铯原子双磁光阱中冷原子的输运：从推载到导引

在超高真空环境下实现中性原子的激光冷却与俘获，可以有效地避免背景气体对冷原子的碰撞所造成的影响，已成为玻色-爱因斯坦凝聚、冷原子光学腔量子电动力学、中性原子玻色-费米混合气体等实验研究的出发点。结合气室磁光阱和超高真空磁光阱的所谓双磁光阱，以其真空系统相对简单、参数易于控制、效率高等优点，得到了很大发展。双磁光阱既能在气室磁光阱部分从处于室温的原子背景中快速冷却和俘获原子，然后将其通过一定途径输运到超高真空磁光阱中，又能达到在压力极低的超高真空环境下制备冷原子的目的。     

以慢原子束方式进行原子转移的双磁光阱系统

建立了一套用于玻色-爱因斯坦凝聚实验的铷原子双磁光阱装置.从低速强源中获得慢原子束，向超高真空磁光阱进行原子转移.低速强源磁光阱与超高真空磁光阱之间可维持3个量级的压强差,超高真空磁光阱的真空度最高可达1×10^-9 Pa. 慢原子束的束流通量达1×10⁹/s. 约4×10⁸个⁸⁷Rb原子被装载到超高真空磁光阱中.还讨论了两种典型情况下磁光阱中装载的最大原子数.     

深紫外激光光发射与热发射电子显微镜在热扩散阴极研究中的应用

对热扩散阴极表面微区发射状态进行原位观察和分析一直是热阴极研究的重要课题.本文着重介绍深紫外激光光发射电子/热发射电子显微镜的基本原理及其在热扩散阴极研究中的典型实例.系统配备了高温激活所用的加热装置,样品可被加热至1400℃.系统具有光发射电子、阴极热发射电子、光发射电子和阴极热发射电子联合三种电子成像模式.应用表明,对于热扩散阴极而言,深紫外激光光发射电子像适于呈现阴极表面的微观结构形貌;热发射电子像适于反映阴极表面的本征热电子发射及均匀性;光电子和热电子联合成像适于对阴极表面的有效发射点做出精确定位.     

北京大学玻色-爱因斯坦凝聚的实现及研究进展

在这里我们报道北京大学玻色-爱因斯坦凝聚的实现和研究进展.观察到单个和多个组分的87 Rb玻色-爱因斯坦凝聚的形成.介绍了北京大学玻色-爱因斯坦凝聚的实验系统,包括达到10-11毫巴的双磁光阱超高真空系统,大功率半导体激光系统,激光稳频和频率控制系统, QUIC磁阱及磁阱的控制系统,蒸发冷却系统,吸收成像和CCD数据采集处理系统,LabVIEW时序控制系统.     

紫外增强薄膜发射光谱测量中的倍波现象分析

紫外探测技术足继激光和红外探测技术之后发展起来的又一军民两用光电探测技术,在普通探测器件光敏面镀上将紫外波段的光转化为可见波段的光的变频薄膜是增强光电探测器紫外响应的主要技术.文章用"旋涂法"制备成像器件紫外增强薄膜.在对紫外增强薄膜的量子转化效率进行测量分析的实验过程中用SP1702紫外可见光栅光谱仪对薄膜的紫外变频效率进行分析,在激发光源为260和280nm时变频薄膜的发射光谱在520和560 nm附近有较明显的波峰.结合光栅光谱仪的工作原理,对该现象进行了理论分析,得出520和560 nm附近的波峰并非变频薄膜受激发发出的光波,而是光谱测量中产生的倍波现象.从分离重级光谱的角度没计了光谱分级器,以消除光谱测鼍中倍波现象的影响.     

利用扫描透射X射线显微镜观测磁涡旋结构

利用上海光源软X射线谱学显微光束线站(STXM)并结合X射线的磁圆二色效应, 我们对方形、圆形和三角形的Ni₈₀Fe₂₀薄膜微结构中的磁涡旋结构进行了定量实验观测, 并利用同步辐射光源的元素分辨特性, 分别在Fe和Ni的L₃吸收边对涡旋磁结构进行了观测. 我们还对磁涡旋中磁矩的分布进行了定量分析, 发现实验结果与微磁学模拟结果完全符合.     

ZnO薄膜的特殊光谱性质及其机理

以同步辐射真空紫外光(195nm)为激发源,在低温下观察到Si基衬底上ZnO薄膜的发光有三种紫外发射,其峰值波长分别为380,369．5,290nm。它们各自具有不同的衰减时间和不同的温度依赖关系,但其激发谱相同。强激发带不在近紫外区,而在真空紫外区(100～200nm),可能源于ZnO的下价带(Zn3d组态)电子的激发。对三种紫外发射的来源作了分析讨论。     

大失谐连续输运激光情形下双磁光阱中冷原子的输运

在我们建立的铯原子双磁光阱实验装置上,采用连续激光将气室磁光阱中冷却并俘获的冷原子输运到超高真空磁光阱.在前期利用近共振弱光研究原子输运的工作基础上,我们将输运激光的负失谐量扩展到约2.0 GHz,并增大了输运光功率,对冷原子的输运作了实验研究.结果表明:在大负失谐情形下,较强的输运光使冷原子输运更为有效,归因于输运光束对原子的偶极力造成对冷原子的导引作用.     

具有条纹磁畴结构的NiFe薄膜的制备与磁各向异性研究

具有条纹磁畴结构的磁性薄膜表现出面内转动磁各向异性,对于解决高频电子器件的方向性问题起着至关重要的作用.本文采用射频磁控溅射的方法,研究了NiFe薄膜的厚度、溅射功率密度、溅射气压等制备工艺参数对条纹磁畴结构、面内静态磁各向异性、面内转动磁各向异性、垂直磁各向异性的影响规律.研究发现,在功率密度15.6 W/cm~2与溅射气压2 mTorr(1 Torr=1.33322×102Pa)下生长的NiFe薄膜,表现出条纹磁畴的临界厚度在250 nm到300 nm之间.厚度为300 nm的薄膜比250 nm薄膜的垂直磁各向异性场增大近一倍,从而磁矩偏离膜面形成条纹磁畴结构,并表现出面内转动磁各向异性.高溅射功率密度可以降低薄膜出现条纹磁畴的临界厚度.在相同功率密度15.6 W/cm~2下生长300 nm的NiFe薄膜,随着溅射气压由2 mTorr增大到9 mTorr,NiFe薄膜的垂直磁各向异性场逐渐由1247.8 Oe(1 Oe=79.5775 A/m)增大到3248.0 Oe,面内转动磁各向异性场由72.5 Oe增大到141.9 Oe,条纹磁畴周期从0.53μm单调减小到0.24μm.NiFe薄膜的断面结构表明柱状晶的形成是表现出条纹磁畴结构的本质原因,高功率密度下低溅射气压有利于柱状晶结构的形成,表现出规整的条纹磁畴结构,高溅射气压会导致柱状晶纤细化,面内转动磁各向异性与面外垂直磁各向异性增强,条纹磁畴结构变得混乱.     

C掺杂FePt铁磁薄膜光诱导超快退磁动力学研究

FePt合金薄膜由于具有较强的磁各向异性而在磁信息和磁光信息存储中具有重要的应用.C掺杂可精确调控薄膜的磁各向异性,从而可有效地改变薄膜的矫顽场.通过超短激光脉冲与铁磁薄膜相互作用,可以获得非平衡状态下电子、自旋和晶格等自由度之间的动态耦合参数,这是研究超快磁记录材料的物理基础.本文基于瞬态磁光Kerr效应,研究了两种C掺杂浓度下FePt薄膜的超快磁光响应.实验结果表明:瞬态Kerr信号与外加磁场正相关,磁场反向,Kerr信号反号,而瞬态反射率与外加磁场无关;不同C掺杂的FePt薄膜的矫顽场不同,软磁的退磁时间显著小于硬磁薄膜的退磁时间.我们还观测到超快激光在铁磁薄膜中诱导频率约为49 GHz的相干声学声子,该声子的频率与外加磁场无关.实验结果为设计和研制新型磁光薄膜提供了实验依据.     

Laser induced threshold photoemission magnetic circular dichroism and its application to photoelectron microscope

This work enlightens the threshold photoemission magnetic circular dichroism (MCD) and its adaption on photoemission electron microscopy (PEEM) using lasers. MCD is a simple and efficient way to investigate magnetic properties since it does not need any spin analyzers with low efficiency, and thus the MCD related techniques have developed to observe magnetic domains. Usually, MCD in a total yield measurement in the valence band with weak spin–orbit coupling (SOC) excited by low photon energy (hν≤ 6 eV) does not compete with the X-ray magnetic circular dichroism (XMCD) with strong SOC. XMCD PEEM observation of magnetic domains has been successfully established while MCD PEEM derived from valence bands has not been. However, using angle and energy resolved photoelectron, valence band MCD provides large asymmetry similar to that by XMCD. Threshold measurement of photoelectron in a total electron yield procedure can take advantage of the measurement of photoelectrons with a limited angle and energy mode. This restriction of the photoelectron makes the threshold MCD technique an efficient way to get magnetic information and gives more than 10% asymmetry for Ni/Cu(0 0 1), which is comparable to that obtained by angle resolved photoemission. Thus the threshold MCD technique is a suitable method to observe magnetic domains by PEEM. For threshold MCD, incident angle dependence and high sensitivity to out-of-plane magnetized films compared with in-plane ones are discussed. Ultrashort pulse lasers make it feasible to measure two photon photoemission MCD combined with PEEM, where resonant excitation has a possibility to enhance dichroic asymmetry. Recent results for valence band magnetic dichroism PEEM are presented.     

Imaging excitations in magnetic thin film microstructures

We show how a photoemission electron microscope (PEEM) installed at a synchrotron can be used to image magnetic objects with very high spatial and temporal resolution. Sub-nanosecond magnetic field pulses are used to excite the fundamental magnetic modes of micron sized permalloy particles. The time evolution of the magnetization is imaged using a pump-probe technique where the magnetic contrast is given by X-ray magnetic circular dichroism (XMCD). Depending on the shape and size of the magnetic object we can observe modes related to either the homogenously magnetized domains, to the domain walls or to the vortex. All of these can be analyzed quantitatively yielding their frequencies, amplitudes and damping time constants. For objects with controlled defects we show that the magnetic vortex can be switched between defects using magnetic field pulses.     

Exploring nanomagnetism with soft X-ray microscopy

Magnetic soft X-ray microscopy images magnetism in nanoscale systems with a spatial resolution down to 15 nm provided by state-of-the-art Fresnel zone plate optics. X-ray magnetic circular dichroism (X-MCD) is used as the element-specific magnetic contrast mechanism similar to photoemission electron microscopy (PEEM), however, with volume sensitivity and the ability to record the images in varying applied magnetic fields which allows study of magnetization reversal processes at fundamental length scales. Utilizing a stroboscopic pump-probe scheme one can investigate fast spin dynamics with a time resolution down to 70 ps which gives access to precessional and relaxation phenomena as well as spin torque driven domain wall dynamics in nanoscale systems. Current developments in zone plate optics aim for a spatial resolution towards 10 nm and at next generation X-ray sources a time resolution in the fs regime can be envisioned.     

Femtosecond spectroscopic imaging by time-of-flight photoemission electron microscopy

Advances in electron optics and fast-pulsed light sources have enabled the imaging of nanoscale structures with simultaneous energy and time resolutions. We present the results obtained from a time-resolved time-of-flight photoemission electron microscopy (TR-TOF-PEEM) system. This system combined the spatial resolution of conventional PEEM with the time resolution of a femtosecond-pulsed laser and the energy resolution of a TOF energy analyzer. The TOF-PEEM system consists of three electrostatic lenses in front, a drift tube for the measurement of TOF, and a delay line detector (DLD) at the end of the optics. The excitation source is femtosecond pulses from a cavity-dumped Ti:sapphire oscillator that is frequency-doubled to 400 nm using a β-barium borate (BBO) crystal. Using a pump-probe two-photon photoemission technique, we demonstrate an example of sub-100 nm space-resolved ultrafast time evolution of the electron energy spectra for the plasmon resonance of an Ag-coated Si nanostructure, which exhibited unexpectedly intense high energy photoemission signals that show different time evolution between bright and dark regions in a PEEM image.     

Magneto-optical linear dichroism in threshold photoemission electron microscopy of polycrystalline Fe films

Magnetic linear dichroism in threshold photoemission has been exploited to obtain magnetic contrast in a photoemission electron microscope using a mercury arc lamp. The dichroism at threshold can be described similar to the magneto-optical Kerr effect in the region of visible light. The asymmetry of electron intensity observed for a 100 nm polycrystalline Fe film on silicon is A=(0.37+/-0.05)%. The asymmetry occurs for the geometry of the transverse Kerr effect. For unpolarized light the asymmetry was about half the value observed for linearly polarized light. Threshold photoemission microscopy has a large potential for high resolution magnetic domain imaging with fast data acquisition.     

Surface antiferromagnetic domain structures of NiO (0 0 1) studied using UV photoemission electron microscope

Direct observation of the antiferro (AF) magnetic domain structures of a NiO (0 0 1) surface is found to be possible using a spectroscopy photoelectron low-energy electron microscope (SPELEEM) and a commercial UV Hg excitation light source without using any polarizers. The principle is based on the magnetic linear dichroism (MLD) effect, where different domain contrasts are produced according to the relative angle between the antiferromagnetic axis and the linearly polarized light. The observed AF magnetic domain structures are strongly affected by both bulk AF magnetic domain structures and the stresses induced during the sample cleaving process. Moreover, the AF magnetic domain structures are found to be irreversible when the sample is heated to over its Néel temperature and then cooled. The possibility of imaging AF magnetic domain structures without using synchrotron radiation or a polarizer is attractive.     

Exploring the magnetic and organic microstructures with photoemission electron microscope

We present photoemission electron microscopy (PEEM) studies on geometrically constrained ferromagnetic, organic, and organics–ferromagnet hybrid structures. Powered by an elliptically polarized undulator, the PEEM at Taiwan Light Source (TLS) is capable of recording polarization enhanced X-ray images and has been employed to examine the domain configurations in a lithographically patterned permalloy film as well as the orientations of pentacene molecules adsorbed on self-assembled monolayers (SAMs) modified gold surfaces. In addition, magnetic images acquired on cobalt/pentacene and pentacene/cobalt bilayers reveal that in hybrid structures the order of thin film deposition can lead to distinct domain configurations. Spectroscopic evidence further suggests that there is significant orbital hybridization at the interface where metallic cobalt was deposited directly on organic pentacene.     

Phase defect inspection of multilayer masks for 13.5 nm optical lithography using PEEM in a standing wave mode

We report on recent developments of an “at wavelength” full-field imaging technique for defect inspection of multilayer mask blanks for extreme ultraviolet lithography (EUVL). Our approach uses photoemission electron microscopy (PEEM) in a near normal incidence mode at 13.5 nm wavelength to image the photoemission induced by the EUV wave field on the multilayer blank surface. We analyze buried defects on Mo/Si multilayer samples down to a lateral size of 50 nm and report on first results obtained from a six inches mask blank prototype as prerequisite for industrial usage.     

Real space observation of current-induced magnetic domain wall displacement in Co/Ni nano-wire by photoemission electron microscopy

Current-induced magnetic domain wall (DW) displacement in a Co/Ni nano-wire with perpendicular magnetic anisotropy was investigated in real space by photoemission electron microscopy (PEEM) for the first time. DW velocity determined from the PEEM observation was 40?m?s(-1) for the current density of 2.5?×?10(12)?A?m(-2), which was consistent with the result obtained by the electrical measurement used in our previous reports.