脉宽压缩光栅用的多层膜设计和性能分析

应用于啁啾脉冲放大技术中的脉宽压缩光栅是基于多层膜作为基底,利用全息干涉技术和离子束技术刻蚀而成。脉宽压缩光栅的衍射效率和抗激光损伤阈值一方面依赖于光栅结构的设计,另一方面很大程度上取决于作为基底的多层膜的设计。给出了以413.1nm作为写入波长,1053nm作为使用波长的多层介质光栅膜的设计,样品在ZZS-800F型真空镀膜机上采用电子束蒸发方式沉积而成,并给出了膜系结构对光学性能影响因素的详细分析,结果表明膜系H3L(H2L)9H0.5L2.03H满足光栅膜的指标。给出了样品光学特性测试,其使用波长处的透射率<0.5%,写入波长处的透射率>90%,测试表明样品满足设计要求且实验结果和理论设计符合得很好。     

脉宽压缩光栅用多层膜制备和性能测试

给出了以413 nm作为写入波长,1053 nm作为使用波长的多层介质光栅膜的设计,计算表明膜系H3L(H2L)^9H0.5L2.03H满足光栅膜的要求.最后给出了制备得到的样品光学特性测试,结果表明在使用波长和曝光波长处满足设计要求,其抗激光损伤阈值在光正入射和51.2°入射时分别为14.14 J/cm2和9.32 J/cm2,膜系的应力表现为压应力.     

Optimization of thin-film design for multi-layer dielectric grating

Thin-film design used to fabricate multi-layer dielectric (MLD) gratings should provide high transmittance during holography exposure, high reflectance at use wavelength and sufficient manufacturing latitude of the grating design making the MLD grating achieve both high diffraction efficiency and low electric field enhancement. Based on a (HLL)⁹H design comprising of quarter-waves of high-index material and half-waves of low-index material, we obtain an optimum MLD coating meeting these requirements by inserting a matching layer being half a quarter-wave of Al₂O₃ between the initial design and an optimized HfO₂ top layer. The optimized MLD coatings exhibits a low reflectance of 0.017% under photoresist at the exposure angle of 17.8° for 413 nm light and a high reflectance of 99.61% under air at the use angle of 51.2° for 1053 nm light. Numerical calculation of intensity distribution in the photoresist coated on the MLD film during exposure shows that standing-wave patterns are greatly minimized and thus simulation profile of photoresist gratings after development demonstrates smoother shapes with lower roughness. Furthermore, a MLD gratings with grooves etched into the top layer of this MLD coating provides a high diffraction efficiency of 99.5% and a low electric field enhancement ratio of 1.53. This thin-film design shows perfect performances and can be easily fabricated by e-beam evaporation.     

飞秒激光用多层介质膜脉宽压缩光栅的设计

以薄膜光学的干涉理论和衍射光学的傅里叶模式理论为基础，给出了0.8μm飞秒激光器用多层介质膜脉宽压缩光栅的理论设计；设计采用H3L(HL)^9H0.5L2.4H的多层介质膜为基底，当刻蚀后表面浮雕结构的占宽比为0.35，线密度为1480线/mm，槽深为0.2μm，顶层HfO₂的剩余厚度为0.15μm时，对于Littrow角度(36.7°)和TE波模式入射的衍射光栅其-1级衍射效率达到95％以上. 关键词： 飞秒激光 脉宽压缩光栅 多层介质膜     

Special Report: High-Speed Access Report—Third Quarter 2010

Abstract

We fabricated Bragg gratings in planar lightwave circuits and investigated their growth characteristics. The refractive index modulation of the gratings grew in the PLC with total fluence F by the power law δ n = AF ^B with A = 8.6 ± 0.9 × 10^?8 and B = 1.47 ± 0.02. The PLC gratings as external reflectors for ECLs were controlled reasonably well by adjusting the writing conditions based on the power law and the coupled mode theory. The properties of fabricated PLC gratings were closely matched to the design parameters of the PLC grating. The single longitudinal mode oscillations of the ECLs were also demonstrated at 1309.5 nm and 1550.5 nm.     

双波段激光防护多层反射膜的设计

利用TFCalc膜系设计软件,从理论上对激光防护多层反射膜的光学性能进行了分析。计算了各个膜系的理论投射率曲线。分析了各个因素(如膜系结构、膜层奇偶性、起膜材料)对膜层光学性质的影响。并设计了以ZrO2和SiO2为膜层材料,聚碳酸酯(PC)为基体材料,可以同时防护532nm和1064nm波长激光的1∶2型多层反射薄膜。在532nm和1064nm处的理论透过率都达到了0.01%(光学密度D=4)。并在PC镜片表面镀上23层1∶5型激光反射膜,对理论设计进行验证。对其在400nm~1200nm波长范围内的光学性能进行了测试,测试结果与理论计算值基本吻合。     

Study on the feasibility of double stack high reflector coating at 355 nm

The feasibility of the idea of double stack HR coating was discussed in this paper both in theory and experiment. The theoretical simulation was made by employing optical coating design software. The analysis results showed that the design of double stack HR coating was feasible, which made the HR coating have ascendancy not only at reflectance but also at laser damage resistance. Then, the LaF₃/MgF₂ HR coating, the HfO₂/SiO₂ HR coating and the double stack HR coating were prepared for comparison, respectively. Transmittance spectra, surface morphologies and damage morphologies of these coatings were measured. Measurement of laser-induced damage threshold (LIDT) of S polarized light of the samples was performed at 355 nm, 45° incidence. The measurement results showed that the LIDT value of the LaF₃/MgF₂ HR coating with 30 layers was very high, but the reflectance was low. When the layer number was increased up to 36, lots of cracks appeared on the surface of the LaF₃/MgF₂ HR coating, with the LIDT badly declining. It was thought that the residual stress resulted in the cracks and the decline of the LIDT. The spectra measurement showed the double stack HR coatings could provide higher reflectance and wider reflection band than LaF₃/MgF₂ HR coating with less layer pairs. Any crack was also not found on the surface of the double stack coatings. Meanwhile, the double stack HR coatings possessed greater laser damage resistances than the HfO₂/SiO₂ HR coating. The damage morphologies showed that the damage of the double stack coating was even milder than that of the HfO₂/SiO₂ coating. Therefore, the double stack design was effective to gain high reflectance and great UV laser radiation resistance simultaneously.     

基于等离子体增强化学气相沉积技术的光电子器件多层抗反膜的设计和制作

针对光电子器件端面抗反镀膜的要求,研究了基于等离子体增强化学气相沉积(PECVD)技术的多层抗反膜的设计和制作.首先,对影响SiN_x折射率的因素进行了实验研究,确定了具有大折射率差的SiO₂/SiN_x材料的PECVD沉积条件.根据理论计算分析,设计了四层SiO₂/SiN_x抗反膜结构,能够在70 nm的波长范围内实现低于10^-4的反射率     

F2-laser ablation patterning of dielectric layers

Spatially defined patterning of multi-layer dielectric optical systems by laser-induced ablation is demonstrated. A 49-layer high-reflectivity mirror for 193-nm light was irradiated with F₂-laser light through the CaF₂-substrate to cleanly remove the whole dielectric stack by rear-sided ablation. The 157-nm light is absorbed efficiently by dielectric layers such as SiO₂ and Al₂O₃ that are typically used for ultraviolet (UV) transmission at 193-nm and longer wavelengths. Thus it is possible to ablate highly reflective UV-laser mirrors (HR 193 nm) and to create dielectric masks that withstand high power levels at 193 nm. A single 157-nm pulse with a fluence of less than 500 mJ/cm² is sufficient to cleanly ablate the whole layer stack with sharp edges and without debris deposition. Received: 31 October 2000 / Accepted: 14 November 2000 / Published online: 10 January 2001     

Omni-directional reflectors for deep blue LED using symmetric autocloning method

Omni-directional reflectors (ODRs) for deep blue LED were designed and fabricated using symmetric autocloning method. The symmetric stack multi-layers for the reflectors were designed by finite-difference time-domain simulation. The fabricating process of ODR is combined with the techniques of anodic aluminum oxide (AAO) process and autocloning method. The two-dimensional structure template of nano-channel array was grown using AAO with the period of 150 nm. Then the shaping layer was deposited on the AAO template by evaporation deposition. Besides, the ion etching was applied to modify the apex angle to the triangle shape at 100°. Finally, the sub/(0.5TiO₂ SiO₂ 0.5TiO₂)⁸ multi-layer stack was deposited on the shaping layer using autocloning method to achieve the ODR. The results show the reflective spectra of ODR at the incident angles of 0, 30, 45, and 60° had high values within the range 400–450 nm. Besides, the central wavelength shifting is not obvious which is very good for keeping the color of LED stable.     

Design of High-Efficiency Diffraction Gratings Based on Rigorous Coupled-Wave Analysis for 800nm Wavelength

We report on the design of a high diffraction efficiency multi-layer dielectric grating with wide incident angle and broad bandwidth for 80Ohm. The optimized grating can achieve 〉 95% diffraction efficiency in the first order at an incident angle of 5° from Littrow and a wavelength from 77Ohm to 83Ohm, with peak diffraction efieieney of 〉 99.5% at 80Ohm. The electric field distribution of the optimized multi-layer dielectric grating within the gratings ridge is 1.3 times enhancement of the incidence light, which presents potential high laser resistance ability. Because of its high-effieieney, wide incident, broad bandwidth and potential high resistance ability, the multi-layer dielectric grating should have practical application in Ti：sapphire laser systems.     

Polarizing and non-polarizing mirrors for the hydrogen Lyman-<Emphasis Type="Italic">α</Emphasis> radiation at 121.6 nm

Efficient polarizing as well as non-polarizing mirrors for a wavelength of λ=121.6 nm (hydrogen Lyman-α radiation) are necessary to achieve an experimental determination of the magnetic field in the solar corona through the Hanle effect. We have designed, realized and characterized such mirrors. These consist of glass coated with a thin-film stack. The coatings use the most reflective (Al) and most transparent (fluorides) materials at this wavelength. Different coatings were explored which involve an increasing number of films in the coating stack. At the incident angle of maximum polarization where the p-polarized reflectivity R _p is minimized, an s-polarized reflectivity R _s as high as 69% is experimentally obtained with a coating made of a Fabry–Pérot resonator. To our knowledge, this value is the highest ever reported for a polarizing mirror at this wavelength. Additionally, efficient non-polarizing mirrors have been designed and realized by using a two-layer coating (MgF₂/Al/glass). By optimizing the fluoride layer thickness, a mirror with non-polarizing properties in the whole range of incident angles was realized.     

A study of some optical properties of hafnium dioxide (HfO2) thin films and their applications

2 ), a series of films ranging in thickness from 50 to 10000 nm was prepared by using an electron beam gun inside an evacuated coating chamber of pressure 1×10^-5 mbar. The films were obtained on optical glass substrate by using oxygen with a backfill pressure of 2.4×10^-4 mbar during the deposition processes. The optical constants of the films were computed in the spectral wavelength region (350–2000 nm) from the transmission, reflection and thickness measurements. A computer program was created to determine two optical parameters n and k of the films, and this was achieved by entering the practical results into the computer program, which solved a series of equations for each wavelength. The effects created by changing various evaporation conditions (thickness, substrate temperature and evaporation rate) were studied in the spectral wavelength range, and the optimum values of the various conditions were obtained while achieving the best optical performance. According to the investigations of the HfO₂ material, two applications of the anti-reflection (AR) multi-layer coatings were achieved in two different spectral wavelength ranges. The first application was measured in the visible and near infra-red (VIS/NIR) range from 500 nm to 850 nm deposited on the glass substrate. The second application was measured in the infrared (IR) range from 7500 nm to 11500 nm deposited on germanium substrate. Computer modelling for designing the optical multi-layer system has been presented. The theoretical formulation and experimental results with the same specification were achieved. The correlation between the theoretical and the experimental results reveals a close agreement that offers a convenient method for predicting and controlling the multi-layer coating. By continuous measurement of the optical and mechanical (durability) performances of the coating process, high-quality films were produced in the manufacture of various optical devices. Received: 16 April 1997/Accepted: 5 August 1997     

Grating-Outcoupled Radiation in Second-Order Fiber Bragg Gratings

Abstract

The experimental results of the radiation for second-order fiber Bragg gratings, which are made of a single-mode photosensitive fiber (PS-1500; Fiber-Core Corp.) and a single-mode fiber (SMF-28; Corning Inc.), by a phase mask writing fabrication technique are explored. For PS-1500 fiber Bragg gratings, the maximum radiation efficiency of ?23.5 dB at resonance λ = 1,539.34 nm with a very narrow bandwidth (about 0.02 nm) are measured from a 10-mm-diameter photo-detector, while for SMF-28 fiber Bragg gratings, the maximum radiation efficiency is ?34.6 dB (λ = 1,538.03 nm) with a bandwidth of 0.06 nm. The total efficiencies of the radiation are about ?16.8 dB for PS-1500 fiber Bragg gratings and ?28.1 dB for SMF-28 fiber Bragg gratings.     

Enhanced laser induced damage threshold of dielectric antireflection coatings by the introduction of one interfacial layer

A new method for increasing laser induced damage threshold (LIDT) of dielectric antireflection (AR) coating is proposed. Compared with AR film stack of H2.5L (H:HfO2, L:SiO2) on BK7 substrate, SiO2 interfacial layer with four quarter wavelength optical thickness (QWOT) is deposited on the substrate before the preparation of H2.5L film. It is found that the introduction of SiO2 interfacial layer with a certain thickness is effective and flexible to increase the LIDT of dielectric AR coatings. The measured LIDT is enhanced by about 50%, while remaining the low reflectivity with less than 0.09% at the center wavelength of 1064 nm. Detailed mechanisms of the LIDT enhancement are discussed.     

Light-induced thermal gratings in LiNbO3: Fe

Holographic gratings are recorded in LiNbO³: Fe using frequency-doubled pulses of aQ-switched Nd : YAG laser (light wavelength = 532 nm, pulse durationt _p = 20ns). We monitor diffraction efficiencies of the holograms during and several milliseconds after exposure. Variations of Fe²⁺ concentration, light intensity, and fringe spacing show that different types of gratings are involved: photochromic, thermooptic, pyroelectric, and space-charge gratings. The influence of the internal pyroelectric field on the light-induced charge transport is discussed in terms of a two-center model. Pyroelectric and bulk photovoltaic effect are shown to partially compensate each other. In LiNbO₃: Fe, the photovoltaic effect is the dominant charge-driving force for our recording conditions.     

A Dielectric Chirped Layered Mirror for Optical Telecommunication Wavelengths

We describe in this paper a design procedure for omnidirectional high reflectors with wide bandwidths for optical telecommunication bands. From the numerical results achieved by the transfer matrix method, it is found that a partial omnidirectional high-reflector covering the optical telecommunication wavelengths 1.3 and 1.55 μm is obtained for a partially deformed quarter-wave stack air/H(LH)¹⁵/glass by using the tellurium as a material of high refractive index (n _H = 4.6). The partially deformed stack is a periodic system deformed by a power law y = x ^1+k. Here y is the coordinates of the deformed object, x is the coordinates of the periodic stack and k is the coefficient defining the deformation degree. The study of this system leads to an omnidirectional high reflector band covering the optical telecommunication wavelengths 1.3 and 1.55 μm for k = 0.2.     

Multi-spectral antireflection coating on zinc sulphide simultaneously effective in visible,eye safe laser wave length and MWIR region

In recent years multi-spectral device is steadily growing popularity. Multi-spectral antireflection coating effective in visible region for sighting system, laser wavelength for ranging and MWIR region for thermal system can use common objective/receiver optics highly useful for state of art thermal instrumentation. In this paper, design and fabrication of antireflection coating simultaneously effective in visible region (450–650 nm), Eye safe laser wave length (1540 nm) and MWIR region (3.6–4.9 μm) has been reported. Comprehensive search method of design was used and the number of layers in the design was optimised with lowest evaluated merit function studied with respect to various layers. Finally eight-layer design stack was established using hafnium oxide as high index layer and silicon-di-oxide as low index coating material combination. The multilayer stack had been fabricated by using electron beam gun evaporation system in Symphony 9 vacuum coating unit. During layer deposition the substrate was irradiated with End-Hall ion gun. The evaporation was carried out in presence of oxygen and layer thicknesses were measured with crystal monitor. The result achieved for the antireflection coating was 85% average transmission from 450 to 650 nm in visible region, 95% transmission at 1540 nm and 96% average transmission from 3.6 to 4.9 μm in MWIR region.     

多层介质膜脉冲压缩光栅近场光学特性分析

利用傅里叶模式理论分析了TE波自准直角入射的使用条件下，多层介质膜光栅的光栅区和多层膜区电场分布的特点.分别讨论了HfO₂和SiO₂为顶层光栅材料时，光栅结构参数对光栅脊峰值电场的影响，结果表明，对于不同膜厚的顶层材料，存在一个最佳膜厚度，使光栅脊峰值电场最小，并且当膜厚增大时，设计大高宽比的光栅可以降低该电场峰值.最后，在大角度条件下使用多层膜光栅也可以降低光栅脊处的峰值电场. 关键词： 衍射光学 多层介质膜光栅 模式理论 损伤阈值