大气压低温氦等离子体射流的诊断研究

为了加快低温氦气等离子体射流的工程化进程,通过自主设计的同轴式介质阻挡放电等离子体射流发生器,在放电频率10 kHz,一个大气压条件下产生了稳定的氦气等离子体射流。通过分析不同工况下的电压电流波形可以发现单纯增加氦气体积流量只能小幅的增加电流脉冲幅值,而对放电时间、电流脉冲数的影响不大。增加放电峰值电压时电流脉冲幅值会得到较大幅度增加。通过发射光谱法对大气压氦气等离子射流的活性粒子种类、电子激发温度、电子密度进行了诊断。结果表明,大气压氦气等离子体射流中的主要活性粒子为He Ⅰ原子、N₂第二正带系、N+₂的第一负带系、羟基（OH）,H原子的巴尔末线系（H_α和H_β）与O原子,这表明虽然该试验中使用的氦气纯度已达99.99%,但其中仍残留有少量的空气,同时放电时大气中的空气会被卷吸到放电空间发生电离。还可以发现,主要活性粒子的相对光谱强度随氦气体积流量的增加及放电峰值电压的增大均呈现上涨的趋势。选用He Ⅰ原子的四条谱线对不同试验工况下的电子激发温度进行了计算,得到大气压氦气等离子体射流的电子激发温度在3 500~6 300 K之间,电子激发温度随放电峰值电压与氦气体积流量的增大总体上呈现上升的趋势。但由于反向电场的存在,某些峰值电压可能会出现电子激发温度下降的情况;根据Stark展宽原理对大气压氦气等离子体射流的电子密度进行了计算,发现电子密度的数量级可达1015 cm-3,同时增大峰值电压与氦气体积流量均可有效的提高射流中的电子密度。这些参数的研究对氦气等离子体射流在工程实际中的应用具有重要意义。     

脉冲驱动氩气真空介质阻挡放电的光谱特性研究

通过自主设计正极性Marx纳秒脉冲电源,在不同放电频率、不同电源电压幅值下,采用发射光谱在真空环境下对氩气放电时的电子激发温度和电子密度进行测量计算。通过双谱线法选取合适的Ar原子谱线,求得电子激发温度在1 550～3 400 K之间,在正极性脉冲电源做电压源,且电源电压一定时,电子激发温度随着电源频率的升高而呈现上升趋势,在电源频率一定时,电子激发温度也随着电源电压的增加而升高。依据Stark展宽原理对真空体积介质阻挡放电时的电子密度进行了测量计算。电子密度的数量级可达10¹³ m^-3,当电源电压不变时,电子密度随电源频率的增加呈现上升趋势,当电源频率不变,电子密度随着电源电压的升高也逐渐提升。     

双阳极霍尔推力器效率及推力的模拟研究

为确定双阳极霍尔推力器中阳极电压分布对推力器效率及推力的影响，采用PIC三维数值模拟对双阳极结构霍尔推力器的放电过程进行了模拟。基于垂直分布的双阳极结构，得到了放电后离子羽流分布以及电子在放电区域的分布。通过对放电状态的模拟，计算得到了不同工况下的推力以及效率。在双阳极结构中第二阳极的电压增加会增大离子能量，但将影响电子约束，而过高的电压将引起电子密度减小。推力随着霍尔电流的增大而增大，但效率会随之减小，导致在提升推力的同时损失效率。     

大气压射频氧气放电特性的数值模拟研究

基于漂移扩散近似,对大气压下氧气射频放电产生的等离子体建立了一维流体模型,包括了电子、正离子和负离子的连续性方程、电子能量方程及泊松方程。采用有限差分法对所建立的模型进行了自洽的数值模拟,得到了相应的数值结果。通过对所得数值结果的分析,研究了大气压下氧气放电的基本特性。研究表明,大气压氧气放电中等离子体密度可达到10¹²cm^-3 ,电子温度约在1.23eV,放电中主要的负离子是O^-离子;随着电压峰值的增加,电子密度、电子温度都增加,但n_O-/n_e 的比率先增加到7.5%又后减小到5%,在电压峰值为700V 时达到最大。     

介质阻挡放电等离子体中OH自由基的光腔衰荡光谱原位诊断

研制了一套等效噪声吸收可达3×10^-9cm^-1的连续波光腔衰荡光谱装置。用该装置对介质阻挡放电等离子体中的OH自由基和水进行了原位定量测量,考察了OH自由基数密度随气压和放电电压以及放电频率的变化情况。实验结果表明,在(2.13~22.0)Χ10³Pa范围内,随着气压增加,OH自由基数密度在气压较低时增加;而在较高气压时由于H₂O的解离吸附作用使得体系中电子密度减小,OH自由基数密度随之减小。随放电电压和放电频率增加介质阻挡放电等离子体中电子密度和电子能量增加而导致OH数密度增加。     

大气压下氩原子谱线辐射诊断试验研究

大气压下介质阻挡放电应用领域具有多范畴、深广度、常态化等优势,针对同轴电极放电试验进行了系列参数诊断。采用自主研发的介质阻挡放电助燃激励器,在一个标准大气压、放电频率11.4 kHz、放电峰值电压5.4～13.4 kV(间隔1.0 kV)条件下进行了氩气电离试验。采用原子发射光谱法(AES)对氩等离子体谱线的激发、分光进行了检测分析;选用二谱线法及Boltzmann法测试了电子激励温度;根据Stark展宽效应计算了电子密度;获得了电子激励温度及电子密度随放电峰值电压增长的变化规律。结果表明,在试验电压条件下电子激励温度并不随外加电压的升高而递增,这表明通道内微放电的主要特征并不依赖于外部电压的供给,而是取决于气体组份、气体压强和放电模型,增大外加放电电压仅增加单位时间内微放电的数量,经整合电子激励温度可达3 500 K符合典型的低温等离子体特征;电子密度随外加电压的增长而趋于准线性趋势,电子密度数量级可达到108～109 cm-3,电离度偏弱。这些参数的探索对等离子体研讨有重大意义。     

三种电极的大气压氩等离子体射流光学特性

采用铜片-单匝线圈电极、螺旋缠绕电极和双铜片电极3种结构的放电装置,以氩气作为工作气体,在正弦波激励下获得了大气压等离子体射流。利用电学方法测量了放电电流以及电荷量,并对放电脉冲和放电功率进行了研究;利用发射光谱法对射流的等离子体参量进行了空间分辨测量,并根据ArⅠ 763.5 nm和Ar Ⅰ 772.4 nm的光强计算了电子激发温度。结果发现：在外加电压的正负半周期内,电流脉冲的个数和幅值呈现非对称的变化趋势;随着外加电压的增加,3种结构电极的放电功率从1.7 W逐渐增加到6.0 W;在相同的外加电压情况下,电极面积越小,等离子体射流的长度越长;3种等离子体射流的电子激发温度在1 348.5~3 212.1 K之间,并且随着气体流量的增加,各位置的电子激发温度总体上呈下降趋势,而等离子体的电子密度呈上升趋势。实验结果表明：外加电压对放电功率有一定影响;射流长度与电极面积有关;气体流量对电子激发温度和电子密度的空间分布起重要作用。     

气压对大面积等离子体片电子密度分布的影响

利用脉冲磁约束线形空心阴极放电装置,在15mT磁场约束下,产生了持续时间为200μs、峰值放电电流为3A、面积为60cm×60cm的大面积等离子体片。采用快帧法和旋转空心阴极法,在90~210Pa内,利用朗缪尔探针首次获得了不同气压的等离子体片的厚度向电子密度分布及其演化构成的二维分布图;研究了在同等峰值放电电流条件下,等离子体片达到最大厚度向峰值电子密度时,气压对所需放电时间、最大厚度向峰值电子密度及电子密度半高宽的影响。结果表明:在相同的峰值放电电流条件下,等离子体片达到最大厚度向峰值电子密度的时间随气压的降低而减小;气压越低,最大厚度向峰值电子密度越大,电子密度半高宽越小。     

微隙介质阻挡放电装置中的空气均匀放电光谱特性

大气压空气中介质阻挡均匀放电产生的等离子体在工业领域具有广阔的应用前景,为研究其产生条件及机理,利用微间隙介质阻挡放电装置,在大气压空气中实现了均匀放电。电学实验结果表明,低电压时电流波形在电压每半个周期存在若干个脉冲宽度很小的脉冲,肉眼观察到大量的微放电丝,随着外加电压增加,放电功率逐渐增加,放电空间内微放细丝增多。当电压增大到9.2 kV时,电流波形在电压每半个周期只存在一个宽度较大(约5.5 μs)强度较强的脉冲,观察不到微放电丝,微放电最终扩展叠加形成均匀放电。采集了光谱范围为330～420 nm的发射光谱,氮分子第二正带系337.1 nm的谱线强度明显比氮分子离子第一负带系391.4 nm的强。将337.1 nm谱线的强度归一,391.4 nm谱线的强度即反应了电子平均能量的大小,同时拟合计算了反映分子内部能量的氮分子振动温度。结果表明电子平均能量和分子内部能量都随外加电压的增加而降低。表明放电空间电场能量较低时不容易形成丝状放电,均匀放电模式中电子平均能量比微放电丝放电模式中的低。这些结果对于空气中介质阻挡均匀放电在工业应用方面具有一定的指导意义。     

13.56 MHz/2 MHz柱状感性耦合等离子体参数的对比研究

通过Langmuir双探针和发射光谱诊断方法,对比研究了驱动频率为13.56 MHz和2 MHz柱状感性耦合等离子体中电子密度和电子温度的径向分布规律.结果表明:在高频和低频放电中,输入功率的增加对等离子体参数产生了不同的影响,高频放电中主要提升了电子密度,低频放电中则主要提升了电子温度.固定气压为10 Pa,分别由高频和低频驱动时,电子密度的径向分布均为"凸型".而电子温度的分布差异比较明显,高频驱动时,电子温度在腔室中心较为平坦,在边缘略有上升;低频驱动时,电子温度随径向距离的增加而逐渐下降.为了进一步分析造成这种差异的原因,在相同放电条件下采集了氩等离子体的发射光谱图,利用分支比法计算了亚稳态粒子的数密度,发现电子温度的径向分布始终与亚稳态粒子的径向分布相反.继续升高气压到100 Pa,发现不论高频还是低频放电,电子密度的径向分布均从"凸型"转变为"马鞍形",较低气压时电子密度的均匀性有了一定的提升,但低频的均匀性更好.     

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Based on one dimensional fluid model, the characteristics of helium plasma discharge driven by dual frequency at atmospheric pressure were studied. The results show that the electron density and discharge current increase with power voltage both in single frequency discharge and dual frequency discharge. In comparison with single frequency discharge, the discharge current and electron density in dual frequency discharge are lowered due to the coupling of low frequency source. As the voltage of low frequency source increases, the electron density, ion flux, electron energy dissipation, as well as electron heating decrease, whereas electron temperature and potential increase. As the voltage of high frequency source increases, the ion flux nonlinearly increases at the same voltage of low frequency source.     

Effect of Cathode and Anode Voltage on an Ion Sheath Thickness in a Magnetically Confined Diffusion Plasma

This article reports about the ion sheath thickness variation occurring in front of a negatively biased plate immersed in the target plasma region of a double plasma device. The target plasma is produced due to the local ionization of neutral gas by the high energetic electrons coming from the source region (main discharge region). It is observed that for an increase in cathode voltage (filament bias voltage) in the source region, the ion flux into the plate increases. As a result, the sheath at the plate contracts. Again, for an increase in source anode voltage (magnetic cage bias), the ion flux to the plate decreases. As a result, the sheath expands at the plate. The ion sheath formed at the separation grid of the device is found to expand for an increase in cathode voltage and it contracts for an increase in the anode voltage of the main discharge region. One important observation is that the applied anode bias can control the Bohm speed of the ions towards the separation grid. Furthermore, it is observed that the ion current collected by the separation grid is independent of changes in plasma density in the diffusion region but is highly dependent on the source plasma parameters. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Nonlinear dynamics of radio frequency plasma processing reactorspowered by multifrequency sources

The source frequency has a strong influence on plasma characteristics in RF discharges. Multiple sources at widely different frequencies are often simultaneously used to separately optimize the magnitude and energy of ion fluxes to the substrate. In doing so, the sources are relatively independent of each other. These sources can, however, nonlinearly interact if the frequencies are sufficiently close. The resulting plasma and electrical characteristics can then be significantly different from those due to the sum of the individual sources. In this paper, a plasma equipment model is used to investigate the interaction of multiple frequency sources in capacitively and inductively coupled RF excited plasmas. In capacitively coupled systems, we confirmed that the plasma density increases with increasing frequency but also found that the magnitude of the DC bias and DC sheath voltage decreases. To produce a capacitively coupled discharge having a high plasma density with a large DC bias, we combined low and high frequency sources. The plasma density did increase using the dual frequency system as compared to the single low frequency source. The sources, however, nonlinearly interacted at the grounded wall sheath, thereby shifting both the plasma potential and DC bias. In inductively coupled plasmas (ICP), the frequency of the capacitive substrate bias does not have a significant effect on electron temperature and density. The DC bias and DC sheath voltage at the substrate were, however, found to strongly depend on source frequency. By using additional RF sources at alternate locations in ICP reactors, it was found that the DC bias at the substrate was varied without significantly changing other plasma parameters, such as the substrate sheath potential     

Driving frequency effects on the mode transition in capacitively coupled argon discharges

A one-dimensional fluid model is employed to investigate the discharge sustaining mechanisms in the capacitively coupled argon plasmas, by modulating the driving frequency in the range of 40 kHz-60 MHz. The model incorporates the density and flux balance of electron and ion, electron energy balance, as well as Poisson's equation. In our simulation, the discharge experiences mode transition as the driving frequency increases, from the γ regime in which the discharge is maintained by the secondary electrons emitted from the electrodes under ion bombardment, to the α regime in which sheath oscillation is responsible for most of the electron heating in the discharge sustaining. The electron density and electron temperature at the centre of the discharge, as well as the ion flux on the electrode are figured out as a function of the driving frequency, to confirm the two regimes and transition between them. The effects of gas pressure, secondary electron emission coefficient and applied voltage on the discharge are also discussed.     

大气压脉冲调制射频氩气放电等离子体特性的数值研究

基于等离子体流体理论,建立了大气压脉冲调制射频氩气放电的一维流体模型。通过数值模拟的方 法研究了放电参数(放电电极间距、射频频率)对氩等离子体特性的影响。研究结果表明：当电压固定时,随着电 极间距的增加,等离子体区逐渐增大,最大电子密度也增加,在 0.20cm 达到最大值后略有降低;放电电流密度 与输入功率密度随着电极间距的增加而增加;鞘层区电子温度随着电极间距的增加而降低;在脉冲开启前期,等 离子体区电子温度随着电极间距的增加而增加,但当脉冲开启后期,电极间距对等离子体区电子温度影响较小。 不同射频频率下最大电子密度随电极间隙的增加而减小,也具有一个最优值。      

Numerical study on discharge characteristics influenced by secondary electron emission in capacitive RF argon glow discharges by fluid modeling

A one-dimensional(1D) fluid model of capacitive RF argon glow discharges between two parallel-plate electrodes at low pressure is employed. The influence of the secondary electron emission on the plasma characteristics in the discharges is investigated numerically by the model. The results show that as the secondary electron emission coefficient increases,the cycle-averaged electric field has almost no change; the cycle-averaged electron temperature in the bulk plasma almost does not change, but it increases in the two sheath regions; the cycle-averaged ionization rate, electron density, electron current density, ion current density, and total current density all increase. Also, the cycle-averaged secondary electron fluxes on the surfaces of the electrodes increase as the secondary electron emission coefficient increases. The evolutions of the electron flux, the secondary electron flux and the ion flux on the powered electrode increase as the secondary electron emission coefficient increases. The cycle-averaged electron pressure heating, electron Ohmic heating, electron heating, and ion heating in the two sheath regions increase as the secondary electron emission coefficient increases. The cycle-averaged electron energy loss increases with increasing secondary electron emission coefficient.     

介质阻挡均匀大气压辉光放电数值模拟研究

通过数值求解一维电子、离子连续性方程和动量方程，以及电流连续性方程，计算了氦气介 质阻挡大气压辉光放电电子、离子密度和电场在放电空间的时空分布，以及放电电流密度和 绝缘介质板充电电荷密度随时间的变化. 分析讨论所加电压频率、幅值及介质板性质等对均 匀大气压辉光放电性质的影响. 当外加电压频率足够高时，大量离子被俘获在放电空间，空 间电荷场又引起足够多的电子滞留在放电空间. 这些种子电子使得在大气压下发生汤森放电 ，放电空间结构类似于低气压辉光放电，即存在明显的阴极位降区、负辉区、法拉第暗区和 等离子体正柱 关键词： 大气压辉光放电 介质阻挡 数值模拟 等离子体     

Characteristics of a dual‐radio‐frequency cylindrical inductively coupled plasma

The plasma parameters such as electron density, effective electron temperature, plasma potential, and uniformity are investigated in a new dual‐frequency cylindrical inductively coupled plasma (ICP) source operating at two frequencies (2 and 13.56 MHz) and two antennas (a two‐turn high‐frequency antenna and a six‐turn low‐frequency (LF) antenna). It is found that the electron density increases with 2 MHz power, whereas the electron temperature and plasma potential decrease with 2 MHz power at a fixed 13.56 MHz power. Moreover, the plasma uniformity can be improved by adjusting the LF power. These results indicate that a dual‐frequency synergistic discharge in a cylindrical ICP can produce a high‐density, low‐potential, low‐effective‐electron‐temperature, and uniform plasma.