SrAl2O4：Eu2+的长余辉发光特性的研究

本文研究了SrAl2O4:Eu2+材料的发光及长余辉特性.首次得到了这一材料的发光衰减由初始的快衰减和后期的慢衰减过程所组成,以及热释发光光谱出现两个热释发光峰值的实验结果.对所得结果进行了分析讨论,提出了这一材料的发光衰减是由两个足够深的电子陷阱所引起.     

一种阴极射线发光荧光仪

本文描述一种玻璃真空系统、可折电子枪式阴极射线致发光仪,它可以测量快达10~(-8)sec短时发光衰减过程。文中讨论了光电倍增管阳极回路特性,建议采用宽带示波器,其频带宽度为衰减时间常数倒数的三倍,否则就要进行修正。用该仪观察了ZnO∶Zn发光衰减过程,测量结果和其他作者的完全符合。     

能量传递过程的计算机模拟

通过对供体(D)—受体(A)间传递速率静态分布的模拟,得到了静态能量传递情况下D的发光衰减曲线,与Inokuti-Hirayama模型结果一致.模拟并讨论了D—D传递与D—A传递相关和非相关情况下D—D传递对D发光衰减的影响. 关键词：     

石榴石型Cd3Al2Ge3O12:Tb化合物的发光

对具有石榴石型的镉铝锗酸盐Cd3Al2Ge3O12(CAGG)磷光体的合成、光致发光、阴极射线发光及磷光衰减特性进行了研究.254nm紫外光停止激发后,CAGG:Tb呈现强而长的Tb3+离子的特征的黄绿光辐射.基质和磷光体的磷光衰减都符合B=At-α关系式.对这种磷光现象进行了讨论.     

氧、硼、磷掺杂对氢化非晶硅中铒1.54μm发光的作用

利用等离子体增强化学气相淀积(PECVD)技术生长氧、硼、磷掺杂的氢化非晶硅薄膜.在室温下注入铒离子后研究三种掺杂元素对铒离子发光的作用.室温下观察到很强的光致发光现象.氧的引入并且和铒离子形成发光中心,提高了铒离子的发光强度.退火实验表明氧、硼、磷的掺杂补偿了材料中的缺陷,提高了氢的逃逸温度,改善材料的热稳定性,使材料的退火温度因掺杂元素的加入而提高,铒的发光得到增强.讨论了铒离子的发光机制.     

基于光子技术的UV-B辐射对植物细胞伤害评价方法

用50 μW/cm2 UV-B连续辐射大豆愈伤组织16 h,发现大豆愈伤组织的自发发光强度逐渐增长,延迟发光呈现衰减的趋势.通过对延迟发光动力学过程的分析,得到了UV-B辐射下大豆愈伤组织延迟发光的特征参数积分强度I(T)、初始光子数I0、相干时间τ和衰减参数β的变化规律.结果表明,大豆愈伤组织延迟发光初始光子数I0、...     

模拟高压静电对Q67发光影响的实验系统

用发光二级管和光学衰减片模拟Q67的发光光谱.实验中发现高压静电较低时发光微生物发光强度高于无静电作用时,但随高压静电的增加,发光强度逐渐减弱.实验结果表明该系统可以模拟高压静电对Q67发光的影响,使实验可在室外环境中进行,方便水环境的监测.     

γ射线辐照诱导Bi:α-BaB2O4单晶近红外宽带发光的研究

用提拉法技术生长出了掺Bi的α-BaB₂O₄单晶并经过γ射线辐照.测定了样品在室温下的吸收光谱、发射光谱及荧光衰减曲线.在808 nm波长光的激发下,经γ射线辐照后的α-BaB₂O₄单晶中发现了中心波长为1139 nm、半高宽为113 nm的近红外宽带发光现象.讨论了辐照条件和退火处理对Bi离子发光的影响.对于其发光机理进行了初步的探讨. 关键词： 近红外宽带发光 2O₄单晶')" href="#">α-BaB₂O₄单晶 辐照 退火处理     

纳米硅薄膜的光致发光特性

用等离子体增强化学汽相淀积法系统制备了发光纳米硅(nc-Si∶H)薄膜.讨论了晶粒尺寸和表面结构对光致发光(PL)谱的影响.用量子限制-发光中心模型解释了nc-Si∶H的PL.研究了PL谱的温度特性.温度从10K上升到250K，PL峰值红移了54meV，且PL强度衰减了两个数量级. 关键词：     

PbWO4闪烁晶体的发光动力学模型

在对PbWO₄闪烁晶体的光谱特性、发光衰减及其温度依赖以及热释光的研究基础上,并结合理论计算,提出了PbWO₄晶体发光的动力学模型,给出了PbWO₄晶体的基本能带结构及激子发光中心能态、陷阱能级在能隙中的位置。用此模型可以完整说明PbWO₄的发光过程,特别是导致室温下发光效率低的原因。最后还对其主发射成分蓝、绿发光中心的起源作了简要讨论。     

少子寿命和表面形貌与多孔硅发光性能的关系

研究了不同时间腐蚀的多孔硅的光致发光性能与多孔硅的表面形貌和少子寿命之间的关系。结果表明,多孔硅的发光来自与氧空位有关的缺陷,而多孔硅表面的氢原子能够钝化多孔硅表面的非辐射中心从而提高多孔硅的发光效率。多孔硅的空隙度随腐蚀时间的延长而增大,这也导致了多孔硅的少子寿命的降低,从而造成多孔硅的光致发光效率随多孔硅空隙度的增大以及少子寿命的降低而提高。另外,原子力显微照片表明长时间的腐蚀使多孔硅表面层被化学腐蚀,从而降低了多孔硅表面的粗糙度。     

The mechanism of emission in the red photoluminescence band of porous silicon

Porous silicon (PS) exhibits several photoluminescence (PL) bands, whose spectral position and intensity depend strongly on the actual conditions of preparation of PS, its treatment, and subsequent use. The PS PL band peaking at about 1.8 eV and usually assigned to the intrinsic emission of silicon nanocrystals was studied. It was shown that the temperature-induced variation of the PL kinetics in the 80 to 300-K interval follows a complex pattern and depends noticeably on the actual point on the band profile. The temperature behavior of PL decay in the 1.8-eV band is determined by the electron-hole recombination rate within a nanocrystal and the cascade carrier transitions from small to large nanocrystals, with an attendant decrease in energy.     

Emission mechanisms in stabilized iron-passivated porous silicon: Temperature and laser power dependences

Photoluminescence (PL) measurements of porous silicon (PS) and iron-porous silicon nanocomposites (PS/Fe) with stable optical properties versus temperature and laser power density have been investigated. The presence of iron in PS matrix is confirmed by Raman spectroscopy. The PL intensity of PS and PS/Fe increases at low temperature, the evolution of integrated PL intensity follows the modified Arrhenius model. The incorporation of iron in PS matrix reduces the activation energy traducing the existence of shallow levels related to iron atoms. Also, the temperature dependence of the porous silicon PL peak position follows a linear evolution at high temperature and a quadratic one at low temperature. Such evolution is due to the thermal carriers' redistribution and an energy transfer. Similarly, we have compared the laser power dependence of the PL in PS and PS/Fe layers. The results prove that the recombination process in PS is realised through the lower energy traps localised in the electronic gap. However, the observed emission in PS/Fe is essentially due to direct transitions. So, we can conclude that the presence of iron in PS matrix induces a strong modification of the PL mechanisms.     

多孔硅的表面碳膜钝化

报道对多孔硅（ＰＳ）进行碳膜（ＣＦ）钝化处理的结果。红外吸收光谱表明,经钝化处理样品的表面由Ｓｉ－Ｃ、Ｓｉ－Ｎ和Ｓｉ－Ｏ键所覆盖;荧光我谱表明,经钝化处理的样品较未处理的样品发光强度提高４￣４．５倍,且发光峰位明显蓝移;存放实验显示,经钝化处理的样品发光强度稳定、发光峰位不变。这些结果表明正丁胺可以在多孔硅表面形成优良的钝化碳膜,是一种十分有效的多孔硅后处理途径。     

多孔硅的一种新的后处理方法──微波等离子体辅助钝化处理

报道了对多孔硅进行后处理的一种新方法，即真空中微波等离子体辅助的钝化处理．傅里叶变换红外吸收谱表明，经处理的样品表面主要是被SiS_x和SiO_y所覆盖．与未经处理的样品相比，其发光强度增加约3.5倍，PL峰位蓝移了40nm，而且在空气条件下存放60d后发光强度没有变化．表明这种方法是增加多孔硅发光强度和提高稳定性的有效方法之一．     

Thermal annealing dependence of some optical properties of plasma-modified porous silicon

The photoluminescence and reflectance of porous silicon (PS) with and without hydrocarbon (CH_x) deposition fabricated by plasma enhanced chemical vapour deposition (PECVD) technique have been investigated. The PS samples were then, annealed at temperatures between 200 and 800 °C. The influence of thermal annealing on optical properties of the hydrocarbon layer/porous silicon/silicon structure (CH_x/PS/Si) was studied by means of photoluminescence (PL) measurements, reflectivity and ellipsometry spectroscopy. The composition of the PS surface was monitored by transmission Fourier transform infrared (FTIR) spectroscopy. Photoluminescence and reflectance measurements were carried out before and after annealing on the carbonized samples for wavelengths between 250 and 1200 nm. A reduction of the reflectance in the ultraviolet region of the spectrum was observed for the hydrocarbon deposited polished silicon samples but an opposite behaviour was found in the case of the CH_x/PS ones. From the comparison of the photoluminescence and reflectance spectra, it was found that most of the contribution of the PL in the porous silicon came from its upper interface. The PL and reflectance spectra were found to be opposite to one another. Increasing the annealing temperature reduced the PL intensity and an increase in the ultraviolet reflectance was observed. These observations, consistent with a surface dominated emission process, suggest that the surface state of the PS is the principal determinant of the PL spectrum and the PL efficiency.     

蓝光发射多孔硅RTO过程中的尺寸分离效应

对用水热腐蚀技术制备的、具有蓝光发射的多孔硅样品在快速热氧化(RTO)处理前后其光致发光谱、硅纳米颗粒的大小及尺寸分布变化进行了研究.实验发现,新鲜多孔硅样品经过RTO处理后,其光致发光谱整体蓝移并由单发光峰分裂为两个发光峰;与此对应,样品中的硅纳米颗粒在整体减小的同时出现尺寸分离现象.这一结果表明,多孔硅中的短波长发射也具有强烈的尺寸相关性. 关键词：     

Microstructure and optical properties of ZnO/porous silicon nanocomposite films

In this study, porous silicon (PS) templates were formed by electrochemical anodization on p-type (100) silicon wafer and ZnO films were deposited on PS substrates using radio frequency (RF) reactive magnetron sputtering technique. The effects of oxygen partial pressures of growth ZnO films and annealing ambience on the microstructure and photoluminescence (PL) of the ZnO/PS nanocomposite films were systematically investigated by X-ray diffraction and fluorescence spectrophotometry. The results indicated that all ZnO/PS nanocomposite films were polycrystalline in nature with a hexagonal wurtzite structure and the (002) oriented ZnO films had the best crystal quality under O₂:Ar ratio of 10:10 sccm and annealing in vacuum. PL measurements at room temperature revealed that ZnO/PS nanocomposite systems formed a broad PL band including the blue and green emissions from ZnO and red-orange emission from the PS. The mechanism and interpretation of broadband PL of the nanocomposites were discussed in detail using an oxygen-bonding model in PS and a native defects model in ZnO.     

Arresting photodegradation of porous silicon by a polymer coating

Light soaking in air rapidly decreases photoluminescence (PL) of porous silicon (PS) and increases electron spin resonance (ESR) signal. In vacuum, a short light exposure (<2700 s) increases PL and decreases ESR, but longer exposures again degrade the PL. We could arrest the light-induced degradation over long periods by applying a thin polymer coating, which resulted in constant PL and ESR intensities. The PL intensity of coated PS is comparable to the PL intensity of a fresh PS sample in air. FTIR spectrum suggests new bond formations at the PS/polymer interface that may be responsible for PL stability.     

White light luminescence from annealed thin ZnO deposited porous silicon

In this study, photoluminescence (PL) properties of annealed ZnO thin films deposited onto a porous silicon (PS) surface by rf-sputtering were investigated. A huge blue shift of luminescence from the ZnO deposited onto the PS surface and a broadband luminescence (white luminescence) across most of the visible spectrum were obtained after the heat treatment at 950 °C in air. The results of Fourier Transform Infrared Spectroscopy (FTIR) analysis suggested that the porous silicon surface was oxidized after ZnO deposition and the broadband luminescence was due to the conversion of Si-H bonds to Si-O-Si bonds on the PS surface. The underlying mechanisms of the broadband PL were discussed by using oxygen-bonding model for the PS and native defects model for ZnO. The experimental results suggested that the heat treatment provides a relatively easy way to achieve white luminescence from thin ZnO deposited porous silicon.