Variation of plasma parameters in a modified mode of plasma production in a double plasma device

A modified mode of plasma production in a double plasma device is presented and plasma parameters are controlled in this configuration. Here plasma is produced by applying a discharge voltage between the hot filaments in the source (cathode) and the target magnetic cage (anode) of the device. In this configuration, the hot electron emitting filaments are present only in the source and the magnetic cage of this is kept at a negative bias such that due to the repulsion of the cage bias, the primary electrons can go to the grounded target and produce plasma there. The plasma parameters can be controlled by varying the voltages applied to the source magnetic cage and the separation grid of the device.     

Operational characteristics of a plasma cathode with a grid stabilization in a two-stage ion source

The discharge characteristics and the parameters of the cathode plasma in a two-stage ion source with a grid plasma cathode and a magnetic trap in the anode region are investigated. It is shown that an increase in the gas pressure and the accompanying increase in the reverse ion current in the bipolar diode between the cathode and anode plasmas lead to an increase in the cathode plasma potential and a transition of the cathode into the regime of electron emission from the open plasma boundary. The dependence of the ion current extracted from the anode plasma on the area of the exit aperture of the hollow cathode and the mesh size of the grid plasma cathode is explained. The conditions at which the ion emission current from the anode plasma is maximum are determined. The potential difference at the bipolar diode is measured by using the probe method. It is shown that, when the gas pressures reaches a critical value determined by the mesh size of the grid plasma cathode, the discharge passes into a contracted operating mode, in which the ion current extracted from the anode plasma decreases severalfold.     

用发射光谱法测量氮气直流辉光放电的转动温度

本文报道了氮气气压分别为10和20Pa时，对直流辉光放电的发射光谱进行测量和分析的结果。选择的研究对象为N2放电中形成的N2^ B^2∑u^ →X^2∑g^ 跃迁的Δv=v′-v″=0谱带系中v′=0→v″=0谱带的R支。在阴极背面辉光区、阴极鞘层区、正柱区以及阳极辉光区中分别选择一点进行了转动分辨的发射光谱的测量。利用自己编写的光谱拟合程序，获得了相应的实验条件下N2^ 的转动温度，给出了转动温度随放电电压的变化趋势，其结果可以用直流放电的帕邢定律得到很好的解释。在10和20Pa气压下，放电的阴极鞘层区、正柱区、阳极辉光区中的转动温度都随放电电压呈现出了不同的变化趋势，甚至是完全相反的变化趋势。我们认为这是由于气压不同时，放电状态不同所致：气压为10Pa时的放电是正常辉光放电，而气压为时20Pa的放电为反常辉光放电。     

Effect of Discharge Voltage on an Ion Sheath Formed at a Grid in a Multi-Dipole Discharge Plasma

It is experimentally demonstrated that a relatively strong ion-rich sheath formed at a fixed negative bias of the grid can be changed to a rather weak ion sheath （sheath potential weakly retards electrons） only by increasing the discharge voltage in the system. At sufficiently high negative grid bias, an increase of discharge voltage enhances the ion collection current at the grid. An explanation is put forward in support of this experimental observation. A slight density enhancement with a fall in plasma electron temperature is also observed with the increasing negative grid bias.     

大气压双频氦气放电等离子体特性的数值研究

用一维流体模型研究了大气压双频氦气放电等离子体的特性。数值模拟的结果表明,在单、双频放电中,随着应用电压的增加,电子密度和放电电流都增加。相对于单频放电,双频放电中低频源的耦合效应使得放电中的电流以及电子密度降低。随着低频源电压峰值的增加,电子密度降低,离子通量,电子损失能量以及电子吸收能量均降低;但电子温度和电势随着低频源电压峰值的增加而增加。在相同低频源电压下,随着高频源电压的增加离子流非线性增加。     

Characteristic features of the emission properties of pulsed broad-beam ion and plasma sources utilizing the evaporation of metal by a vacuum arc

An experimental confirmation was obtained of the anode potential fall effect in pulsed broad-beam ion and plasma sources utilizing the evaporation of metal by a vacuum arc. An increase in the overall voltage across the arc discharge was discovered. The investigations demonstrated that the magnitude of the positive anode fall depends on the structural features of the ion source and are determined by the ratio of the plasma flux directed onto the lateral surface of the anode to the total plasma flux from the cathode spot. It was established that the anode fall effect is controlled and makes it possible to influence the homogeneity of the ion current distribution over the beam cross section, the efficiency of extracting ions from the plasma, and the charge composition of the ion flux.Scientific-Research Institute of Nuclear Physics, Polytechnic University, Tomsk. Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 2, pp. 82–92, February, 1994.     

Simulation of radio-frequency atmospheric pressure glow discharge in γ mode

The existence of two diffe1：ent discharge modes has been verified in an rf （radio-frequency） atmospheric pressure glow discharge （APGD） by Shi [J. Appl. Phys. 97, 023306 （2005）]. In the first mode, referred to as a mode, the discharge current density is relatively low and the bulk plasma electrons acquire the energy due to the sheath expansion. In the second mode, termed γ mode, the discharge current density is relatively high, the secondary electrons emitted by cathodc under ion bombardment in the cathode sheath region play an important role in sustaining the discharge. In this paper, a one-dimensional self-consistent fluid model for rf APGDs is used to simulate the discharge mechanisms in the mode in helium discharge between two parallel metallic planar electrodes. The results show that as the applied voltage increases, the discharge current becomes greater and the plasma density correspondingly increases, consequentially the discharge transits from the a mode into the γ mode. The high collisionality of the APGD plasma results in significant drop of discharge potential across the sheath region, and the electron Joule heating and the electron collisional energy loss reach their maxima in the region. The validity of the simulation is checked with the available experimental and numerical data.     

Extension of the gas-pressure operating range and increase in the lifetime of the plasma cathode grid of an ion source

A new scheme of a gas-discharge system is proposed for a basket-type ion source with a plasma cathode in which the electrons are emitted from the expanded anode part of a constricted hollow-cathode glow discharge bounded by a grid electrode. The modified electrode system of the ion source made it possible to enlarge the surface area of the plasma cathode grid and the aperture of its cells, thereby providing stable ion emission from the discharge plasma within a wide gas-pressure range and substantially (by one order of magnitude) increasing the grid lifetime. The operation of the plasma cathode in the free and forced emission modes is examined, and the energy efficiency of ion generation in the gas-discharge system under study is evaluated.     

Intense emission from a grid-stabilized plasma cathode

Intense emission from a grid-stabilized plasma cathode based on a glow discharge with an expanded anode area is studied. In the electrode system of the ion source, the potential difference between a large-mesh grid electrode (a hole diameter of 4–6 mm) and cathode and anode plasma reaches 200 V and the glow discharge current is up to 1 A. The current distribution over the electrodes of the plasma cathode is taken, and the dependences of the electron extraction efficiency and electron-emitting-plasma potential on the gas pressure and discharge parameters are obtained. A relationship between the geometric parameters of the grid, cathode plasma potential, and efficiency of electron extraction from the plasma is derived. It is shown that stable intense emission from the plasma cathode can be provided in wide ranges of gas pressure and discharge current by varying the geometry and mesh size of the plasma cathode grid. Discharge contraction in the grid plane at elevated gas pressures is explained. It is assumed that the emitting plasma becomes inhomogeneous due to variation in the thickness of near-electrode layers in the holes of the grid, which makes the distribution of the emission current from the plasma more nonuniform.     

ICP等离子体鞘层附近区域发光光谱特性分析

为了独立控制鞘层附近区域离子密度和离子能最分布,采用光发射谱(OES)测量技术,对不同射频功率、放电气压和基底偏压下感应耦合等离子体鞘层附近区域辉光特性进行了研究.原子谱线和离子谱线特性分析表明,在鞘层附近区域感应耦合等离子体具有较高的离子密度和较低的电子温度.改变放电气压和射频功率,对得到的光谱特性分析表明,鞘层附近区域离子密度随射频功率的增大而线性增大,在低压下随气压的升高而增大.低激发电位原子谱线强度增加迅速,高激发电位原子谱线强度增加缓慢,而离子谱线强度增加很不明显.改变基底直流偏压,对得到的发射光谱强度变化分析表明,谱线强度随基底正偏压的增加而增大.随着基底负偏压的加入,谱线强度先减小而后增大;直流偏压为-30 V时,光谱强度最弱.快速离子和电子是引起Ar激发和电离过程的主要能量来源.     

微腔等离子体放电过程的数值研究

采用2维自洽完全流体模型,数值研究了阳极为通孔的高气压微腔放电结构中等离子体参数的变化过程。模拟结果获得了当氩气压强为13.3 kPa时,放电中的电势分布、等离子体密度分布、径向电场分布和电子温度分布等重要参数的演化过程。模拟结果表明在放电过程中,阴极附近的电场由轴向电场逐步转变为径向电场,等离子体密度最大值位于放电腔中间处,并随时间推移由阳极附近向阴极附近移动,电子温度的最大值出现在阴极环形鞘层区域。     

Characteristics of a large gap uniform discharge excited by DC voltage at atmospheric pressure

A large-gap uniform discharge is ignited by a coaxial dielectric barrier discharge and burns between a needle anode and a plate cathode under a low sustaining voltage by feeding with flowing argon. The basic aspects of the large-gap uniform discharge are investigated by optical and spectroscopic methods. From the discharge images, it can be found that this discharge has similar regions with glow discharge at low pressure except a plasma plume region. Light emission signals from the discharge indicate that the plasma column is invariant with time, while there are some stochastic pulses in the plasma plume region. The optical emission spectra scanning from 300 nm to 800 nm are used to calculate the excited electron temperature and vibrational temperature of the large-gap uniform discharge. It has been found that the excited electron temperature almost keeps constant and the vibrational temperature increases with increasing discharge current.Both of them decreases with increasing gas flow rate.     

赝火花开关辉光放电腔的粒子模拟与实验研究

 给出了赝火花开关所需辉光放电腔的具体要求,对赝火开关辉光放电腔进行了优化设计,并对优化后的放电腔进行了粒子模拟和实验研究。粒子模拟结果表明：此放电腔为辉光放电腔,辉光放电建立时间约18.5 ns;辉光放电时,此放电腔阴极位降占整个电位降的主要部分,且阴极位降区净离子密度为一常数。实验结果显示：此放电腔为辉光放电腔,其工作在Paschen曲线最低点左侧,放电电压随气压的升高而降低;当辉光放电电流为0.14～3.60 mA时,放电模式为正常辉光放电。     

Variations of Plasma Parameters and Sheath Thickness Due to the Extraction of Ion and Electron Flux in a Double Plasma Device

Influence of charged particle extraction on plasma parameters and on ion sheath has been investigated in a double plasma device. When ions are extracted from the plasma, the plasma density as well as the positive ion flux into the sheath increases. As a result a sheath contraction takes place. Again, in case of electron extraction, it is found that the plasma density as well as the positive ion flux into the sheath decreases. As a result a sheath expansion takes place. Furthermore, it is observed that the floating potential of a plate can be controlled by extracting charged particles from the plasma. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

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Based on one dimensional fluid model, the characteristics of helium plasma discharge driven by dual frequency at atmospheric pressure were studied. The results show that the electron density and discharge current increase with power voltage both in single frequency discharge and dual frequency discharge. In comparison with single frequency discharge, the discharge current and electron density in dual frequency discharge are lowered due to the coupling of low frequency source. As the voltage of low frequency source increases, the electron density, ion flux, electron energy dissipation, as well as electron heating decrease, whereas electron temperature and potential increase. As the voltage of high frequency source increases, the ion flux nonlinearly increases at the same voltage of low frequency source.     

脉冲磁过滤阴极弧沉积中基片台悬浮电位研究

通过测量脉冲磁过滤阴极弧等离子体沉积系统中的基片台悬浮电位，发现了弧源接地方式对基片台悬浮电位与等离子体电位影响很大。当阳极接地时基片台悬浮电位可达－60V，而弧源悬浮时却只有－5V。因此，要获得相似沉积条件的沉积薄膜，弧源接地方式不同，给基片施加偏压也应有所不同。     

高压耦合高功率脉冲磁控溅射的增强放电效应

等离子体源离子注入与沉积技术作为一种可生产高结合力、高致密度涂层的真空镀膜技术,具有广阔的应用前景,尤其适用于高载荷工况下服役的功能涂层制备.该技术中金属等离子体源是关键,而现有的脉冲阴极弧源结构复杂,且由于伴随"金属液滴"而需要增加过滤装置.本文研究了另一种简单结构的金属等离子体源备选一高功率脉冲磁控溅射源(HPPMS)的放电特性,采用等离子体发射光谱仪探索了不同的耦合高压对HPPMS放电靶电流特性和等离子体特性的作用.发现耦合高压对HPPMS放电有明显的促进作用,相同靶电压下的放电强度大幅增加,相对于金属放电,耦合高压对气体放电的促进作用更加明显,但在自溅射为主的高压放电阶段对金属放电的促进作用明显增强.讨论了耦合高压对HPPMS放电的增强机制,发现耦合高压自辉光放电、耦合高压和HPPMS电压构成双向负压形成的空心阴极效应,以及耦合高压鞘层改善的双极扩散效应都对HPPMS放电的增强有明显作用.     

Experimental observations of steady anodic vacuum arcs withthermionic cathodes

Stationary plasma discharges have been investigated in a high vacuum ambient (background gas pressure <10^-2 Pa), with an externally heated cathode and a consumable hot evaporating anode. With various anode materials like chromium or copper, and electrode separations between 0.5 and 3 mm, the nonself-sustained discharge operates with DC arc currents in the range of 220 A. The waveform of the arc voltage is strongly influenced by the magnetic field of the cathode heating current, and arc voltages between a minimum of 3 V and a maximum exceeding 100 V have been observed. The voltage-current characteristics (V_CC) and the influence of the electrode separation have been measured separately for the minimum and the maximum of the arc voltages and show a different behavior. The metal plasma expands into the ambient vacuum toward the walls of the vacuum vessel and offers a macroparticle free deposition source of thin films. The arc voltage can be varied by external manipulations of the arc discharge, and the mean ion energy of the expanding metal plasma shows a linear dependence of the mean arc voltage     

Effect of cold electron emission on diffusion plasma parameters and the sheath structure in a double plasma device

It is observed experimentally that by injecting cold electrons in the discharge region of a double plasma device, the plasma parameters and sheath structure can be controlled in the other region, which is devoid of any electrical discharge. The main discharge region is separated from the region under investigation by a grounded mesh grid. Both cold and hot ionizing electrons are emitted from separate sets of filaments in the discharge region. With an increase in the cold electron emission current, the plasma parameters in the discharge region get changed, which in turn alter the plasma parameters in the other region. Two important effects caused by cold electrons in the diffusion region are the increase in the plasma density and decrease in the plasma potential. The increase in the plasma density and decrease in the sheath potential drop therefore cause the contraction of the sheath.     

介质阻挡放电点燃大气压直流均匀放电的光谱研究

由于大气压均匀放电等离子体在工业领域具有广泛的应用前景,为了获得大尺寸的大气压均匀等离子体,采用氩气作为工作气体,在大气压空气环境中利用同轴介质阻挡放电点燃了针-板电极间的大气隙(气隙宽度达到5 cm)直流均匀放电。研究发现,同轴介质阻挡放电能够有效降低针-板电极间的击穿电压。该均匀放电由等离子体柱、等离子体羽、阴极暗区和阴极辉区组成。其中等离子体柱和阴极辉区都是连续放电。而等离子体羽不同位置的放电是不同时的。事实上,等离子体羽放电是由从阴极向着等离子体柱移动的发光光层(即等离子体子弹)叠加而成。利用电学方法测量了放电的伏安特性曲线,发现其与低气压正常辉光放电类似,均具有负斜率。采集了放电的发射光谱,发现存在N₂第二正带系、氩原子和氧原子谱线。通过Boltzmann plot方法对放电等离子体电子激发温度进行了空间分辨测量,发现等离子体柱的电子激发温度比等离子体羽的电子激发温度低。通过分析放电机制,对以上现象进行了定性解释。这些研究结果对大气压均匀放电等离子体源的研制和工业应用具有重要意义。