高分辨电子显微镜研究α-Si3N4晶格缺陷

对于用MgO和LiF作为添加剂以热压法制备的α-Si₃N₄进行高分辨电子显微镜观察时,发现结构缺陷。观察到在三晶粒晶界处有分相现象,这表明晶界玻璃相化学成分不均匀。在晶粒中,由晶格变形和(100)晶面位移所引起应力区域时有发现。在有些区域晶格变形是如此严重,以致晶胞的六方对称性都失掉了。晶格的形变可借助于(100)晶面间距与正常值6.771?的偏离加以衡量。用高分辨电子显微镜,我们发现α-Si₃N₄存在辐射损伤,这可能 关键词：     

Analytical electron microscopy of a reaction-bonded Si3N4-based ceramic containing oxide additions

The microstructure of a silicon nitride (Si₃N₄)-based ceramic, prepared by a process combining direct nitridation and reactive liquid phase sintering of silicon/ceramic oxide powder compacts, has been characterised using analytical transmission electron microscopy. The presence of the reactive liquid phase, promoted by the addition of oxides from the CaO-Al₂O₃-SiO₂ ternary system, resulted in an as-fired microstructure containing a mixture of crystalline phases based on -Si₃N₄, β-Si₃N₄ and Si₂ N₂O, and distinct amorphous regions rich in Si, Al and Ca. X-ray microanalysis revealed the calcium to be wholly partitioned to the glassy phase, while significant concentrations of aluminium were detected in both β-Si₃N₄ and Si₂N₂O. The observed compositions of these phases, together with measured lattice parameters systematically in excess of those of the pure compounds, imply that they are in fact β- and O-sialons respectively. Semi-quantitative energy dispersive X-ray spectroscopy, using an ultra-thin window detector, is demonstrated to be capable of distinguishing clearly between these phases according to their oxygen content and of determining the aluminium content of both phases to within ± 1 equ.%, even at concentration levels of <5 equ.%.     

CRYSTALLINE CARBON NITRIDE THIN FILMS DEPOSITED BY MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION

The crystalline carbon nitride thin films have been prepared on Si (100) substrates using microwave plasma chemical vapor deposition technique. The experimental X-ray diffraction pattern of the films prepared contain all the strong peaks of α-C₃N₄ and β-C₃N₄, but most of the peaks are overlapped.The films are composed of α-C₃N₄ and β-C₃N₄. The N/C atomic ratio is close to the stoichiometric value 1.33. X-ray photoelectron spectroscopic analysis indicated that the binding energies of C 1s and N 1s are 286.43eV and 399.08 eV respectively. The shifts are attributed to the polarization of C-N bond. Both observed Raman and Fourier transform infrared spectra were compared with the theoretical calculations. The results support the existence of C-N covalent bond in α- and β-C₃N₄ mixture.     

高温隐形材料SiBN陶瓷

已有的实验结果表明, 硅硼氮陶瓷材料具有非晶态的微观结构, 并且可在六方相氮化硅 (β-Si₃N₄) 的基础上得到较好理论模型. 本文通过同样方法建立硅硼氮陶瓷材料的理论模型, 并在此基础上进行分子动力学与密度泛函理论结合的计算研究, 得到其高温下光学性质的显著变化. 与氮化硅 (Si₃N₄) 的光学性质比较分析后发现, 低温下SiBN陶瓷对可见光甚至紫外及高频光吸收显著, 而高温下呈现对微米波的较好吸收和其他波段小于0.3的吸收系数; 低温下SiBN陶瓷的反射系数全波段接近0.1, 而高温下其反射系数可小至1%; 单晶Si₃N₄的光学性质则随温度升高几乎不发生变化. 这一结果表明SiBN陶瓷作为高温激光隐形材料的可能, 也为非晶材料光电应用指出一个新的方向. 关键词： 硅硼氮陶瓷 密度泛函理论 光吸收系数 反射系数     

基于原位等离子体氮化及低压化学气相沉积-Si_3N_4栅介质的高性能AlGaN/GaN MIS-HEMTs器件的研究

通过对低压化学气相沉积(LPCVD)系统进行改造,实现在沉积Si_3N_4薄膜前的原位等离子体氮化处理,氮等离子体可以有效地降低器件界面处的氧含量和悬挂键,从而获得了较低的LPCVD-Si_3N_4/GaN界面态,通过这种技术制作的MIS-HEMTs器件,在扫描栅压范围V_(G-sweep)=(-30 V,+24 V)时,阈值回滞为186 mV,据我们所知为目前高扫描栅压V_(G+)(20 V)下的最好结果.动态测试表明,在400 V关态应力下,器件的导通电阻仅仅上升1.36倍(关态到开态的时间间隔为100μs).     

Deposition and characterization of carbon nitride films from hexamethylenetetramine/N2 by microwave plasma-enhanced chemical vapor deposition

Carbon nitride thin films were deposited on Si(1 0 0) substrate by microwave plasma-enhanced chemical vapor deposition (PECVD). Hexamethylenetetramine (HMTA) was used as carbon and nitrogen source while N₂ gas was used as both nitrogen source and carrier gas. The sp³-bonded C---N structure in HMTA was considered significantly in the precursor selection. X-ray diffraction analysis indicated that the film was a mixture of crystalline - and β-C₃N₄ as well as graphitic-C₃N₄ and β-Si₃N₄ which were not easily distinguished. Raman spectroscopy also suggested the existence of - and β-C₃N₄ in the films. X-ray photoelectron spectroscopy study indicated the presence of sp²- and sp³-bonded C---N structures in the films while sp³C---N bonding structure predominated to the sp² C---N bonding structure in the bulk composition of the films. N was also found to be bound to Si atoms in the films. The product was, therefore, described as CN_x:Si, where x depends on the film depth, with some evidences of crystalline C₃N₄ formation.     

C+注入a-SiNx：H薄膜的微结构及光发射的研究

常温下对低压化学气相沉积制备的纳米硅镶嵌结构的a-SiN_x:H薄膜进行低能量高剂量的C⁺注入后,在800~1200℃高温进行常规退火处理。X射线光电子能谱(XPS)及X射线光电子衍射(XRD)等实验结果表明,当退火温度由800℃升高到1200℃后,薄膜部分结构由SiC_xN_y转变成SiN_x和SiC的混合结构。低温下利用真空紫外光激发,获得分别来自于SiN_x、SiC_xN_y、SiC的,位于2.95,2.58,2.29 eV的光致发光光谱。随着退火温度的升高,薄膜的结构发生了变化,发光光谱也有相应的改变。     

Alkali-metal(Li,Na, and K)-adsorbed MoSi2N4 monolayer: an investigation of its outstanding electronic,optical, and photocatalytic properties

Single-layer MoSi₂N₄,a high-quality two-dimensional material,has recently been fabricated by chemical vapor deposition.Motivated by this latest experimental work,herein,we apply first principles calculations to investigate the electronic,optical,and photocatalytic properties of alkali-metal(Li,Na,and K)-adsorbed MoSi₂N₄ monolayer.The electronic structure analysis shows that pristine MoSi₂N₄ monolayer exhibits an indirect bandgap(E_g=1.89 eV).By contrast,the bandgaps of one Li-,Na-,and K-adsorbed MoSi₂N₄ monolayer are 1.73 eV,1.61 eV,and 1.75 eV,respectively.Moreover,the work function of MoSi₂N₄ monolayer(4.80 eV)is significantly reduced after the adsorption of alkali metal atoms.The work functions of one Li-,Na-,and K-adsorbed MoSi₂N₄ monolayer are 1.50 eV,1.43 eV,and 2.03 eV,respectively.Then,optical investigations indicate that alkali metal adsorption processes substantially increase the visible light absorption range and coefficient of MoSi₂N₄ monolayer.Furthermore,based on redox potential variations after alkali metals are adsorbed,Li-and Na-adsorbed MoSi₂N₄ monolayers are more suitable for the water splitting photocatalytic process,and the Li-adsorbed case shows the highest potential application for CO₂ reduction.In conclusion,alkali-metal-adsorbed MoSi₂N₄ monolayer exhibits promising applications as novel optoelectronic devices and photocatalytic materials due to its unique physical and chemical properties.     

七叶亭及其衍生物的NMR研究

七叶亭衍生物含有药效性较高的苯二酚基团,具有各种生物活性.本文以七叶亭（化合物1）为母体,通过将苯基引入到4位、将甲氧基与羟基分别引入到5、6、7和8位,得到一系列七叶亭衍生物2~14.首先以七叶亭为例,以DMSO-d₆作为溶剂,采集了它的多种核磁共振（NMR）谱图（包括¹H NMR、¹³C NMR、¹H-¹³C HSQC、¹H-¹³C HMBC）,并进行了较详细的化学位移归属;然后对七叶亭衍生物2~14的¹H和¹³C NMR进行了全归属;另外,讨论了取代基变化对七叶亭及其衍生物上的¹H和¹³C NMR化学位移的影响;最后,使用GIAO和CSGT两种量子化学计算方法计算了七叶亭及其衍生物上的¹H和¹³C NMR化学位移,并与它们的实测值做了比较.     

Mechanical,elastic, anisotropy,and electronic properties of monoclinic phase of m-Si_xGe_(3-x)N_4

The structural,mechanical,elastic anisotropic,and electronic properties of the monoclinic phase of m-Si_3N_4,mSi_2GeN_4,m-SiGe_2N_4,and m-Ge_3N_4are systematically investigated in this work.The calculated results of lattice parameters,elastic constants and elastic moduli of m-Si_3N_4and m-Ge_3N_4are in good agreement with previous theoretical results.Using the Voigt–Reuss–Hill method,elastic properties such as bulk modulus B and shear modulus G are investigated.The calculated ratio of B/G and Poisson’s ratio v show that only m-SiGe_2N_4should belong to a ductile material in nature.In addition,m-SiGe_2N_4possesses the largest anisotropic shear modulus,Young’s modulus,Poisson’s ratio,and percentage of elastic anisotropies for bulk modulus ABand shear modulus AG,and universal anisotropic index AUamong m-Si_xGe_(3-x)N_4(x=0,1,2,3.)The results of electronic band gap reveal that m-Si_3N_4,m-Si_2GeN_4,m-SiGe_2N_4,and m-Ge_3N_4 are all direct and wide band gap semiconducting materials.     

榄香烯及其衍生物的计算化学研究I β-榄香烯13C NMR化学位移的理论计算

报道了抗癌新药β-榄香烯的¹³C NMR化学位移的量子化学计算.在分子力学MMX和量子化学RHF/6-31G^*或B3LYP/6-31G^*优化结构的基础上进行了两种规范变换方法GIAO和CSGT的Hartree-Fock和B3LYP (6-31G^*基组)的化学位移计算.并对计算结果进行了误差分析和线性相关分析.所有的这些结果中,采用GIAO规范变换方法都好于CSGT,而以GIAO-B3LYP/6-31G^*//B3LYP/6-31G^*计算的结果最好,RMS为4.3ppm,相关系数R²为0.998,SD为2.42 ppm.而GIAO-B3LYP/6-31G^*//MMX是一种能兼顾计算时间和计算精度的方法,其RMS、R²和SD分别为4.9、0.996和3.0 4 ppm.     

榄香烯及其衍生物的计算化学研究I β-榄香烯13C NMR化学位移的理论计算

报道了抗癌新药β-榄香烯的¹³C NMR化学位移的量子化学计算.在分子力学MMX和量子化学RHF/6-31G^*或B3LYP/6-31G^*优化结构的基础上进行了两种规范变换方法GIAO和CSGT的Hartree-Fock和B3LYP (6-31G^*基组)的化学位移计算.并对计算结果进行了误差分析和线性相关分析.所有的这些结果中,采用GIAO规范变换方法都好于CSGT,而以GIAO-B3LYP/6-31G^*//B3LYP/6-31G^*计算的结果最好,RMS为4.3ppm,相关系数R²为0.998,SD为2.42 ppm.而GIAO-B3LYP/6-31G^*//MMX是一种能兼顾计算时间和计算精度的方法,其RMS、R²和SD分别为4.9、0.996和3.0 4 ppm.     

紫外波段SiO2/Si3N4介质膜分布式布拉格反射镜的制备与研究

采用光学传递矩阵方法设计了紫外波段SiO₂/Si₃N₄介质膜分布式布拉格反射镜, 并利用等离子体增强化学气相沉积技术在蓝宝石(0001)衬底上制备了SiO₂/Si₃N₄介质膜分布式布拉格反射镜. 光反射测试表明, 样品反射谱的峰值波长仅与理论模拟谱线相差10 nm, 并随着反射镜周期数的增加而蓝移. 由于SiO₂与Si₃N₄具有相对较大的折射率比, 因而制备的周期数为13的样品反射谱的峰值反射率就已大于99%. 样品反射谱的中心波长为333 nm, 谱峰的半高宽为58 nm. 样品截面的扫描电子显微镜和表面的原子力显微镜测量结果表明, 样品反射谱的中心波长蓝移是由子层的层厚和界面粗糙度的变化引起的. X射线反射谱表明,子层界面过渡层对于反射率的影响较小, 并且SiO₂膜的质量比Si₃N₄差, 也是造成反射率低于理论值的原因之一.     

电荷俘获存储器的过擦现象

基于密度泛函理论的第一性原理平面波超软赝势方法和VASP软件对电荷俘获存储器过擦现象进行了分析研究.通过形成能的计算,确定了含有氮空位缺陷的Si3N4和含有间隙氧缺陷的Hf O2作为研究的对象;俘获能的计算结果表明两种体系对电子的俘获能力比对空穴的大,因而对两体系擦写载流子确定为电子.分别计算了Hf O2和Si3N4擦写前后的能量、擦写前后电荷分布变化、吸附能和态密度,以说明过擦的微观机理.对能量和擦写电荷变化的研究,表明Si3N4相比于Hf O2,其可靠性较差,且Si3N4作为俘获层,在一个擦写周期后,晶胞中电子出现减少现象;界面吸附能的研究表明,Si3N4相比于Hf O2在缺陷处更容易与氧进行电子交换;最后,通过对态密度的分析表明Si3N4和Hf O2在对应的缺陷中均有缺陷能级俘获电子,前者为浅能级俘获,后者为深能级俘获.综上分析表明,Si3N4在氮空位的作用下,缺陷附近原子对电子的局域作用变弱,使得Si3N4作为俘获层时,材料本身的电子被擦出,使得擦操作时的平带偏移电压增大,导致存储器发生过擦.本文的研究结果揭示了过擦的本质,对提高电荷俘获存储器的可靠性以及存储特性有着重要的指导意义.     

Decisive factors for realizing atomic-column resolution using STEM and EELS

We demonstrate atomic-column imaging by scanning transmission electron microscopy (STEM) and electron energy-loss spectroscopy (EELS). The silicon atomic-columns of a β-Si₃N₄ (0 0 1) specimen are clearly resolved. The atomic-site dependence and the energy-loss dependence of the spatial resolution are elucidated on the basis of the experimental results and multislice calculations. We describe two decisive factors for realizing atomic-column imaging in terms of localization in elastic and inelastic scattering. One is the channeling of the incident probe due to dynamical diffraction, which has atomic-site dependence. The other is the localization in inelastic scattering; in addition to the energy-loss dependence of delocalization, we point out its dependence on the offset energy from the ionization energy, i.e., an additional localization factor concerning the Bethe surface. The present atomic-column observation of the Si-L core-loss image indicates that the local approximation, which can be interpreted intuitively, is achievable under appropriate experimental conditions, such as high-energy-loss, a small convergence angle and a large collection angle (e.g., 400 eV, 15 and 30 mrad, respectively).     

(C_5H_(11)N_2)~+和(C_7H_(12)N_2)~(2+)的NMR研究

结合1H NMR,13C NMR谱,分别对钨、钼配合物{WO2(C10H6O2)2(C5H11N2)2[H2N(CH2)3NH2]}3(1),{(C5H11N2)2[H2N(CH2)3NH2][MoO2(C10H6O2)2]}(2),{(C7H12N2)2[MoO2(C10H8O2)2]}(3)晶体结构中小分子环进行了归属.其中,配合物1和2中(C5H11N2)+的NMR研究证实了六元环由1,3-丙二胺和乙腈化合而成,配合物3中(C7H12N2)2+的NMR谱图证实了七元环由乙二胺和乙酰丙酮化合而成,并且推导出这些亲核加成-消除反应的反应机理.配合物1~3中的小分子环的合成在其它体系中尚未见报导,而在合成它们的反应中作为新产物随主体晶体析出,并由晶体结构解析和NMR得到了证实.     

无杂质空位扩散法造成InGaAsP/InP多量子阱结构带隙蓝移规律的研究

采用光荧光谱(PL)和光调制反射谱(PR)的方法,研究了由Si₃N₄、SiO₂电介质盖层引起的无杂质空位(IFVD)诱导的InGaAsP四元化合物半导体多量子阱(MQWs)结构的带隙蓝移。实验中Si₃N₄、SiO₂作为电介质盖层,用来产生空位,再经过快速热退火处理(RTA)。实验结果表明:多量子阱结构带隙蓝移和退火温度、复合盖层的组合有关。带隙蓝移随退火温度的升高而加大。InP、Si₃N₄复合盖层产生的带隙蓝移量大于InP、SiO₂复合盖层。而InGaAs、SiO₂复合盖层产生的带隙蓝移量则大于InGaAs、Si₃N₄复合盖层。同时,光调制反射谱的测试结果与光荧光测试的结果基本一致,因此,PR谱是用于测试带隙变化的另一种方法。     

双环磷酸酯类化合物NMR结构效应研究

用现有理论说明不了双环磷酸酯类化合物³¹P NMR化学位移的变化。本文在我们提出的核外电子云球对称效应原理基础上,用量子化学和分子力学计算的参数,表达了这类化合物³¹P化学位移变化的规律,同时还研究了它们的¹³C NMR化学位移和偶合常数的取代基效应。     

Hf-N体系的晶体结构预测和性质的第一性原理研究

为了寻找具有优异力学性能的新型超高温陶瓷材料, 结合进化算法和第一性原理, 系统研究了Hf-N二元体系所有稳定存在的化合物及其晶体结构. 除了实验已知的岩盐结构的HfN之外, 本文还找到了Hf₆N(R-3), Hf₃N(P6₃22), Hf₃N₂(R-3m), Hf₅N₆(C2/m)和Hf₃N₄(C2/m)五种新结构, 基于准简谐近似原理计算了这些稳定结构的声子谱以验证其动力学稳定性, 常温甚至更高温度下的吉布斯自由能以验证其高温热力学稳定性. 结果表明, 这些结构是动力学稳定的, 且在1500 K以下都是热力学稳定的. 同时, 本文还列出了在搜索过程中出现的空间对称性较高、能量较低的亚稳态结构, 包括Hf₂N(P4₂/mnm), Hf₄N₃(C2/m), Hf₆N₅(C2/m), Hf₄N₅(I4/m), Hf₃N₄(I-43d)和Hf₃N₄(Pnma). 之后计算了上述所有结构的力学性质(弹性常数、体模量、 剪切模量、 杨氏模量、硬度), 随着N 所占比例的增加, 硬度呈现的整体趋势是先增大后下降, 在Hf₅N₆处取得最大值, 为21 GPa. 其中Hf₃N₂和Hf₄N₅也展现出了较高的硬度, 都为19 GPa. 最后, 计算了这些结构的电子态密度和晶体轨道汉密尔顿分布, 从电子结构的角度分析了力学性能的成因. 研究结果显示, 较强的Hf-N共价键和较低的结构空位率是Hf₅N₆具有优异力学性能的主要原因.     

第一性原理研究O和S掺杂的石墨相氮化碳(g-C_3N_4)_6量子点电子结构和光吸收性质

利用密度泛函和含时密度泛函理论研究了氧(O)和硫(S)原子掺杂的石墨相氮化碳(g-C_3N_4)_6量子点的几何、电子结构和紫外-可见光吸收性质.结果表明:掺杂后(g-C_3N_4)_6量子点杂质原子周围的C-N键长发生了一定的改变,最高电子占据分子轨道-最低电子未占据分子轨道(HOMO-LUMO)能隙显著减小.形成能的计算表明O原子取代掺杂的(g-C_3N_4)_6量子点体系更稳定,且O原子更易取代N3位点,而S原子更易取代N8位点.模拟的紫外-可见电子吸收光谱表明,O和S原子的掺杂改善了(g-C_3N_4)_6量子点的光吸收,使其吸收范围覆盖了整个可见光区域,甚至扩展到了红外区.而且适当的杂质浓度使(g-C_3N_4)_6量子点光吸收在强度和范围上都得到明显改善.通过O和S掺杂的比较,发现二者在可见光区对(g-C_3N_4)_6量子点的光吸收有相似的影响,然而在长波长区域二者的影响有明显差异.总体而言,O掺杂要优于S掺杂对(g-C_3N_4)_6量子点光吸收的影响.