硅掺杂氧化锡柔性薄膜晶体管的制备与特性

研究了柔性非晶硅掺杂氧化锡（SiSnO,STO）薄膜晶体管的电学特性及其在弯曲状态下的电学特性。通过射频磁控溅射在聚酰亚胺（Polyimide,PI）衬底上制备出了柔性非晶硅掺杂氧化锡薄膜晶体管。通过对比不同退火温度的器件性能,发现在300℃能获得最佳器件性能,其饱和迁移率达到2.71 cm²·V^-1·s^-1,开关比高于10⁶,亚阈值摆幅为1.95 V·dec^-1,阈值电压为2.42 V。对器件在不同曲率半径（5,10,20,30 mm）状态下进行输出特性和转移特性测试,发现其在弯曲状态下仍具有良好的电学性能。     

基于Au/TiO_2/FTO结构忆阻器的开关特性与机理研究

采用简单的一步水热法在FTO导电玻璃上外延生长了锐钛矿TiO_2纳米线,制备了具有Au/TiO_2/FTO器件结构的锐钛矿TiO_2纳米线忆阻器,系统研究了器件的阻变开关特性和开关机理.结果表明,Au/TiO_2/FTO忆阻器具有非易失的双极性阻变开关特性.同时,在103s的时间内,器件在0.1 V的电阻开关比始终保持在20以上,表明器件具有良好的非易失性.此外,器件在低阻态时遵循欧姆导电特性,而在高阻态时则满足陷阱控制的空间电荷限制电流传导机制,同时提出了基于氧空位导电细丝形成与断开机制的阻变开关模型.研究结果表明Au/TiO_2/FTO忆阻器将是一种很有发展潜力的下一代非易失性存储器.     

悬空氧化铟纳米线晶体管制备与光电性能表征

一维(1D)半导体纳米线在纳米电子学和纳米光子学中表现出色。然而,纳米线晶体管的电特性对纳米线与衬底之间的相互作用非常敏感,而优化器件结构可以改善纳米线晶体管的电学和光电检测性能。本文报道了通过一步式光刻技术制造的悬浮式In₂O₃纳米线晶体管,显示出54.6 cm²V^?1s^?1的高迁移率和241.5 mVdec^?1的低亚阈值摆幅。作为紫外光电探测器,光电晶体管显示出极低的暗电流(~10?13 A)和高响应度1.6×10⁵ A?W^?1。悬浮晶体管的沟道材料的这种简单而有效的制备方法可广泛用于制造高性能微纳米器件。     

High-performance artificial neurons based on Ag/MXene/GST/Pt threshold switching memristors

Threshold switching (TS) memristors can be used as artificial neurons in neuromorphic systems due to their continuous conductance modulation, scalable and energy-efficient properties. In this paper, we propose a low power artificial neuron based on the Ag/MXene/GST/Pt device with excellent TS characteristics, including a low set voltage (0.38 V) and current (200 nA), an extremely steep slope (< 0.1 mV/dec), and a relatively large off/on ratio (> 10³). Besides, the characteristics of integrate and fire neurons that are indispensable for spiking neural networks have been experimentally demonstrated. Finally, its memristive mechanism is interpreted through the first-principles calculation depending on the electrochemical metallization effect.     

非线性一维光子晶体波导光双稳

利用非线性折射率系数较大且非线性时间响应较快的CdS_xSe_1-x玻璃为材料,设计并制备了非线性一维光子晶体波导光双稳器件,该器件的折射率空间分布呈正弦形式。实验测得双稳开关的阈值功率密度为1.60×10⁵W/cm²,开关时间为63ps。采用时域有限差分方法讨论了光子晶体带隙随入射光强变化而移动的情况,随着入射光功率密度的增加,光子晶体的带隙中心向短波方向移动。同时计算了该器件的双稳特性,理论计算得到双稳开关的阈值功率密度为1.40×10⁵W/cm²,开关时间约为50ps。获得了理论与实验基本一致的结果。     

A mathematical analysis: From memristor to fracmemristor

The memristor is also a basic electronic component, just like resistors, capacitors and inductors. It is a nonlinear device with memory characteristics. In 2008, with HP's announcement of the discovery of the TiO₂ memristor, the new memristor system, memory capacitor (memcapacitor) and memory inductor (meminductor) were derived. Fractional-order calculus has the characteristics of non-locality, weak singularity and long term memory which traditional integer-order calculus does not have, and can accurately portray or model real-world problems better than the classic integer-order calculus. In recent years, researchers have extended the modeling method of memristor by fractional calculus, and proposed the fractional-order memristor, but its concept is not unified. This paper reviews the existing memristive elements, including integer-order memristor systems and fractional-order memristor systems. We analyze their similarities and differences, give the derivation process, circuit schematic diagrams, and an outlook on the development direction of fractional-order memristive elements.     

Fabrication of printed memory device having zinc-oxide active nano-layer and investigation of resistive switching

An all printed resistive memory device, a 9-bit memristor, has been presented in this study consisting of 3 × 3 memristor crossbars deposited via electrohydrodynamic inkjet printing process at room conditions. Transparent zinc oxide active nano-layers, directly deposited by electrospray process, are sandwiched between the crossbars to complete the metal–insulator metal structure consisting of copper–zinc oxide–silver, where Cu and Ag are used as bottom and top electrodes respectively. The 9-bit memristor device has been characterized using current–voltage measurements to investigate the resistive switching phenomenon thereby confirming the memristive pinched hysteresis behavior signifying the read–write and memory characteristics. The memristor device showed a current bistability due to the existence of metal–oxide layer which gives rise to oxygen vacancies upon receiving the positive voltage hence breaking down into doped and un-doped regions and a charge transfer takes place. The maximum ON/OFF ratio of the current bi-stability for the fabricated memristor was as large as 1 × 10³, and the endurance of ON/OFF switchings was verified for 500 read–write cycles. The metal–insulator–metal structure has been characterized using X-ray diffraction, X-ray photoelectron spectroscopy and scanning electron microscope techniques.     

基于垂直晶体管结构的低电压并五苯光电探测器

并五苯(Pentacene)具有优良的场效应晶体管特性及在可见光区的高吸收系数, 被广泛应用于光敏(电)晶体管中. 垂直晶体管的沟道长度可做到纳米量级, 能有效提高器件的性能和工作频率, 同时降低能耗. 本文制备了一种基于垂直晶体管结构的低电压并五苯光电探测器ITO(S)/Pentacene/Al(G)/Pentacene/Au(D). 实验发现, 在工作电压低至-3 V时, 并五苯光电探测器ITO/Pentacene (80 nm)/Al(15 nm)/ Pentacene(80 nm)/Au 的阈值电压为-0.9 V, “开/关”电流比为10⁴, 表现出了良好的P型晶体管特性以及低电压调控性能. 在350-750 nm的不同波长单色光照射下, 器件的“明/暗”电流比和响应度随入射波长而变化; 在350 nm单色光照射下, 该光电探测器的“明/暗”电流比的最大值达到308, 其对应的响应度为219 mA·W^-1, 大于标准硅基探测器在350 nm 单色光照射下的探测率. 这为制备低电压下工作的高灵敏度全有机光电探测器提供了一种可行的方法.     

基于石墨烯-钙钛矿量子点场效应晶体管的光电探测器

以等离子增强化学气相沉积法制备的石墨烯作为导电沟道材料,将其与无机CsPbI_3钙钛矿量子点结合,设计并制备了石墨烯-钙钛矿量子点场效应晶体管光电探测器.研究和分析了石墨烯作为场效应晶体管的电学特性及其与钙钛矿量子点结合作为光电探测器的光电特性.结果表明,石墨烯在场效应晶体管中表现出良好的电学性质,其与钙钛矿量子点的结合对波长为400 nm的光辐射具有明显的光响应,在光强为12μW时器件光生电流最大为64μA,响应率达6.4 A·W~(-1),对应的光电导增益和探测率分别为3.7×10~4,6×10~7Jones(1 Jones=1 cm·Hz~(1/2)·W~(-1)).     

Localized electric-field-enhanced low-light detection by a 2D SnS visible-light photodetector

Due to their excellent carrier mobility, high absorption coefficient and narrow bandgap, most 2 D IVA metal chalcogenide semiconductors(GIVMCs, metal = Ge, Sn, Pb;chalcogen = S, Se) are regarded as promising candidates for realizing high-performance photodetectors. We synthesized high-quality two-dimensional(2 D) tin sulfide(Sn S) nanosheets using the physical vapor deposition(PVD) method and fabricated a 2 D Sn S visible-light photodetector. The photodetector exhibits a high photoresponsivity of 161 A·W~(-1) and possesses an external quantum efficiency of 4.45 × 10~4%, as well as a detectivity of 1.15 × 10~9 Jones under 450 nm blue light illumination. Moreover, under poor illumination at optical densities down to 2 m W·cm~(-2), the responsivity of the device is higher than that at stronger optical densities. We suggest that a photogating effect in the 2 D Sn S photodetector is mainly responsible for its low-light responsivity. Defects and impurities in 2 D Sn S can trap carriers and form localized electric fields, which can delay the recombination process of electron-hole pairs,prolong carrier lifetimes, and thus improve the low-light responsivity. This work provides design strategies for detecting low levels of light using photodetectors made of 2 D materials.     

Photoresponse and trap characteristics of transparent AZO-gated AlGaN/GaN HEMT

AZO-gated and Ni/Au-gated AlGaN/GaN HEMTs are fabricated successfully,and an excellent transparency of AZOgated electrode is achieved.After a negative gate bias stress acts on two kinds of the devices,their photoresponse characteristics are investigated by using laser sources with different wavelengths.The effect of photoresponse on AZO-gated electrode device is more obvious than on Ni/Au-gated electrodes device.The electrons are trapped in the AlGaN barrier of AZO-gated HEMT after it has experienced negative gate bias stress,and then the electrons can be excited effectively after it has been illuminated by the light with certain wavelengths.Furthermore,the trap state density D_T and the time constantτ_T of the AZO-gated Schottky contact are extracted by fitting the measured parallel conductance in a frequency range from10 kHz to 10 MHz.The constants of the trap range from about 0.35 μs to 20.35 μs,and the trap state density increased from1.93×l0~(13)eV 1·cm~2 at an energy of 0.33 eV to 3.07×10~(11) eV~1·cm~2 at an energy of 0.40 eV.Moreover,the capacitance and conductance measurements are used to characterize the trapping effects under different illumination conditions in AZO-gated HEMTs.Reduced deep trap states' density is confirmed under the illumination of short wavelength light.     

玉米淀粉固态电解质质子\电子杂化突触晶体管

随绿色可持续发展观念的深入人心,研究人员致力于寻找天然有机材料应用于功能性电子器件.淀粉以其低廉的价格、丰富的来源和优异的机械性能进入了科研人员的视野.淀粉可由玉米、马铃薯、甘薯和葛根等含淀粉的物质中提取而得,一般不溶于水,在和水加热至一定温度时,则糊化成胶状溶液.本文通过旋涂法将玉米淀粉的胶状溶液旋涂至氧化铟锡玻璃表面,然后在30?C恒温环境中晾干制备成固态胶合状薄膜.以此薄膜作为固态电解质制备了氧化铟锌突触晶体管,并实现了生物神经突触的双脉冲易化、学习记忆能力、高通滤波等可塑性行为的仿真.本研究以玉米淀粉固态胶合薄膜作为电解质大大降低了氧化物薄膜晶体管固态电解质的成本,且该电解质无毒性、来源丰富,将为人工神经网络的开发提供一种可选择的元件.     

Effect of the adiabatic process on the absorption in heavy-ion scattering

We have succeeded in obtaining the optical model potential for ¹²C---¹²C scattering at low incident energies (10 MeV E_cm 20 MeV), by applying the adiabatic approximation to the coupled channels equation. As for this potential inelastic channels of single and mutual excitations of ¹²C^*(2⁺, 4.43 MeV) make a contribution to the real part and not to the imaginary part.     

Horizontal InAs nanowire transistors grown on patterned silicon-on-insulator substrate

High-density horizontal InAs nanowire transistors are fabricated on the interdigital silicon-on-insulator substrate. Hexagonal InAs nanowires are uniformly grown between face-to-face (111) vertical sidewalls of neighboring Si fingers by metal-organic chemical vapor deposition. The density of InAs nanowires is high up to 32 per group of silicon fingers, namely an average of 4 nanowires per micrometer. The electrical characteristics with a higher on/off current ratio of 2×10⁵ are obtained at room temperature. The silicon-based horizontal InAs nanowire transistors are very promising for future high-performance circuits.     

Synaptic behaviors and modeling of a metal oxide memristive device

Nanoscale memristive devices using tungsten oxide as the switching layer have been fabricated and characterized. The devices show the characteristics of a flux-controlled memristor such that the conductance change is governed by the history of the applied voltage signals, leading to synaptic behaviors including long-term potentiation and depression. The memristive behavior is attributed to the migration of oxygen vacancies upon bias which modulates the interplay between Schottky barrier emission and tunneling at the WO _X /electrode interface. A physical model incorporating ion drift and diffusion effects using an internal state variable representing the area of the conductive region has been proposed to explain the observed memristive behaviors. A SPICE model has been further developed that can be directly incorporated into existing circuit simulators. This type of device can be fabricated with low-temperature processes and has potential applications in synaptic computations and as analog circuit components.     

Thermally- or optically-biased memristive switching in two-terminal VO2 devices

We investigated thermally- or optically-biased memristive switching in two-terminal micro devices based on vanadium dioxide (VO₂) thin films. For the preparation of multi-level resistance switching, the device was kept at a specific temperature or an optical illumination power so that it fell into the thermal or optical hysteresis region of the device resistance during the switching. With the application of external current pulses, the device resistance decreased in a discrete manner showing multiple resistance levels, each of which was maintained as long as the temperature (or optical) bias excited the device. In particular, in the optically-biased case, the effect of the pulse-free interval between current pulses on the device resistance was also examined with respect to three intervals including 10, 15, and 30 s. It was observed that a longer pulse-free interval and higher optical bias reduced the rate of current-induced change in the device resistance. Finally, in order to explore a trend of grain resistance change in the VO₂-based device, we carefully suggested a grain network model explaining a percolative transition in inhomogeneous VO₂ film.     

Electronic transport properties of silicon junctionless nanowire transistors fabricated by femtosecond laser direct writing

Silicon junctionless nanowire transistor(JNT) is fabricated by femtosecond laser direct writing on a heavily n-doped SOI substrate.The performances of the transistor,i.e.,current drive,threshold voltage,subthreshold swing(SS),and electron mobility are evaluated.The device shows good gate control ability and low-temperature instability in a temperature range from 10 K to 300 K.The drain currents increasing by steps with the gate voltage are clearly observed from 10 K to50 K,which is attributed to the electron transport through one-dimensional(1D) subbands formed in the nanowire.Besides,the device exhibits a better low-field electron mobility of 290 cm~2·V~(-1)·s~(-1),implying that the silicon nanowires fabricated by femtosecond laser have good electrical properties.This approach provides a potential application for nanoscale device patterning.     

DC and analog/RF performance of C-shaped pocket TFET (CSP-TFET) with fully overlapping gate

A C-shaped pocket tunnel field effect transistor (CSP-TFET) has been designed and optimized based on the traditional double-gate TFETs by introducing a C-shaped pocket region between the source and channel to improve the device performance. A gate-to-pocket overlapping structure is also examined in the proposed CSP-TFET to enhance the gate controllability. The effects of the pocket length, pocket doping concentration and gate-to-pocket overlapping structure on the DC and analog/RF characteristics of the CSP-TFET are estimated after calibrating the tunneling model in double-gate TFETs. The DC and analog/RF performance such as on-state current (I_on), on/off current ratio (I_on/I_off), subthreshold swing (SS) transconductance (g_m), cut-off frequency (f_T) and gain-bandwidth product (GBP) are investigated. The optimized CSPTFET device exhibits excellent performance with high I_on (9.98×10 ^{- 4} A/μm), high I_on/I_off (～ 10¹¹), as well as low SS (～ 12 mV/dec). The results reveal that the CSP-TFET device could be a potential alternative for the next generation of semiconductor devices.     

忆阻突触耦合环形Hopfield神经网络动力学分析及其电路实现

提出一种新型忆阻器模型, 利用标准非线性理论分析三个忆阻特性, 并设计模拟电路。基于忆阻突触, 构建一个忆阻突触耦合环形Hopfield神经网络模型。采用分岔图、李雅普诺夫指数谱、时序图等方法, 揭示与忆阻突触密切相关的特殊动力学行为。数值仿真表明: 在忆阻突触权重的影响下, 它能够产生多种对称簇发放电模式和复杂的混沌行为。实现了该忆阻环形神经网络的模拟等效电路, 并由PSIM电路仿真验证MATLAB数值仿真的正确性。     

Proton radiation effect on GaAs/AlGaAs core–shell ensemble nanowires photo-detector

We demonstrate that the GaAs/AlGaAs nanowires(NWs) ensemble is fabricated into photo-detectors. Current–voltage(I–V) characteristics are measured on Ga As/Al Ga As core–shell ensemble NW photo-detectors at room-temperature before and after 1-MeV proton irradiation with fluences from 1.0 × 10~(13) cm~(-2) to 5.0 × 10~(14) cm~(-2). The degradation of photocurrent suggests that the point defects induced by proton radiation could cause both carrier lifetime and carrier mobility to decrease synchronously. Comparing with a GaAs quantum well, the degradations of light and dark current for the irradiated NWs photo-detector indicate that NWs material is a preferable potential candidate for space applications.