GUIDING OF PLASMA BY ELECTRIC FIELD AND MAGNETIC FIELD

The relationship between the transported ion current and the cathodic arc current is determined in a vacuum arc plasma source equipped with a curved magnetic filter. Our results suggest that the outer and inner walls of the duct interact with the plasma independently. The duct magnetic field is a critical factor of the plasma output. The duct transport efficiency is to maximize at a value of bias plate voltage in the range +10 V to +20 V, and independent (within our limit of measurement) of the magnetic field strength in the duct. The plasma flux is composed of two components: a diffusion flux in the transverse direction due to particle collisions, and a drift flux due to the ion inertia. The inner wall of the magnetic duct sees only the diffusion flux while the outer wall receives both fluxes. Thus, applying a positive potential to the outer duct wall can reflect the ions and increase the output current. Our experimental data also show that biasing both sides of the duct is more effective than biasing the outer wall alone.     

THE EFFECT OF MESH ANODE ON CATHODIC ARC IN FOCUSING MAGNETIC FIELD

The performance and characteristics of a cathodic arc deposition apparatus consisting of a titanium cathode, an anode with and without a tungsten mesh, and a coil producing a focusing magnetic field between the anode and cathode are investigated. The arc voltage V_a is measured with a fixed arc current. The relationship between V_a and the magnetic field B with and without a mesh is obtained. In addition, the relationship between the arc current I_a and V_c, the voltage to which the artificial transmission line was charged, is measured with and without the mesh to determine the minimum ignition voltage for the arc. The arc resistance increases with the focusing magnetic strength B and decreases when using the mesh. Our results indicate that the high transparency and large area of the mesh allows a high plasma flux to penetrate the anode from the cathodic arc. The mesh also stabilizes the cathodic arc and gives better performance when used in concert with a focusing magnetic field.