衬底温度对氧化锌薄膜的光谱学特性影响研究

采用脉冲激光沉积技术,在不同沉积温度下制备了氧化锌薄膜。对衬底温度为400和700℃的薄膜进行了结构和光谱学性能表征。结果表明:沉积温度为400和700℃时,氧化锌薄膜均为C轴取向生长;但是表面晶粒生长模式由岛状生长转为柱状晶生长,柱状晶的出现导致了氧化锌薄膜拉曼光谱信号的增强、谱线的展宽、以及拉曼禁戒模式的出现;氧化锌UV峰由3.29 eV红移到3.27 eV,这可能是由于沉积温度为700℃时,氧化锌颗粒尺寸显著增大造成的。     

大面积均匀纳米金刚石薄膜制备研究

报道了一种利用偏压恒流等离子辅助热丝化学气相沉积城硅基板上制备大面积均匀纳米金刚石薄膜的新工艺，在不同沉积条件下研究了纳米金刚石薄膜的成核和生长过程，并通过扫描电镜、拉曼光谱和表面粗糙度测试仪观察了纳米金刚石薄膜的结构特征。最后成功制备了直径100mm、平均晶粒尺寸10nm的光滑纳米金刚石薄膜。     

非晶InGaZnO薄膜成分配比对透明性和迁移率的影响

利用固相反应法制备了富铟含量在不同成分配比下的高质量InGaZnO陶瓷靶材,采用脉冲激光沉积法,在基片温度为20℃、氧压为1Pa条件下,在石英玻璃衬底上生长了非晶InGaZnO薄膜,并对薄膜进行X射线衍射、透射吸收光谱、拉曼光谱与霍尔效应测试。通过对InGaZnO薄膜的测试表征,在较低温度条件下,铟含量较高的薄膜样品保持了非晶结构、可见光的高透明性和高电子迁移率,InGaZnO薄膜有望应用于电子器件。     

射频、直流磁控溅射和多弧离子镀沉积类金刚石薄膜的拉曼光谱分析

用射频、直流磁控溅射和多弧离子镀制备一系列类金刚石(DLC)薄膜样品,并测量了样品的拉曼光谱.通过数据分析发现三种沉积方式中多弧离子镀沉积得到的薄膜含有更高的sp3含量.采用多弧离子镀设备,在不同的溅射负偏压下沉积了一系列的DLC薄膜样品,对样品进行拉曼光谱测试,通过对比分析发现随着沉积负偏压的提高,薄膜内sp3的含量不断提高.表明可以通过提高多弧离子镀的负偏压来提高DLC薄膜的质量.     

富硅氮化硅薄膜的制备及其光学带隙研究

采用双极脉冲磁控反应溅射法在不同参数条件下制备了一系列氮化硅薄膜。利用数字式显微镜和紫外-可见光光谱仪研究了沉积薄膜的表面形貌及其光学带隙,利用共焦显微拉曼光谱仪比较了硅衬底、氮化硅薄膜退火前后的拉曼光谱。结果表明,氮气流量对薄膜的光学带隙影响较大,制备的薄膜主要为富硅氮化硅薄膜。原沉积薄膜的拉曼光谱存在明显的非晶硅和单晶硅峰,退火处理后非晶硅峰减弱或消失,表明薄膜出现明显的结晶化;单晶硅峰出现频移现象,表明薄膜中出现硅纳米颗粒,平均尺寸约为6.6 nm。     

纳米TiO2薄膜的结构及光催化特性

利用磁控溅射方法在单晶硅和石英衬底表面沉积TiO2薄膜. 通过调节实验参量,制备出不同结构的TiO2薄膜. 通过X射线衍射、扫描电镜、拉曼光谱、吸收光谱等对样品进行表征,同时对不同结构的TiO2薄膜的光催化特性进行分析,发现具有网络状结构锐钛矿相的TiO2薄膜具有更高的光催化能力. 本文对不同薄膜的表面形貌和生长机理进行分析,并讨论TiO2结构和表面形貌对其光催化特性的影响.     

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利用微波电子回旋共振等离子体增强型化学气相沉积(ECR-PECVD)采用一步法直接在K9玻璃上低温沉积制备了多晶硅薄膜.研究了不同实验参数对薄膜沉积的影响,采用X射线衍射(XRD)、拉曼光谱、扫描电子显微镜(SEM)等实验分析方法对不同条件下制备的样品进行了晶体结构和表面形貌分析,并讨论了多晶硅薄膜沉积的最佳条件.实验结果表明,玻璃衬底上多晶硅薄膜呈柱状生长,并有一定厚度的非晶孵化层;较高氢气比例和衬底温度有利于结晶,薄膜的结晶率达到了62％;晶粒团簇的最大尺寸约为500nm.     

相变区硅薄膜拉曼和红外光谱分析

采用等离子体增强化学气相沉积(PECVD)技术制备了一系列不同氢稀释率下的硅薄膜,采用拉曼散射光谱和傅里叶红外光谱技术研究了非晶/微晶相变区硅薄膜的微观结构变化,将次晶结构(paracrystalline structure)引入到非晶/微晶相变区硅薄膜结构中,提出了次晶粒体积分数(f_p),用来表征硅薄膜中程有序程度。结果表明,氢稀释率的提高导致硅薄膜经历了从非晶硅到微晶硅的相变过程,在相变区靠近非晶相的一侧,硅薄膜表现出氢含量高、结构致密和中程有序度高等特性,氢在薄膜的生长中主要起到表面钝化作用。在相变区靠近微晶相的一侧,硅薄膜具有氢含量低、晶化率高和界面体积分数小等特性,揭示了氢的刻蚀作用主控了薄膜生长过程。采用扫描电子显微镜对样品薄膜的表面形貌进行分析,验证了拉曼散射光谱和傅里叶红外光谱的分析结果。非晶/微晶相变区尤其是相变区边缘硅薄膜结构特性优良,在太阳能电池应用中适合用作硅基薄膜电池本征层。     

含氮氟化类金刚石(FN-DLC)薄膜的研究:(Ⅰ)sp结构与化学键分析

以CF4,CH4和N2为源气体,利用射频等离子体增强化学气相沉积法,在不同功率下制备了含氮氟化类金刚石膜.用俄歇电子能谱、拉曼光谱、X射线光电子能谱和傅里叶变换红外光谱对薄膜的电子结构和化学键进行了表征,并结合高斯分峰拟合方法分析了薄膜中sp2,sp3结构比率.结果表明,制备的薄膜属于类金刚石结构,不同沉积功率下,薄膜内的sp2/sp3值在2.0—9.0之间,随着沉积功率的增加薄膜内sp2的相对含量增加.膜内主要有C—Fx(x=1,2),C—C,CC和CN等化学键.沉积功率增加,C—C基团增加,膜内F的浓度降低,C—F基团减少,薄膜的关联加强,稳定性提高.     

不同La掺杂浓度的BiFeO_3的结构性质的显微拉曼光谱研究

使用显微拉曼散射技术研究不同的La掺杂浓度对BiFeO3(Bi1-xLaxFeO3,x=0,0.1,0.2,0.3,0.6,0.8和1.0)的结构性质的影响。拉曼光谱的变化证明了在Bi1-xLaxFeO3中,随着La含量的增加,其结构从三方相变成正交相。引人注目的是,位于610 cm-1附近的拉曼峰和它的二阶峰依然存在,并且随着La掺杂量的增加发生明显的增强。这一现象与BiFeO3在三方相结构存在的螺旋自旋结构被破坏有关。我们的实验证实了在Bi1-xLaxFeO3材料中存在着强烈的自旋-声子相互作用,这对于理解Bi1-xLaxFeO3材料的结构与物性之间的关系提供有用的信息。     

Mn掺杂对多铁性BiFeO_3薄膜铁电性能以及漏电流的影响

本文利用脉冲激光沉积技术在(LaAlO3)0.3(Sr2AlTaO6)0.7(001)衬底上生长了BiFe1-xMnxO3(x=0～5%)外延薄膜,研究了Mn掺杂对BiFeO3(BFO)薄膜结构、铁电特性和漏电流的影响.XRD和SEM结果表明薄膜具有良好的结晶质量.漏电流测量显示Mn掺杂有效地减小了BFO薄膜的漏电流密度,因而在室温下5%Mn掺杂的BFO薄膜能够获得饱和的电滞回线.XPS分析证明,Mn掺杂改善BFO薄膜性能的可能原因在于其极大地减少了BFO薄膜中的Fe2+离子.     

Mechanisms of exchange bias with multiferroic BiFeO3 epitaxial thin films

We have combined neutron scattering and piezoresponse force microscopy to show that the exchange field in CoFeB/BiFeO_{3} heterostructures scales with the inverse of the ferroelectric and antiferromagnetic domain size of the BiFeO3 films, as expected from Malozemoff's model of exchange bias extended to multiferroics. Accordingly, polarized neutron reflectometry reveals the presence of uncompensated spins in the BiFeO3 film at the interface with CoFeB. In view of these results, we discuss possible strategies to switch the magnetization of a ferromagnet by an electric field using BiFeO3.     

Strain-induced polarization rotation in epitaxial (001) BiFeO3 thin films

Direct measurement of the remanent polarization of high quality (001)-oriented epitaxial BiFeO3 thin films shows a strong strain dependence, even larger than conventional (001)-oriented PbTiO3 films. Thermodynamic analysis reveals that a strain-induced polarization rotation mechanism is responsible for the large change in the out-of-plane polarization of (001) BiFeO3 with biaxial strain while the spontaneous polarization itself remains almost constant.     

Atomic structure of highly strained BiFeO3 thin films

We determine the atomic structure of the pseudotetragonal T phase and the pseudorhombohedral R phase in highly strained multiferroic BiFeO(3) thin films by using a combination of atomic-resolution scanning transmission electron microscopy and electron energy-loss spectroscopy. The coordination of the Fe atoms and their displacement relative to the O and Bi positions are assessed by direct imaging. These observations allow us to interpret the electronic structure data derived from electron energy-loss spectroscopy and provide evidence for the giant spontaneous polarization in strained BiFeO(3) thin films.     

Terahertz radiation by an ultrafast spontaneous polarization modulation of multiferroic BiFeO3 thin films

Terahertz (THz) radiation has been observed from multiferroic BiFeO3 thin films via ultrafast modulation of spontaneous polarization upon carrier excitation with illumination of femtosecond laser pulses. The radiated THz pulses from BiFeO3 thin films were clarified to directly reflect the spontaneous polarization state, giving rise to a memory effect in a unique style and enabling THz radiation even at zero-bias electric field. On the basis of our findings, we demonstrate potential approaches to ferroelectric nonvolatile random access memory with nondestructive readability and ferroelectric domain imaging microscopy using THz radiation as a sensitive probe.     

Strain control of domain-wall stability in epitaxial BiFeO3 (110) films

We have studied the stability of domains and domain walls in multiferroic BiFeO3 thin films using a combination of piezoelectric force microscopy and phase-field simulations. We have discovered that a film-substrate misfit strain may result in a drastically different thermodynamic stability of two parallel domain walls with the same orientation. A fundamental understanding of the underlying physics, the stress distribution in a domain structure, leads to a novel approach to control the ferroelastic domain stability in the multiferroic BiFeO3 system.     

Local weak ferromagnetism in single-crystalline ferroelectric BiFeO3

Polarized small-angle neutron scattering studies of single-crystalline multiferroic BiFeO(3) reveal a long-wavelength spin density wave generated by ～1° spin canting of the spins out of the rotation plane of the antiferromagnetic cycloidal order. This signifies weak ferromagnetism within mesoscopic regions of dimension 0.03 microns along [110], to several microns along [111], confirming a long-standing theoretical prediction. The average local magnetization is 0.06 μ(B)/Fe. Our results provide an indication of the intrinsic macroscopic magnetization to be expected in ferroelectric BiFeO(3) thin films under strain, where the magnetic cycloid is suppressed.     

Write-Once Medium with Fe-Doped BiOx Thin Films for Blue Laser Recording

Fe：BiOx films are fabricated on K9 glass substrates by rf-magnetron sputtering of a BiFeO target under argon atmosphere with increasing sputtering power from 80 to 200 W at room temperature. It is found that the thin films grown at the sputtering power of 160 W can be formed at an appropriate deposition rate and have an improved surface morphology. The XPS result reveals that the films investigated are comprised of Bi, Fe and O elements. A typical XRD pattern shows that no phase transition occurs in the films up to 400℃. The results of the blue laser recording test demonstrate that the Fe：BiOx films have good writing sensitivity for blue laser beam （406.7nm） and good stability after reading 10000 times. The recording marks of 200nm or less are obtained. These results indicate that the introduction of Fe into BiOx films can reduce the mark size and improve the stability of the films.     

Field-Induced Spin-Modulated Transitions in Epitaxial (001) BiFeO3 Films

Physics of the Solid State - Alterations in the ground state of thin (001) films of a BiFeO3 (BFO)-type multiferroic in a magnetic field are studied theoretically, with changes in the energy of...     

Conduction through 71° domain walls in BiFeO3 thin films

Local conduction at domains and domain walls is investigated in BiFeO(3) thin films containing mostly 71° domain walls. Measurements at room temperature reveal conduction through 71° domain walls. Conduction through domains could also be observed at high enough temperatures. It is found that, despite the lower conductivity of the domains, both are governed by the same mechanisms: in the low voltage regime, electrons trapped at defect states are temperature activated but the current is limited by the ferroelectric surface charges; in the large voltage regime, Schottky emission takes place and the role of oxygen vacancies is that of selectively increasing the Fermi energy at the walls and locally reducing the Schottky barrier. This understanding provides the key to engineering conduction paths in BiFeO(3).