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This paper presents a facile and effective method to fabricate microlens array in polydimethylsiloxane (PDMS). The microlens array model is fabricated in photoresist via digital maskless grayscale lithography technique and the replica molding technique is used to fabricate PDMS microlens array. A convex PDMS microlens array with rectangular aperture and concave PDMS microlens array with hexagonal aperture are fabricated. The morphological characteristics of the microlens arrays are measured by microscope and 3D profiler. The results indicate that the profiles of the PDMS microlens arrays are clear and distinct. This method provides a simple and low-cost approach to prepare large area, concave or convex with arbitrary shape microlens array, which has potential application in many optoelectronic devices. 相似文献
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凹折射微透镜阵列的离子束刻蚀制作 总被引:1,自引:0,他引:1
利用光刻热熔成形工艺及离子束刻蚀制作 12 8× 12 8元凹微透镜阵列。所制硅及石英凹微透镜的典型基本图形分别为凹球冠形、凹柱形和矩顶凹面形。分析了在光致抗蚀剂柱凹微透镜图形制作过程中的膜系匹配特性 ,与制作该种微透镜有关的光掩模版的主要结构参数 ,以及光致抗蚀剂掩模工艺参数的控制依据等。探讨了在凹微透镜器件制作基础上利用成膜工艺开展平面折射微透镜器件制作的问题。采用扫描电子显微镜 (SEM)和表面轮廓仪测试了所制石英凹微透镜阵列的表面微结构形貌。给出了所制石英凹微透镜阵列远场光学特性的测试结果。 相似文献
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为了改善PtSi IRCCD器件的红外响应特性,需要添加长焦距微透镜阵列进行焦平面集光,本文提出了一种新的方法—曲率补偿法用于长焦距微透镜阵列的制作.扫描电子显微镜(SEM)显示微透镜阵列为表面极为平缓的方底拱形阵列,表面探针测试结果显示用曲率补偿法制作的微透镜阵列表面光滑,单元重复性好,其焦距可达到685.51μm.微透镜阵列器件与PtSi IRCCD器件在红外显微镜下对准胶合,显著改善了IRCCD器件的光响应特性. 相似文献
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We report a simple method for fabricating a concave refractive microlens array (MLA) in solgel glass by using a proximity-effect-assisted reflow technique. The solgel concave refractive MLA that we fabricated had excellent surface smoothness; good dimensional conformity, with an 8.23% nonuniformity of the microlens elements; and structural perfection, with a biggest deviation of 1% from a perfect concave spherical crown. The relative error between the measured and the designed values of the concave MLA's focal length was only 1.83%. Compared with the conventional fabrication techniques for concave MLAs, the proposed method has significant advantages including simplicity, low cost, good element conformity, and smooth device surface. 相似文献
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Shih-Wei Yang Chern-Sheng Lin Shu-Hsien Fu Mau-Shiun Yeh Chingfu Tsou Teng-Hsien Lai 《Optics Communications》2012,285(6):1066-1074
This study attempted to develop a detection system for lens sag of the microlens array in real time using an optical automatic inspection framework to link with the computer through a camera. An image processing technique was applied to detect the spherical microlens array, and then, the results were compared.The system light source used laser light and applied CCD to collocate with the microscope array to form an automatic optical detection system for an optical interferometric microscope. It applied the principle of the Fizeau interferometer, illuminated the surface of microlens array, and formed the phase difference required by the interference of two lights through the laser light reflected by the reference plane and the surface of the microlens array, thus, forming an interference fringe.When the sag of the microlens was much longer than the wave length of the detection light source, the fringe would be densely distributed, thus, only a few central fringes were clear in the microscopic image. An image processing method was used to search the center of the interference fringe and a creative algorithm was utilized to obtain the lens sag of the microlens. As proved by the experiment, lens sag of 4 microlens arrays were detected in real time, with a minimum detection error of 0.08 μm, and a maximum detection error of 4 μm (error value 1 ~ 9%), according to different sample processes. This system featured a simple structure and is applicable to non-contact detection and detection of different-sized microlens arrays. 相似文献
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扩展微透镜数值孔径范围的阶梯光刻热熔法研究 总被引:4,自引:1,他引:3
在微透镜阵列的光刻热熔制作法中,临界角效应严重影响了微透镜的制作范围和面形质量。在对临界角效应定性研究的基础上,提出了用阶梯光刻熔法来扩展热熔型微透镜阵列的数值孔径范围。实验结果表明,采用这一方法制作的微透镜,其单元孔径范围扩展为50 ̄900μm,相对口径范围扩大到为F/1 ̄F/10,并有效地改善了临界角效应对大孔径微透镜面形质量的影响。 相似文献
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Sihai Chen Xinjian Yi Yi Li Miao He Lingbin Kong Hong Ma 《International Journal of Infrared and Millimeter Waves》2001,22(3):393-398
A special method, named step simulation method, is proposed for fabricating Si microlens array to improve the performance of infrared focal plane array (IR FPA). The focus length of rectangle-based multistep microlens array with element dimension of 40 µm×30 µm is 885.4 µm by the method, which is much longer than the focus length of microlens array fabricated by conventional Fresnel binary optics technique., The large-scale 256×256 element microlens array is hybridintegrated with the PtSi Schottky-barrier IR FPA by optical adhesive. The test results show that diffractive spot size of the microlens is 17 µm×15 µm and the average optical response of the IR FPA is increased by a factor of 2.4. 相似文献
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为了提升高功率固体激光器中激光二极管(LD)面阵抽运场性能,采用几何光学和数理统计分析的方法,建立了基于微透镜阵列匀束的LD面阵抽运耦合系统的数学与物理模型,对微透镜阵列参数与最终耦合输出抽运场参数之间的关系进行分析,明确了微透镜单元F数、微透镜通光单元数以及微透镜阵列空间周期参数的设计原则.经实验测试,优化设计完成的LD面阵抽运耦合系统光场不均匀度为7.9%,耦合效率为90.7%. 相似文献
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Fabrication of Refractive Microlens Array with no Dead Area 总被引:1,自引:1,他引:0
CHEN Bo GUO Lurong TANG JiyueZHEN Hongjun PANG Ling TIAN Weijian 《Chinese Journal of Lasers》1998,7(2):146-151
FabricationofRefractiveMicrolensAraywithnoDeadAreaCHENBoGUOLurongTANGJiyueZHENHongjunPANGLingTIANWeijian(InformationOpticsRe... 相似文献
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折射型微透镜列阵的光刻热熔法研究 总被引:8,自引:1,他引:7
研究了制作折射型微透镜列阵的一种新方法光刻胶热熔成形法,获得了20×20的折射型微透镜列阵,单元微透镜相对口径为F/2,单元透镜直径为90μm,中心间隔100μm,透镜的波像差小于1.3波长。本文详细阐述了光刻热熔法的基本原理及微透镜设计方法,并讨论了工艺参数对微透镜列阵质量的影响。 相似文献
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Yi Li Xinjian Yi Liping Cai 《International Journal of Infrared and Millimeter Waves》2000,21(9):1417-1425
Diffractive microlens arrays can completely collect the light at the focal plane and concentrate it into a smaller spot size on the detector plane, the photodetector area can be substantially reduced. Increased gamma radiation hardening and noise reduction result from the decrease in photodetector sensitive area. The diffractive microlens arrays have been designed by considering the correlative optical and processing parameters for PtSi focal plane array. They have been fabricated on the backside of PtSi focal plane array chip by successive photolithography and Ar+ ion-beam-etching technique. The alignment of microlens array with PtSi focal plane array was completed by a backside aligner with IR light source. The practical processes and fabrication method are discussed. The performance parameters of PtSi FPA with diffractive microlens array are presented. 相似文献
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针对目前红外焦平面光敏阵列中存在的占空比小、光能利用率低的实际问题,展开了正方形孔径球面微透镜阵列制作及其与红外焦平面阵列集成应用的研究.本文从红外焦平面光敏阵列特点入手,对比分析了正方形孔径相比于传统圆形孔径微透镜阵列在光能利用上的优势.提出正方形孔径微透镜阵列激光直写变剂量曝光制作技术,建立光刻胶曝光数学模型和正方形球面微透镜面型函数,以此为基础,编制直写设备变剂量曝光控制软件;利用长春理工大的学复合坐标激光直写系统和等离子刻蚀机进行相关工艺实验,制作了阵列256×256、单元尺寸40×40 μm2、球面半径60 μm、单元间距1 μm的红外石英微透镜阵列;并将其与相应阵列的碲-镉-汞红外光敏阵列进行集成.结果表明:微透镜的占空比达到95%,红外焦平面光能利用率从原来的60%提高到90% 以上.由此得出结论:变剂量曝光制作微透镜技术是可行的,正方形孔径球面微透镜阵列代替圆形孔径微透镜阵列,对于提高红外探测器的灵敏度、信噪比、分辨率等性能具备明显优势. 相似文献
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用于红外焦平面的正方形孔径球面微透镜阵列研究 总被引:1,自引:0,他引:1
针对目前红外焦平面光敏阵列中存在的占空比小、光能利用率低的实际问题,展开了正方形孔径球面微透镜阵列制作及其与红外焦平面阵列集成应用的研究.本文从红外焦平面光敏阵列特点入手,对比分析了正方形孔径相比于传统圆形孔径微透镜阵列在光能利用上的优势.提出正方形孔径微透镜阵列激光直写变剂量曝光制作技术,建立光刻胶曝光数学模型和正方形球面微透镜面型函数,以此为基础,编制直写设备变剂量曝光控制软件;利用长春理工大的学复合坐标激光直写系统和等离子刻蚀机进行相关工艺实验,制作了阵列256×256、单元尺寸40×40μm2、球面半径60μm、单元间距1μm的红外石英微透镜阵列;并将其与相应阵列的碲-镉-汞红外光敏阵列进行集成.结果表明:微透镜的占空比达到95%,红外焦平面光能利用率从原来的60%提高到90%以上.由此得出结论:变剂量曝光制作微透镜技术是可行的,正方形孔径球面微透镜阵列代替圆形孔径微透镜阵列,对于提高红外探测器的灵敏度、信噪比、分辨率等性能具备明显优势. 相似文献
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Fabrication and design of various dimensions of multi-step ashperical microlens arrays for OLED package 总被引:1,自引:0,他引:1
An optical film with aspherical microlens array (A-MLA) by using multi-step lithography process for an OLED (Organic Light-Emitting Diode) package is fabricated, by which method the luminance of OLEDs can be enhanced. The method of design and fabrication of an A-MLA is explored in this study. In the design process, various parameters of an A-MLA such as curved profiles, layout template and dimensions of microlens are analyzed and characterized. Curved profiles include hyperbola, parabola, ellipse and sphere; and layout templates include square, hexagon, triangle and tangential circle. The profile of the A-MLA was determined by using a commercial optical simulation software, FRED. Based on the simulated result, a film with an A-MLA was fabricated using the LIGA-like (Lithographie Galvanoformung Abformung, LIGA) process, including lithography, sputtering, micro-molding with PDMS (Polydimethylsiloxane) and UV (Ultraviolet)-cured technology. The major challenge to this process is to use JSR-126N negative thick photoresist to manufacture an approximate A-MLA optical film with multi-step lithography method. Finally, the films with A-MLAs are attached to an OLED to measure their optical-electric properties. The effectsof A-MLA optical films on OLED luminance are analyzed. In addition, the measured results are compared with simulated ones. They show good agreement with each other. 相似文献