4H-SiC NMOS电子、质子辐照数值模拟

 分析了高能电子、质子对4H-SiC的损伤机理,建立了4H-SiC NMOS器件物理模型。电子、质子辐照效应模型。应用ISE-TCAD软件进行数值模拟计算,得出在能量为2.5 MeV、注量为5×10¹³ cm^-2的电子辐照及能量为6.5 MeV、注量为2×10¹⁴ cm^-2的质子辐照下,4H-SiC NMOS转移特性曲线和亚阈值漏电流曲线变化的初步规律。数值模拟结果与相同条件下Si NMOS实验结果吻合较好。     

3 MeV质子辐照对AlGaN/GaN高电子迁移率晶体管的影响

研究了AlGaN/GaN 高电子迁移率晶体管(HEMT)的质子辐照效应. 在3 MeV质子辐照下, 当辐照剂量达到1× 10¹⁵ protons/cm²时, 漏极饱和电流下降了20%, 最大跨导降低了5%. 随着剂量增加, 阈值电压向正向漂移, 栅泄露电流增加. 在相同辐照剂量下, 1.8 MeV质子辐照要比3 MeV质子辐照退化严重. 从SRIM软件仿真中得到不同能量质子在AlGaN/GaN异质结中的辐射损伤区, 以及在一定深度形成的空位密度. 结合变频C-V测试结果进行分析, 表明了质子辐照引入空位缺陷可能是AlGaN/GaN HEMT器件电学特性退化的主要原因.     

双束质子辐照砷化镓光电导探测器的I-V特性

 对用能量为7.5MeV和20MeV,注量为10¹¹～10¹³cm^-2的质子辐照后的砷化镓材料制作的光电导探测器的光电流和暗电流进行了测试，并由此推得电导率的变化。结果表明，经过能量为7.5MeV的质子改性后的砷化镓探测器相对于未改性的附加光电导率Δσ减少，而且随着辐照注量的增加而越小，而对于先用能量为20MeV质子辐照后再用能量为7.5MeV的质子辐照的砷化镓材料制作的探测器，其附加光电导率Δσ的减少则更为明显。对上述现象进行了分析，并根据其相应关系预测了该种探测器的响应时间、灵敏度、拖尾现象及受X射线激发的输出脉冲的后延的变化情况。     

辐射变色薄膜的质子辐照响应

 用J-2.5质子静电加速器提供的质子束,对研制的一种高灵敏度新型辐射变色膜进行质子辐射响应研究。该变色膜以聚乙烯醇缩聚物为基质,以类丁二炔化合物为有机染色材料,质子能量为2.0 MeV,辐照注量为1.0×10¹⁰～1.0×10¹² cm^-2。用光谱响应测试薄膜的辐射效应显示：变色薄膜颜色由粉红渐变为蓝色, 并随着辐照剂量的增加而逐渐加深;用图像分析仪分析辐照后靶材的光密度发现,图像的光密度随聚焦斑距离的增大而减小;用分光光度计测试其吸收光谱发现,主吸收峰值出现在660 nm附近,且吸收峰处的响应吸光度与质子注量具有较好的线性关系;对新型变色薄膜辐照后持续效应的研究表明,变色膜辐照后续效应微弱,辐照后可以立即测量,且对测量环境变化不敏感。     

光电耦合器的反应堆中子辐射效应

 选择3种典型光电耦合器开展了反应堆中子辐照实验,中子注量为3×10¹¹~5×10¹²cm^-2时,位移效应导致电流传输比下降,饱和压降提高。发光器件相同,探测器为Si PIN光电二极管的光电耦合器比探测器为Si NPN光敏晶体管的光电耦合器的初始电流传输比要小,但其抗位移损伤能力更强。探测器均为Si NPN光敏晶体管,发光器件为异质结LED要比硅两性掺杂LED的光电耦合器的电流传输比抗位移损伤能力提高2个量级;以光敏晶体管为探测器的光电耦合器,在较大的正向电流和输出负载电阻条件下工作可提高抗辐射水平。此外,光电耦合器的位移损伤存在加电退火效应。     

110keV质子辐照温控涂层性能变化的XPS分析

实验研究了注量在1.0×10¹¹—1.0×10¹⁶p/cm²范围依次变化时110keV质子辐照引起的温控涂层热光性能的变化,并使用XPS谱仪分析了辐照样品化学态的变化. 实验结果表明,质子注量不高于1.0×10¹⁴p/cm²时,同种材料的温控涂层样品的相对光反射率变化很小,同时同种材料样品的表面化学结构如化学位移和元素的比例变化很小.当注量高于1.0×10¹⁴p/cm²时, 样品的相对光反射率变化明显,样品表面的原子化学结构变化大, 化学位移明显增加, 元素比例变化显著,所有样品表面的C元素比例明显增大而O元素比例明显减小.一定注量的低能质子辐照能够使某些低太阳吸收率α_s的温控涂层的太阳吸收率变得更低, 具有改善热光性能的效果.质子辐照之后温控涂层样品表面化学结构的变化与样品的物理性能的变化存在直接的关联.     

CMOS图像传感器在质子辐照下热像素的产生和变化规律

应用于空间的图像传感器在辐射影响下产生的热像素严重影响空间光电探测性能,本文通过质子辐照试验研究了热像素的产生和变化规律。首先,使用3 MeV和10 MeV两种能量的质子对图像传感器进行辐照,分析不同能量、不同注量的质子辐照产生热像素的性质;其次,再对辐照后的器件进行退火试验,分析热像素的退火规律。对于相同注量辐照,3 MeV质子辐照下热像素产生率大约是10 MeV质子辐照下的2.3倍,但是10 MeV质子辐照产生热像素的灰度值高于3 MeV质子;辐照过程中热像素的数量都是随着注量的增加线性增加。退火过程中,热像素数量都不断减少,而3 MeV质子辐照产生的热像素相比于10 MeV质子,退火更为显著。结果表明,质子辐照下每个质子与器件之间的作用过程及产生缺陷的机制是相对独立的,不同质子的作用过程之间没有相关性。不同能量的质子辐照产生缺陷的类型不同,导致热像素具有不同特性。     

18 MeV质子辐照对TiNi形状记忆合金R相变的影响

 研究了用HZ-B串列加速器的18MeV质子辐照对TiNi形状记忆合金R相变的影响，辐照在奥氏体母相状态下进行。示差扫描量热法（DSC）表明，辐照后R相变开始温度T^s_R和逆马氏体相变结束温度T^f_A随辐照注量的增加而降低。当注量为1.53×10¹⁴/cm²时，T^sR和T^f_A分别下降6K和13K，辐照未引起R相变结束温度T^s_R和逆马氏体相变开始温度T^f_A的变化。表明辐照后母相(奥氏体相)稳定。透射电镜（TEM）分析表明辐照后没有引起合金可观察的微观组织变化。辐照对R相变开始温度T^s_{R和逆马氏体相变结束温度Af的影响可能是由于质子辐照后产生了孤立的缺陷团，形成了局部应力场，引起晶格有序度的下降所造成的。}     

用于质子和伽马射线探测的金刚石薄膜探测器的辐照性能

 研制出CVD金刚石薄膜探测器,在国家串列加速器和⁶⁰Co稳态辐射源上分别完成了该探测器对9 MeV质子束流和1.25 MeV γ射线的辐照性能研究。结果表明:该探测器在9 MeV质子照射累积强度达到10¹³ cm^-2时,探测器信号电荷收集效率减小量低于3.5%,辐照前后探测器暗电流没有明显变化。计算得到9 MeV质子对该探测器的损伤系数为1.3×10^-16 μm^-1·cm²。由于γ射线与金刚石作用产生的电子起到了填补缺陷的作用,探测器信号电荷收集效率随γ射线照射剂量的增加略有增加,在γ射线累积照射量达到10.32 C/kg时,其增幅小于0.7%。说明金刚石薄膜探测器具有较高耐辐照强度,适用于高强度辐射测量领域。     

质子辐照空间级硅橡胶的正电子淹没寿命谱研究

 用正电子淹没寿命谱方法（PALS）研究了质子辐照对空间级硅橡胶KH-L-Y微观结构的影响。试验结果表明，PALS谱所揭示的最长寿命成分的t₃, I₃及自由体积分数Vf随辐照剂量的增加开始明显下降；而当辐照剂量大于10¹⁵cm^-2后，随剂量的增加平缓上升。辐照剂量小于10¹⁵cm^-2时，质子辐照使硅橡胶自由体积减小，分子链间堆砌紧密；辐照剂量大于10¹⁵cm^-2时，质子辐照使硅橡胶自由体积增大。交联密度及DMA测试结果同样表明，质子辐照在剂量较小时硅橡胶的交联密度及玻璃化转变温度增加，辐照以交联效应为主；而剂量较大时辐照降解占优势。     

Experimental investigations of fast-proton production in a picosecond laser plasma

Results of experimental investigations of fast-proton production in a laser plasma are presented for the case where the intensity of laser radiation at the targets is 2 × 10¹⁸ W/cm². Three processes of fast-proton acceleration in laser plasma are investigated: (1) the acceleration of protons from the front surface toward the laser pulse, (ii) the acceleration of protons from the front surface of the target toward its interior, and (iii) the acceleration of protons from the rear foil surface in the outward direction. The activation procedure and CR-39 tracker detectors featuring a set of various-thickness aluminum filters were used to record fast protons. It turned out that the proton-acceleration process is the most efficient in the case of proton acceleration from the rear foil surface in the outward direction. Experimental results revealed that about N _p = 10⁷ protons of energy in the region E _p > 1.9 MeV that are accelerated from the target surface toward a laser ray, N _p = 4× 10⁷ protons of energy in the region E _p > 1.9 MeV that are accelerated fromthe front surface of the target toward its interior, and N _p = 4×10⁸ protons of energy in the region E _p > 1.9 MeV that are accelerated from the rear foil surface in the outward direction are generated at a laser-radiation intensity of 2 × 10¹⁸ W/cm² at the surface of aluminum, copper, and titanium targets. Experimental investigations aimed at optimizing the process of proton acceleration from the rear surface of aluminum foils were performed by varying the foil thickness over the range between 1 and 100 μm. The results of these experiments showed that there is an optimum foil thickness of 10 μm, in which case protons of maximum energy 5 MeV are generated.     

Hot electron studies of lattice damage created in silicon by implantation of 2.8 MeV protons

Abstract

In this paper we report the results of a study of the annealing properties of the ionized defect density associated with the damage created in the silicon lattice by implantation of 2.8 MeV protons at room temperature. In particular, the annealing of damage created by implanting to a level of 4.43 × 10¹² protons/cm² is reported. The resulting isochronal annealing curve covered the temperature range from 70°C to 460°C. Two major annealing stages are discussed, one a broad stage between 70°C to 200°C and the other an abrupt annealing stage between 440°C to 460°C. Between the temperature range 200°C to 440°C the number of ionized defects remained relatively constant. Above 460°C no detectable effects of the proton implantation remained.     

The study of damage and optical properties in LiNbO3 implanted by MeV Er and He ions

Abstract

Two LiNbO₃ (X and Y cut) crystals from different companies were implanted by 3.0 MeV Er ions to a dose of 7.5 × 10¹⁴ ions/cm² and 3.5 × 10¹⁴ ions/cm² with different beam current densities, respectively. After annealing at 1060°C in air for 2 hours, one LiNbO₃ sample was implanted by 1.5 MeV He ions to a dose of 1.5 × 10¹⁶ ions/cm². The Rutherford backscattering/channeling and prism coupling method have been used to study the damage and optical properties in implanted LiNbO₃. The results show: (1) the damage in LiNbO₃ created by 3.0 MeV Er ions depends strongly on the beam current density; (2) after annealing at 1060°C in air for 2 hours, a good Er doped LiNbO₃ crystal was obtained; (3) there is waveguide formation possible in this Er-doped annealed LiNbO₃ after 1.5 MeV He ion implantation. It is suggested that annealing is needed to remove the damage created by MeV Er ions before the MeV He ion implantation takes place, to realize the waveguide laser for Er doped LiNbO₃.     

Radiation source dependence of device performance degradation for 4H-SiC MESFETs

The impact of radiation source dependence on the device performance degradation of 4H-SiC MESFETs (Metal Schottky Field Effect Transistors), which have been irradiated at room temperature with 2 MeV electrons and 20 MeV protons, is studied. No performance degradation is observed by 1×10¹⁵ e/cm² and 5×10¹¹ p/cm², while a slight increase of the linear drain current together with a decrease of the threshold voltage are noticed above higher fluence. The damage coefficient for protons is about three orders of magnitude larger than that for electrons. The radiation source dependence of the device performance degradation is attributed to the difference of mass and the possibility of nuclear collision for the formation of lattice defects. Based on thermal annealing results of electron-irradiated MESFETs, it is found that the recovery of the drain current characteristics principally takes place from 100 C, and that the drain current recovers to the pre-rad value after 200 C annealing. On the other hand, capacitance and induced deep levels do not recover by 200 C annealing. It is concluded that the degradation of the drain current is mainly sensitive to the radiation-induced decrease of the Schottky barrier height at the gate contact.     

First results of electron cooling experiments at LEAR

The first results are presented of electron cooling experiments in the Low-Energy Antiproton Ring (LEAR) at CERN, performed with a proton beam of about 50 and 21 MeV. The number of stored protons ranged from 10⁷ to 3 × 10⁹. Cooling times of the order 1 s and proton drag rates of up to 0.7 MeV/s were obtained. The capture of cooling electrons by protons producing hydrogen atoms was used to derive an effective electron temperature (0.25 eV). From the angular profile of the neutral hydrogen beam an upper limit of 3π mm.mrad could be deduced for the horizontal equilibrium proton-beam emittance. The lowest equilibrium momentum spread was 2 × 10⁵ (FWHM), as derived from the analysis of the longitudinal Schottky signal. This Schottky signal exhibited an unusual behaviour with beam intensity and under certain conditions showed a doublepeak structure which was associated with collective beam noise. For very cold beams transverse instabilities were observed, which resulted in a rapid spill-off of protons and a stabilization at lower intensities. The threshold of these instabilities was raised by heating the proton or the electron beam. The cooling of a bunched proton beam was investigated. The reduction of the proton momentum spread led to bunch lengths of about 2 m, containing 3 × 10⁸ protons.     

Continuous-wave laser oscillation at 1.06 µm in silicon ion-implanted Nd:YVO<Subscript>4</Subscript> planar waveguide

This work, for the first time to our knowledge, reports continuous-wave laser oscillation at 1.06 μm in Nd:YVO₄ planar waveguide formed by 3.0 MeV Si⁺ ion implantation at a dose of 1 × 10¹⁵ ions/cm² at room temperature. The effective refractive indices of the waveguide propagation modes were measured by using a prism-coupling method after the annealing at 240°C for 60 min in air. The performance of the waveguide laser has been studied in terms of the threshold pump power and slope efficiency. The laser outputs show a very high stability operating in cw regime at room temperature.     

Initiation of the (<Emphasis Type="Italic">γ, n</Emphasis>) and (<Emphasis Type="Italic">p,n</Emphasis>) nuclear reactions in the picosecond laser plasma at a laser intensity of 2 × 10<Superscript>18</Superscript> W/cm<Superscript>2</Superscript>

The experimental results on the initiation of various (γ, n) and (p, n) nuclear reactions in the picosecond laser plasma are presented. It is demonstrated that the following (γ, n) and (p, n) nuclear reactions can be initiated at a laser intensity of 2 × 10¹⁸ W/cm² with the threshold energies of γ-quanta ranging from 1.67 to 7.56 MeV and the threshold energies of protons ranging from 1.88 to 5 MeV: ⁹Be(γ, n)2α, ¹⁸¹Ta(γ, n)¹⁸⁰Ta, ⁷Li(p, n)⁷Be, ⁶³Cu(p, n)⁶³Zn, ⁴⁸Ti(p, n)⁴⁸V. The method based on the detection of fast neutrons using the 3He counters is employed for the measurement of the number of the initiated (γ, n) and (p, n) nuclear reactions. The measured yield of the (γ, n) and (p, n) nuclear reactions ranges from 5 × 10¹ to 10⁵ reactions per laser pulse.