La,V共掺杂的Bi_4Ti_3O_(12)铁电薄膜的溶胶-凝胶法制备及性能测试

采用溶胶-凝胶(sol-gel)工艺在Pt/TiO2/SiO2/p-Si(100)衬底上制备出Bi4Ti3O12(BIT)和Bi3.25La0.75Ti2.97V0.03O12(BLTV)铁电薄膜,研究了La,V共掺杂对BIT薄膜的晶体结构和电学性能的影响.BIT薄膜为c轴择优取向,BLTV薄膜为随机取向,拉曼光谱分析表明V掺杂降低了TiO6(或VO6)八面体的对称性,也增强了Ti—O键(或V—O键)杂化.BLTV薄膜的剩余极化Pr为25.4μC/cm2,远大于BIT薄膜的9.2μC/cm2,表现出良好的铁电性能.疲劳、漏电流测试显示BLTV薄膜具有优良的抗疲劳特性和漏电流特性,表明La,V共掺杂能有效地降低薄膜中的氧空位.     

Switching between the Functions of Half-Wave Plate and Quarter-Wave Plate Simply by Using a Vanadium Dioxide Film in a Terahertz Metamaterial

We propose a switchable THz metamaterial that can be switched between two functions of half-wave plate and quarter-wave plate.The two switchable functions can be simply achieved by inserting a VO_2 film in the metamaterial design.Finite-difference time-domain(FDTD) simulation results show that the proposed metamaterial can convert x-polarized incident wave to y-polarized reflected wave when VO_2 is at metal phase,and convert x-polarized wave to circularly polarized wave when VO_2 is at insulator phase.The metamaterial performs well in the two functions,i.e.,the same broad working frequency band and near perfect polarization conversion.The switching effect originates from the switchable Fabry-Perot cavity length induced by the phase change of VO_2.We believe that our findings provide a reference in designing switchable metamaterials.     

Low-temperature phase transformation of CZTS thin films

The low temperature phase transformation in the Cu_2ZnSnS_4(CZTS) films was investigated by laser annealing and low temperature thermal annealing.The Raman measurements show that a-high-power laser annealing could cause a red shift of the Raman scattering peaks of the kesterite(KS) structure and promotes the formation of the partially disordered kesterite(PD-KS) structure in the CZTS films,and the low-temperature thermal annealing only shifts the Raman scattering peak of KS phase by several wavenumber to low frequency and the broads Raman peaks in the low frequency region.Moreover,the above two processes were reversible.The Raman analyses of the CZTS samples prepared under different process show that the PD-KS structure tends to be found at low temperatures and low sulfur vapor pressures.Our results reveal that the control of the phase structure in CZTS films is feasible by adjusting the preparation process of the films.     

GaN layers with different polarities prepared by radio frequency molecular beam epitaxy and characterized by Raman scattering

GaN layers with different polarities have been prepared by radio-frequency molecular beam epitaxy (RF-MBE) and characterized by Raman scattering. Polarity control are realized by controlling Al/N flux ratio during high temperature AlN buffer growth. The Raman results illustrate that the N-polarity GaN films have frequency shifts at $A_{1}$(LO) mode because of their high carrier density; the forbidden $A_{1}$(TO) mode occurs for mixed-polarity GaN films due to the destroyed translation symmetry by inversion domain boundaries (IDBS); Raman spectra for Ga-polarity GaN films show that they have neither frequency shifts mode nor forbidden mode. These results indicate that Ga-polarity GaN films have a better quality, and they are in good agreement with the results obtained from the room temperature Hall mobility. The best values of Ga-polarity GaN films are 1042 cm$^{2}$/Vs with a carrier density of 1.0$\times $10$^{17}$~cm$^{ - 3}$.     

Splitting of frequencies of optical phonons in tensile-strained germanium layers

Tensile-strained germanium films in Ge/GeSn/Si/GeSnSi multilayer heterostructures grown by molecularbeam epitaxy on Si(001) substrates are investigated by Raman spectroscopy. Biaxial tensile strains in the films reach 1.5%, which exceeds values previously obtained for this system. Splitting of frequencies of long-wavelength optical phonons is experimentally observed; i.e., the shift of the frequency of the singlet induced by biaxial tensile strains is larger than the shift of the frequency of the doublet in agreement with calculations. The strain-induced shift of Raman scattering peaks from two-phonon scattering in germanium is also detected.     

Role of manganese in ferromagnetic (Al,Mn)N films

We have studied the (Al,Mn)N films grown by plasma-enhanced molecular beam epitaxy via Raman spectroscopy to verify how Mn atoms were incorporated into AlN lattice. In Raman spectra of (Al,Mn)N, the frequency of E₂ (high) mode blueshifts. Together with XRD results, the strain calculations support the existence of the substitutional dopant. Also, an additional peak, attributed to local vibrational mode of Mn, coincides with the calculated phonon frequency on the basis of a simple model. The Raman results reveal that Mn atoms replace Al atoms at the substitutional sites in the lattice. The (Al,Mn)N films were found to exhibit insulating characteristics and ferromagnetic ordering above room temperature. These results suggest that the ferromagnetism in the (Al,Mn)N films is due to the intrinsic nature originating from the substitutional Mn within (Al,Mn)N.     

RF-PECVD掺溴非晶碳氢膜的Raman光谱分析

在室温条件下,以溴乙烷为单体、氢气为载气,用13.56 MHz射频等离子体化学气相淀积方法(RF-PECVD)在硅片衬底上生长了掺溴非晶碳氢薄膜(a-C:Br:H).通过对其进行Raman光谱分析,研究了工作气压对薄膜结构的影响.结果显示:随着气体工作压力从20 Pa下降至5 Pa,样品D峰强度增强,I_D/I_G值逐步由1.18增加至1.36,G峰的位置向高频轻微移动;与此同时,薄膜生长方式逐步转为低能态形式生长,薄膜中sp~2C逐步由链式结构向环式结构转化.     

Ca9R(VO4)7 : Eu3+ 发光粉的发光特性

采用高温固相法制备了Eu³⁺离子激活的Ca₉R(VO₄)₇(R = Y, La, Gd)红色发光粉,并利用荧光光谱对发光粉的特性进行研究。激发光谱中,Ca₉Y(VO₄)₇ : Eu³⁺ , Ca₉La(VO₄)₇ : Eu³⁺和Ca₉Gd(VO₄)₇ : Eu³⁺都有两个宽的VO^3-₄激发带和Eu³⁺的特征激发峰。发射光谱中,在Ca₉Y(VO₄)₇ : Eu³⁺ 和Ca₉La(VO₄)₇ : Eu³⁺中的350~550 nm范围内出现VO^3-₄的发射带,而在Ca₉Gd(VO₄)₇ : Eu³⁺中却没有观察到VO^3-₄的发射。在这三种发光粉中,Ca₉Gd(VO₄)₇ : Eu³⁺的发光强度远远高于其它两种,这是由于Gd³⁺的存在有效地使能量通过Gd³⁺ →VO^3-₄ → Eu³⁺及Gd³⁺ → Eu³⁺的两种方式进行能量传递,从而提高了Eu³⁺发光效率。     

The effects of thermal annealing on the obliquely deposited Ag-Ge-S thin films

Obliquely deposited thin films of ternary Ag-Ge-S glasses are characterized in this work. Thin films are fabricated in a vacuum thermal evaporator at different evaporation angles and examined by Raman spectroscopy. The Raman mode frequency of GeS₄ corner-sharing (CS) structure of the as-deposited films display a red-shift as a function of Ag content due to reduced global connectivity, and therefore decreased network stress. Film thickness of normally deposited thin films is significantly less when compared against obliquely deposited ones. Sulfur-ring (S₈) modes are observed in thin films but not in corresponding bulk material. Thermal annealing of thin films results in the disappearance of Sulfur-ring (S₈) modes, while the temperature required for this phenomenon is deposition angle dependent. Thickness of the obliquely deposited films shrinks significantly after thermal annealing, which indicates a collapse of the micro-column structure introduced by oblique deposition.     

掺杂和未掺杂氧化锌薄膜的拉曼光谱

利用拉曼光谱分别对不同衬底上,未掺杂和掺杂以及掺杂浓度不同的ZnO薄膜进行了系统的分析研究。其中ZnO薄膜均由溶胶-凝胶法制得,掺杂源为LiCl。测得的拉曼光谱显示,Pt/Ti/SiO2/Si衬底上生长的ZnO薄膜的拉曼特征峰(437cm-1)的强度明显高于SiO2/Si衬底上ZnO薄膜的拉曼特征峰的强度,说明Pt/Ti/SiO2/Si衬底上ZnO的晶化程度比SiO2/Si上ZnO的晶化程度高;但ZnO拉曼特征峰的位置和半高宽并没有发生变化,说明两种衬底上ZnO薄膜中应力大小没有发生变化。掺Li+后,580cm-1处的峰位向高频方向移动,且掺杂浓度越大频移量越大,说明掺杂已经在不同程度上引起了ZnO晶体中自由载流子浓度的变化。此外,还分析了掺Li+未在很大程度上引起ZnO晶格畸变的原因。     

Structural Variation and Its Influence on the 1/f Noise of a-Si_(1-x)Ru_x Thin Films Embedded with Nanocrystals

The structural variation and its influence on the 1/f noise of a-Si_(1-x)Ru_x thin films are investigated by Raman spectroscopy,transmission electron microscopy, and low frequency noise measurement. The Ru atoms are introduced into the amorphous silicon thin films by rf magnetron co-sputtering. Ru2 Si nanocrystals are found in the as-deposited samples. It is shown that the 1/f noise of the films can be reduced by a slight doping with Ru atoms. Moreover, both the microstructure and the 1/f noise performance of a-Si_(1-x)Ru_x thin films could be improved through a high-temperature annealing treatment.     

射频功率对类金刚石薄膜性能的影响

在不同射频功率条件下,实验研究了射频等离子体化学气相沉积类金刚石薄膜的金刚石相分数、光学常数和硬度。利用Raman光谱仪、椭圆偏振仪、数字式显微硬度计分别测试了不同条件下单层类金刚石薄膜的金刚石相分数、光学常数和硬度。实验表明,随着功率的增加,金刚石相的相对分数减少,薄膜的折射率先减小再增加然后减小,射频功率大于910 W时,沉积速率急剧增大。而薄膜的硬度先增加后减小,在射频功率为860 W处获得最大值。     

RF溅射的SiO_2和SiO_2/Al/SiO_2薄膜的喇曼散射光谱研究

用射频溅射(RF Sputtering)法制成了SiO_2和SiO_2/Al/SiO_2薄膜。应用喇曼光谱研究了薄膜结构。结果表明:RF溅射制成的SiO_2薄膜是含有大量环结构缺陷的玻璃态;SiO_2/Al/SiO_2层状薄膜的喇曼光谱中观察到Al_2O_3的特征峰,证实了Al/SiO_2薄膜界面确有氧化还原反应发生;从喇曼光谱中Al_2O_3的特性峰的位置和相对强度可推断出,SiO_2/Al/SiO_2薄膜界面处的Al_2O_3是非晶γ-Al_2O_3。     

Stress effect and evidence of ferroelectric weakening in highly c-axis-oriented PbTiO3 thin films

3 were successfully grown on Pt-coated SrTiO₃ single-crystal substrates by metalorganic chemical vapor deposition (MOCVD) and were investigated by using X-ray diffraction (XRD), scanning electron microscopy (SEM) and Raman spectroscopy. The as-deposited thin films were found to be highly (001)-oriented with an average grain size of about 0.3 μm. Both a decrease of the tetragonality and a frequency downshift of the long-wavelength optical phonons were observed and attributed to the effect of compressive stress in the thin films. However, Raman scattering studies estimated a stress value of 2.6 GPa, which is much larger than the value of 0.75 GPa obtained from the XRD analyses. Raman spectroscopic studies also confirmed the grain-size-related disorder feature in the as-grown PbTiO₃ thin films. Structural investigations implied the weakening of ferroelectricity in the heteroepitaxial ferroelectric thin films. Received: 1 April 1997/Accepted: 14 July 1997     

Raman scattering study of ion implanted and C.W.-Laser annealed polycrystalline silicon

Recovery of crystallinity in ion-implanted and c.w.-laser annealed polycrystalline silicon films has been examined by the Raman spectroscopy. The variation of the Raman frequency and width with laser annealing and thermal annealing shows the presence of uniform strain in the laser annealed polysilicon. It is found that the subsequent thermal annealing releases the strain.     

Surface oxidation of vanadium dioxide films prepared by radio frequency magnetron sputtering

This paper reports that the thermochromic vanadium dioxide films were deposited on various transparent substrates by radio frequency magnetron sputtering, and then aged under circumstance for years. Samples were characterized with several different techniques such as x-ray diffraction, x-ray photoelectron spectroscopy, and Raman, when they were fresh from sputter chamber and aged after years, respectively, in order to determine their structure and composition. It finds that a small amount of sodium occurred on the surface of vanadium dioxide films, which was probably due to sodium ion diffusion from soda-lime glass when sputtering was performed at high substrate temperature. It also finds that aging for years significantly affected the nonstoichiometry of vanadium dioxide films, thus inducing much change in Raman modes.     

TiO2 thin films for spintronics application: a Raman study

We present the results of a systematic study performed by micro‐Raman spectroscopy on pure anatase, pure rutile and mixed anatase–rutile TiO₂ thin films, deposited by radio frequency magnetron sputtering on quartz substrates, with different thicknesses. The crystal structures of the as‐deposited films were unambiguously determined and a good crystalline homogeneity was revealed by a systematic mapping of the samples. In the mixed‐phase films, the relative amount of the two phases was monitored by a simple analysis of the components of the multi‐Lorentzian fitting curves. For the single‐phase films, the influence of the thickness and the effect of different thermal treatments, carried out to obtain series of thin films differing only for oxygen content, are discussed. The analysis of the scattered light has provided indication about the presence of an interface layer between the substrate and the film, which can play a role in driving the interesting magnetic properties exhibited by our samples, which are of potential usefulness for spintronics application. The results obtained from other techniques are briefly reported and discussed in relation to our systematic Raman characterization. This study points out how Raman investigation can provide suggestions toward the understanding of the complex physical phenomena leading to room‐temperature ferromagnetism in TiO₂ thin films. Copyright © 2009 John Wiley & Sons, Ltd.     

激发频率对高氢稀释下纳米晶硅薄膜生长特性的影响

利用等离子体增强化学气相沉积技术,在高氢稀释条件下,研究不同激发频率对纳米晶硅薄膜生长特性的影响.剖面透射电子显微镜(TEM)分析结果显示,不同激发频率下制备的纳米晶硅薄膜晶化区均呈锥状结构生长,但13.56 MHz激发频率下制备的纳米晶硅薄膜最初生长阶段存在非晶态孵化层,即纳米晶硅薄膜的形成经历了由非晶态孵化层到晶态结构层的转变.而高激发频率(40.68 MHz)下硅纳米晶则能直接在非晶态衬底上生长形成.Raman谱和红外吸收谱测量结果表明高激发频率(40.68 MHz)下制备的纳米晶硅薄膜不但具有较高     

Microstructure and Raman spectra of Ag-MgF_2 cermet films

Ag-MgF2 cermet films with different Ag fractions were prepared by vacuum evaporation. The micfostruc-ture of the films was examined by Raman scattering technique. The surface-enhanced Raman spectrum for MgF2 molecules in the cermet film strongly suggests the existence of Ag nanoparticles dispersed in MgFa matrix. The intensities of the Raman spectra of Ag-MgF2 cermet films increase with Ag fraction. The enhancement of Raman scattering disappears when Ag content reaches wt.20%. The analyses with the transmission electron microscopy showed that Ag-MgF2 cermet films are mainly composed of amorphous MgF2 matrix with embedded faced-center-cubic Ag nanoparticles. It suggests that the percolation threshold should be around wt.20% of Ag content.     

Raman-spectroscopy study of PbTiO3 thin films grown on Si substrates by metalorganic chemical vapor deposition

Raman spectra have been investigated in PbTiO₃ thin films grown on Si by metalorganic chemical vapor deposition. A large grazing-angle scattering technique was taken to measure the temperature dependence of Raman spectra below room temperature. All Raman modes in the thin films are assigned and compared with those in the bulk single crystal, a newA ₁(TO) soft mode at 104 cm^–1 was recorded which satisfies the Curie-Weiss relation ² =A(T _c –T). Intensities of theA ₁(1TO) andE(1TO) modes were anomalously strengthened with increasing temperature. Raman modes for the thin films exhibit remarkable frequency downshift and upshift which is related to the effect of internal stress.