离子注入Zn的Si(001)基片热氧化制备纳米ZnO团簇及其生长行为研究

采用离子注入技术将Zn离子注入Si（001）基片,并在大气环境下加热氧化制备了ZnO纳米团簇.利用电子探针、薄膜X射线衍射仪、原子力显微镜和透射电子显微镜,对注入和热氧化后的薄膜成分、表面形貌和微观结构进行表征,探讨了热氧化温度以及注入剂量对纳米ZnO团簇的成核过程及生长行为的影响.结果表明,Zn离子注入到Si基片表面后形成了Zn纳米团簇,热氧化过程中Zn离子向表面扩散,在表面SiO₂非晶层和Si基片多晶区的界面处形成纳米团簇.热氧化温度是影响ZnO纳米团簇结晶质量的一个重要参数.随着热氧化温度的升高,金属Zn的衍射峰强度逐渐变弱并消失,而ZnO的（101）衍射峰强度逐渐增强.当热氧化温度高于800 ℃以后,ZnO与SiO₂之间开始发生化学反应形成Zn₂SiO₄. 关键词： ZnO纳米团簇 离子注入 微观结构 形貌分析     

气体团簇离子束两步能量修形法的平坦化效应

本文提出采用气体团簇离子束的两步能量修形法来改善4H-SiC(1000)晶片表面形貌.先用15 keV的高能Ar团簇离子进行整体修形,再用5 keV的低能团簇离子优化表面.结果表明,在相同的团簇离子剂量下,与单一15 keV的高能团簇处理相比,两步法修形后的表面具有更低的均方根粗糙度,两者分别为1.05 nm和0.78 nm.本文还以原子级平坦表面为研究对象,揭示了载能团簇引起的半球形离子损伤(弧坑)与团簇能量的关系,及两步能量修形法在弧坑修复中的优势.在原子力显微镜表征的基础上,引入了二维功率谱密度函数,以直观全面地给出材料的表面形貌特征及其随波长(频率)的分布.结果表明,经任何能量的团簇离子轰击的表面,在0.05—0.20μm波长范围内,团簇轰击都能有效地降低粗糙度,而在0.02—0.05μm范围内,则出现了粗化效应,这是由于形成了半球形离子损伤,但第二步更低能量的团簇离子处理可以削弱这种粗化效应.     

纳米团簇熔化过程的分子动力学模拟

本文采用分子动力学结合嵌入原子多体势,模拟了不同半径的Ni纳米团簇的升温熔化过程,研究团簇尺寸对熔点和表面能的影响.模拟结果表明:团簇的熔点显著低于体材料的熔点.团簇熔化的过程首先是在团簇的表面出现预熔,然后向团簇内部扩展,直到整个团簇完全熔为液态.在模拟的纳米尺度范围内,团簇的熔点与团簇尺寸基本成线性关系.团簇的表面能随着团簇尺寸的增大而减小,而且表面能均高于体材料的表面能.     

载能团簇离子的非线性辐照损伤

由于团簇离子在能量损失、二次离子发射和辐照损伤上的非线性效应,所以团簇离子与物质的相互作用倍受关注。对团簇作用的非线性效应研究不仅对于了解团簇离子与物质相互作用的机制具有十分重要的理论意义,而且载能团簇离子还有可能成为材料表面改性与分析、新功能材料的合成与研究的一种有效的新手段。因此,团簇离子与物质的相互作用成为当今国际上的研究热点之一。主要评述了载能团簇离子在物质中的非线性辐照损伤,介绍了典型的研究方法和实验结果。 Due to energetic cluster produces simultaneous impacts of several atoms and deposits extremely high energy density in a very small area, the cluster impingement on solids has produced non-linear radiation damages not presented in the collisions of individual atoms with those solids. The radiation damages are usually investigated by channeling Rutherford backscattering, Scanning Tunneling Microscope （STM）, Transmission Electronic c Microscope（TEM） and computer simulation. The typical methods and results on the non-linear radiation damages induced by clusters are reviewed in this paper.     

载能团簇离子诱发的非线性二次离子发射

载能团簇离子进入固体时, 由于集体相互作用,在入射路径上产生非常高的能量沉积密度。 实验发现, 载能团簇离子的作用结果并不等于团簇中各原子独立作用的总和, 而是具有非线性效应。 就二次离子发射而言, 这种非线性通常与团簇的能量、 团簇的大小、 离子的电荷态以及靶物质的结构有关。 通过研究二次离子发射有助于理解载能团簇离子与物质相互作用过程中的能量沉积与释放机制。 Using energetic cluster as projectile is a unique way to produce simultaneous impacts of several atoms and deposit extremely high energy density in a very small area. The cluster impingement on solids has exhibited some non linear effects not presented in collisions of individual atoms with those solids. The study of the secondary ion emissions can give insight into the energy deposition and relaxation steps of the cluster solid interaction. The dependence of the yields of secondary ion emission induced by clusters on the energy of clusters,cluster sizes,charge states and material structures of the targets was reviewed in this paper.     

Ar原子团簇与飞秒强激光相互作用产生的高能离子计算

利用改进的“等离子体球”模型模拟了Ar原子团簇与飞秒强激光相互作用的物理过程.改进后的模型弱化了原模型在共振吸收附近团簇内部屏蔽电场的异常增强行为，从而使其更为合理，计算得到的Ar离子平均动能与以往的实验结果符合.还定量地研究了Ar离子平均动能及其平均电荷态与团簇尺寸以及激光参数之间的变化关系. 关键词： 团簇 飞秒激光 高能离子 共振吸收     

飞秒强激光场中大尺寸氩团簇爆炸机理的实验研究

利用飞行时间谱，研究了在飞秒强激光场（60 fs，2×1016 W/cm2）作用下，大尺寸氩原子团簇Arn（n—=3×103—3×106原子/每团簇）的电离爆炸过程，测量了 团簇爆炸所产生的氩离子的平均能量与团簇尺寸（气体背压）的关系.实验发现，随着气体 背压的升高（团簇尺寸增大），氩离子的平均能量也相应升高.通过分析两个不同几何尺寸 锥形超声喷嘴所产生团簇爆炸后的离子能量，结合Hagena团簇尺寸规律，发现在激光参数保 持不变的情况下，离子的平均能量由团簇尺寸唯一确定.分析表明，团簇尺寸在3×105原 子/每团簇以下时，团簇膨胀的主要机理是库仑爆炸.随着团簇尺寸的进一步增大，团簇膨胀 机理将由库仑爆炸向流体动力学膨胀过渡，在3×105关键词： 原子团簇 飞秒强激光 库仑爆炸 流体动力学膨胀     

碱金属团簇Na2在重离子作用下的离化

在时间相关的局域密度近似理论框架下研究了重离子Ar8+ 和碱金属团簇Na2 随时间演化的相互作用 .给出了电子系统的总能量 ,产生Na2 的各种电荷态的几率和Na2 价电子的平均逃逸数等物理量随时间的演化 ,进而得到了Na2 的离化几率 .在快重离子与团簇作用中 ,可以得到低激发态的团簇离子. Based on the Time Dependent Local Density Approximation(TDLDA), the processes of excitation of sodium clusters by highly charged Ar 8+ions are simulated. The time-dependent probabilities of escaped electrons are obtained, furthermore, the ionization probabilities of the Na 2clusters are deduced.In fast ion-cluster collisions, Na 2cluster ions can be produced with minimum or even no excitation of the cluster itself     

用扫描隧道显微镜操纵Cu亚表面自间隙原子

在超高真空环境下使用扫描隧道显微镜研究了吸附有双甘氨肽分子的Cu(001)表面.在一定的 偏压条件下，针尖在该表面扫描后会形成纳米尺度的Cu团簇，这些团簇可以根据意愿排列成 字母或图形.团簇的高度同偏压、隧道电流以及时间等条件有密切关系.在室温下可以稳定存 在的团簇为制造纳米器件提供了技术上的可能性.实验结果表明，形成团簇的Cu原子不是来 自Cu衬底表面或是针尖.化学吸附在Cu表面的双甘氨肽分子，受到隧道电场的作用会在Cu表 面形成张应变场，Cu亚表面自间隙原子在张应变场作用下迁移到表面是形成团簇的原因. 关键词： 扫描隧道显微镜 纳米尺度Cu团簇 自间隙原子     

银、钴和铂原子纳米团簇熔化过程的分子动力学模拟

本文采用分子动力学模拟方法,研究了银、钴和铂原子纳米团簇的熔化过程,模型采用的是Johson的EAM作用势.模拟结果表明,较大原子数目的纳米团簇其熔点随尺寸单调增加,而较小原子数目的团簇熔点和尺寸呈现无规则变化;大多数团簇在熔点附近都出现了负热容现象,说明负热容是纳米团簇在熔化过程中的一个普遍现象.     

Self-assembly of well-ordered and highly uniform nanoripples induced by focused ion beam

Well-ordered and highly uniform nanoripple structures on the surface of single crystal LaAlO₃ (1 0 0), SrTiO₃ (1 0 0) and Al₂O₃ (0 0 0 1) were formed via self-assembly (not by beam writing) by focused ion-beam bombardment. The morphology and topography of nanoripple structures were characterized using in-situ focused ion-beam/scanning electron microscope, as well as ex-situ atomic force microscopy. Under off-normal bombardment without sample rotation, the characteristic wavelength of nanoripples varying from 248 to 395 nm on the LaAlO₃ (1 0 0) surface can be obtained by changing ion fluence and incident angle. When all sputtering parameters except the ion fluence are constant, the wavelength of nanoripples is increased with the enhanced ion fluence. These results demonstrate the potential application of using ion sputtering method for fabricating the well-ordered and highly uniform nanoripples which can be used in nanodevices.     

Self-assembly of well-ordered and highly uniform nanoripples induced by focused ion beam

Well-ordered and highly uniform nanoripple structures on the surface of single crystal LaAlO₃ (1 0 0), SrTiO₃ (1 0 0) and Al₂O₃ (0 0 0 1) were formed via self-assembly (not by beam writing) by focused ion-beam bombardment. The morphology and topography of nanoripple structures were characterized using in-situ focused ion-beam/scanning electron microscope, as well as ex-situ atomic force microscopy. Under off-normal bombardment without sample rotation, the characteristic wavelength of nanoripples varying from 248 to 395 nm on the LaAlO₃ (1 0 0) surface can be obtained by changing ion fluence and incident angle. When all sputtering parameters except the ion fluence are constant, the wavelength of nanoripples is increased with the enhanced ion fluence. These results demonstrate the potential application of using ion sputtering method for fabricating the well-ordered and highly uniform nanoripples which can be used in nanodevices.     

The super hydrophobicity of ZnO nanorods fabricated by electrochemical deposition method

Electrochemical deposition method was employed to fabricate ZnO nanorods on zinc foil substrate in this paper. The structural observations of ZnO nanorods with different aspect ratios were carried out by field-emission scanning electron microscopy. The microstructures of ZnO nanorods were also characterized by X-ray diffraction and the changes in surface hydroxyls with electrochemical deposition time were analyzed by X-ray photoelectron spectroscopy. The study results show the aspect ratios of ZnO nanorods and the density of their surface hydroxyls are responsible for their superhydrophobicity. The fluorinated polymer coated ZnO nanorods showed an excellent superhydrophobic behavior with 167° contact angle of water droplet, which is larger than that of fluorinated polymer flat surface. The more the surface hydroxyls are, the more hydrophilic the surfaces are. Meanwhile, the larger the aspect ratio of ZnO nanorod arrays is, the larger its drophobicity is. The results of this study might pave a simple and feasibility pathway to the fabrication of superhydrophobic cleaning materials used in engineering fields.     

Sputter damage in Si surface by low energy Ar+ ion bombardment

The damage distributions in Si(1 0 0) surface after 1.0 and 0.5 keV Ar⁺ ion bombardment were studied using MEIS and Molecular dynamic (MD) simulation. The primary Ar⁺ ion beam direction was varied from surface normal to glancing angle. The MEIS results show that the damage thickness in 1.0 keV Ar ion bombardment is reduced from about 7.7 nm at surface normal incidence to 1.3 nm at the incident angle of 80°. However, the damage thickness in 0.5 keV Ar ion bombardment is reduced from 5.1 nm at surface normal incidence to 0.5 nm at the incident angle of 80°. The maximum atomic concentration of implanted Ar atoms after 1 keV ion bombardment is about 10.5 at% at the depth of 2.5 nm at surface normal incidence and about 2.0 at% at the depth of 1.2 nm at the incident angle of 80°. However, after 0.5 keV ion bombardments, it is 8.0 at% at the depth of 2.0 nm for surface normal incidence and the in-depth Ar distribution cannot be observable at the incident angle of 80°. MD simulation reproduced the damage distribution quantitatively.     

常压化学气相沉积法在Ag/Si(111)模板上生长ZnO薄膜及其性能研究

在Si衬底上利用磁控溅射的方法沉积1.5 nm厚度的Ag膜用以阻挡Si衬底被氧化。采用常压金属有机化学气相沉积法(MOVCD),在Ag/Si(111)衬底上成功地生长出马赛克结构的ZnO薄膜。用光学显微镜观察表面形貌,结果显示有带晶向特征的微裂纹,裂纹密度为100 cm-1。依据X射线晶体衍射的结果,薄膜结晶质量良好,呈C轴高度择优取向。用双晶X射线衍射得到(002)面的ω扫描半峰宽为1.37°。温度10 K时光致发光谱(PL)观察到自由激子、束缚激子发射及它们的声子伴线。结果表明,金属有机化学气相沉积法方法在Si(111)衬底上制备ZnO薄膜时,Ag是一种有效的缓冲层。     

热蒸发法制备ZnO纳米棒阵列

氩气氛常压下，利用热蒸发法，在无催化剂、无ZnO预沉积层的硅衬底上制备了取向良好，排列整齐的ZnO纳米棒阵列．在距Zn源不同位置的Si衬底上得到了不同形貌的样品．硅衬底置于锌源正上方是得到取向一致的ZnO纳米阵列的一个关键性条件．用场发射扫描电子显微镜、X射线粉末衍射表征样品表面形貌、晶体结构．进一步研究了样品的生长机制和荧光性质．     

金属杂质辅助低能氩离子束诱导蓝宝石自组织纳米结构

使用实验室自主研发的等离子抛光与刻蚀系统,研究了不同入射能量下不锈钢杂质辅助Ar+离子束刻蚀蓝宝石表面自组织纳米结构的形成机制。采用Taylor Surf CCI2000非接触式表面测量仪和原子力显微镜分别对刻蚀后蓝宝石样品的粗糙度、纳米结构的纵向高度和表面形貌进行了分析。研究表明:引入不锈钢杂质后,当离子束入射角度为65°、束流密度为487μA/cm²、刻蚀时间为60 min、离子束入射能量为1000 eV时,蓝宝石样品表面出现了纵向高度为11.1 nm高度有序的条纹状纳米结构;随着入射能量的增加,表面开始出现岛状纳米结构;当入射能量为1200 eV时,形成了岛状与条纹状相结合的纳米结构,其纵向高度为13.6 nm;入射能量继续增加,蓝宝石表面岛状结构密度变大;当入射能量达1400 eV时,样品表面岛状结构的纵向高度为18.8 nm;入射能量为1600 eV时,样品表面出现较为有序且密集的岛状结构,其纵向高度为20.1 nm。自组织纳米结构先是以“条纹”形状出现,随着入射能量的增加,引入的金属杂质打破了在离子束溅射过程中表面生长机制和表面平滑机制的平衡状态,形成了岛状结构,该结构促进了纳米结构的生长,改变了纳米结构的有序性。     

梯度特异材料表面对入射高斯光束的反射研究

最近人们[1-3]提出了一类反射式梯度特异材料表面系统,此系统可以高效地将入射波转换成被束缚于材料表面的表面波,这个系统成为连接行波和表面波的一座桥梁。以往人们研究梯度特异材料表面的反射特性时多是以入射平面波为主,这里我们结合实际,以入射的高斯光束作为研究对象,讨论梯度特异材料表面对其的反射特性,尤其是高斯光束的主入射角和束腰对反射行为的影响,得到了与平面波入射不同的反射现象。对于临界角为17.2°的梯度特异材料表面,束腰为4的高斯光束以主入射角分别为0°、10°、30°入射时,我们发现随着主入射角的变大,入射高斯光束转变为表面波的比例增大;而固定主入射角为30°,我们通过改变束腰,发现束腰越大,波矢分布越窄,越接近于平面波,转变为表面波的效率就越高。在数值模拟中,反射光束出现了明显的Goos-Hansen位移现象。同时还出现了类似光栅反射的特点,即分叉现象,这是由于模拟计算时网格不能无限小,梯度特异材料表面不能模拟为折射率连续变化的材料而应该是阶跃式变化的材料。由于实际制备的梯度特异材料表面是人工微结构的排列,因此微小的阶跃式变化的梯度特异材料表面更为实际。我们的工作对于利用梯度特异材料表面将入射高斯光束转变为表面波具有指导意义。     

湿法刻蚀对Si基片孔点阵及ZnO外延薄膜周期形貌的影响

利用射频等离子体辅助分子束外延法,在刻有周期性孔点阵结构的Si衬底上生长了ZnO二维周期结构薄膜,系统研究了湿法化学刻蚀对孔形点阵Si(100),Si(111)基片表面形貌的影响,以及两种初底上ZnO外延薄膜的结晶质量与周期形貌的差异.X射线衍射及扫描电子显微测试结果表明：Si (111)衬底上生长出的ZnO二维周期结构薄膜具有较好的结晶质量与较好的周期性表面形貌.该研究结果为二维周期结构的制备提供了一种新颖的方法. 关键词： ZnO 分子束外延 Si 湿法刻蚀     

Improving light trapping and conversion efficiency of amorphous silicon solar cell by modified and randomly distributed ZnO nanorods

Three-dimensional （3D） nanostructures in thin film solar cells have attracted significant attention due to their appli- cations in enhancing light trapping. Enhanced light trapping can result in more effective absorption in solar cells, thus leading to higher short-circuit current density and conversion efficiency. We develop randomly distributed and modified ZnO nanorods, which are designed and fabricated by the following processes： the deposition of a ZnO seed layer on sub- strate with sputtering, the wet chemical etching of the seed layer to form isolated islands for nanorod growth, the chemical bath deposition of the ZnO nanorods, and the sputtering deposition of a thin Al-doped ZnO （ZnO：Al） layer to improve the ZnO/Si interface. Solar cells employing the modified ZnO nanorod substrate show a considerable increase in solar energy conversion efficiency.