离子注入对多孔硅可见光发射特性的影响

本文在前期对多孔硅发光机理研究的基础上,研究了离子注入对多孔硅光致发光的影响.实验表明离子注入除了可以降低多孔硅光致发光的强度外,还将使多孔硅的光致发光光谱谱峰产生蓝移、半高宽展宽,并在多孔硅发光谱带中产生一些发光减弱区和次峰结构.文中最后对实验现象做了解释.     

基于多孔硅分布Bragg反射镜的有机微腔的光学性质

报道了采用多孔硅多层膜作为Bragg反射镜的有机半导体光学微腔.被测样品的光致发光谱半 高宽可由无微腔下的83nm窄化为有微腔时的4nm,非共振模得到有效的抑制.同时共振峰强度 的增强和峰位随出射角增大的“蓝移”等微腔效应也被观测到. 关键词： 微腔 多孔硅 有机半导体     

激光诱导多孔硅晶格畸变的Raman光谱和光致发光谱研究

研究了掺钛水热法制备多孔硅的Raman光谱和光致发光谱.实验发现,当激光功率较低时,多孔硅的Raman光谱在略低于520cm^-1附近表现为一锐的单峰,和晶体硅的Raman光谱类似.随激光功率增大,该单峰向低波数移动,Raman和光致发光峰的强度与激光强度的一次方成正比.当激光功率增大到一定值时,该单峰分裂成两个Raman峰,光致发光谱的强度突然增大,与激光强度之间不再满足一次方的关系,位于低波数一侧的Raman峰随激光功率增大进一步向低波数移动.多孔硅Raman光谱随激光功率的变化是 关键词： 多孔硅 Raman光谱 光致发光     

蓝光发射多孔硅RTO过程中的尺寸分离效应

对用水热腐蚀技术制备的、具有蓝光发射的多孔硅样品在快速热氧化(RTO)处理前后其光致发光谱、硅纳米颗粒的大小及尺寸分布变化进行了研究.实验发现,新鲜多孔硅样品经过RTO处理后,其光致发光谱整体蓝移并由单发光峰分裂为两个发光峰;与此对应,样品中的硅纳米颗粒在整体减小的同时出现尺寸分离现象.这一结果表明,多孔硅中的短波长发射也具有强烈的尺寸相关性. 关键词：     

掺铜及掺铝多孔硅的光致发光及其发光机理

分别将特定杂质铜和铝引入多孔硅后，观察到了杂质铜和铝所引起的附加发光带：对于没有掺铜的多孔硅，其光致发光谱只有一个发光带；而掺过铜的多孔硅，其光致发光谱出现两个发光带，其中能量较低的发光带随主发光带而变化。在掺铝多孔硅的光致发光谱中，则出现4个与铝杂质能级有关发光带。我们认为上述与杂质有关的发光带是由截流子在杂质深能级上复合所致。     

激光促进多孔硅内表面氧化与光致发光的退化

本文对刚制备的以及分别经以下三种情况:1.样品在1大气压的氧气中经激光(Ar~+激光器的48.80nm线,功率密度为1.77W/cm~2)连续照射1小时;2.样品在1大气压的氧气中在没有激光照射的情况下保持1小时;3.样品在1.3×10~2Pa真空度下用激光连续照射1小时处理后的多孔硅在室温下进行了光致发光谱和傅里叶变换红外吸收测量,研究了处理前后光谱的变化。实验发现经第一种情况处理后光致发光峰位蓝移了约0.1eV,发光强度衰减了二十几倍,相应的其红外光谱中与氧有关的吸收峰强度大幅度增长,而经第二,三两种情况处理后它们的光致发光及红外吸收谱则无大的变化。研究表明在氧气中激光辐照能大大加速多孔硅内表面的氧化。我们认为很可能是多孔硅内表面的氧化作用使光致发光峰位蓝移,由氧化作用产生的非辐射复合中心导致光致发光效率的下降。     

镶嵌于多孔硅微腔中8-羟基喹啉铝的窄峰发射

利用浸渍法将8羟基喹啉铝(Alq₃)镶嵌到多孔硅微腔中,制备了多孔硅微腔—Alq₃镶嵌膜,研究了多孔硅微腔对镶嵌其中的Alq₃自发发射的微腔效应,观察到了光谱窄化、发光强度增强等现象。镶嵌于多孔硅微腔中的Alq₃荧光光谱的半峰全宽只有15nm,而非微腔样品,即镶嵌于普通的单层多孔硅中Alq₃荧光谱半峰全宽在85nm以上。并且有微腔时Alq₃发光强度比没有微腔时Alq₃发光强度增强一个数量级。随机改变微腔中Bragg反射镜高折射率层的几何厚度可使高反射区展宽,从而更加有效地抑制了多孔硅本身的发光模,使发光色度更纯,但由于峰值透射率减小,导致共振峰强度有所减小。多孔硅微腔有机镶嵌膜有可能成为进一步发展Alq₃在电致发光器件方面应用的一条新途径。     

发射可见光多孔硅的拉曼光谱

本文报导了多孔硅的拉曼散射和光致发光的研究。给出了多孔硅的拉曼和光致发光谱之间的对应关系,根据拉曼峰的移动,估算了多孔硅量子线横截面的平均尺度为2.1～4.2nm。     

铜掺杂多孔硅的光致荧光猝灭

采用浸泡镀敷的方法在多孔硅表面形成了一铜镀层,通过对掺铜前后多孔硅的光致发光(PL)谱和傅里叶变换红外(FTIR)吸收光谱的研究,讨论了铜在多孔硅表面的吸附对其光致发光的影响。实验表明,掺铜对多孔硅的光致发光具有明显的猝灭效应,并使多孔硅的发光峰位蓝移。由于多孔硅表面铜的吸附使硅-氢键明显减少,而铜原子和硅的悬挂键成键会形成新的非辐射复合中心,从而使多孔硅的光致发光强度衰减。且浸泡溶液的浓度越高,这种猝灭效应越明显。而多孔硅发光峰位的蓝移,则是由于在发生金属淀积的同时伴随着多孔硅表面Si的氧化过程(纳米Si氧化为SiO2)的缘故。     

稀土掺杂硅基薄膜的高效发光特性

测量了在不同离子注入剂量,不同退火条件下的Nd注入Si基晶片室温光致发光谱,结果表明它们均具有蓝、紫发光峰,且发光稳定。在一定范围内发光效率随掺杂浓度的增加而增大,随退火条件的不同而改变。在实验室条件下,对掺杂硅片和单晶硅片进行电化学腐蚀制成多孔硅样片,同时用适当配比的HNO3对以单晶硅为基底的多孔硅进行处理,测试了腐蚀后各类样品的光致发光（PL）谱。发现掺稀土Nd的多孔硅和用HNO3处理的多孔硅的发光效率有显著提高。     

Improvement of the luminescence in p-type as-prepared or dye impregnated porous silicon microcavities

We have realized distributed Bragg reflectors and microcavities with a remarkable optical quality (R_max.=99.5% at 850 nm, FWHM=5 nm at 772 nm) with low doped p-type silicon. This is due to a strong decrease of the porous Si/bulk Si interface roughness that was obtained by low-temperature anodization. The properties of porous silicon microcavities are investigated by photoluminescence and reflection measurements. We also have filled porous silicon with Rhodamine 800 dye. The spontaneous emission spectrum of the optically excited Rhodamine 800 is drastically modified by microcavity effect: the peak emission intensity is increased, the line width is narrowed. The results demonstrate that using all porous silicon or dye-filled microcavities provides new possibilities to improve the properties of photonic devices.     

Photoluminescence studies of porous silicon microcavities

Narrow photoluminescence peaks with a full-width at half-maximum of 14–20 nm are obtained from porous silicon microcavities (PSM) fabricated by the electrochemical etching of a Si multilayer grown by molecular beam epitaxy. The microcavity structure contains an active porous silicon layer sandwiched between two distributed porous silicon Bragg reflectors; the latter were fabricated by etching a Si multilayer doped alternatively with high and low boron concentrations. The structural and optical properties of the PSMs are characterised by scanning electron microscopy and photoluminescence (PL). The wavelength of the narrow PL peaks could be tuned in the range of 700–810 nm by altering the optical constants.     

Controlled emission from dye saturated single and coupled microcavities

Modified photoluminescence is demonstrated from the dye saturated porous silicon based single and coupled microcavities. When photonic cavity mode is weakly coupled to the emission states of the dye, photoluminescence line narrowing and intensity enhancement have been observed. Our experimental work and transfer matrix simulations and cavity modelling convincingly explain the tunability and optical field confinement within the microcavity. We also show that the photoluminescence enhancement is due to one-dimensional microcavity effect. These optically active hybrid materials from inexpensive fabrication may become an important consideration for many photonic applications.     

Annealing and amorphous silicon passivation of porous silicon with blue light emission

The photoluminescence (PL) of the annealed and amorphous silicon passivated porous silicon with blue emission has been investigated. The N-type and P-type porous silicon fabricated by electrochemical etching was annealed in the temperature range of 700-900 °C, and was coated with amorphous silicon formed in a plasma-enhanced chemical vapor deposition (PECVD) process. After annealing, the variation of PL intensity of N-type porous silicon was different from that of P-type porous silicon, depending on their structure. It was also found that during annealing at 900 °C, the coated amorphous silicon crystallized into polycrystalline silicon, which passivated the irradiative centers on the surface of porous silicon so as to increase the intensity of the blue emission.     

Effect of rapid thermal treatment on photoluminescence of surface passivated porous silicon

The photoluminescence of porous silicon with and without carbon deposition fabricated by plasma-enhanced chemical vapor deposition technique has been investigated. After the deposition, the rapid thermal processes in the temperature ranging from 500 to 1100 °C have been carried out. It was found that after the carbon deposition a new intense blue emission appeared. The rapid thermal processes at 800and 900 °C could enhance the blue emission, while the other rapid thermal processes quenched it. Finally, the mechanism for the effect of carbon deposition and rapid thermal processes on photoluminescence properties of porous silicon was discussed.     

Tunable photoluminescence of porous silicon by liquid crystal infiltration

The photoluminescence (PL) of porous silicon films has been investigated as a function of the amount of liquid crystal molecules that are infiltrated into the constricted geometry of the porous silicon films. A typical nematic liquid crystal 4-pentyl-4′-cyanobiphenyl was employed in our experiment as the filler to modify the PL of porous silicon. It is found that the originally red PL of porous silicon films can be tuned to blue by simply adjusting the amount of liquid crystal molecules in the microchannels of the porous films. The chromaticity coordinates are calculated for the recorded PL spectra. The mechanism of the tunable PL is discussed. Our results have demonstrated that the luminescent properties of porous silicon films can be efficiently tuned by liquid crystal infiltration.     

Peculiarities of photoluminescence of porous silicon with luminescent liquid crystal fillers

Photoluminescence spectra of porous silicon filled by luminescent liquid crystals 5CB and H109 were investigated. It was observed that there were photoluminescence bands corresponding to both porous silicon and liquid crystal in experimental spectra. In addition, the band corresponding to porous silicon increases in comparison with photoluminescence of porous silicon without the filler. Experimental results are explained by the radiating and nonradiating energy transfer from liquid crystal to porous silicon.     

嵌入多孔硅中的C60分子的发光行为

1990年团簇C60分子分离的成功[1],立即引起了科学界的极大重视,有关C60分子的超导电性、光谱特性以及电子能级结构的研究报道与日俱增,由于单个C60分子是直径为7.1Å的球形分子,因而在某种程度上对于由C60分子聚集而成的具有几个纳米尺寸的CBO微晶的体系应该也具有类似于半导体超微粒低维量子限域的物理特性.     

Correlation of excitation-wavelength dependent photoluminescence with the fractal microstructures of porous silicon

The correlation of the excitation-wavelength dependent photoluminescence with the fractal microstructures of porous silicon has been investigated. As the excitation wavelength increases from 340 to 650 nm, the photoluminescence of porous silicon redshifts from 500 to 780 nm. The excitation-wavelength dependent photoluminescence suggests the existence of a size distribution for the large number of silicon nanocrystallites in porous silicon. Using scanning electron microscopy and computer simulation, we have investigated the fractal features of the microstructures of porous silicon. Our results have demonstrated that the fractal features in the microstructures of porous silicon indicate the existence of a size distribution for the silicon nanocrystallites in porous silicon. The recorded excitation-wavelength dependent photoluminescence of porous silicon can be interpreted in terms of the bond-order-length-strength correlation theory.     

金刚石膜/多孔硅复合材料的性能表征

提出了一种新颖的多孔硅表面钝化技术,即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。采用原子力显微镜（AFM）、扫描电子显微镜（SEM）、X射线衍射仪（XRD）、拉曼光 谱仪和荧光分光度计对多孔硅及金刚石膜的表面形貌、结构和发光特性进行了表征。结果表明采用微波等离子体化学气相沉积法可在多孔硅基片上形成均匀、致密、性能稳定且对可见光具有全透性的金刚石膜。金刚石膜与多孔硅的复合,大大稳定了多孔硅的发光波长和强度,同时增强了多孔硅的机械强度。