高能氮离子轰击对四面体非晶碳膜的表面改性和摩擦系数影响的研究

利用过滤阴极真空电弧技术制备了sp³键含量不小于80%的四面体非晶碳(ta-C)膜.利用冷阴极潘宁离子源产生不同能量的氮离子对制备的ta-C薄膜进行轰击,通过X射线光电子能谱和原子力显微镜对薄膜表面结构与形貌进行分析研究.研究表明,随着氮离子的轰击能量的增大,薄膜中的CN键结构略有增大,形成了轻N掺杂;同时,在薄膜表层发生了sp³键结构向sp²键结构的转化;薄膜的表面粗糙度在经过氮离子轰击后从0.2 nm减小至0.18 nm,然后随着轰击能 关键词： 四面体非晶碳 X射线光电子能谱 摩擦系数     

不同能级加速过滤电弧沉积四面体非晶碳膜的结构和性能

采用过滤阴极真空电弧技术，通过施加0—2000 V衬底负偏压使沉积离子获得不同能级的入射能量，在单晶硅上制备了四面体非晶碳薄膜.拉曼光谱分析表明，薄膜的结构为非晶sp³骨架中镶嵌着平面关联长度小于1 nm的sp²团簇.原子力显微镜研究表明：在低能级、富sp³能量窗口和次高能级，薄膜中sp³的含量越多，其表面就越光滑，应用sp³浅注入生长机制能够圆满地解释薄膜表面形态与离子入射能量之间的关系；但在高 关键词： 四面体非晶碳 过滤阴极真空电弧 能级     

氩离子轰击对四面体非晶碳膜内应力和摩擦系数影响的研究

利用磁过滤真空阴极电弧技术制备了sp³键大于80%的四面体非晶碳(ta-C)薄膜, 通过冷阴极离子源产生keV能量的氩离子轰击ta-C薄膜,研究了氩离子轰击能量对ta-C薄膜结构, 内应力以及耐磨性的影响.通过X射线光电子能谱和原子力显微镜研究了氩离子轰击对薄膜结构 与表面形貌的改性,研究表明,氩离子轰击诱导了ta-C薄膜中sp³键向sp²键的转化, 并且随着氩离子轰击能量的增大,薄膜中sp²键的含量逐渐增多, 薄膜内应力随着氩离子轰击能量的增大逐渐减小.氩离子轰击对薄膜的表面形貌有较大影响, 在薄膜表面形成刻蚀坑,并且改变了薄膜的表面粗糙度,随着氩离子轰击能量的增大, 薄膜的表面粗糙度也会逐渐增大.通过摩擦磨损仪的测试结果,氩离子轰击对薄膜的初始摩擦系数影响较大, 但是对薄膜的稳定摩擦系数影响较小,经过氩离子轰击前后的ta-C薄膜的摩擦系数为0.1左右, 并且具有优异的耐磨性.     

氮化铬过渡层对四面体非晶碳薄膜在高速钢基底上附着特性影响的研究

利用磁过滤阴极电弧与磁控溅射相结合的薄膜沉积技术在高速钢基底上 制备了氮化铬/四面体非晶碳(CrN/ta-C)复合涂层, 通过改变过渡层氮化铬(CrN)的制备工艺, 研究了四面体非晶碳(ta-C)薄膜在钢基底材料上的附着特性的变化. 结果表明, 随着氮气流量的增大, CrN/ta-C复合涂层中的氮化铬经过了Cr-Cr₂N-CrN的相变过程. 同时涂层的附着力也随着氮气流量的增大而增加, 但是当氮气流量超过30 sccm时, 涂层附着力会有所下降; 通过改变基片偏压, 复合涂层中氮化铬的择优取向与晶粒结构发生改变, 随着偏压的增大, 涂层附着力也会大大改善, 但是当偏压超过200 V, 涂层附着特性会略微降低. 通过涂层耐磨性的测试也表明, 在高速钢基底上, CrN涂层能显著提高ta-C薄膜在高速钢基底上的附着力, 同时显著提高耐磨特性. 关键词： 附着力 四面体非晶碳薄膜 X射线衍射 拉曼光谱     

硼掺杂对四面体非晶碳膜电导性能的影响

以单质硼和高纯石墨的混合粉末压制成型的靶材作为靶源,采用过滤阴极真空电弧技术制备不同硼含量的掺硼四面体非晶碳膜.分别采用四探针法、阻抗分析仪和电化学界面对薄膜的变温电导率、I-V特性和C-V特性进行了测试和研究.实验结果表明,当B含量由0增加至6.04 at%时,薄膜的室温电导率先逐渐增大而后逐渐减小,相应薄膜的电导激活能先逐渐减小而后逐渐增大,并在2.13 at%时分别出现最大和最小值1.42×10^-7S/cm和0.1eV.此外,掺硼四面体非晶碳/n型硅异质结的I-V曲线表现出典型的整流特性,表明p-n结二极管已经形成,且结两端的掺杂能级在空间上连续统一. 关键词： 四面体非晶碳 电导率 I-V曲线')" href="#">I-V曲线 C-V曲线')" href="#">C-V曲线     

基底表面纳米织构对非晶四面体碳膜结构和摩擦特性的影响研究

本文利用离子束表面改性技术对基底表面进行不同时间的轰击, 形成不同规则的纳米织构, 对不同织构的变化规律进行了研究, 同时, 利用磁过滤真空阴极电弧技术, 在具有不同纳米织构的各基底上沉积相同时间的四面体非晶碳薄膜. 采用原子力显微镜对各基底的织构进行形貌分析, 结果表明, 高能粒子束的轰击对基底表面形貌有较大的影响, 根据离子束轰击时间的不同, 可以在基底表面形成各种不同规则的纳米织构, 轰击15 min后发现基底表面形成点阵纳米织构, 之后随着时间的增加, 基本维持点阵结构. 通过X射线光电子能谱仪和摩擦磨损试验仪对沉积在具有不同织构的基底上的ta-C薄膜进行测试, 研究表明, 基底表面纳米织构的非晶层结构引起薄膜内部sp³键的含量降低, 释放了薄膜的内应力, 同时发现基底表面纳米织构将ta-C薄膜磨损时间从不足10 min提高到约70 min, 有效提高了薄膜的耐磨性.     

氮离子轰击能量对ta-C:N薄膜结构的影响

利用磁过滤真空阴极电弧技术制备了sp³键含量不小于80%的四面体非晶碳薄膜(ta-C), 然后通过氮离子束改性技术制备了氮掺杂的四面体非晶碳(ta-C:N)薄膜. 利用Raman光谱和X射线光电子能谱对薄膜结构的分析,研究了氮离子轰击能量对ta-C:N薄膜结构的影响. 氮离子对ta-C薄膜的轰击,形成了氮掺杂的ta-C:N薄膜. 氮离子轰击诱导了薄膜中sp³键向sp²键转化, 以及CN键的形成.在ta-C:N薄膜中,氮掺杂的深度和浓度随着氮离子能量的增大而增大. ta-C:N薄膜中sp²键的含量和sp²键团簇的尺寸随着氮离子轰击能量的增大而增加; 在ta-C:N薄膜中, CN键主要由C-N键和C＝N键构成, C-N 键的含量随着氮离子轰击能量的增大而减小,但是C＝N 键含量随着氮离子轰击能量的增大而增大.在ta-C:N薄膜中不含有C≡N键结构.     

非晶金刚石薄膜的场致电子发射性能研究

利用真空磁过滤弧沉积技术制备出一种高sp³含量的非晶碳膜———非晶金刚石薄膜，并对这种非晶金刚石薄膜的场电子发射特性及其发射机理进行了研究．实验结果表明，在阈值电场低于20V/μm情况下，得到的场发射电流达20—40μA，薄膜的电子发射行为符合Fowler-Nordheim场发射理论．研究表明，这种非晶金刚石薄膜具有负的电子亲合势和较小的有效功函数以及相对较低的禁带宽度 关键词：     

利用强流脉冲离子束技术在室温下沉积类金刚石薄膜研究

利用强流脉冲离子束技术在Si基体上快速大面积沉积类金刚石(DLC)薄膜.电压为250kV,束流密度为250A·cm-2,脉宽为80—100ns,能流密度为5J·cm-2的离子束(主要由碳离子和氢离子组成)聚焦到石墨靶材上,使石墨靶材充分蒸发和电离,在石墨靶的法线方向的Si基体上沉积非晶的碳薄膜.Raman谱分析显示,所沉积薄膜为类金刚石薄膜.随着靶材与基体之间距离的减小,薄膜中sp3碳成分含量增加,同时硬度值也有所增大,并且薄膜的摩擦系数和表面粗糙度增加.x射线光电子能谱(XPS)分析显示薄膜中的sp3碳 关键词： 强流脉冲离子束 类金刚石薄膜 XPSRaman谱分析     

非晶金刚石膜的性能及其应用

非品金刚石薄膜具有超高硬度等一系列优异的特殊性能，为工程界孜孜追求的材料表面镀膜。用百纳科技公司研发制造的过滤阴极真空电弧离子镀膜机镀制的非晶金刚石薄膜，SP^3金刚石结构量≥80％，硬度高，膜／基结合力高，摩擦系数小，耐磨损，耐腐蚀，透光率高，在电子，机械，光学，生物医学上有广泛应用前景。我们已在视窗玻璃，丝锥，模具，硬质合金刀头等产品上成功应用。     

Experimental Investigation of Laminar Heat Transfer Inside Trapezoidal Duct Having Different Corner Angles

In this study, steady-state laminar forced flow and heat transfer in a horizontal smooth trapezoidal duct having different corner angles were experimentally investigated in the Reynolds number range from 10² to 10³. Flow is hydrodynamically fully developed and thermally developing under a uniform surface temperature condition. Based on the present experimental data of laminar flow in the thermal entrance region, new engineering correlations were presented for the heat transfer and friction coefficients for each corner angle. The results have shown that as the Reynolds number increases heat transfer coefficient increases but Darcy friction factor decreases. Also, it is observed that average Nusselt number increases while average Darcy friction factor decreases with increasing corner angle of the duct.     

Bi0.8Pb0.2SrCaCuOy超导体中磁通运动引起的内耗峰

在线性增加磁场的条件下,用变频倒扭摆测量了配比成份为(Bi_0.8Pb_0.2)SrCaCu₂O_y的试样在超导态时磁化过程中的低频内耗。测量温度为95K,试样处于零电阻状态,所用频率为0.5-5Hz.在内耗-场强H曲线上观测到内耗峰,它有如下特点:1)峰高随加场速率H的增大而增大,但随测量频率的增大而降低;2)峰值处的场强为4-6mT;3)当H由非零值突然改变至零时,磁化过程特征内耗消失;4)试样处于正常态时,上述特征内耗消失。认为超导体在磁化过程中的上述特征内耗是量子磁通的运动所引起来的。 关键词：     

Cold-hollow-cathode arc discharge in crossed electric and magnetic fields

A crossed-field cold-hollow-cathode arc is stable at low working gas pressures of 10⁻²–10⁻¹ Pa, magnetic-field-and gas-dependent arcing voltages of 20–50 V, and discharge currents of 20–200 A. This is because electrons come from a cathode spot produced on the inner cathode surface by a discharge over the dielectric surface. The magnetic field influences the arcing voltage and discharge current most significantly. When the plasma conductivity in the cathode region decreases in the electric field direction, the magnetic field increases, causing the discharge current to decline and the discharge voltage to rise. The discharge is quenched when a critical magnetic field depending on the type of gas is reached. Because of the absence of heated elements, the hollow cathode remains efficient for long when an arc is initiated in both inert and chemically active gases.     

THE EFFECT OF MESH ANODE ON CATHODIC ARC IN FOCUSING MAGNETIC FIELD

The performance and characteristics of a cathodic arc deposition apparatus consisting of a titanium cathode, an anode with and without a tungsten mesh, and a coil producing a focusing magnetic field between the anode and cathode are investigated. The arc voltage V_a is measured with a fixed arc current. The relationship between V_a and the magnetic field B with and without a mesh is obtained. In addition, the relationship between the arc current I_a and V_c, the voltage to which the artificial transmission line was charged, is measured with and without the mesh to determine the minimum ignition voltage for the arc. The arc resistance increases with the focusing magnetic strength B and decreases when using the mesh. Our results indicate that the high transparency and large area of the mesh allows a high plasma flux to penetrate the anode from the cathodic arc. The mesh also stabilizes the cathodic arc and gives better performance when used in concert with a focusing magnetic field.     

感应式脉冲推力器中等离子体加速数值研究

为了分析感应式脉冲放电等离子体推力器中时变电磁场作用下等离子体的放电参数分布及其随着磁场强度变化的影响,引入了利用双曲型散度清除方法的二维轴对称瞬态等离子体流动的磁流体力学数值模型.计算结果表明,随着输入能量的增加,等离子体团出现速度峰值的时刻提前,等离子体中同时存在的异号电流环对其加速具有阻滞作用.等离子体的加速效率随着磁场强度非线性增大,磁场大于某一临界值时(几何构型下峰值磁场强度大于0.45 T),有限空间情况下等离子体的加速效率获得显著提高.     

Enhancement and stabilization of cathodic arc using mesh anode

The performance and characteristics of a cathodic arc deposition apparatus consisting of a titanium cathode, an anode with and without a tungsten mesh, and a coil producing a focusing magnetic field between the anode and cathode arc investigated. The arc voltage V_a is measured with a fixed arc current for an anode diameter of 40 mm. The relationship between V_a and the magnetic field B with and without a mesh is obtained. In addition, the relationship between the arc current I_a and V_c, the voltage to which the artificial transmission line was charged, is measured with and without the mesh to determine the minimum ignition voltage for the arc when the anode hole diameter is 40 mm. The arc resistance increases with the focusing magnetic strength B and decreases when using the mesh. Our results indicate that the high transparency and large area of the mesh allows a high plasma flux to penetrate the anode from the cathodic arc. The mesh also stabilizes the cathodic arc and gives better performance when used in concert with a focusing magnetic field     

Doppler-shifted cyclotron resonance in tungsten plates with atomic pure surface

The surface resistance of thin monocrystalline W plates as a function of the constant magnetic field H directed along the normal to the sample surface is studied in the r.f. spectrum region. The sample surface was cleaned in high vaccum (10^-11 torr) or coated with the monomolecular impurity film. The oscillating with the magnetic field part R_osc due to the Doppler-shifted cyclotron resonance is studied. The doppleron oscillation amplitude is found to depend on the surface state and increases with the crystal cleaning. The observed changes are caused by the increase of the specular reflection coefficient for resonance electrons. With the deviation of the magnetic field from the normal to the plate surface, the doppleron wave undergoes a collisionless magnetic Landau damping and the signal amplitude decreases down to values comparable with that of Gantmakher-Kaner oscillations. Cleaning of the surface (and related increase of specularity) gives rise to a further decrease of the doppleron amplitude and appearance of additional interference maxima induced by the Gantmakher-Kaner effect.     

Features of low-temperature thermal expansion of n-type Bi<Subscript>2</Subscript>Se<Subscript>3</Subscript> single crystals in magnetic field

Tensometric study of n-type Bi₂Se₃ single crystals in dc magnetic fields to 6 T in a temperature range of 7–23 K detected a weak negative thermal expansion (NTE) in the basal plane. The NTE increases with the field strength and depends on its orientation with respect to the trigonal c axis. In a magnetic field of 6 T, parallel to the c axis, the linear NTE coefficient reaches ?7 · 10^?7 K^?1, and a minimum sample length is reached at a temperature of 13 K, where a Hall carrier concentration maximum is also detected. The found magnetoelastic anomaly can be associated with the topological insulator state.