大功率激光制备a-C和a-C∶H类金刚石膜的光学性能研究

采用大功率高重复频率准分子激光溅射热解石墨靶制备了类金刚石碳膜,研究了实验条件对类金刚石膜光学性能的影响,发现氢可以提高膜中sp3键的含量和膜的光学透过率.在实验参数范围内,膜的光学性能随着氢压的增加而提高.根据类金刚石膜的反应沉积机理对上述结果进行了分析、解释.     

直流负偏压对类金刚石薄膜结构的影响

在不同的直流负偏压下利用直流射频等离子体辅助化学气相沉积技术在单晶硅表面沉积得到了类金刚石薄膜,用拉曼光谱、红外光谱和原子力显微镜对薄膜的结构和形貌进行了表征.结果表明:无偏压时,沉积得到的薄膜呈现类聚合物结构且表面比较粗糙,而叠加了偏压后,薄膜表现出类金刚石薄膜的结构特征,随着偏压的增大,膜中的氢含量和sp3碳含量均逐渐减小,且薄膜的表面粗糙度逐渐减小.     

DMF溶液中导电玻璃上沉积类金刚石薄膜

液相法制备类金刚石膜设备简单,操作容易,能大面积成膜,越来越受到研究者们的关注．Ｎａｍｂａ［１］以乙醇为介质,在１２００Ｖ电压７０℃以下沉积膜,得到了类金刚石膜;Ｓｕｚｕｋｉ等［２］以水乙二醇溶液为介质制膜,只得到了石墨相的碳膜;以乙醇的水溶液为介质利用电解热沉积膜,得到了玻璃碳和石墨碳,同时阴极钨发生碳化有ＷＣ和Ｗ２Ｃ生成［３］;Ｎｏｖｉｋｏｖ等［４］在乙炔的液氨溶液中沉积膜,Ｒａｍａｎ谱表明他们得到了类金刚石（ＤＬＣ）膜;Ｋｗｉａｔｅｋ等［５］重复了Ｎａｍｂａ的实验,证明沉积膜主要为非晶态…     

聚硅氧烷/钛溶胶光催化复合膜的制备与表征

在锐钛型钛溶胶颗粒或粉体TiO2存在下,进行端乙烯基硅油与含氢硅油的原位硅氢加成反应,制得聚硅氧烷/TiO2复合膜,实现TiO2在立体交联膜中的分散及与聚硅氧烷基体的有效复合.通过红外分析、电镜观察、拉伸实验和紫外-可见光透过测试,对聚硅氧烷的组成和交联结构、复合膜的形态结构及其拉伸和光学性能进行表征和分析.发现原料硅油的扩链处理和SiO2的补强作用有助于提高反应的过程稳定性及复合膜的拉伸性能.亲水性的粉体TiO2在成膜过程中易发生进一步的大规模团聚,这在膜表面构筑微纳结构的同时会劣化膜材的力学、光学性能.溶胶-凝胶法自制钛溶胶颗粒表面残留有部分未脱除的有机基团,这使其具有一定的亲油性和较好的有机相容性,因而钛溶胶颗粒可在有机介质和聚硅氧烷膜中达到初级粒子形式的均匀稳定分散.上述形态结构,可使相应复合膜具有更佳的拉伸性能和紫外屏蔽/可见光透过性能,并有望在保持复合膜高耐老化性的同时具有高效的光催化性能.     

可溶性聚酰亚胺类偶氮高分子的合成与表征

用聚合物的后重氮偶合方法合成了以可溶性聚酰亚胺为主链 ,偶氮生色团为侧基的新型偶氮高分子 ,并通过引入线性长链烷烃侧基来提高聚合物的溶解性 .采用红外光谱、氢核磁共振、紫外光谱和热分析等手段 ,对产物的结构、热性能及光学性能等进行了表征 .该聚合物膜在氩离子干涉激光的照射下形成正弦波形的表面起伏光栅 ,起伏深度可达 2 0 0nm .     

混合溶剂对可录型光盘中吲哚类菁染料薄膜性能的影响

本文采用紫外可见光谱、FT-IR及AFM等手段,研究了混合溶剂对光盘记录介质吲哚类菁染料薄膜光学性能、稳定性和表面结构的影响.发现在不同混合溶剂下涂出的相同膜厚的染料薄膜,其光学性能和表面形貌都有很大的差异.不同的混合溶剂都存在一个最佳混合体积比,染料在此体积比下旋涂出膜的光学性能和表面形貌均优于单一溶剂下涂出的膜.对比不同混合溶剂涂出的膜的光学性质及AFM的观测结果,发现二丙酮醇与氯仿在等体积比混合、四氟丙醇与氯仿在7:3体积下混合时效果最好,易得到反射率高,表面较平整的染料薄膜.     

醋酸纤维素衍生物的合成及包衣性质

用苯酐、四氢苯酐和甲基四氢苯酐对醋酸纤维素进行修饰,对醋酸纤维素邻苯二甲酸酯(CAP)、醋酸纤维素四氢邻苯二甲酸酯(CATH)和醋酸纤维素甲基四氢邻苯二甲酸酯(CAMT)的性质如酸值、膜透湿性、抗张强度、黏度和玻璃化转变温度进行了初步探讨,并选用盐酸青藤碱为模型药物进行包衣片剂的体外释放实验.结果表明,两类高分子材料的成膜性能良好,符合药剂学薄膜包衣材料的有关要求.包衣片的体外释放实验表明,CAMT和CATH作为薄膜材料在纯化水中释放药物的速度比醋酸纤维素薄膜材料释放药物的速度明显减慢.CAMT和CATH可以用作长效释药的包衣材料.     

射频磁控溅射制备纳米晶Ni-Mo催化阴极及其表征

利用射频磁控溅射方法制备了纳米晶Ni-Mo合金薄膜, 并将其用作太阳能光电化学制氢的阴极催化膜. 采用XRD， EDS， SEM和AFM对膜的晶型、 成分、 表面形貌以及晶粒尺寸进行了表征. 用稳态极化曲线和电化学交流阻抗谱对膜的析氢电化学特性进行了测试. 结果表明， 在较高的工作压强、 较低的衬底温度和较远的靶距下沉积的膜有较好的电化学性能, 晶粒的细化以及膜中Mo含量的增加有助于析氢催化活性的提高, 在电流密度为100 mA/cm2时析氢过电势为177.7 mV, 电化学脱附是膜上析氢反应的控制步骤.     

掺硼多晶金刚石膜的电化学性能研究

采用EACVD(Electron Assisted Chemical Vapor Deposition)方法制备了掺硼金刚石膜, 并用扫描电镜、拉曼光谱及霍尔效应等测试方法对其表面形貌、生长特性、载流子浓度以及导电性能进行了分析. 测试结果表明, 掺硼金刚石膜是由微米级晶粒组成的多晶膜, 其载流子浓度为4.88×1020 cm-3, 电阻率为0.03 Ω·cm, 是高品质金刚石膜. 用该金刚石膜制作电化学电极, 利用循环伏安法分别测量了金刚石膜电极在氯化钾空白底液、亚铁氰化钾溶液和左旋半胱氨酸溶液中的循环伏安曲线, 发现该金刚石膜电极在水溶液中具有宽的电化学窗口(约为3.7 V)和接近零的背景电流, 在生物制剂的检测中具有很高的灵敏度和良好的稳定性, 是一种理想的电化学电极材料.     

氢溴储能电池结构的优化和运行条件对电池性能的影响

研究了氢溴电池的电池结构、正极氢溴酸和溴电解质浓度、负极的氢气压力、质子交换膜厚度对氢溴电池的性能和电池效率的影响。对氢溴电池结构进行改进,单电池实现了200 mA·cm^-2电流密度恒流充放电,电池库伦效率100%。溴电极电化学反应受浓差极化控制,提高氢溴酸浓度,电池充电性能提高,同时,溴在氢溴酸的溶解度增大,电池放电性能也提高,氢溴酸浓度由0.5 mol·L^-1提高至1 mol·L^-1,电流密度200 mA·cm^-2,电池的能量效率和电压效率提高27.9%。氢溴电池充电过程,降低电池负极氢出压力,有利于提高充电性能,但膜透酸严重,放电过程中最佳的氢出压力是维持氢在碳纸憎水催化层的单层吸附,充放电过程氢出压力均为40.0 kPa,电池的能量效率80.2%。膜厚度与膜电阻极化和膜透酸密切相关,充电过程,膜由50.0 μm降至15.0 μm,膜透酸严重,负极电化学活性比表面积下降,电池充电性能降低。膜厚度对放电性能的影响还与电流密度有关,电流密度较低时,膜透酸造成负极电化学比表面积下降居主导地位,50.0 μm Nafion膜放电性能更高;电流密度超过200 mA·cm^-2时,膜电阻极化居主导电位,15.0 μm Nafion膜性能更高。采用20.0 μm质子交换膜,在200 mA·cm^-2电流密度循环充放电五次,电池的能量效率和电压效率达到85.3%,库伦效率100%。     

Electrodeposition and characterization of Pd nanoparticles doped amorphous hydrogenated carbon films

Palladium (0) nanoparticles incorporated hydrogenated amorphous carbon (Pd/a-C:H) films were synthesized on single crystal silicon (100) substrates by electrochemical deposition route using methanol and camphor as carbon source, and Pd nanoparticles as dopant. The characterization results indicate that Pd nanocrystalline particles with diameter in the range of 1–5 nm dispersed in the amorphous carbon matrix. Compared with pure a-C:H films, the introduction of Pd nanoparticles didn't change the structure of carbon films. At the end, the growth mechanism of the Pd/a-C:H composite films was discussed.     

Approach to excellent superhydrophobicity and corrosion resistance of carbon-based films by graphene and cobalt synergism

A new series of carbon-based films doped with graphene oxide and cobalt (G-Co/a-C:H films) were successfully prepared on Si substrate via one-step electrochemical deposition of methanol as the carbon source and graphene oxide/cobalt as the dopant. G-Co/a-C:H films were fabricated at various graphene oxide concentration for comparative experiments. It can be found that the graphene oxide and cobalt were well embedded in amorphous carbon matrix to form superhydrophobic G-Co/a-C:H film at the doping GO concentration of 0.007 mg/mL, which was confirmed by transmission electron microscopy (TEM). It was noted that the superhydrophobicity of the resulting surface derives from its rough surface with hierarchical micro-nanostructures and the presence of the low-surface-energy GO components on it. The hierarchical micro-nanostructures are attributed to the corporate joint of GO and cobalt to form the multilevel nanoscale composite interface. Specially, the as-fabricated superhydrophobic G-Co/a-C:H film could exhibit excellent self-cleaning ability and corrosion resistance, revealed by the self-cleaning and corrosion tests.     

Characterization of amorphous hydrogenated carbon formed by low-pressure inductively coupled plasma enhanced chemical vapor deposition using multiple low-inductance antenna units

Three-dimensional plasma enhanced chemical vapor deposition (CVD) of hydrogenated amorphous carbon (a-C:H) has been demonstrated using a new type high-density volumetric plasma source with multiple low-inductance antenna system. The plasma density in the volume of phi 200 mm x 100 mm is 5.1 x 10(10) cm(-3) within +/-5% in the lateral directions and 5.2 x 10(10)cm(-3) within +/-10% in the axial direction for argon plasma under the pressure of 0.1 Pa and the total power as low as 400 W. The uniformity of the thickness and refractive index is within +/-3.5% and +/-1%, respectively, for the a-C:H films deposited on the substrates placed on the six side walls, the top of the phi 60 mm x 80 mm hexagonal substrate holder in the pure toluene plasma under the pressure is as low as 0.04 Pa, and the total power is as low as 300 W. It is also found that precisely controlled ion bombardment by pulse biasing led to the explicit observation in Raman and IR spectra of the transition from polymer-like structure to diamond-like structure accompanied by dehydrogenation due to ion bombardment. Moreover, it is also concluded that the pulse biasing technique is effective for stress reduction without a significant degradation of hardness. The stress of 0.6 GPa and the hardness of 15 GPa have been obtained for 2.0 microm thick films deposited with the optimized deposition conditions. The films are durable for the tribology test with a high load of 20 N up to more than 20,000 cycles, showing the specific wear rate and the friction coefficient were 1.2 x 10(-7) mm3/Nm and 0.04, respectively.     

The antioxygen radiation properties of the nanocomposite film consisted of hydrogenated amorphous carbon (a-C:H) and MoS2

MoS₂/a-C:H multilayer film and MoS₂/a-C:H composite film exhibit excellent tribological properties in vacuum, which can be used as the potential space lubricant. The radiation-protective properties of these two films in atomic oxygen (AO) are evaluated. The influences of AO radiation on structure, morphology, and tribological properties of the films were investigated. The results show that AO radiation mainly causes oxidation and increases sp² C content in both of the films. Furthermore, the MoS₂ sublayer on the surface of the multilayer film is oxidized heavily, whereas both the MoS₂ and the a-C:H matrix on the surface were oxidized in the composite film. As a result of this, the multilayer film exhibits high friction coefficient and short sliding lifetime in vacuum after AO radiation. Compared with that, the composite film exhibits lower friction and longer sliding time more than 3600 seconds in vacuum, which illustrates it has a good AO radiation protection. This indicates that MoS₂/a-C:H composite film is more likely to be used as a potential space lubricant.     

Achieving ultra-low friction of a-C:H film grown on 9Cr18Mo steel for industrial application via programmable high power pulse magnetron sputtering

Owing to the high hardness and hydrogen passivation of carbon bonds, hydrogenated diamond-like carbon (a-C:H) film has shown promising potential to achieve ultra-low friction and wear on steel surfaces. Here, a-C:H film was successfully deposited on 9Cr18Mo steel via programmable high power pulse magnetron sputtering and potential application for industrial was evaluated. The a-C:H films against different mating materials of GCr15 steel balls, Al₂O₃, Si₃N₄, ZrO₂, and a-C:H-coated GCr15 balls all showed ultra-low friction under a normal load of 5 N in a dry ambient air environment. Among them, self-mating tribo-system a-C:H films on steel surfaces and a-C:H-coated steel balls achieve best friction performance; the principal reason is that both contacting surfaces coated with a-C:H film have the lower electron affinities compared with other tribo-systems. However, the differences of coefficient of friction (COF) for uncoated-GCr15, Al₂O₃, ZrO₂, Si₃N₄, and a-C:H(GCr15) balls can be attributed to different sizes of clustering in wear debris. This work provides new insights on synthesis and industry application of the a-C:H films with ultra-low friction properties.     

Synthesis of silver and copper nanoparticle containing a-C:Hby ion irradiation of polymers

One of the many applications of diamond like carbon (DLC) is the biocompatible coating of medical tools and implants. The most recent field of interest concerns the generation of antimicrobial activity in combination with the excellent wear resistance and biocompatibility of DLC. As has already been shown for polymers, nanoparticles of silver or copper within a carbonacious matrix have a bactericidal effect.In this work we describe a new technique to produce amorphous hydrogenated carbon films (a-C:H), which contain nanometer sized clusters of silver or copper. The hybrid deposition process is based on sol–gel synthesis of polymer films and subsequent ion-induced densification and cross-linking to form a-C:H. By thermal or UV-induced reduction of metal salts in polymer solution, colloidal metal particles are produced. In this way polymer films, already containing noble metal nanoclusters, can be deposited in a wet chemical step. Upon sol–gel deposition, the polymer is subjected to ion irradiation. Based on earlier results, the influence of ion energy on chemical and mechanical properties, as well as bonding structure is investigated. Special attention is also dedicated to ion-induced diffusion and growth as well as oxidation effects.     

热辅助存储磁盘硅掺杂非晶碳薄膜氧化的ReaxFF反应力场分子动力学模拟

Heat-assisted magnetic recording (HAMR) is one of the promising ways to extend the magnetic recording area density to 1 Tb·in^-2 in hard disk drives (HDDs).High temperature induced by laser heating can cause carbon overcoat (COC) oxidation.Reactive molecular dynamics (MD) simulations are performed to investigate the oxidation process of silicon-doped amorphous carbon (a-C:Si) films for HAMR application.The atomic details of the structure evolution and oxidation process are investigated, and, the oxidation mechanism of the a-C:Si film is clarified.The effect of the duration of laser irradiation on the oxidation of the a-C:Si film is investigated.The oxidation occurs during heating and the beginning of cooling process.Both volume expansion during heating process and cluster of carbon atoms during cooling process increase the rate of sp² carbon.Because of the decrease in the amount of unsaturated silicon atoms and low diffusion coefficient of atomic oxygen, the oxidation rate of the a-C:Si film decreases with laser irradiation cycles.The molecular oxygen is the oxidant due to surface defect of a-C:Si film.The atomic strains break the O-O bonds in Si-O-O-Si linkages and rearrange the surface oxide layers, and process the oxidation of the a-C:Si film.     

Optical emission spectroscopy in reactive hollow cathode arc discharge plasmas – Local distribution of active species during the deposition of hard carbon films

A low pressure arc plasma discharge from a hollow LaB(6)-cathode with up to 100 A discharge current is used to create plasmas of high density. Typical values for the electron density and temperature in PETRA ( Plasma Engineering and Technology Research Assembly) are n(e)=10(12)-10(13) cm(-3) and T(e)=5-20 eV. The ionization ratio is typically 1-10%. Optical emission spectroscopy has been applied to investigate the processes within the plasma which lead to the deposition of thin carbon films. In these experiments hydrogenated carbon films (a-C:H) have been deposited on Si-substrates by introducing hydrocarbon gases (CH(4), C(2)H(2)) into He- and Ar-plasmas. Space resolved optical emission spectroscopy using an in-situ translation mechanism of the optical fibre has been performed to measure the local concentrations of CH-radicals, carbon ions and of the excitation of He-neutrals. In addition the hydrogen liberated by the dissociation of the hydrocarbon molecules has been measured. The dissociation of the hydrocarbon molecules takes place as a localized process in the vicinity of the reactive gas inlet.     

脉冲激光沉积非晶态Ni-V2O5 复合薄膜及其电化学性能研究

首次报道了用355 nm脉冲激光沉积非晶态Ni-V2O5复合薄膜电极的电化学性能.采用不同摩尔比的NixV2O5 靶(x=0.1,0.3,0.5),在不同的基片温度(Ts)和O2气压力下制备了Ni-V2O5复合薄膜.XRD 和SEM测定表明, 在不锈钢基片上, Ts=300℃和氧气压力为14 Pa沉积0.5 h得到的是非晶态的Ni-V2O5薄膜.将此非晶态的Ni0.3V2O5薄膜电极用于锂电池的正极,与纯V2O5薄膜相比,不仅具有良好的放电速率性能和高的比容量,而且其充放电循环稳定性优异.该薄膜电极在放电速率为20 C时测得的比容量达200 mAh/g,并经1000次以上的充放电循环无明显的衰减.     

Investigation of surface topography, morphology and structure of amorphous carbon films by AFM and TEM

Morphology and structure of amorphous carbon films deposited with a pulsed arc source (LASER-ARC) have been studied using microscopical methods (SEM, TEM and AFM), electron diffraction and spectroscopical investigation (EELS). The parameters of the arc source and the deposition conditions (substrate temperature) influence morphology and structure of deposited amorphous carbon films. Especially the incorporation and growth of particles, embedded in the film have been investigated. By particle analysis using an optical microscope a majority of particles that is smaller than 500 nm has been determined. The morphology has been also demonstrated similar by AFM and TEM images. Their number and size of particles is strongly influenced by the deposition temperature. The structure of amorphous film is characterized by the EELS-spectra, but the particle structure was not detectable.