不同能级加速过滤电弧沉积四面体非晶碳膜的结构和性能

采用过滤阴极真空电弧技术，通过施加0—2000 V衬底负偏压使沉积离子获得不同能级的入射能量，在单晶硅上制备了四面体非晶碳薄膜.拉曼光谱分析表明，薄膜的结构为非晶sp³骨架中镶嵌着平面关联长度小于1 nm的sp²团簇.原子力显微镜研究表明：在低能级、富sp³能量窗口和次高能级，薄膜中sp³的含量越多，其表面就越光滑，应用sp³浅注入生长机制能够圆满地解释薄膜表面形态与离子入射能量之间的关系；但在高 关键词： 四面体非晶碳 过滤阴极真空电弧 能级

The microstructure and properties of tetrahedral amorphous carbon films deposited by filtered arc with accelerating at different energetic grades

Tetrahedral amorphous carbon (ta-C) films were deposited on single crystalline silicon by accelerating the species with different impinging energetic grades produced by static-electricity pulse substrate bias from 0 to -2000 V. The microstructure of the ta-C films consist of amorphous sp³ hybridization skeleton enchased with sp² clusters with sizes less than 1 nm by visible Raman measurement. At low energetic grade, sp³-rich energetic window, and sub-high energetic grade, the more the content of sp³ in the film, the smoother the surface of the film. The relationship between the impinging energy of the species and the surface morphology can be illustrated perfectly in the light of subimplantation growth mechanism. Nevertheless, at high energetic grade, the impinging ions with appropriate energy and angle can sputter and smoothen the surface, even the roughness is lower than the surface of the films with the most sp³. The hardness and Young's modulus of the films deposited at high energetic grade (-2000 V) are higher than those of the films prepared on the floating conditions. At the same time, the critical scratching load of the films deposited with the substrate bias of -2000 V is even larger than the one of the sp³-rich films.