Structural, optical and electrical properties of amorphous silicon thin films prepared by sputtering with different targets

Amorphous silicon (a-Si) films were prepared by sputtering method with polycrystalline and monocrystalline silicon targets. Structural, optical and electrical properties of the a-Si films have been systematically studied. The deposition power is from 100 to 200 W. Compared with the a-Si films deposited by using monocrystalline silicon target, the a-Si films prepared with polycrystalline silicon target exhibit better growth property, similar optical band gap, and own the highest mobility of 1.658 cm²/Vs, which make a good match with the optimal window of optical band gap for a-Si solar cells. The results indicated that the polycrystalline silicon target is superior to the monocrystalline silicon target when used to prepare a-Si films as the intrinsic layer in a-Si solar cells.     

Structural, Raman, and photoluminescence characteristics of ZnO nanowires coated with Al-doped ZnO shell layers

Al-doped ZnO (AZO) shell layers were coated on core ZnO nanowires to fabricate ZnO/AZO core–shell nanowires. The energy-dispersive X-ray spectra confirmed the presence of Al element in the shell layers, and the lattice resolved transmission electron microscopy image revealed that these layers corresponded to the hexagonal ZnO structure. The X-ray diffraction pattern exhibited a shift of the ZnO peaks, suggesting the substitutive incorporation of Al into the ZnO lattice. The A₁(LO) mode line in the Raman spectra was enhanced by the AZO coating. In the photoluminescence measurements, the AZO coating enhanced the intensity ratio of the UV to green emission.     

化学水浴法和磁控溅射法制备硫化镉薄膜的性能研究

以氯化铵、氯化镉、氢氧化钾和硫脲为反应物采用化学水浴法制备了硫化镉薄膜,为了作对比研究,采用射频磁控溅射以硫化镉为靶材,氩气为溅射气体,制备了硫化镉薄膜。采用X射线衍射、扫描电子显微镜和紫外-可见光光谱仪分别表征了硫化镉薄膜的结构、形貌和光学吸收特性。结果表明,采用以上两种方法制备的硫化镉均具有(002)择优取向,溅射法制备的硫化镉薄膜较致密,薄膜表面较光滑,平均晶粒尺寸在20～30nm;水浴法制备的硫化镉薄膜颗粒尺寸较小,缺陷较多。除了在短波段溅射所得硫化镉薄膜的透过率略差于水浴法所得硫化镉薄膜之外,溅射法制备的硫化镉薄膜的性能整体上优于水浴法制备的薄膜。两种方法制备的硫化镉薄膜的能隙在2.3～2.5eV。     

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采用分子动力学模拟方法研究了样品温度对Ar+与SiC样品表面相互作用的影响。由模拟结果可知,SiC样品中Si原子的溅射产额随着温度的升高而增加,而温度对C原子的溅射产额影响不大。在相同温度下,Si原子的溅射产额要高于C原子的溅射产额。溅射出来的Si原子和C原子主要来源于样品的表层区域,样品中的Si和C原子密度、键密度及它们的成键方式也发生了较大的变化。初始样品中Si和C原子的密度是均匀的,而被轰击过后的样品表面Si原子的密度要高于C原子,而样品中部C原子的密度要高于Si原子。初始样品都是Si-C键,成键方式为Si-Csp3;被轰击过后又有Si-Si和C-C键,成键方式也发生了变化,还有Si-Csp1和Si-Csp2。     

Metal Precursor Influence on Performance of CuIn1-xGaxSe2 Films

在镀有Mo的纳钙玻璃衬底上顺序溅射沉积CuGa/In/CuGa层,然后在真空下520 oC硒化40 min,制备成CIGS薄膜. 通 过调整预制层的底层和表层的溅射沉积CuGa层的厚度比,制备不同的CIGS薄膜. 通过X射线衍射谱、拉曼谱、电子能谱、平面和断面SEM的分析, 揭示出CIGS薄膜是黄铜矿相的结构, 晶粒0.5～2 μm,且由硒化CuGa/In/CuGa厚度比为7:20:3的金属预制层后的CIGS薄膜的结晶性最好. 拉曼光谱表明,没有In-Se二元化合物相和有序缺陷化合物相.     

Characterization and aging effect study of nitrogen-doped ZnO nanofilm

The influence of sputtering and annealing conditions and aging effect on properties of sputtered ZnO:N thin films were investigated. Achieved results confirmed a planar growth of nitrogen-doped ZnO film with a high uniform and smooth surface morphology. Incorporation of nitrogen in the ZnO films made new Raman shifts. X-ray diffraction spectra showed only the ZnO (0 0 2) diffraction peak, which was slightly shifted toward lower angels, compared to pure ZnO, which is the result of incorporating nitrogen in the ZnO films. The amount of this shift was proportional to N concentration. In addition, annealed samples showed better crystallinity with lower shift due to dramatically reduction of N atoms during the annealing. The Hall effect measurements exhibited p-type behaviour on annealed ZnO:N thin films while the un-annealed samples showed n-type conductivity. Aging effect studies demonstrated that the N content of thin films decreased dramatically as time passed. The reduction of N concentration in annealed samples was lower than un-annealed ones after 6 months.     

Two routes to polycrystalline CoSi2 thin films by co-sputtering Co and Si

Two processes for the fabrication of polycrystalline CoSi₂ thin films based on the codeposition of Co and Si by sputtering were studied and compared. The first process involved “annealing after deposition”, where Co and Si are codeposited at ambient temperature and then crystallized by annealing. This process yielded randomly oriented plate-like CoSi₂ grains with a grain size that is governed by the nanostructure of the as-deposited film. Polycrystalline CoSi₂ thin films were obtained at a process temperature of 170 °C, which was much lower than the annealing temperature of 500 °C needed for Co/Si bilayers. The second process involved “heating during deposition”, where Co and Si are codeposited on heated substrates. This process yielded CoSi₂ grains with a columnar structure, and the grain size and degree of (1 1 1) orientation are temperature dependent. The sheet resistance of the resulting films was determined by the preparation temperature regardless of the deposition process used, i.e. “annealing after deposition” or “heating during deposition”. Temperatures of 500 °C and higher were needed to achieve CoSi₂ resistivity of 40 μΩ cm or lower for both processes.     

Yields and ionization probabilities of sputtered Inn particles under atomic and polyatomic Aum ion bombardment

The emission of neutral and charged atoms and clusters from a polycrystalline indium surface under bombardment with 5 and 10 keV Au, Au₂, Au₃ and Au₅ projectiles was investigated. Single photon laser postionization was utilized for the detection of sputtered neutral particles. Secondary ions were detected without the laser under otherwise exactly the same experimental conditions. The relative cluster yields were found to be enhanced under polyatomic projectile bombardment, more so the larger the number of atoms in the sputtered cluster. The ionization probability strongly increases with increasing cluster size, but is essentially independent of the projectile impact energy. At a fixed impact energy, the ionization probability of sputtered monomers was found to decrease with increasing number of constituent gold atoms per projectile, but there was no detectable effect for sputtered dimers and larger clusters.     

Effect of deposition condition on residual stress of iron nitride thin films prepared by magnetron sputtering and ion implantation

The surface roughness and residual stress development in Fe-N thin films prepared by compound technology—combining magnetron sputtering with plasma based ion implantation were investigated by means of atomic force microscope and synchrotron radiation. The results indicate that the grain size of the thin film increases with the increasing of nitrogen ion implantation time, and the state of residual stress is related closely to the formation mechanism of thin films. With the nitrogen ion implantation time increasing, the residual stress of the thin film changes into tensile stress from initial compressive stress, and the tensile stress decreases with the further increasing of ion implantation time.     

溅射法制作的Fe-Al-O颗粒薄膜的磁化曲线及巨磁阻曲线的测定

用溅射法制作了不同的Fe-Al2O3颗粒薄膜，用样品振动型磁力计测定了磁化曲线和巨磁阻曲线，并对其进行了分析和讨论．