| 磁控溅射制备极紫外高反射率多层膜应力研究 |
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| 引用本文： | 何世峰,涂昱淳,冯志祥,岳帅鹏,王风丽,朱京涛.磁控溅射制备极紫外高反射率多层膜应力研究[J].强激光与粒子束,2014,26(5):054002-237. |
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| 作者姓名： | 何世峰 涂昱淳 冯志祥 岳帅鹏 王风丽 朱京涛 |
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| 作者单位： | 1.同济大学 物理科学与工程学院, 先进微结构材料教育部重点实验室, 上海 200092 |
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| 基金项目： | 国家自然科学基金项目（11375131，11305104) |
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| 摘 要： | 为制备硼边附近6.7 nm波长的极紫外高反射率多层膜反射镜,研究了Mo_2C/B_4C,Mo/B_4C周期多层膜,重点解决薄膜应力难题。采用直流磁控溅射技术制备了膜层厚度为30 nm的Mo,Mo_2C,B_4C,单层膜,周期厚度为3.5 nm,30对的Mo_2C/B_4C,Mo/B_4C周期多层膜。利用台阶仪测试了镀膜前后基底面形,计算并比较了不同薄膜样品的应力值。结果表明Mo_2C/B_4C多层膜压应力要远小于Mo/B_4C多层膜,且成膜质量与Mo/B_4C相当。因此Mo_2C/B_4C是应用于6.7 nm反射镜较好的多层膜材料组合。
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| 关 键 词： | 应力 多层膜 磁控溅射 极紫外 |
| 收稿时间： | 2013/11/17 |
Stress analysis of high reflective multilayers fabricated by magnetron sputtering |
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| Affiliation: | 1.MOE Key Laboratory of Advanced Micro-Structured Materials,School of Physics Science and Engineering,Tongji University,Shanghai 200092,China |
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| Abstract: | In order to fabricate high reflective multilayer mirrors for 6.7 nm wavelength near B absorption edge, a series of Mo, B4C, Mo2C thin films and Mo/B4C, Mo2C/B4C multilayers were deposited using direct current (DC) magnetron sputtering technology. The thickness for all of the thin films is 30 nm, and the bi-layer number for both multilayer is 30. The period thickness is 3.5 nm, which were measured by grazing incidence-X-ray reflection(GIXR). Surface profiles before and after deposition were measured with a stylus profiler and the stresses were calculated by Stoney formula. The results indicate that all of the thin films show compressive stress, in which the B4C layer shows the biggest stress, and the compression stress of Mo2C layer is larger than that of the Mo layer. Both of the multilayer films show the compressive stress. Mo2C/B4C periodic multilayers have a smaller stress than Mo/B4C multilayers with a sharp interface and are a good material combination for extreme ultraviolet multilayer optics with a large number of bilayers. |
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| Keywords: | stress multilayer magnetron sputtering extreme ultraviolet |
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