排序方式: 共有10条查询结果,搜索用时 216 毫秒
1
1.
2.
Low-Temperature Growth of Polycrystalline silicon Films by SiCl4/H2 rf Plasma Enhanced Chemical Vapour Deposition 总被引:4,自引:0,他引:4 下载免费PDF全文
Polycrystalline silicon film was directly fabricated at 200℃ by the conventional plasma enhanced chemical vapour deposition method from SiCl4 with H2 dilution. The crystallization depends strongly on the deposition power.The maximum crystMlinity and the crystalline grain size are over 80% and 200—50Onm, respectively. The results of energy dispersive spectroscopy and infrared spectroscopy measurements demonstrate that the film is mostly composed of silicon, without impurities such as Cl, N, C and bonded H. It is suggested that the crystallization at such a low temperature originates from the effects of chlorine, i.e., in-situ chemical, etching, in-situ chemical cleaning, and the detachment of bonded H. 相似文献
3.
4.
The reliability of measurements on electron energy distribution function in silane rf glow discharges 总被引:1,自引:0,他引:1 下载免费PDF全文
Electron energy distribution function (EEDF) is a key parameter of plasmas, which is directly proportional to the second derivative of the probe I-V characteristics. Because of an amplifying effect of unavoidable noises in the experimental probe I-V curves during the derivation process, the experimental I-V curves should be smoothed before performing the numerical derivation. This paper investigates the effect of adjustable factors used in the smoothing process on the deduced second derivative of the I-V curves, and an optimum group of the adjustable factors is selected to make the rms deviation of the smoothed I-V curves from the measured curves less than 1%. A simple differentiation circuit is designed and used to measure the EEDF parameter straightforwardly. It is the first time, so far as we know, to measure the EEDF parameters simultaneously by means of both numerical and circuit derivative methods under the same discharge conditions and on the same discharge equipment. The deviation between two groups of mean electron energy E and electron density n_e obtained by the above different methods is within about 7%. This apparently improves the reliability of the measurements of the EEDF parameters. 相似文献
5.
以ZnO、SnO2和活性炭的混合物为原料,通过碳热还原热蒸发法无催化剂成功制备出Zn2SnO4纳米材料.借助X射线衍射仪(XRD)、拉曼光谱和扫描电子显微镜(SEM)对样品物相和形貌进行了表征,结果显示样品为面心立方结构的Zn2SnO4纳米链状棒,同时含有少量的ZnO物相.利用X射线光电子能谱(XPS)对Zn2SnO4样品表面各元素的化学状态及相互作用方式进行了测试,结果表明:样品中Zn和Sn分别是以+2价和+4价氧化态形式存在,其中Zn2p3/2电子有两个结合能,分别来自ZnO和Zn2SnO4,Zn2SnO4中Sn4+占据不同的格点位置.室温下光致发光谱(PL)结果显示,样品在紫外区域(320-450nm)和可见区域存在很强的发光带,其中紫外区域的宽发光带,经过高斯拟合可分为358和385nm两个发光峰,与同条件下制备得到的纯ZnO纳米材料发光谱比较,确认358nm发光峰是来自于Zn2SnO4的近带边复合发光. 相似文献
6.
7.
8.
氩直流辉光放电等离子体中电子运动及能量的模拟 总被引:1,自引:1,他引:0
采用自动调节时间步长的蒙特卡罗模拟,对平行板放电系统中的氩气直流辉光放电系统中的等离子体区内电子的运动过程进行了跟踪和抽样。统计结果表明:在我们的实验条件下,等离子体中的电子在电场作用下出现明显的轴向漂移;在40000次抽样中,出现能量为E的电子数目随能量E增大呈下降趋势,场强增大将引起能量分布展宽和电子平均能量增加;即使场强达到15V·cm-1,等离子体激发和电离仍是很少的;场强和气压都能明显改变电子的平均自由程。 相似文献
9.
Langmuir探针是诊断等离子体参数的重要手段.报道了在氩气射顿(13.56MHz)辉光放电等离子体中使用调谐单探针进行诊断,对探针I-V特性曲线的统计噪声进行了数字滤波的光滑化处理,而后求二次微商.在相同的放电条件下,使用自行设计的微分电路,对探针特性二次微商进行在线测量.这两种方法得到的二次微商结果能够较好地符合.
关键词:
Langmuir探针
二次微商
数值滤波
微分电路 相似文献
10.
1