一种新型的光纤光栅封装装置

介绍了一种新型剪刀形封装装置,并利用其进行了光纤布拉格光栅的温度补偿实验.这种封装结构保持了光纤光栅体积小的优点,同时无需给光纤光栅施加预应力;封装后不产生啁啾,并可与压电陶瓷结合,扩展光纤光栅布喇格波长的调谐范围;应变量的调节只跟金属丝有关,与支架的材料无关,从而大大简化了设计.在－30℃~80℃温区,温度灵敏度降低10倍以上,达到0.001 nm/℃,符合光纤通信要求.     

一种测量温度和流速的光纤光栅传感器

提出一种基于铝片的测量温度和流速的光纤布喇格光栅(FBG)传感器。采用一种耐高温胶将光纤布喇格光栅封装在一小铝片上，经过高温固化处理，可保持光纤光栅传感器的稳定性。通过-20℃～100℃温度实验，得到该传感器的温度灵敏度系数为0.0392nm/℃,是封装前的3.5倍，且传感器温度响应保持了很好的线性和重复性。从水温14.5℃时的流速实验中得到水流速在0～20m/s范围变化时，FBG峰值波长漂移了0.13nm,验证了此光纤光栅传感器测量流速的可行性。试验结果表明，该传感器既可以作为温度传感器，又可以作为流量传感器，并且制作简单，成本较低。     

一种新型光纤Bragg光栅流量传感器的仿真与实验研究

为了克服传统单个光纤布喇格光栅传感器对温度交叉敏感的问题,设计制作了一种基于双光纤布喇格光栅的以阻流件和弹性体为换能元件的流量传感器.该流量传感器采用弹性伞状结构体作为流量传感器的换能元件,用硅胶树脂封装双光纤光栅的弹性伞状结构体,起到了温度补偿的作用且提高了应变测量灵敏度.用有限元优化传感器结构,在1~20m/s的流速下利用ANSYS对传感器结构和传感器周围的流体场进行模拟分析,并计算了传感器的灵敏度,实验证明了硅胶树脂作为封装材料的优越性.进行了砝码干校法模拟实验,完成传感器封装前后的性能测试,通过提取该传感器的反射谱信号特征值,得到封装前后传感器的载荷响应灵敏度分别为:1.71nm/kg,0.103nm/kg.表明该流量传感器结构简单、安装方便、具有较好的线性度和灵敏度.     

铝槽封装光纤光栅传感器的增敏特性研究

提出了一种光纤布喇格光栅的铝槽封装工艺,并对铝槽封装光纤光栅传感器的应变与温度传感特性进行了实验研究和理论分析.与裸光纤光栅的测试结果比较表明,铝槽封装工艺基本不改变光纤光栅应变传感的灵敏性,但是温度灵敏度系数提高了3.5倍.经过该工艺封装的光纤光栅可以探测识别0.2 με的应变与0.02℃的温度变化.     

聚合物封装的高灵敏度光纤Bragg光栅温度传感器

将光纤光栅封装于一种有机聚合物基底中,制成温敏元件,测量了20～100℃不同温度下光纤光栅的反射谱.由于基底材料的带动作用,封装后的光纤光栅温度灵敏度为83.07×10-6/℃,是相应裸光纤光栅的12.3倍.     

可双参量同时测量的光纤磁场传感器

设计并制作了一种马赫-曾德尔干涉仪(Mach-Zehnder Interferometer,MZI)与光纤布喇格光栅级联的光纤磁场传感器,其中MZI由相当于分光器的锥结构和相当于耦合器的花生锥结构级联组成,封装在填充了磁流体的毛细管中.由于磁流体的有效折射率会随着外界磁场强度的改变而变化,故可通过观察干涉谱的特征波长的变化来测量外界磁场强度,而光纤布喇格光栅透射峰对磁场强度不敏感.当磁场强度由0mT变化到20mT时,马赫-曾德尔干涉峰的灵敏度为0.11nm/mT.温度特性实验测得马赫-曾德尔干涉峰和光纤布喇格光栅透射峰的温度灵敏度分别为0.401 5nm/℃和0.011 4nm/℃.因此,可利用敏感矩阵实现双参量同时测量.     

用拉伸和二次曝光法制作基于莫阿光纤光栅的带通滤波器

我们利用一块均匀掩膜版,通过对光纤拉伸和二次紫外曝光的方法制作了一基于莫阿-布喇格光纤光栅的带通滤波器,其带通宽度为0.28nm.我们对这种方法制作的莫阿-布喇格光栅作了理论分析.在此文中,还给出了均匀光纤光栅的拉伸特性.     

活塞式菱形结构光纤布喇格光栅渗压传感器

为了适应矿井、大坝对渗压监测的需要,提出一种活塞和菱形传压结构相结合的光纤布喇格光栅渗压传感器,活塞把测试压力传递到菱形传压结构,菱形传压结构拉动其上下对称连接的弹性钢片,导致粘贴在弹性钢片上的光纤布喇格光栅中心波长产生变化.利用有限元方法在500kPa的测试环境中对顶角分别为90°、110°、130°、150°情况下菱形传压结构的应力特性进行分析,根据仿真参量研制了渗压传感器,并对该传感器进行了压力标定试验和温度补偿试验.实验结果表明:传感器对渗压的灵敏度为2.04nm/MPa,拟合度为0.997,重复性为0.9%,两个测压光栅温度灵敏度分别为0.023 33nm/℃、0.021 68nm/℃,温补光栅为0.009 916nm/℃.     

铜片封装光纤光栅传感器的应变和温度传感特性研究

提出了一种光纤光栅的铜片封装工艺，并通过实验和理论分析研究了光纤光栅的应变和温度传感特性.与裸光纤光栅的测试结果相比，铜片封装工艺基本不改变光纤光栅应变传感的灵敏度，但是温度灵敏度系数提高了2.78倍.经过铜片封装后的光纤光栅可以探测到的应变和温度分别为1 με和0.03℃，便于工程应用.     

光纤光栅径向受力检测技术

对光纤布喇格光栅径向受力特性进行了理论与实验研究,给出了光纤布喇格光栅的径向受力灵敏度,并利用可调F-P标准具设计了一套解调光纤布喇格光栅反射峰劈裂值的实验系统.此系统消除了外界环境对F-P标准具初始腔长的干扰所引起的误差,系统的准确度达到了0.02 nm.     

Study of leading factors in formation of surface wavy structures on a rubber material

Wavy structures are often observed on the surface of a rubber material (polydimethylsiloxane, PDMS) covered with a thin metallic film. In this study we demonstrate that the orientation, periodicity, location of formation, and range of periodicity of the wavy structures can be regulated by three leading factors including the surface pattern, substrate hardness and the thickness of the metallic film. Results show the orientation of the wavy structures can be adjusted by the location, shape and size of the surface patterns. Enhancement of the substrate hardness can prevent forming random wavy structures. The thickness of surface metallic film significantly influenced the periodicity of the structures. Experimental results revealed an increase of the thickness of surface Au film by 50 nm, the periodicity was increased roughly by 1 μm. A compound structure, combining longitudinally preset patterns and transversely induced wavy structures, and a parallel wavy structure fabricated, respectively, by suitable arrangement of pattern configurations and adjustment of substrate hardness were demonstrated. The relatively simple approaches proposed here show the potential application in fabrication of designated complicate structures.     

A study of AFM-based scratch process on polycarbonate surface and grating application

We report on the possibility of applying atomic force microscope (AFM) lithography to draw micro/nano-structures on the surface of a polycarbonate (PC) substrate. We also fabricated a grating structure on the PC surface using the scratch method. An AFM silicon tip coated with a diamond layer was utilized as a cutting tool to scratch the surface of the sample. In order to obtain pattern depth deeper than the control method of interaction force, we used a scanner movement method which the sample scanner moves along the Z-axis. A grating of 100 μm × 150 μm was fabricated by the step and repeat method wherein the sample stage is moved in the direction of the XY-axis. The period and the depth of the grating are 500 and 50 nm, respectively. Light of 632.8 nm wavelength was diffracted on the surface of the PC substrate.     

多芯CSP-LED芯片间距对热拥堵的影响

在铝基板上贴片了不同间距的四颗芯片级封装发光二级管(CSP-LED)模组,测试了不同贴片间距CSP-LED模组的EL光谱、流明效率、光通量、相关色温等光电参数。结果显示,在小电流(20~400 mA)下,随着注入电流的增大,不同排布间距的蓝、白光样品的光电性能基本呈现相同的变化规律,即光通量、光功率呈线性增长,光效基本保持稳定;在大电流(1~1.5 A)下,随着芯片间排布间距减小,EL光谱积分强度降低,色温升高,红色比下降,排布间距为0.2 mm的光通量衰减了84.58%,相比之下排布间距为3 mm和5 mm的光通量衰减明显减缓,分别为8.96%和3.58%,这些现象与禁带宽度、热应力、非辐射复合等因素有关。结果表明,CSP白光LED光通量衰减主要是荧光粉退化导致的,考虑到实际生产成本问题,排布间距为3 mm时,有利于热量散出,进而提高LED光电性能特性及其自身的使用寿命。     

Czerny-Turner正交型光栅单色仪的波长校准

研究了Czerny-Turner正交型光栅单色仪的波长校准技术。结合单色仪的结构参数和特点,提出以符合光栅方程的正弦曲线作为仪器出射波长的校准方程,基于最小二乘法原理给出校准方程的拟合残差表达式,由于校准方程的非线性,应用二维Nelder-Mead单纯形法求解拟合残差的待定系数,建立了波长与光栅转角的精确表达式,并通过实验验证了该算法的准确性。结果表明,经过校准的单色仪波长定位精度小于0.1nm,比设计要求提高一个数量级。该方法在Czerny-Turner正交型光栅单色仪的波长校准过程中,应用简单,容易实现,只需稍加修改步进电机的控制程序,即可完成对仪器出射波长的快速实时校准,实用性强。     

光纤布拉格光栅嵌入SMS光纤结构的湿度传感器

提出了一种基于光纤布拉格光栅嵌入单模-多模纤芯-单模(single-mode-multimode fiber core-single mode, SMS)光纤结构的湿度传感器。当环境湿度变化时,SMS光纤结构的干涉光谱会发生漂移,而光纤布拉格光栅对湿度不敏感,其纤芯基模保持不变。因此利用SMS光纤结构对环境湿度的敏感性去调制光纤布拉格光栅纤芯基模,通过检测光纤布拉格光栅纤芯基模的反射能量变化就可以实现湿度测量。数值模拟了SMS光纤结构的内部光场分布规律,理论计算了不同环境折射率时,多模纤芯的长度、直径对SMS光纤结构输出能量耦合系数的影响。理论模拟表明,随着环境折射率变化,SMS光纤结构中传输的纤芯基模的输出能量耦合系数会发生变化。同时制作了传感器样品并对其进行了传感实验研究,实验结果表明多模纤芯长35 mm、纤芯直径为85 μm的传感器在45%～95%RH湿度变化范围内,湿度灵敏度为0.06 dBm·(%RH)-1。在20～80 ℃温度范围内,传感器的温度灵敏度为0.008 nm·℃-1,温度所带来的湿度测量误差为0.047%RH·℃-1。传感器具有制作简单、灵敏度高、反射式能量检测等优点,在湿度测量领域有一定的应用价值。     

平场全息凹面光栅制作结构与使用结构之间误差补偿作用的数值模拟与实验验证

通过对优化计算出的平场全息凹面光栅制作结构(曝光记录结构)和使用结构(光谱仪分光结构)之间各个参数进行联合数值模拟,得出如下结论：在优化设计参数值附近一个较大范围的误差区域内,平场全息凹面光栅的制作结构参数误 差和使用结构参数误差可以相互补偿,最终补偿的结果可以使光谱成像质量达到与原设计结构相当的水平,满足光谱仪器的使用要求。文章给出了数值模拟结果以及与其相符的实验验证结果。此补偿作用有利于降低平场全息凹面光栅制作 中各个参数精度的调节难度,并且可以对实际使用过程中光谱仪器的设计和装调进行理论上的指导。     

提高叠栅条纹信号质量的一种新方法

在国内外普遍使用的细栅距幅光栅叠栅条纹系统中,衍射效应是很明显的,这是造成叠栅条纹信号的衬比(度)和正弦性不好的主要原因.本文在分析了叠栅条纹信号的基础上,导出了衍射光栅副中±1级叠栅条纹的相位与光栅副间隔,光线入射角等的关系,提出了用±1级叠栅条纹来提高叠栅条纹的信号质量,实验结果与理论分析一致,实际应用,效果良好.     

Amorphous Si waveguides with high-quality stacked gratings for multi-layer Si optical circuits

To realize a stacked multi-layer silicon-based photonic device, a waveguide with a stacked grating was fabricated by using amorphous Si (a-Si) material, which is suitable for constructing layered structures. The fabrication method was based on forming a flat a-Si layer on a non-flat structure by using only spin-on-glass (SOG) coating technique. The a-Si grating was precisely constructed on the a-Si waveguide with gold alignment marks for electron beam lithography. Transmitted and reflected light power dependence on the grating period, wavelength, and polarization was systematically measured and compared with the designed dependence. As a result, the reflected light power exhibited a characteristic peak structure at a particular wavelength. Remarkable transverse electric/transverse magnetic (TE/TM) mode dependence was also observed. Furthermore, the measured and the designed properties were in excellent agreement with each other. Consequently, the designed structure was well reproduced in the actual stacked structure based on the a-Si material. These results pave the way for novel a-Si based integrated photonic devices such as polarization selectors and wavelength filters, indicating that a-Si is an excellent material for implementing Si-based multi-layer optical circuits.     

Plasmonic structure generation by laser illumination of silica colloid spheres deposited onto prepatterned polymer-bimetal films

Plasmonic structures are prepared on bimetal films evaporated onto glass substrates applying a multi-step process, and atomic force microscopy is utilized to study the structures after each step. Sub-micrometer gratings are generated on polycarbonate films spin-coated onto silver-gold bimetal layers by interference lithography (IL) applying the fourth harmonics of a Nd:YAG laser. These polymer gratings are used as prepatterned templates in order to deposit silica colloid spheres by spin-coating. It is shown that the conditions of periodic silica sphere-array formation along the template valleys are sufficiently large grating modulation depth, appropriate ratio of silica sphere diameter to grating period, and optimized speed of spinning. The periodic silica sphere arrays are illuminated by a homogeneous KrF excimer laser beam, and periodically arrayed sub-wavelength holes are drilled into bimetal films via colloid sphere lithography (CSL). The characteristic dimensions of the resulted plasmonic structures are defined by the polymer grating period and by the silica colloid sphere diameter. Attenuated total reflection spectroscopy is performed exciting plasmons on different metal-dielectric interfacial structures by the second harmonic of a continuous Nd:YAG laser. The polar and azimuthal angle dependent grating-coupling and scattering effects of the complex periodic structures on the resonance characteristic of plasmons is demonstrated.     

全息光栅的制造技术及其改进

本文叙述了全息光栅的制造原理、工艺要求和制造技术。介绍了平场全息光栅、图象全息光栅、超环面全息光栅、激光全患光栅和闪耀全息光栅的新进展。最后,作者提出进一步发展全息光栅的若干建议。