紫外增强薄膜发射光谱测量中的倍波现象分析

紫外探测技术足继激光和红外探测技术之后发展起来的又一军民两用光电探测技术,在普通探测器件光敏面镀上将紫外波段的光转化为可见波段的光的变频薄膜是增强光电探测器紫外响应的主要技术.文章用"旋涂法"制备成像器件紫外增强薄膜.在对紫外增强薄膜的量子转化效率进行测量分析的实验过程中用SP1702紫外可见光栅光谱仪对薄膜的紫外变频效率进行分析,在激发光源为260和280nm时变频薄膜的发射光谱在520和560 nm附近有较明显的波峰.结合光栅光谱仪的工作原理,对该现象进行了理论分析,得出520和560 nm附近的波峰并非变频薄膜受激发发出的光波,而是光谱测量中产生的倍波现象.从分离重级光谱的角度没计了光谱分级器,以消除光谱测鼍中倍波现象的影响.

Investigation of Multi-Wavelength Effect During the Measurement of UV-Enhanced Film's Emission Spectrum

The UV-responsive detector is a dual-use device for civilian and military after the laser and IR-responsive sensors. Typical image sensor coated with a layer of down-convert frequency thin film on it’s photosurface to enhance UV response is the key technology of enhancing UV-response. The UV-enhanced thin film was made in the experimental laboratory using the Zn2SiO4∶Mn phosphor by spin coating method. Two peaks at 520 and 560 nm respectively in the emission spectrum of the UV-enhanced film were found by SP1702 spectrograph when the excitation wavelength was 260 and 280 nm.The peaks were found in the process of experiment of measuring and counting the quantum efficiency of UV-enhanced thin film. But the light peaks at 520 and 560 nm are not the emission light peaks by the exciting light of 260 and 280 nm. The reason why the light at 520 and 560 nm is not the emission light was analyzed based on the measurement principle of grating spectrograph. The reasons for the multi-wavelength of light overlaps during the measurement of emission spectrum were also discussed. And the equipment used to separate the overlapped different wavelengths was designed, which will be used to resolve the problem of the overlap of multi-wavelength.