缓冲层对LiB_3O_5晶体上1064nm,532nm倍频增透膜性能的影响

采用电子束蒸发方法在LiB3O5(LBO)晶体上制备了无缓冲层和具有不同缓冲层的1064nm,532nm倍频增透膜。利用Lambda900分光光度计、MTS Nano Indenter纳米力学综合测试系统以及调Q脉冲激光装置对样品的光学性能、附着力和激光损伤阈值进行了测试分析。结果表明,所有样品在1064nm和532nm波长的剩余反射率都分别小于0.1%和0.2%。与无缓冲层样品相比,预镀Al2O3缓冲层的样品的附着力提高了43%,具有Si O2缓冲层的样品的附着力显著提高。激光损伤阈值分析表明,采用Si O2缓冲层改进了薄膜的抗激光损伤性能,但是Al2O3缓冲层的插入却导致薄膜的激光损伤阈值降低。     

缓冲层对LBO晶体上1 064 nm,532 nm二倍频增透膜的激光损伤阈值的影响

采用电子束蒸发方法在LBO晶体上制备了无缓冲层和具有不同缓冲层的1 064 nm,532 nm二倍频增透膜.利用Lambda900分光光度计和调Q脉冲激光装置对样品的光学性能和抗激光损伤性能进行了测试分析.结果表明,所有样品在1 064 nm和532 nm波长的剩余反射率都分别小于0.1%和0.2%.与无缓冲层样品相比,采用SiO2和MgF2缓冲层薄膜的激光损伤阈值分别提高了23.1%和25.8%,而Al2O3缓冲层的插入却导致薄膜的激光损伤阈值降低.通过观察薄膜的激光损伤形貌,分析破斑的深度信息和电场分布,表明LBO晶体上1 064 nm,532 nm二倍频增透膜的激光损伤破坏主要表现为膜层剥落,激光产生的热冲击应力使薄膜应力发生很大变化,超过膜层之间的结合而引起膜层之间的分离.采用SiO2或MgF2缓冲层可改进Al2O3膜层的质量,从而有利于提高薄膜的激光损伤阈值.     

缓冲层对LBO晶体上1 064 nm|532 nm二倍频增透膜的激光损伤阈值的影响

采用电子束蒸发方法在LBO晶体上制备了无缓冲层和具有不同缓冲层的1 064 nm,532 nm二倍频增透膜.利用Lambda900分光光度计和调Q脉冲激光装置对样品的光学性能和抗激光损伤性能进行了测试分析.结果表明,所有样品在1 064 nm和532 nm波长的剩余反射率都分别小于0.1％和0.2％.与无缓冲层样品相比,采用SiO2和MgF2缓冲层薄膜的激光损伤阈值分别提高了23.1％和25.8％,而Al2O3缓冲层的插入却导致薄膜的激光损伤阈值降低.通过观察薄膜的激光损伤形貌,分析破斑的深度信息和电场分布,表明LBO晶体上1 064 nm,532 nm二倍频增透膜的激光损伤破坏主要表现为膜层剥落,激光产生的热冲击应力使薄膜应力发生很大变化,超过膜层之间的结合而引起膜层之间的分离.采用SiO2或MgF2缓冲层可改进Al2O3膜层的质量,从而有利于提高薄膜的激光损伤阈值.     

缓冲层对LBO晶体上1 064 nm，532 nm增透膜附着力的影响

 采用电子束蒸发方法在LBO晶体上制备了无缓冲层和具有不同缓冲层的1 064 nm,532 nm二倍频增透膜。利用分光光度计、纳米力学综合测试系统以及调Q脉冲激光装置对样品的光学性能、附着力以及抗激光损伤性能进行了测试分析。结果表明：所有样品在1 064 nm和532 nm波长的剩余反射率都分别小于0.1％和0.2％;与无缓冲层样品相比,预镀Al₂O₃缓冲层样品的附着力提高了43.1％,具有SiO₂缓冲层样品的附着力显著提高,而MgF₂缓冲层的插入却导致薄膜附着力降低。应用全塑性压痕理论和剪切理论对薄膜的附着力增强机制进行了分析。薄膜的抗激光损伤性能分析表明,SiO₂缓冲层也有助于改进薄膜的激光损伤阈值。     

CsB_3O_5晶体高效三倍频产生28.3W 355nm激光

利用CsB_3O_5(CBO)晶体对Nd:YAG声光调Q准连续1064 nm激光的高效三倍频效应获得高功率355 nm激光输出.1064 nm激光采用大功率脉冲式半导体激光(LD)列阵侧面抽运Nd:YAG晶体的主振荡-功率放大(MOPA)系统实现210 W的调Q准连续输出,激光以1 kHz脉冲串方试运转,每个脉冲串包含5个调Q脉冲,单脉冲宽度为40 ns.经I类LiB_3O_5(LBO)晶体倍频产生98 W 532 nm绿光.通过30 mm长的II类CBO晶体对1064 nm与532 nm光和频获得28.3 W的355 nm紫外光,相应的三倍频转换效率为13.5%,比相同条件下II类LBO晶体高28.6%.研究了CBO三倍频产生355 nm光的温度敏感特性,得到其温度带宽为25?C,远大于LBO晶体的4?C.实验证明,CBO晶体在三倍频产生355 nm的转换效率和温度不敏感性方面均优于LBO晶体.     

钛酸镧薄膜在1064nm/532nm波长激光辐照下的光学特性

采用热蒸发沉积技术制备了钛酸镧(H4)薄膜,研究了1 064nm和532nm波长激光诱导辐照处理后的薄膜折射率、消光系数、激光损伤阈值和损伤过程变迁.结果表明:采用不同波长的激光辐照H4薄膜后,会使其折射率升高,但升高的幅度不大.用1 064nm的激光辐照处理,可将H4膜的激光损伤阈值从10.2J/cm~2提高到15.7J/cm~2(5脉冲辐照),而532nm激光辐照对样品损伤阈值的提高效果不明显.同一样片,1 064nm激光的损伤阈值远远高于532nm的激光损伤阈值.1064nm激光辐照下,H4薄膜经历了轻微损伤、轻度损伤、重度损伤和极度损伤四个缓慢演变的阶段.而532nm激光辐照下,H4薄膜从未损伤到损伤是一个突变的过程,经历了重度损伤和极度损伤的演变阶段.     

三硼酸锂晶体上1064 nm,532 nm,355 nm三倍频增透膜的设计

采用矢量法设计了三硼酸锂晶体上1064 nm、532 nm和355 nm三倍频增透膜,结果表明1064 nm、532 nm和355 nm波长的剩余反射率分别为0.0017%、0.0002%和0.0013%。根据误差分析,薄膜制备时沉积速率精度控制在 5.5%时,1064 nm、532 nm和355 nm波长的剩余反射率分别增加至0.20%、0.84%和1.89%。当材料折射率的变化控制在 3%时,1064 nm处的剩余反射率增大为0.20%,532 nm和355 nm处分别达0.88%和0.24%。与薄膜物理厚度相比,膜层折射率对剩余反射率的影响大。对膜系敏感层的分析表明,在1064 nm和355 nm波长,从入射介质向基底过渡的第二层膜的厚度变化对剩余反射率的影响最大,其次是第一膜层。在532 nm波长,第一和第三膜层是该膜系的敏感层。同时发现,由于薄膜材料的色散,1064 nm5、32 nm和355 nm波长的剩余反射率分别增加至0.15%、0.31%和1.52%。     

LD泵浦355nm准连续紫外激光器

报道了一台LD侧面泵浦Nd:YAG晶体的内腔三次谐波转换的全固态准连续紫外激光器。在谐振腔内,1064nm的基频波通过对Ⅱ类相位匹配KTP晶体进行二倍频来产生532nm波长激光,二者再通过对Ⅱ类相位匹配LBO晶体进行和频来获得355nm紫外激光输出。355nm全固态紫外激光器在声光调Q重复频率为2.8kHz下,当输入电流为18A时可得到503mW的激光输出。     

用于355nm紫外激光器的消偏振二向色镜

采用离子束辅助电子束成膜,用双重膜厚监控方法监控各膜层厚度,制备了45°入射、808nm高反、1064nm高透的消偏振二向色镜,并用于全固态355nm激光器.将部分薄膜样品在250℃进行退火处理后,用Lambda950分光光度计测试该样品的光谱性能;用表面热透镜技术测量退火前后该样品的弱吸收值;用激光阈值损伤装置测试该样品在1064nm调Q激光下的损伤阈值;用NIKON显微镜观察样品在不同激光能量辐照下的破斑形貌.实验结果表明:波长为808nm和1 064nm时,薄膜透射率分别为0.04%和99.6%,符合设计要求,满足全固态355nm紫外激光器系统所要求的光学性能指标;退火后的弱吸收值较退火前有所降低;在激光作用下薄膜产生微破坏喷出,说明膜层不会向灾难性破坏演变.     

基于Nd∶YAG/Cr∶YAG复合晶体的全固态紫外激光器

被动调Q产生1064 nm脉冲激光在腔外聚焦后入射到KTP中,产生532 nm的倍频光,再通过LBO和频产生355 nm激光。当抽运功率为3.4 W时,基频光调Q输出平均功率为350 mW,峰值功率达3.5 kW。腔外二倍频532 nm绿光输出平均功率为110 mW,用Ⅰ类相位匹配LBO晶体和频获得36 mW的355 nm的紫外激光输出,三倍频效率(1064~355 nm)达到10.2%。由于Cr∶YAG晶体达到饱和吸收后,会呈现出各向异性的特征,对基频光的偏振状态有很大影响。实验中必须合理放置复合晶体,使基频光的偏振状态为近似线偏振以提高转换效率。     

520nm泵浦780nm+1560nm双共振光学参量振荡器

我们在实验中演示了520nm单频绿光泵浦的基于周期极化磷酸钛氧钾(PPKTP)晶体的780nm+1560nm双共振光参量振荡器,高效制备780nm+1 560nm连续可调谐双色下转换光场。该参量振荡器可输出93.3 mW的1 560nm单频激光和44.6mW的780nm单频激光。通过改变PPKTP晶体的温度所得到的波长粗调范围为:信号光1 529.81nm~1 573.83nm(~44nm),闲置光788.26nm~777.20nm(~11nm);通过连续调谐520nm泵浦激光频率初步得到的闲置光在780.24nm(铷原子D2线)处频率连续调谐范围约1.6GHz。     

1 064, 532和680 nm波长的反射-吸收复合型防护膜的研制

 针对1 064, 532 和 680 nm波长激光， 以聚碳酸酯 （PC） 为镀膜基底， 钕玻璃激光中心波长为1 064 nm, 采用六分之一加三分之一膜系的反射膜系设计，以氧化锆为高折射率膜层材料，氯化酞菁铝掺杂的氧化硅为低折射率膜层材料，通过溶胶-凝胶法镀21层膜，并在多层反射膜与PC基底之间插入张力匹配层，实现了钕玻璃激光器1 064 nm主频和532 nm二倍频波长激光的反射，以及680 nm波长红宝石激光的同时吸收，1 064,532和680 nm波长处的透射率分别为1.67％，18.24％和2.4％。     

All-Solid-State Nd:YAG Laser Operating at 1064nm and 1319nm under 885nm Thermally Boosted Pumping

We report a high-effciency Nd：YAG laser operating at 1064 nm and 1319nm, respectively, thermally boosted pumped by an all-solid-state Q-switched Ti：sapphire laser at 885 nm. The maximum outputs of 825.4 m W and 459.4mW, at 1064nm and 1319nm respectively, are obtained in a 8-ram-thick 1.1 at.% Nd：YAG crystal with 2.1 W of incident pump power at 885nm, leading to a high slope efficiency with respect to the absorbed pump power of 68.5% and 42.0%. Comparative results obtained by the traditional pumping at 808nm are presented, showing that the slope efficiency and the threshold with respect to the absorbed pump power at 1064nm under the 885nm pumping are 12.2% higher and 7.3% lower than those of 808rim pumping. At 1319nm, the slope efficiency and the threshold with respect to the absorbed pump power under 885nm pumping are 9.9% higher and 3.5% lower than those of 808 nm pumping. The heat generation operating at 1064 nm and 1319 nm is reduced by 19.8% and 11.1%, respectively.     

Multilayers with high-reflectivity at 19.5 nm and low-reflectivity at 30.4 nm

The multilayer （ML） mirror with high-reflectivity （HR） at a specific emission line of 19.5 nm （Fe line） and low-reflectivity （LR） at 30.4 nm （He line） is needed to be designed and fabricated for observing the image of sun. Based on a variety of optimizations utilized different structures, the design is performed and the final results demonstrate that the reflectivity at 30.4 nm does not achieve minimum value when the reflectivity at 19.5 nm reaches the maximum value. The tradeoff should be done between the HR at 19.5 nm and LR at 30.4 nm. One optimized mirror is fabricated by direct current magnetron sputtering and characterized by grazing-incident X-ray diffraction （XRD） and synchrotron radiation （SR）. The experimental results demonstrate that the ML achieves the reflectivity of 33.3% at 19.5 nm and of 9.6× 10-4 at 30.4 nm at the incident angle of 13°.     

Holmium-doped fluoride fiber laser at 2950 nm pumped at 1175 nm

We report a single-mode, highly stable, continuous-wave Ho³⁺: ZBLAN fiber laser. The system was pumped by a 1175-nm fiber Raman laser and emitted at ～2950 nm. The optical-to-optical conversion efficiency was 43% that is the highest reported in the literature. Characterizations revealed a quasigaussian intensity profile with a power stability of less than 1%. This high stability relies on the single-wavelength emission of the system because the system does not require simultaneous oscillation at 2100 nm. Coincidence between the emission wavelength and the absorption peak of water makes the system suitable to replace a high-power (～9.34-W) Er³⁺: ZBLAN fiber laser for cutting materials with high moisture content.     

1064 nm Nd:YAG laser intracavity pumped at 946 nm

We present for the first time a Nd:YAG laser emitting at 1064 nm intracavity pumped by a 946 nm diode-pumped Nd:YAG laser. A 885 nm laser diode is used to pump the first Nd:YAG crystal emitting at 946 nm, and the second Nd:YAG laser emitting at 1064 nm intracavity pumped at 946 nm. We achieved an output power of 7.97 W at 1064 nm for an absorbed pump power at 946 nm of 9.55 W, corresponding to an optical efficiency of 83.4%. The beam quality M² quality factor is about 1.1 at the maximum output power.     

Molecular iodine laser optically pumped at 521 nm and 531 nm

We report the observation and identification of over 50 new cw laser lines belonging to the B³∏?X¹∑ system of I₂ optically pumped by a single mode krypton ion laser. When pumping at 531 nm, simultaneous oscillation was achieved on up to 16 lines in the range 540 nm to 650 nm. This system offers considerable potential as a multi-wavelength laser source in interferometry.     

在19.5 nm处高反在30.4 nm处抑制的双功能薄膜

 研究了极紫外波段的双功能光学元件。采用周期膜叠加的思想,运用遗传方法优化设计了在19.5 nm处高反,在30.4 nm处抑制的双功能多层膜。采用磁控溅射技术制备了多层膜,利用X射线衍射仪测试了多层膜的结构,在国家同步辐射实验室测试了双功能多层膜的反射特性。结果表明：制备出的双功能膜性能与设计相符,在入射角13°,19.5 nm处的反射率达到33.3%,接近传统的19.5 nm周期高反膜的反射率,并且在30.4 nm附近将反射率由1.1%降到9.6×10^-4。     

Precision measurement of two iodine lines at 585 nm and 549 nm

The transition frequencies of thei-component of the R(99)15-1 and thew-component of the R(85)26-0 transition in the B-X system of molecular¹²⁷I₂ have been determined with an overall relative standard uncertainty of 1.3 · 10^?10. For this purpose a commercial linear dye laser has been modified and stabilized to the corresponding iodine line. This dye laser serves as a transportable frequency standard which is compared with the wavelength standards of the PTB. The evaluation of an experiment for testing special relativity at the test storage ring (TSR) in Heidelberg is based on the precision of the reported interferometric wavelength comparison.