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Low-Temperature Growth of Polycrystalline silicon Films by SiCl4/H2 rf Plasma Enhanced Chemical Vapour Deposition 总被引:4,自引:0,他引:4 下载免费PDF全文
Polycrystalline silicon film was directly fabricated at 200℃ by the conventional plasma enhanced chemical vapour deposition method from SiCl4 with H2 dilution. The crystallization depends strongly on the deposition power.The maximum crystMlinity and the crystalline grain size are over 80% and 200—50Onm, respectively. The results of energy dispersive spectroscopy and infrared spectroscopy measurements demonstrate that the film is mostly composed of silicon, without impurities such as Cl, N, C and bonded H. It is suggested that the crystallization at such a low temperature originates from the effects of chlorine, i.e., in-situ chemical, etching, in-situ chemical cleaning, and the detachment of bonded H. 相似文献
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A Movable Mass Spectroscopy Sampling Apparatus for Measuring Spatial Distribution of Neutral Radicals in Silane Plasma 下载免费PDF全文
A movable mass spectroscopy gas sampling apparatus has been established and a straight-line fit of silane depletion fraction f is proposed. The spatial density distributions of SiHn (n=0-3) radicals in silane radio frequency glow discharge have been measured by a mass spectrometer. The experimental results demonstrate that the densities of the neutral radicals have the peak value near the middle position of electrodes, and the densities of SiH2 and SiH3 are higher than those of Si and SiH in silane plasma. This reveals that SiH2 and SiH3 may be the primary precursors in forming the a-Si:H film. 相似文献
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The reliability of measurements on electron energy distribution function in silane rf glow discharges 总被引:1,自引:0,他引:1 下载免费PDF全文
Electron energy distribution function (EEDF) is a key parameter of plasmas, which is directly proportional to the second derivative of the probe I-V characteristics. Because of an amplifying effect of unavoidable noises in the experimental probe I-V curves during the derivation process, the experimental I-V curves should be smoothed before performing the numerical derivation. This paper investigates the effect of adjustable factors used in the smoothing process on the deduced second derivative of the I-V curves, and an optimum group of the adjustable factors is selected to make the rms deviation of the smoothed I-V curves from the measured curves less than 1%. A simple differentiation circuit is designed and used to measure the EEDF parameter straightforwardly. It is the first time, so far as we know, to measure the EEDF parameters simultaneously by means of both numerical and circuit derivative methods under the same discharge conditions and on the same discharge equipment. The deviation between two groups of mean electron energy E and electron density n_e obtained by the above different methods is within about 7%. This apparently improves the reliability of the measurements of the EEDF parameters. 相似文献
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利用脉冲激光制膜法,在多种衬底和温度条件下,系统研究了La0.5Sr0.5CoO3(LSCO)薄膜的结构和外延生长特性,在LaAlO3,SrTiO3和MgO衬底上实现了LSCO薄膜的外延生长.外延生长的薄膜具有低的电阻率和金属性导电特征.研究表明,外延生长的最佳温度范围为700—800℃,最佳衬底为LaAlO3.并着重探讨了衬底材料和淀积温度等多种因素对LSCO薄膜的生长与性
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Radicals produced by the plasma enhanced chemistry vapour deposition technique in SiCl4 plasma are identified by mass spectrometry using our newly proposed straight-line fit method. Since flow rate is one of the most important parameters in depositing thin films, we present the effects of SiCl4 flow rate variation on SiCln (n 〈 3) densities. The experimental results demonstrate that Si and SiCln (n = 1, 2) densities decrease with increasing SiCl4 flow rate. After reaching the minimum values at a flow rate of 17 and 13sccm, respectively, Si and SiCln (n = 1, 2) densities slightly increase with further increase of flow rate to 20.5sccm. These results could be interpreted to which the depletion fraction of SiCl4 decreases and the residence time of SiCl4 molecule becomes shorter, with the increasing SICl4 flow rate. In order to obtain high-quality poly-Si films with high growth rate, it is better to use smaller flow rate of SICl4 source gas for depositing films. 相似文献
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以ZnO、SnO2和活性炭的混合物为原料,通过碳热还原热蒸发法无催化剂成功制备出Zn2SnO4纳米材料.借助X射线衍射仪(XRD)、拉曼光谱和扫描电子显微镜(SEM)对样品物相和形貌进行了表征,结果显示样品为面心立方结构的Zn2SnO4纳米链状棒,同时含有少量的ZnO物相.利用X射线光电子能谱(XPS)对Zn2SnO4样品表面各元素的化学状态及相互作用方式进行了测试,结果表明:样品中Zn和Sn分别是以+2价和+4价氧化态形式存在,其中Zn2p3/2电子有两个结合能,分别来自ZnO和Zn2SnO4,Zn2SnO4中Sn4+占据不同的格点位置.室温下光致发光谱(PL)结果显示,样品在紫外区域(320-450nm)和可见区域存在很强的发光带,其中紫外区域的宽发光带,经过高斯拟合可分为358和385nm两个发光峰,与同条件下制备得到的纯ZnO纳米材料发光谱比较,确认358nm发光峰是来自于Zn2SnO4的近带边复合发光. 相似文献