渐变耦合脊波导晶体管探测器光响应分析

为提高InP基光探测器的吸收效率和工作速度,设计了一种渐变耦合脊波导单载流子传输异质结光敏晶体管探测器。采用有效折射率法和光束传播法,分析渐变耦合脊波导的光传输模式,优化后波导宽度和波导长度分别为2.6μm和250μm,可实现单模传输和高的光吸收效率。由于渐变耦合脊波导单载流子传输异质结光敏晶体管光传输方向与载流子运动方向垂直,分别优化光敏晶体管的吸收效率和速度,器件输出光电流和特征频率均得到改善。渐变耦合脊波导单载流子传输异质结光敏晶体管的响应度为33.83A/W,饱和输出光电流为90mA,最高特征频率达到87GHz,其饱和输出电流和特征频率相比于台面单载流子传输异质结光敏晶体管分别提高了20%和24%。但渐变耦合脊波导单载流子传输异质结光敏晶体管吸收体积大,获得饱和电流时的光功率也比较大,因此渐变耦合脊波导单载流子传输异质结光敏晶体管的响应度略小于台面的单载流子传输异质结光敏晶体管的响应度。     

基于并五苯/酞菁铅异质结的近红外光敏有机场效应管(英文)

采用并五苯(Pentacene)和酞菁铅(PbPc)两种有机材料作为有源层,制备了异质结有机光敏场效应管。在波长为808 nm、强度为124 mW/cm2的近红外光照条件下,异质结phOFET获得最大的光暗电流比达4.4×104,栅压为-50 V时的最大光响应度为118 mA/W,比单层酞菁铅phOFET分别高出766倍和785倍。在经过120 h后,器件的最大光暗电流比和最大光响应度分别稳定于5.4×104和326 mA/W附近。由于在异质结phOFET中采用了对近红外光具有高吸收效率的酞菁铅作为光敏层,而高空穴迁移率的并五苯材料作为靠近栅介质的沟道层,光生载流子的产生与传输能力得到了有效的提高。实验结果表明,基于并五苯/酞菁铅的有机异质结应用于光敏有机场效应管的结构设计中,可以使phOFET成为一种同时具有良好光敏性及稳定性的近红外光探测器件。     

单载流子传输光敏晶体管小信号等效电路模型的建立与分析

建立了单载流子传输双异质结光敏晶体管的小信号等效电路模型.分析了单载流子传输双异质结光敏晶体管光生电流的产生机制,并将其作为基极电流的一部分,引入到小信号等效电路中.分析了单载流子传输双异质结光敏晶体管中单载流子传输的输运方式对光跨导、发射结电阻、发射结结电容和集电结结电容的影响.基于所建模型,研究了InP基单载流子传输双异质结光敏晶体管的光特征频率和光电流增益受光窗口面积和入射光功率的影响.结果表明,在同样入射光功率下,存在一个最佳的光窗口面积使得光特征频率获得最大值,最佳光窗口面积随入射光功率的增加在一定面积范围内发生偏移.在固定光窗口面积(8×8μm2)条件下,随着输入光功率的增加,光特征频率先增大后减小,在280μW时达到最高值150GHz,光短路电流增益也随着光功率的增加而逐渐增加,在入射光功率750μW时达到饱和,饱和增益为82dB.     

基于聚合物共混的有机场效应晶体管光电性能研究

采用聚合物共混的方法制备了体异质结薄膜,将其作为光敏半导体层制备了有机场效应光晶体管.利用原子力显微镜表征了共混薄膜的分相情况,探究了器件提高激子解离效率的机理,并对比了聚合物共混前后有机场效应晶体管的光电性能变化和相分离情况.结果表明：制备的聚合物共混光晶体管在微弱光线条件下(0.038 mW/cm²,808 nm)具有较高的光敏性(为10⁶).通过共混聚合物半导体材料制备体异质结薄膜可以有效地提高激子解离的效率,通过双层绝缘层能进一步降低光晶体管的暗电流,从而提高器件的光敏性.     

异质结界面电荷对突变InP/InGaAs异质结双极晶体管热场发射影响研究

异质结界面电荷的存在改变了异质结的内建势, 这引起了界面势垒尖峰高度和形状的扰动, 从而使异质结界面载流子的输运产生相应的变化, 最终导致异质结双极晶体管 (HBT) 性能的改变. 基于热场发射-扩散模型, 对异质结界面电荷对InP/InGaAs HBT性能的改变做了研究, 得到结论是正极性的界面电荷有利于InP/InGaAs HBT的直流和高频特性的改善, 而负极性的界面电荷则使器件的直流和高频特性变差. 关键词： InP/InGaAs异质结双极晶体管 界面电荷 内建势 热场发射     

HgCdTe异质结接点光导体

本文描述了异质结接点的新型光电导体器件结构,这种结构在普通带隙的光导体与金属接点之间接合了一个较高带隙的HgCdTe合金。异质结接点光导体器件的理论分析证明能有效地消除载流子清扫效应;根据计算结果断定,由于消除了响应度的“饱和”效应,故可以大大增加响应度。现已制成了异质结接点器件,用几种方法实验,结果验证了这种理论,在80K时,测得的响应度在30V/cm时约为45×10~4V/W,在125V/cm时超过15×10~5V/W。     

基于PTCDA的有机/无机光敏二极管结构优化

以p型硅和苝四甲酸二酐(perylene-3,4,9,10-tetracarboxylic acid dianhydride,PTCDA)为异质结,梳状金(Au)薄膜作为顶电极和光入射窗口制备了光敏二极管。研究表明,PTCDA的厚度和Au电极的厚度对光敏二极管的光响应度有很大的影响。对比不同PTCDA厚度的器件性能,在PTCDA厚度为100 nm时,光响应度最高达到0.3 A/W。进而采用最优化的100 nm厚的PTCDA薄膜制备硅基光敏二极管,对比不同Au电极厚度的器件性能。在Au厚度为20 nm时,器件的光响应度达到最优化的0.5 A/W。     

基于PTCDA的有机/无机光敏二极管结构优化

以p型硅和苝四甲酸二酐 （perylene-3,4,9,10-tetracarboxylic acid dianhydride,PTCDA）为异质结,梳状金（Au）薄膜作为顶电极和光入射窗口制备了光敏二极管。研究表明,PTCDA的厚度和Au电极的厚度对光敏二极管的光响应度有很大的影响。对比不同PTCDA厚度的器件性能,在PTCDA厚度为100 nm时,光响应度最高达到0.3 A/W。进而采用最优化的100 nm厚的PTCDA薄膜制备硅基光敏二极管,对比不同Au电极厚度的器件性能。在Au厚度为20 nm时,器件的光响应度达到最优化的0.5 A/W。     

新型双异质结高电子迁移率晶体管的电流崩塌效应研究

针对传统单结GaN基高电子迁移率晶体管器件性能受电流崩塌效应和自加热效应限制的困境,对新型A1GaN/GaN/InGaN/GaN双异质结高电子迁移率晶体管的直流性质展开了系统研究.采用基于热电子效应和自加热效应的流体动力模型,研究了器件在不同偏压下电流崩塌和负微分电导效应与GaN沟道层厚度的相关.研究发现具有高势垒双异质的沟道层能更好地将电子限制在沟道中,显著减小高电场下热电子从沟道层向GaN缓冲层的穿透能力.提高GaN沟道层厚度可以有效抑制电流崩塌和和负微分输出电导,进而提高器件在高场作用下的性能.所得结果为进一步优化双异质结高电子迁移率晶体管结构提供了新思路,可促进新型GaN高电子迁移率晶体管器件在高功率、高频和高温等无线通讯领域内的广泛应用.     

基于酞菁钯和C60的异质结有机光敏场效应管

采用酞菁钯(PdPc)和C60两种有机半导体材料,通过真空热蒸镀法以不同的沉积顺序制备了两种不同结构的平面异质结有机光敏场效应管,并对这两种结构器件的光敏特性进行比较。在波长655 nm、光强100mW/cm2的光照条件下,结构为n+-Si/SiO2/PdPc/C60/Al(S&D)(PdPc/C60-OFET)器件的最大光暗比为2×103,光响应度为3 mA/W;而结构为n+-Si/SiO2/C60/PdPc/Al(S&D)(C60/PdPc-OFET)器件的最大光暗比为3×103,光响应度为11mA/W。实验结果表明C60/PdPc-OFET可以获得更好的光敏特性。     

High-performance evanescently-coupled uni-traveling-carrier photodiodes

A new evanescently-coupled uni-traveling-carrier photodiode (EC-UTC PD) based on a multimode diluted waveguide (MDW) structure is fabricated, analysed and characterized. Optical and electrical characteristics of the device are investigated. The excellent characteristics are demonstrated such as a responsivity of 0.36~A/W, a bandwidth of 11.5~GHz and a small-signal 1-dB compression current greater than 18~mA at 10~GHz. The saturation current is significantly improved compared with those of similar evanescently-coupled pin photodiodes. The radio frequency (RF) bandwidth can be further improved by eliminating RF losses induced by the cables, the probe and the bias tee between the photodiode and the spectrum analyzer.     

Study on the saturation characteristics of high-speed uni-traveling-carrier photodiodes based on field screening analysis

A back-illuminated mesa-structure InGaAs/InP charge-compensated uni-traveling-carrier(UTC) photodiode(PD) is fabricated,and its saturation characteristics are investigated.The responsivity of the 40-μmdiameter PD is as high as 0.83 A/W,and the direct current(DC) saturation current is up to 275 mA.The 1-dB compression point at the 3-dB cutoff frequency of 9 GHz is measured to be 100 mA,corresponding to an output radio frequency(RF) power of up to 20.1 dBm.According to the calculated electric field distributions in the depleted region under both DC and alternating current(AC) conditions,the saturation of the UTC-PD is caused by complete field screening at high optical injection levels.     

High-sensitive phototransistor based on vertical HfSe2/MoS2 heterostructure with broad-spectral response

Van der Waals heterostructures based on the two-dimensional (2D) semiconductor materials have attracted increasing attention due to their attractive properties. In this work, we demonstrate a high-sensitive back-gated phototransistor based on the vertical HfSe₂/MoS₂ heterostructure with a broad-spectral response from near-ultraviolet to near-infrared and an efficient gate tunability for photoresponse. Under bias, the phototransistor exhibits high responsivity of up to 1.42×10³ A/W, and ultrahigh specific detectivity of up to 1.39×10¹⁵ cm·Hz^1/2·W^-1. Moreover, it can also operate under zero bias with remarkable responsivity of 10.2 A/W, relatively high specific detectivity of 1.43×10¹⁴ cm·Hz^1/2·W^-1, ultralow dark current of 1.22 fA, and high on/off ratio of above 10⁵. These results should be attributed to the fact that the vertical HfSe₂/MoS₂ heterostructure not only improves the broadband photoresponse of the phototransistor but also greatly enhances its sensitivity. Therefore, the heterostructure provides a promising candidate for next generation high performance phototransistors.     

Si1−xGex/Si multi-quantum well phototransistor for near-infrared operation

For the first time in the literature, we report the monolithic integration of SiGe near-infrared phototransistor and planar hetero-junction bipolar transistor (HBT). The phototransistor is made with SiGe/Si multi-quantum well structure (MQW_PHT). At room temperature, the MQW_PHT reveals an optical responsivity of 1904 mW/A at 0.85 μm and 1.25 mW/A at 1.3 μm under the reversed bias of V_CE=1.5 V. For electrical DC and microwave performance, the SiGe HBT has a current gain of 160 and a cut-off frequency (f_T) of 25 GHz, respectively.     

高速高饱和单行载流子光探测器的设计与分析

设计了一种In P基的背入射台面结构的单行载流子光探测器.通过在吸收层中采取高斯型掺杂界面及引入合适厚度和掺杂浓度的崖层,使得光探测器同时具备了高速和高饱和电流特性.理论分析表明,在光敏面为14μm2、反向偏压为2 V条件下,该器件的3 d B带宽可达58 GHz,直流饱和电流高达158 m A.在大功率光注入条件下,详细分析了光探测器带宽降低和电流饱和现象,得出能带偏移和电场坍塌是其根本原因的结论.     

悬空氧化铟纳米线晶体管制备与光电性能表征

一维(1D)半导体纳米线在纳米电子学和纳米光子学中表现出色。然而,纳米线晶体管的电特性对纳米线与衬底之间的相互作用非常敏感,而优化器件结构可以改善纳米线晶体管的电学和光电检测性能。本文报道了通过一步式光刻技术制造的悬浮式In₂O₃纳米线晶体管,显示出54.6 cm²V^?1s^?1的高迁移率和241.5 mVdec^?1的低亚阈值摆幅。作为紫外光电探测器,光电晶体管显示出极低的暗电流(~10?13 A)和高响应度1.6×10⁵ A?W^?1。悬浮晶体管的沟道材料的这种简单而有效的制备方法可广泛用于制造高性能微纳米器件。     

Ultrasensitive solar-blind ultraviolet detection and optoelectronic neuromorphic computing using α-In2Se3 phototransistors

Detection of solar-blind ultraviolet (SB-UV) light is important in applications like confidential communication, flame detection, and missile warning system. However, the existing SB-UV photodetectors still show low sensitivities. In this work, we demonstrate the extraordinary SB-UV detection performance of α-In₂Se₃ phototransistors. Benefiting from the coupled semiconductor and ferroelectricity property, the phototransistor has an ultraweak detectable power of 17.85 fW, an ultrahigh gain of 1.2 × 10⁶, a responsivity of 2.6 × 10⁵ A/W, a detectivity of 1.3 × 10¹⁶ Jones and an ultralow noise-equivalent-power of 4.2 × 10⁻²⁰ W/Hz^1/2 for 275 nm light. Its performance exceeds most other UV detectors, even including commercial photomultiplier tubes and avalanche photodiodes. It can be also implemented as an optoelectronic synapse for neuromorphic computing. A 784×300×10 artificial neural network (ANN) based on this optoelectronic synapse is constructed and demonstrated with a high recognition accuracy and good noise-tolerance for the Fashion-MNIST dataset. These extraordinary features endow this phototransistor with the potential for constructing advanced SB-UV detectors and intelligent hardware.     

Ultraviolet Phototransistors on AlGaN/GaN Heterostructures

We report on the fabrication and characterization of phototransistors based on AIGaN/GaN heterostructure grown over 6H-SiC substrates. The device has two functions： as a high electron mobility transistor （HEMT） and an ultraviolet photodetector at the same time. As an HEMT, its maximum transconductance is 170mS/ram, while the minimum cutoff frequency fT and the maximum oscillation frequency fm are 19 and 35 GHz, respectively. As a photodetector, the device is visible blind, with an ultraviolet/green contrast of three orders of magnitude, and a responsivity as high as 1700 A/W at the wavelength of 362nm.     

Optimization of the UTC-PD Epitaxy for Photomixing at 340?GHz

We present a method to optimize the epitaxial layer structure of an InGaAs/InP uni-traveling-carrier photo-diode (UTC-PD) for continuous THz-wave generation. The design approach used is general in that it can be applied for any target frequency while this study focuses on 340 GHz. The photodiode epitaxy is modeled and optimized using a TCAD software implementing the hydrodynamic semiconductor equations. This physical device model was found to be in good agreement with reported experimental results. It is shown that the UTC-PD can generate ~1 mW at 340 GHz by choosing the optimum absorption layer and collection layer thicknesses.     

基于VO2薄膜非致冷红外探测器光电响应研究

VO₂薄膜是非致冷微测辐射热红外探测器热敏电阻材料.研究中应用微电子工艺制备了VO₂溅射薄膜红外探测器,在296K的环境中测试了该探测器在不同的直流偏置、光调制频率下对873K标准黑体源8—12μm红外辐射的光电响应以及器件的噪声电压,在10和30Hz的调制频率下其响应率分别大于17kV/W和接近10kV/W.该探测器实现了探测率D大于1.0×10⁸cm (Hz)^1/2/W,热时间常量为0.011s的8—12μm非致冷 关键词： 非致冷测辐射热探测器 红外探测器 二氧化钒 薄膜