改进布里奇曼法生长HgCdTe晶体的生长速度对固液界面形态的影响

为选择合理的晶体生长速度,在用改进Bridgman法生长直径为φ19mm的HgCdTe(x=0.21)晶体过程中,对正在生长的单晶体及熔体进行淬火,以观察其固液界面形态.初步的实验结果表明:在2mm/d及9mm/d的两种生长速度条件下,石英安瓶中的固液界面形态均为凹形抛物面,但其凹陷深度分别为10mm和14mm.较低的晶体生长速度条件下,凹陷深度较小,固液界面形态较平.由实验和讨论得知,宜选择较低的晶体生长速度用改进Bridgman法生长HgCdTe晶体.     

二元半导体合金垂直Bridgman晶体生长的热质对流Ⅱ-三段热管炉

以GeSi半导体合金为例,采用准稳态模型数值研究了垂直Bridgman三段热管炉中二元合金单晶生长过程中的热质对流现象.在原型炉计算结果的基础上,考虑坩埚传热效应对晶体生长过程的影响,分析了热质耦合、合金热物性和拉晶速度对热质对流和径向溶质分凝的影响规律.计算结果表明,在垂直Bridgman三段热管炉装置中熔体出现两个上、下对称分布的对流结构,对流驱动力分别是热边界条件不连续性和热物性不匹配引起的径向温度梯度;对于溶质稳定分布的GeSi合金系统,只有当溶质瑞利数与热瑞利数大小相近时,溶质分布才会对热质对流产生明显的抑制;在本文的计算范围内,拉晶速度对晶体生长过程中的流动没有明显影响,但对溶质分布影响明显.     

GdCOB晶体的坩埚下降法生长

本文报道了非线性光学晶体Ca4GdO(BO3)3(GdCOB)的垂直Bridgman法生长.已获得直径25mm的高质量单晶.生长界面处的纵向温度梯度维持在30～40℃/cm,生长速度0.2～0.8mm/h.GdCOB晶体为二维成核的层状生长机制,易出现(111)及(20)解理面.讨论了影响生长的因素.保证原料配比准确和混料充分,减小温度波动和测温误差等是成功生长GdCOB晶体的重要因素.     

多孔坩埚制备高质量氟化物晶体

采用改进的Bridgman法及独特设计的多孔石墨坩埚批量生长出了高质量的氟化物晶体,通过该方法可以制备出不同尺寸、不同形状的各类氟化物晶体.与传统单孔坩埚相比,可以有效提高氟化物晶体的成品率,降低生产成本.     

碘化铅(PbI2)单晶体的生长研究

本文以高纯Pb、I2单质为原料,在特殊设计的密闭石英安瓿中,采用两温区气相输运方法成功合成出PbI2多晶原料,避免了安瓿的爆炸.以此为原料,用垂直Bridgman法生长出尺寸为φ15mm×30mm的PbI2单晶锭.该晶锭外观完整、呈橙黄色、半透明状,其电阻率为1010Ω·cm量级,X射线衍射分析获得了(001)面的四级衍射谱,表明该晶体是结构完整的单晶体,可用于探测器的制作.     

Bridgman法晶体生长技术的研究进展

本文首先分析了Bridgman法晶体生长的工作原理,以及生长速率和温度场控制方法。其次从单晶的获得,结晶界面的宏观形貌和微观形貌形成原理的角度讨论了Bridgman法晶体生长过程结晶组织控制的原理。进而分析了Bridgman法晶体生长过程中结晶界面上的溶质分凝及其再分配行为,由此获得了晶体中的成分偏析规律。最后,介绍了近年来Bridgman晶体生长过程控制技术的研究进展,包括强制对流控制技术,电磁控制技术,重力场控制技术及其高压Bridgman法等。     

环境条件对Bridgman法晶体生长过程的影响

本文对不同环境条件时Bridgman法晶体生长过程进行计算,并对不同条件对生长过程的影响加以讨论.较大的温度梯度、较大的换热系数和适量的底部冷却是Bridgman法晶体生长的必备条件,也是工艺优化的重要方向.     

Pb-I系统的相变分析与PbI2晶体生长

对Pb-I系统L2+L3相的分层熔体在结晶过程中发生的相变进行了研究.结果表明,在富Pb配料的PbI2熔体凝固过程中,PbI2晶粒的析出和富余Pb的沉积是各相间的动态交换,结晶后富余的Pb将以单质的形式凝固于单相PbI2晶体底部.据此,设计出特殊结构的石英生长安瓿,采用垂直Bridgman法生长出尺寸为10 mm×20 mm、完整性好的PbI2晶体.XRD分析结果表明该晶体为2H结构,P3ml空间群,EDX分析结果表明沉积于籽晶袋球泡中的Pb含量为100 at;,晶体生长实验的结果与Pb-I系统的相变分析一致.     

中红外非线性光学晶体CdSiP2的合成与生长

本文以P,Si,Cd为原料采用双温区法合成出140 g的高纯CdSiP2多晶料锭,分别采用自发形核和施加籽晶的垂直Bridgman法生长出φ12 mm×40 mm和φ15 mm×50 mm优质CdSiP单晶体.所生长的晶体中无宏观散射颗粒,(004)面的单晶摇摆曲线的半峰宽为40".透过光谱表明CdSiP2晶体在2～6.5tμm的透过率达到57;,接近其理论最大值.辉光放电质谱检测到晶体中含有少量的Fe、Cr、Mn、Ti等过渡金属.电子顺磁共振波谱检测到Fe+和Mn2的存在,这些杂质可能会引起晶体在近红外波段的光学吸收.     

垂直式MOCVD反应器中热泳力对浓度分布的影响分析

从分子动力学理论出发,推导出垂直式MOCVD反应器中热泳力和热泳速度与温度、温度梯度、压强、粒子直径的关系式,以及热泳速度与扩散速度、动量速度平衡时的关系式.在典型的生长条件下,计算得到在温度T=605K时,热泳速度与扩散速度、动量速度动量平衡,TMGa浓度达到最大.然后在不考虑化学反应和考虑化学反应两种情况下,针对垂直式MOCVD反应器内的热泳力对粒子浓度分布和沉积的影响进行数值模拟,模拟给出反应粒子在反应器不同进口温度、衬底温度时的温度分布、浓度分布和反应速率.并与文献中的实验值进行对比,模拟结果与实验值有很好的吻合.     

近化学计量比铌酸锂晶体组分过冷与临界生长速率研究

本文在用双坩埚提拉法生长近化学计量比LiNbO3晶体的过程中观察到了组分过冷的实验数据,同时根据Tiller-Chalmers稳定性判据公式半定量计算了近化学计量比LiNbO3晶体临界生长速率的理论值,得到一般电阻加热双坩埚提拉法生长近化学计量比LiNbO3晶体的临界生长速率为0.1mm/h数量级.通过临界生长速率解释了一系列晶体生长的实验结果.提出了一些工艺措施来避免组分过冷,根据这些工艺获得了无包裹体的近化学计量比LiNbO3晶体.     

Growth rate of CdS by vapor transport in a closed ampoule

Vapor transport of CdS in a closed ampoule due to a temperature gradient was investigated. Comparisons between the theoretical and experimental growth rate for the following conditions were made: (1) with and without the presence of Ar gas, (2) convective contribution to the growth rate in the vertical and horizontal configurations, and (3) the effect of starting material composition on the growth rate. It was found that Cd reacts with fused silica ampoules and causes the contamination of CdS samples.     

The kinetics of parasitic growth in GaAs MOVPE

Gallium arsenide (GaAs) deposition was carried out in a horizontal quartz reactor tube with trimethylgallium (TMGa) and arsine (AsH₃) as precursors, using a hydrogen (H₂) carrier gas. Temperatures were in the range 400–500 °C, where surface reactions limit deposition rate. Nucleation time and deposition rate were monitored using laser interferometry, optimum reflectance was gained by aligning a quartz wafer to back reflect the incident beam. The 980 nm infrared laser beam was sufficiently long in wavelength to be able to penetrate the wall deposit. Results showing the effect of temperature and V/III ratio on the nucleation time and deposition rate are presented, where with temperature the nucleation delay was observed to reduce and the growth rate to increase. The nucleation delay is consistent with a thermally activated surface nucleation for the parasitic GaAs. A theoretical growth rate model, based on a restricted set of reaction steps was used to compare with the experimental growth rates. Without any free parameters, the growth rates from theoretical calculation and experiment agreed within a factor of two and showed the same trends with V/III ratio and temperature. The non-linearity of the theoretical growth rates on an Arrhenius plot indicates that there is more than one dominant reaction step over the temperature range investigated. The range of experimental activation energies, calculated from Arrhenius plots, was 17.56–23.59 kJ mol⁻¹. A comparison of these activation energies and minimum deposition temperature with the literature indicates that the wall temperature measurement on an Aixtron reactor is over 100 °C higher than previously reported.     

Y2O3掺杂ZrO2配合物的分子结构和光谱特性的理论研究

本文应用密度泛函理论指导人们深入理解氧化锆溶胶中分子的结构和光谱性能,探讨了溶胶中锆配合物的结构参数、光谱特性和原子的Mulliken 电荷布局. 理论结果表明掺杂引起粒径尺寸减少是由于掺杂引起氧桥聚合速度减慢和颗粒间吸引力的减弱.此外,振动光谱分析表明锆配位前驱体的有序化和第二相掺杂剂的引入明显减少了单斜氧化锆的特征光谱.理论分析结果很好地符合了实验结果.     

The effect of mass transfer on the temperature gradient of a crystal growing from melt

The change in the temperature gradient on the crystal side while the rate of crystal growth from melt is varied has long been debated. Abe and Takahashi have recently reported an unambiguous experimental demonstration that the temperature gradient is a decreasing function of the growth rate, which is different from previous theories, experimental results, and widely held notion of other researchers. The present paper provides a theoretical basis for this seemingly peculiar effect of the growth rate on the temperature gradient. The essential matter is the effect of mass transfer, the role of which had been commonly disregarded in old studies. Although the rate of mass transfer is not large compared to that of heat conduction, it is proven that the temperature gradient is subjected to the mass transfer in a definite manner. Our analysis shows that the effect becomes significant when the crystal diameter is large, which is consistent with the experimental observation. Another effect of the mass transfer is the change in the shape of melt/crystal interface. In old studies, the temperature gradient was determined by Stefan's equation; however, this treatment confuses the cause and effect. The temperature gradient should be determined by the fundamental equation of heat conduction. When the gradient is determined in this way, the shape of the melt/crystal interface spontaneously adjusts to satisfy Stefan's equation.     

大尺寸HVPE反应器寄生沉积的数值模拟研究

在氢化物气相外延(HVPE)生长GaN厚膜中,反应腔壁面总会产生大量的寄生沉积,严重影响薄膜生长速率及质量.本文针对自制的大尺寸垂直式HVPE反应器,通过数值模拟与实验对比,研究了反应腔壁面沉积以及GaN生长速率的分布规律,特别是寄生沉积分布与载气流量的关系.研究发现:在基准条件下,顶壁寄生沉积速率由中心向边缘逐渐降低,与实验结果吻合;侧壁沉积出现8个高寄生沉积区域,对应喷头边缘处排布的GaCl管,说明沉积主要取决于GaCl的浓度输运;模拟得出的石墨托表面生长速率低于实验速率,但趋势一致.保持其他条件不变,增大NH3管载气N2流量,顶壁和侧壁的寄生沉积速率及分布区域均随之增大,石墨托表面生长速率随之减小而均匀性却随之提高;增大GaCl管载气N2流量,顶壁和侧壁的寄生沉积速率及分布区域均随之减小,石墨托表面生长速率随之增大而均匀性却随之降低.研究结果为大尺寸HVPE反应器生长GaN的工艺优化提供了理论依据.     

A theoretical treatment of GaAs growth by vapour phase transport for {001} orientation

The normal growth rate of a {001} face has been theoretically studied; by considering either direct fixation of gallium arsenide molecules, or formation of intermediate surface compounds. From the theory of rate processes, it appears that experimental results can be interpreted by considering the reactions of desorption of the chlorine atoms adsorbed on surface as limiting the growth. A theoretical expression of the normal growth rate based on desorption by hydrogen has been performed. The descending portions of the curves with decreasing substrate temperature or increasing partial pressure of gallium monochloride, appear as due to an increasing coverage of surface with gallium monochloride molecules. Absolute theoretical values agree with experimental published measures, except for the weakest substrate temperatures. This disagreement may be due to the possibility of desorption of two chlorine atoms by gallium monochloride and formation of gallium trichloride molecules.     

The effect of crystal surface roughness on impurity adsorption

The effect of crystal surface roughness on impurity adsorption was investigated in a fluidized bed crystallizer and in a batch crystallizer. The crystallisation of sucrose in pure and impure systems was the study subject. Calcium chloride was utilized as impurity in this work. The results show that the impurity adsorption is growth rate dependent and is strongly influenced by the crystal surface properties. Crystals with high surface roughness have lower impurity adsorption. Based on experimental evidences, a new theoretical model is proposed to quantify the surface roughness influence on the impurity adsorption, allowing, by operating at the more adequate supersaturation, to control the impurity transfer into crystals. The used impurity does not have a significant influence on the growth rates at the studied temperatures. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Analysis and calculation of the formation of grown-in microdefects in dislocation-free silicon single crystals

The physical model of the formation of grown-in microdefects in dislocation-free Si single crystals has been analyzed. The mathematical models used to describe the processes of defect formation in crystals during their growth are proven to be adequate to the physical model. A technique is proposed to determine and calculate the defect structure in dependence of the crystal growth conditions (growth technique, growth rate, temperature gradients, cooling rate). It is shown that the theoretical study of the real crystal structure in the dependence of the thermal growth conditions using an original virtual technique for analyzing and calculating the formation of grown-in microdefects is a new experimental technique.     

The role of stress development and relaxation on crystal growth in glass

The role of internal stresses energy is usually neglected when crystallization kinetics is considered. The common argument is that stress is relaxing too fast to affect the process. In this article we develop a generalized formalism to describe steady-state growth kinetics in viscoelastic media. The residual stress energy results from interplay between the rate of stress development (due to the propagation of a crystal throughout the matrix) and rate of stress dissipation (due to relaxation of the viscous matrix). The degree to which the stress energy can relax depends on the ratio of τ_c/τ_r the characteristic time for crystal growth, τ_c, and the relaxation time, τ_r. The present results challenge the widespread fallacy that internal stresses relax too fast to affect crystal growth. Our model explains the often observed lack of agreement between the theoretical predictions (without taking into account the stresses energy development) and experimental data.