both the crystalline quality of the films and packing density. Finally, the absorption coefficient was calculated in the infrared region for applications in the pyroelectric IR detectors.     

Effect of sputtering anisotropic ejection on the optical properties and residual stress of Nb2O5 thin films

The effect of sputtering anisotropic ejection on the optical properties and internal stress of niobium pentoxide (Nb₂O₅) films prepared by ion-beam sputtering deposition (IBSD) was investigated experimentally. Thin films were deposited on unheated BK7 glass substrates and silicon wafers at different ejection angles surrounding a metal target. The ejection angles varied from 0° to 75° in increments of 15° for each substrate. It was found that the optical constants of the Nb₂O₅ films were significantly influenced by the sputtering ejection angle. The surface roughness and residual stress in the Nb₂O₅ thin films were also found to vary with the ejection angle. In this work, Nb₂O₅ films had a higher refractive index, lower absorption, lower stress and lower roughness when films deposited at an ejection angle of 30°.