High sputtering yields of organic compounds by large gas cluster ions

We measured the sputtering yield, surface roughness and surface damage of thin leucine films bombarded with Ar cluster ions and examined the usefulness of large gas cluster ions for the depth profiling of organic compounds. Ar cluster ion beams with a mean size of 2000 atoms/cluster and energies from 5 to 30 keV were used. Sputtering yields increased linearly with incident ion energy and were extremely high compared to inorganic materials. Surface damage was investigated by measuring positive secondary ions emitted from the leucine film before and after cluster ion irradiation. After irradiation the leucine surface became smoother. The yield ratio of protonated leucine ions to other fragment ions kept constant before and after Ar cluster ion irradiation. These results indicate that large gas cluster ions are useful for depth profiling of organic compounds.     

Formation of neutral clusters during sputtering of gold

Polycrystalline Au was bombarded with 15 keV Ar⁺, and the resulting secondary neutral cluster yield distribution was measured by laser postionisation mass spectrometry. Neutral Au_n clusters containing up to 20 atoms were observed. The yield of Au_n clusters, Y_n, was found to follow a power in n, Y_n ∝ n^−3.4, but the yield of individual clusters depended on whether n was even or odd. This odd-even yield variation was caused by fragmentation of the cluster photoions. Simulation of photoion trajectories within the TOF spectrometer shows that the fragmentation dominantly occurs before the photoions enter the reflectron part of the spectrometer.     

Wettability of ZnO: A comparison of reactively sputtered; thermally oxidized and vacuum annealed coatings

We have studied the wettability of sputter deposited ZnO, thermally oxidized Zn-ZnO and vacuum annealed ZnO coatings. The X-ray diffraction patterns showed the formation of hexagonal-wurtzite structure of ZnO, which was further confirmed by micro-Raman spectroscopy data. The X-ray photoelectron spectroscopy data indicated that the sputter deposited ZnO coatings were more stoichiometric than thermally oxidized Zn-ZnO and vacuum annealed ZnO coatings. The wettability measurements indicated that water contact angles of 158.5° and 155.2° with sliding angles of 2° and 4° were achieved for thermally oxidized Zn-ZnO and vacuum annealed ZnO coatings, respectively. The superhydrophobicity observed in thermally oxidized Zn-ZnO and vacuum annealed coatings is attributed to the nanorod cluster like morphology along with the presence of high fraction of micron scale air pockets. The water droplet on such surfaces is mostly in contact with air pockets rather than solid surface, leading to high contact angle. Whereas, the sputter deposited ZnO coatings exhibited a maximum water contact angle of 110.3°. This is because the sputter deposited ZnO coatings exhibited a densely packed nanograin-like microstructure without any air pockets. The work of adhesion of water was very low for thermally oxidized Zn-ZnO (5.06 mJ/m²) and vacuum annealed ZnO coatings (6.71 mJ/m²) when compared to reactively sputtered ZnO coatings (90.41 mJ/m²). The apparent surface free energy (SFE) for these coatings was calculated using Neumann method and the SFE values for sputter deposited ZnO, thermally oxidized Zn-ZnO and vacuum annealed ZnO coatings were 32.95, 23.21 and 18.78 mJ/m², respectively.     

Crystal orientation control of polycrystalline TiN thin films using ZnO under layers deposited by magnetron sputtering

The effect of ZnO under layers on crystal growth of TiN thin films was investigated. TiN single layers and double-layered ZnO/TiN thin films were deposited on soda-lime-silicate glass substrates by magnetron sputtering. XRD analysis indicated that TiN single layers exhibited {1 1 1} preferred orientation on glass substrates; on the other hand, the TiN thin films with {1 0 0} preferred orientation were obtained using ZnO under layers and crystallized better than the TiN single layers. This crystal orientation change of TiN thin films should come from heteroepitaxial-like growth because the TiN{1 0 0} and ZnO{0 0 1} crystal lattice planes have similar atomic arrangements. Besides, the possible mismatch between TiN and ZnO atomic arrangements was estimated to be 7.8%. Furthermore, the resistivity and optical absorbance of TiN thin films decreased when they were deposited on ZnO under layers. It can be considered that electrical and optical properties should be improved due to the well-crystallization of TiN thin films using ZnO under layers.     

Study of microstructure and nanomechanical properties of Zr films prepared by pulsed magnetron sputtering

The present work studies the effect of substrate temperature on the growth characteristics of zirconium films prepared by pulsed magnetron sputtering. Formation of α-phase of zirconium was observed in the temperature range 300-873 K. X-ray diffraction of Zr films revealed predominantly [0 0 1] texture. It is noticed that crystallite size increases with increasing substrate temperature. Hexagonal shaped crystallites seem to grow along the surface normal of the substrate for the films deposited at 773 K. Nanoindentation measurements showed that the hardness of the films is in the range 6-10 GPa. The scratch test indicated that the films deposited at higher substrate temperatures had excellent bonding with the substrate and no significant critical failure was noticed up to an applied load of 20 N.     

Sputter deposition of high transparent TiO2−xNx/TiO2/ZnO layers on glass for development of photocatalytic self-cleaning application

In this study, TiO_2−xN_x/TiO₂ double layers thin film was deposited on ZnO (80 nm thickness)/soda-lime glass substrate by a dc reactive magnetron sputtering. The TiO₂ film was deposited under different total gas pressures of 1 Pa, 2 Pa, and 4 Pa with constant oxygen flow rate of 0.8 sccm. Then, the deposition was continued with various nitrogen flow rates of 0.4, 0.8, and 1.2 sccm in constant total gas pressure of 4 Pa. Post annealing was performed on as-deposited films at various annealing temperatures of 400, 500, and 600 °C in air atmosphere to achieve films crystallinity. The structure and morphology of deposited films were evaluated by X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), and atomic force microscopy (AFM). The chemical composition of top layer doped by nitrogen was evaluated by X-ray photoelectron spectroscopy (XPS). Photocatalytic activity of samples was measured by degradation of Methylene Blue (MB) dye. The optical transmittance of the multilayer film was also measured using ultraviolet-visible light (UV-vis) spectrophotometer. The results showed that by nitrogen doping of a fraction (∼1/5) of TiO₂ film thickness, the optical transmittance of TiO_2−xN_x/TiO₂ film was compared with TiO₂ thin film. Deposited films showed also good photocatalytic and hydrophilicity activity at visible light.     

Optical emission spectroscopy by Ar ion sputtering of Ti surface under O2 environment

Visible light emission from atoms and ions sputtered on a polycrystalline Ti surface was observed under irradiation of 30 keV Ar³⁺ ions. A number of atomic lines of Ti I and II were observed in the wavelength of 250-850 nm. The intensity of Ti II emission increased 1.3-5.6 times by introducing oxygen molecules at a pressure of 5.8 × 10⁻⁵ Pa, whereas that of Ti I decreased 0.5-0.8 times. Factors enhancing or reducing photon intensities were plotted as a function of energy of the corresponding electrons in the excited states for Ti atoms and Ti⁺ ions.     

Realization of p-ZnO thin films by GaP codoping

An attempt has been made to realize p-ZnO by directly doping (codoping) GaP into ZnO thin films. GaP codoped ZnO thin films of different concentrations (1, 2 and 4 mol%) have been grown by RF magnetron sputtering. The grown films on sapphire substrate have been characterized by X-ray diffraction (XRD), Hall measurement, Photoluminescence (PL) and Energy dispersive spectroscopy (EDS) to validate the p-type conduction. XRD result shows that all the films have been preferentially oriented along (0 0 2) orientation. The decrease of full-width at half maximum (FWHM) with increase in GaP doping depicts the decrease in native donor defects. Hall measurement shows that among the three films, 2 and 4 mol% GaP doped ZnO shows p-conductivity due to the sufficient amount of phosphorous incorporation. It has been found that low resistivity (2.17 Ωcm) and high hole concentration (1.8×10¹⁸ cm⁻³) for 2% GaP codoped ZnO films due to best codoping. The red shift in near-band-edge (NBE) emission and donar-acceptor-pair (DAP) and neutral acceptor bound recombination (A°X) observed by room temperature and low temperature (10 K) PL, respectively, well acknowledged the formation of p-ZnO. The incorporated phosphorous in the film has been also confirmed by EDS analysis.     

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采用分子动力学方法模拟200eV的CH3粒子轰击到不同基底温度的钨样品上,分析了C、H原子在钨表面的沉积、散射及溅射情况,结果表明C、H原子的沉降量均随入射剂量的增加而增加。在基底温度为100K时,相同入射剂量下沉积的C原子最多,而当基底温度为1200K,在入射剂量大于1.5X1016cm-2时,C原子的沉降量小于其它基底温度下的C的沉降量。CH3在轰击样品时发生了分解,各种分解情况随基底温度变化较小,其中不同基底温度下一级分解率在40%上下波动,二级分解在23%左右,而完全分解的CH3在9%左右。C、H原子的散射角主要分布在5°~85°间,散射C原子分布的最大值分布在40%~50°或50°~60°间,散射C原子分布的最小值分布在0°~10°或80°~90°间;而不同基底温度下散射H原子分布的最大值均在40°~50°间,最小值均在0°~10°间。散射C原子的能量在0~140eV之间,散射能量为0~120eV的C原子占散射总量的98%以上,散射C原子平均能量随基底温度的增加而增加,其变化从65.5eV增加到68.5eV;散射H原子的能量也在0~140eV之间,但大约70%的散射H原子能量在40eV以内,散射平均能量随基底温度的增加而减小,其变化从13.92eV减小到13.05eV。     

Enhanced exchange bias in magnetron-sputtered Ni–Mn–Sb–Al ferromagnetic shape memory alloy thin films

In the present study, the influence of aluminium (Al) addition on the martensite-austenite phase transformation and exchange bias of Ni–Mn–Sb films have been investigated. Ni–Mn–Sb–Al films with different Al concentration (∼0–5.6%) were deposited by co-sputtering of Ni–Mn–Sb and Al targets. Experimental results revealed the decrease in martensitic transformation temperature with increasing Al content upto a certain extent (3.3%) beyond which martensitic transformation was suppressed. Paramagnetic to ferromagnetic transition temperature (T_C) also decreased with increasing Al concentration. Ni₅₀Mn_36.3Sb_10.4Al_3.3 thin film showed significant improvement in exchange bias field as compared to pure Ni_50.3Mn_36.9Sb_12.8 thin film. This enhancement in the exchange bias field H_EB = 611 Oe at 10 K is attributed to the increase of AFM-FM interactions that result from the decrease of Mn–Mn distance due to the incorporation of Al atoms. This behaviour is an additional property of the FSMA thin films apart from various other multifunctional properties and therefore, is of technological importance for their applications in magnetic storage devices.