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1.
铁电SBN薄膜电光系数的测量及其在波导中的应用 总被引:2,自引:0,他引:2
利用溶胶-凝胶法在MgO(001)衬底上获得C轴择优取向的铁电铌酸锶钡(SBN)薄膜,主要介绍MgO(001)衬底上SBN60薄膜及掺入的K离子与Nb离子摩尔比例为1:3的SBN60薄膜横向电光系数r51的测量,实验测得不掺K的SBN60薄膜r51值为37.6pm/V,掺K的r51值为58.5pm/V。并由此设计一种基于MgO(001)衬底上的马赫一曾德尔型SBN60薄膜波导调制器,计算出在633nm时,掺K比例为1:3的此种波导调制器半波调制电压值为10V,不掺K的半波电压值为16V,结果说明掺入K离子能增加薄膜的横向电光系数并有效的减少波导的半波调制电压。 相似文献
2.
采用溶胶-凝胶法在(100)Si单晶上预先制备出掺钾(K)的铌酸锶钡(SBN)缓冲层,利用射频磁控溅射法在缓冲层KSBN上沉积出高择优取向的铌酸锶钡薄膜,获得了磁控溅射法制备择优取向铌酸锶钡薄膜的相关工艺参数,研究发现,KSBN缓冲层能够很有效地克服衬底与SBN薄膜之间较大的晶格失配,在氧气氩气的比例为1∶2,工作气压为10 Pa,溅射功率300 W,衬底温度300℃,退火温度为800℃的工艺条件下,能够获得c轴高度择优取向的铌酸锶钡铁电薄膜.利用X射线衍射仪,原子力显微镜等仪器分析了薄膜
关键词:
磁控溅射
高择优取向
p-n结效应 相似文献
3.
采用溶胶-凝胶法在(100)Si单晶上预先制备出掺钾(K)的铌酸锶钡(SBN)缓冲层,利用射频磁控溅射法在缓冲层KSBN上沉积出高择优取向的铌酸锶钡薄膜,获得了磁控溅射法制备择优取向铌酸锶钡薄膜的相关工艺参数,研究发现,KSBN缓冲层能够很有效地克服衬底与SBN薄膜之间较大的晶格失配,在氧气氩气的比例为1∶2,工作气压为10 Pa,溅射功率300 W,衬底温度300℃,退火温度为800℃的工艺条件下,能够获得c轴高度择优取向的铌酸锶钡铁电薄膜.利用X射线衍射仪,原子力显微镜等仪器分析了薄膜 相似文献
4.
5.
采用NbCl5作为先驱物,利用溶胶-凝胶法在Si(100)衬底上成功获得高度择优取向的铁电铌酸锶钡(SBN)薄膜.与用Nb(OC2H5)5作为先驱物的SBN薄膜相比,NbCl5配制的薄膜前驱溶液中含有一定数量的K离子.K离子的含量对SBN薄膜取向的影响存在一个最优值.二次离子质谱测试发现,K离子对SBN晶胞的溶入和对Si衬底的渗透能够同时使SBN晶胞和Si晶胞产生微小扭曲,从而起到调整薄膜与衬底的匹配关系,并最终促使SBN薄膜c轴高度择优取向的生长.测试了薄膜的光学特性.
关键词:
铌酸锶钡
溶胶-凝胶方法
择优取向 相似文献
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采用直流磁控溅射并通过优化工艺参数,在(100)Si衬底上成功制备了高度(100)择优的MgO薄膜和MgO/TiN双层膜结构.对 (100)MgO择优取向温度影响机理做了详细讨论,并利用XRD,AFM,FESEM等手段研究了在(100)Si和(100)TiN/Si两种衬底上,不同工艺条件下MgO薄膜的表面和断面微观结构,表征了MgO薄膜的柱状生长结构和与TiN薄膜的良好外延关系.在对薄膜光学特性的研究中,利用Sellmeier模型获得了Si上MgO薄膜在可见光波段的折射率参数(550 nm处折射率为1.6
关键词:
MgO薄膜
择优取向
直流溅射
折射率拟合 相似文献
8.
分别采用sol-gel法和磁控溅射法在Si(001)单晶衬底上制备出(111)和(001)取向的MgO缓冲层薄膜,随后在其上生长Ba0.7Sr0.3TiO3(BST30)铁电薄膜.通过X射线衍射,扫描电子显微镜,原子力显微镜等方法研究了薄膜的微结构.实验结果发现,在较厚的MgO(001)缓冲层上可长出(101)取向的BST30薄膜,而在较薄的MgO(111) 缓冲层上则表现出(101)和(111)取向相互竞争的现象,随着MgO(111)缓冲
关键词:
0.7Sr0.3TiO3')" href="#">Ba0.7Sr0.3TiO3
铁电薄膜
择优取向
sol-gel 相似文献
9.
本文采用脉冲激光沉积(PLD)方法在熔石英衬底上制备了Sr0.75Ba0.25Nb2O6(SBN0.75)光波导薄膜,采用Hitachi U-3410紫外-可见分光光度计对SBN0.75薄膜的透射谱进行测量,编程计算得到了薄膜折射率色散关系,同时得到SBN0.75薄膜的厚度和光学带隙分别为647.0nm和3.97eV。采用Metricon 2010棱镜耦合仪测量得到SBN0.75光波导薄膜中能激发的TE模式有4个,TM模式有3个。波长在632.8nm处薄膜的折射率为2.2818。并利用透射谱计算得出的薄膜的折射率和厚度值,根据波导理论导光模本征值的有效折射率表达式,对SBN0.75薄膜中能激发的导光模个数及其对应有效折射率进行图解,其结果与棱镜耦合仪所测得的结果非常吻合。 相似文献
10.
《中国光学与应用光学文摘》2005,(3)
O484.5 2005032081 铁电SBN薄膜电光系数的测量及其在波导中的应用= Measurement of electrooptic coefficients in SBN60 thin films and their applications in Mach-Zehnder type waveguide modulators[刊,中]/沈智如(浙江大学现代光学 仪器国家重点实验室.浙江,杭州(310027)),叶辉…∥光 学学报.-2005,25(1).-121-125 利用溶胶-凝胶法在MgO(001)衬底上获得c轴择优 取向的铁电铌酸锶钡(SBN)薄膜,主要介绍MgO(001)衬 相似文献
11.
铌酸锶钡薄膜的微结构与电光性能的研究 总被引:3,自引:1,他引:2
本文叙述了使用溶胶凝胶法在MgO(0 0 1)的衬底上制备铌酸锶钡薄膜的过程 ,膜层厚度可达 5 μm。通过X射线衍射、摇摆曲线、扫描、拉曼散射光谱等方法研究了薄膜的微结构性能 ,实验发现 ,铌酸锶钡薄膜具有了较好的 (0 0 1)方向的优先取向性能 ,并且随着薄膜厚度的增加 ,其晶体取向性也会随之不断改进。熔石英的透明衬底上生长的SBN薄膜具有较大的电致双折射效应 ,其有效电光系数能够高达 6 6 2× 10 -11m/V。 相似文献
12.
X.T. Li P.Y. Du H. Ye C.L. Mak K.H. Wong 《Applied Physics A: Materials Science & Processing》2008,92(2):397-400
Textured LixNi2-xO (LNO) thin films have been fabricated on (001)MgO substrates by pulsed laser deposition technique. The as-deposited LNO
films shows a conductivity of 2.5×10-3 Ω m and possess a transmittance of about 35% in the visible region. Subsequent deposition of Sr0.6Ba0.4Nb2O6 (SBN60) thin film on these LNO-coated MgO substrates resulted in a textured SBN layer with a 〈001〉 orientation perpendicular
to the substrate plane. Phi scans on the (221) plane of the SBN layer indicated that the films have two in-plane orientations
with respect to the substrate. The SBN unit cells were rotated in the plane of the film by ± 8.2° as well as ± 45° with respect
to the LNO/MgO substrate. Besides the highly (00l)-orientation, the SBN films also exhibited a dense microstructure as shown
by scanning electron microscopy. The electro-optic coefficient (r33) of the SBN film was measured to be 186 pm/V. On the basis of our results, we have demonstrated that the LNO film can be
used as a buffer layer as well as a transparent bottom electrode for waveguide applications. The SBN/LNO heterostructure is
also a suitable candidate for integrated electro-optics devices.
PACS 42.79.Gn; 42.82.Et; 78.20.Ci 相似文献
13.
采用溶胶凝胶法在Si(001)基片上制备铁电铌酸锶钡薄膜,使用X射线衍射、摇摆曲线、扫描电子显微镜、喇曼散射光谱等测试手段研究薄膜的微结构与薄膜厚度之间的关系,制备的薄膜厚度可达到5μm.实验发现,随着薄膜厚度的增加,SBN60和SBN75薄膜在(001)方向的优先取向性越来越好.随着膜层的增加,处于底层的膜层能够起到缓冲层的作用,以逐渐改善薄膜与基片之间的晶格失配,从而使得晶体的结晶取向性越来越好. 相似文献
14.
采用脉冲激光沉积(PLD)工艺,制备了以Bi4Ti3O12(BIT)为过渡阻挡层的Au/PZT/BIT/p-Si异质结.研究了BIT铁电层对Pb(Zr0.52Ti0.48)O3(PZT)薄膜晶相结构、铁电及介电性能的影响,对Au/PZT/BIT/p-Si异质结的导电机制进行了讨论.氧气氛530℃淀积的PZT为多晶铁电薄膜,与直接淀积在Si基片上相比,加入BIT铁电层后PZT铁
关键词:
铁电薄膜
异质结构
脉冲激光沉积(PLD) 相似文献
15.
《Current Applied Physics》2015,15(3):194-200
BiFeO3 (BFO) thin films with thickness increasing from 40 to 480 nm were successfully grown on LaNiO3 (LNO) buffered Pt/Ti/SiO2/Si(100) substrate and the effects of thickness evolution on magnetic and ferroelectric properties are investigated. The LNO buffer layer promotes the growth and crystallization of BFO thin films. Highly (100) orientation is induced for all BFO films regardless of the film thickness together with the dense microstructure. All BFO films exhibited weak ferromagnetic response at room temperature and saturation magnetization is found to decrease with increase in film thickness. Well saturated ferroelectric hysteresis loops were obtained for thicker films; however, the leakage current dominated the ferroelectric properties in thinner films. The leakage current density decreased by three orders of magnitude for 335 nm film compared to 40 nm film, giving rise to enhanced ferroelectric properties for thicker films. The mechanisms for the evolution of ferromagnetic and ferroelectric characteristics are discussed. 相似文献
16.
S.B. Xiong Z.M. Ye X.Y. Chen X.L. Guo S.N. Zhu Z.G. Liu C.Y. Lin Y.S. Jin 《Applied Physics A: Materials Science & Processing》1998,67(3):313-316
x Ba1-xNb2O6 (x=0.5) films (abbreviated as SBN:0.5) on SiO2-coated Si substrates are potential components for the application of integrated electro-optics devices. SBN:0.5 optical waveguiding
thin films on SiO2-coated Si substrates with a very thin MgO diffusion buffer have been successfully prepared by pulsed laser deposition. The
as-grown films have a refractive index of 2.28, which is close to that of bulk SBN. X-ray analysis showed that the as-grown
films have a single-phase tetragonal tungsten bronze structure. The SBN:0.5 thin films prepared by PLD exhibit favorable ferroelectric
and optical waveguiding properties. The composition and the morphology of the films were also examined by XPS and by SEM,
respectively. Ferroelectric SBN:0.5 optical waveguiding thin films on SiO2-coated Si substrates are expected to be used in integrated electro-optic devices.
Received: 27 February 1997/Accepted: 17 October 1997 相似文献