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从固体模型理论的结果出发,计算了生长于Si(100)衬底上x值小于085的Si1-xGex合金材料(能带结构为类Si结构)的间接带隙与应变的关系,结 果表明,应变的S iGe材料的带隙和完全弛豫状态下材料的带隙之差与应变呈线性关系.基于这一结果,提出了 用测量带隙来间接测定SiGe/Si应变状态的方法.用带隙法和x射线双晶衍射法测量了不同应 变状态下的SiGe/Si多量子阱材料的应变弛豫度,两者可以较好的符合,表明带隙法测量SiG e应变弛豫度是可行的.
关键词:
SiGe合金
应变
带隙 相似文献
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镜面起伏对1.55μm Si基MEMS光滤波器的影响 总被引:6,自引:0,他引:6
用传输矩阵方法,在简化的光学模型基础上,分别讨论了分布式Bragg反射镜DBR(Distributed Bragg Reflector)的生长精度及镜面起伏对1.55 μm Si基MEMS(Micro-Electro-Mechanical-System)可调谐光滤波器透射谱的影响.计算表明:DBR生长误差仅使主透射峰位置发生变化,而镜面起伏是导致主透射峰性能劣化的主要原因,它使得FWHM增大,透射峰强度下降.理论计算结果能较好地解释实验现像.在此基础上,进一步讨论了引起镜面起伏的多种原因,并提出了可能的解决方法. 相似文献
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随着波分复用技术的发展,成本低廉,易与Si基微电子集成电路集成的长波长探测器越来越受到人们的重视。Si1-kGek/Si量子阱材料在1.3μm石英光纤波段有着明显的响应。但是由于SiGe材料间接带隙结构,吸收系数小,SiGe探测器的应用受到限制。由于(heterojunction phototransistor异质结光敏晶体管)HPT具有内部增益,SiGeHPT有望得到广泛应用。本文在国内首次报道了利用自己研制的UHV-CVD生长的SiGeHPT。在该结衍射和TEM进行表征,并且制作了原型器件,器件的光电流谱表明器件在5V偏压下在1.3μm波段响应度达1mA/W,光增益约为10。同时我们设计了SOR上面的RCEHPT,并进行光电响应模拟,模拟表明RCE HPT的量子效率可达8%,增加吸收区材料Ge组分到0.5,量子效率可提高到30%,半高度为1.5nm,适应光通讯的要求。 相似文献
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Fabrication of Ge Nano-Dot Heterojunction Phototransistors for Improved Light Detection at 1.55μm 总被引:1,自引:0,他引:1 下载免费PDF全文
Heterojunction phototransistors (HPTs) with several Ge/Si nano-dot layers as the absorption region are fabricated to obtain improved light detectivity at 1.55μm. The HPT detectors are of n-p-n type with ten layers of Ge(8ML ) /Si(45nm) incorporated in the base-collector junction and are grown by an ultrahigh-vacuum chemicalvapor-deposition system. The detectors are operated with normal incidence. Because of the good quality of the grown material and fabrication process, the dark current is only 0.71pA/μm^2 under 5 V bias and the breakdown voltage is over 20 V. Compared to the positive-intrinsic-negative (PIN) reference detector with the same absorption layer, the responsivity is improved over 17 times for normal incidence at 1.55μm. 相似文献
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A prototype 1.55-μm Si-based micro-opto-electro-mechanical-systems (MOEMS) tunable filter is fabricated, employing surface micromachining technology. Full-width-at-half-maximum (FWHM) of the transmission spectrum is 23 nm. The tuning range is 30 nm under 50-V applied voltage. The device can be readily integrated with resonant cavity enhanced (RCE) detector and vertical cavity surface emitting laser (VCSEL) to fabricate tunable active devices. 相似文献
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