应力导致InAs/In0.15Ga0.85As量子点结构中In0.15Ga0.85As阱层的合金分解效应研究

利用固源分子束外延技术，在In_0.15Ga_0.85As/GaAs量子阱生长了两个InAs/In_0.15Ga_0.85As量子点(DWELL)样品.通过改变其中一个InAs DWELL样品中的In_0.15Ga_0.85As阱层的厚度和生长温度，获得了量子点尺寸增大而且尺寸分布更均匀的结果.结合光致发光光谱(PL)和压电调制光谱(PzR)实验结果，发现该样品量子点的光学性质也同时得到 关键词： 合金分解效应 0.15Ga_0.85As量子点')" href="#">InAs/In_0.15Ga_0.85As量子点 光致发光光谱 压电调制光谱     

Optimum Indium Concentration for Growth of 1.3μmInAs/InxGa1-xAs Quantum Dots in a Well

Five InAs/InxGa1-xAs quantum dots in a well （DWELL） with different indium concentration x are grown by solid source molecular beam epitaxy. The high quantum dot density is observed in the InAs/In0.3Ga0.7As DWELL. The photoluminescence （PL） experiments indicate that the ground state peaks of InAs/In0.15 Ga0.85As and InAs/In0.22 Ga0.78As DWELLs shift to 1.31 and 1.33μm, respectively. The optical properties are investigated by using the PL and piezoreflectance spectroscope methods. An abnormal blue shift has been observed with the further increase of x from 0.22 to 0.30.     

高In组分InGaNAs/GaAs量子阱的生长及发光特性

采用分子束外延技术(MBE)在Ga As衬底上外延生长高In组分(40%)In Ga NAs/Ga As量子阱材料,工作波长覆盖1.3~1.55μm光纤通信波段。利用室温光致发光(PL)光谱研究了N原子并入的生长机制和In Ga NAs/Ga As量子阱的生长特性。结果表明:N组分增加会引入大量非辐射复合中心;随着生长温度从480℃升高到580℃,N摩尔分数从2%迅速下降到0.2%;N并入组分几乎不受In组分和As压的影响,黏附系数接近1;生长温度在410℃、Ⅴ/Ⅲ束流比在25左右时,In_(0.4)Ga_(0.6)N_(0.01)As_(0.99)/Ga As量子阱PL发光强度最大,缺陷和位错最少;高生长速率可以获得较短的表面迁移长度和较好的晶体质量。     

MOCVD-Ga0.4In0.6As0.85P0.15/InP分布布喇格反射镜的反射率

采用MOCVD方法在InP衬底上制备了高质量的四元合金Ga0.4In0.6As0．85P0.15和InP外延层,用椭圆偏光仪测得Ga0.4In0.6As0.85P0.15和InP外延层的折射率。由这两种具有不同折射率的半导体材料交替生长构成不同周期的分布布喇格反射镜(DBR)。研究了不同周期的DBR结构的反射率与波长及反射率与DBR结构周期数的关系。根据多层膜增反原理,当中心波长为1．55um时,反射率随周期数增加迅速增加,周期数为23时,反射率可达99．97％。利用MOCVD技术,通过Ga0.4In0.6As0.85P0.15/InP的交替生长,成功地获得周期数分别为3,4,7,11,15,19,23的分布布喇格反射镜(DBR)。实验结果表明,已获得表面如镜面状的二元InP外延层,而组分x,y分别为0．4,0．85的四元合金,因其处于混溶隙,外延层表面较粗糙,未获得镜面状表面。反射率的测量结果表明,反射镜的反射率随周期数的增加而升高,当DBR的周期数为23时,反射率为54．44％,与理论结果尚存在一定差距。     

生长温度和结构参数对InGaAs／GaAs量子阱光学特性的影响

研究了不同生长温度下制备的In0.15Ga0.85As/GaAs应变量子阱的PL谱,结果表明,生长温度越高,In偏析和In-Ga互混越严重,同时,导致更多的In脱附,PL谱发光峰蓝移。对不同In含量的和不同InGaAs厚度的InGaAs/GaAs量子阱进行PL谱测试,分析表明In含量<0.2,生长温度低于560℃时,In含量和InGaAs层量子阱的厚度对In偏析、脱附和In-Ga互混基本没有影响。     

As压调制的InAlAs超晶格对InAs纳米结构形貌的影响

利用固源分子束外延设备生长出InAs/InAlAs/InP(001)纳米结构材料, 探讨了As压调制的InAlAs超晶格对InAs纳米结构形貌的影响. 结果表明, As压调制的InAlAs超晶格能控制InAs量子线的形成, 导致高密度均匀分布的量子点的生长. 结果有利于进一步理解量子点形貌控制机理. 分析认为, InAs纳米结构的形貌主要由InAlAs层的各向异性应变分布和In吸附原子的各向异性扩散所决定.     

带有InGaAs覆盖层的InAs量子点红外探测器材料的发光与光电响应

利用分子束外延技术(MBE),在GaAs(001)衬底上自组织生长了不同结构的InAs量子点样品,并制备了量子点红外探测器件。利用原子力显微镜(AFM)和光致发光(PL)光谱研究了量子点的表面结构、形貌和光学性质。渐变InGaAs层的插入有效地释放了InAs量子点所受的应力,抑制了量子点中In组分的偏析,提高了外延层的生长质量,降低了势垒高度,使InAs量子点荧光波长红移。伏安特性曲线和光电流(PC)谱结果表明,生长条件的优化提高了器件的红外响应,具有组分渐变的InGaAs层的探测器响应波长发生明显红移。     

双δ掺杂In0.65Ga0.35As/In0.52Al0.48As赝型高迁移率晶体管材料子带电子特性研究

研究了基于InP基的In0.65Ga0.35As/In0.52Al0.48As赝型高迁移率晶体管材料中纵向磁电阻的Shubnikov-deHaas(SdH)振荡效应和霍耳效应,通过对纵向磁电阻SdH振荡的快速傅里叶变换分析,获得了各子带电子的浓度,并因此求得了各子带能级相对于费米能级的位置.联立求解Schrdinger方程和Poisson方程,自洽计算了样品的导带形状、载流子浓度分布以及各子带能级和费米能级位置.理论计算和实验结果很好符合.实验和理论计算均表明,势垒层的掺杂电子几乎全部转移到了量子阱中,转移率在95%以上.     

钝化低温法生长多层InGaN量子点的结构和光学特性

采用一种新方法生长多层InGaN/GaN量子点,研究所生长样品的结构和光学特性。该方法采用了低温生长和钝化工艺,所以称之为钝化低温法。第一层InGaN量子点的尺寸平均宽度40nm,高度15nm,量子点密度为6.3×10¹⁰/cm²。随着层数的增加,量子点的尺寸也逐渐增大。在样品的PL谱测试中,观察到在In(Ga)As材料系中普遍观察到的量子点发光的温度特性---超长红移现象。它们的光学特性表明:采用钝化低温法生长的纳米结构中存在零维量子限制效应。     

插入生长AlGaAs薄膜对InAs量子点探测器性能的影响

利用分子束外延生长获得的两个InAs量子点样品制备了n型的量子点红外探测器.对于其中一个器件,在InAs量子点有源区的底部和顶部分别插入生长了AlGaAs势垒层.利用透射电阻显微技术研究了两个样品的结构特性;利用光致发光光谱和光电流谱研究了两个器件的光电性质.实验结果表明,AlGaAs层的插入对器件的探测性质有显著的影响.利用有三维效质量近似模型的计算结果,指认了带内光电流谱中峰结构的起源. 关键词： InAs 量子点 AlGaAs薄膜 光致发光光谱 有效质量近似模型     

High and abrupt breakdown voltage In0.15Ga0.85As0.14Sb0.86/GaSb junctions grown by LPE

p-GaInAsSb/n-GaSb junction with breakdown voltages as high as 38 V and abrupt breakdown characteristic have been fabricated by Liquid Phase Epitaxy. To obtain these characteristics the structures have been submitted to annealing processes just after epitaxial growth. The diffusion of dopant from the n-GaSb substrate towards the epitaxial layer separates the electrical junction from the epitaxial interface and produces junctions with better inverse polarization behavior.     

Study of single event effect for the InP-based HEMT with In0.53Ga0.47As/In0.3Ga0.7As/In0.7Ga0.3As composite channel

In this study, the single event effects in In_0.53Ga_0.47As/In_0.3Ga_0.7As/In_0.7Ga_0.3As composite channel InP-based HEMT are investigated using TCAD simulation for the first time. Due to the higher conduction band difference between bottom In_0.7Ga_0.3As channel and InAlAs buffer, the electrons in the buffer layer induced by ions strike cannot enter the channel, led to reduce the peak concentration in the composite channel and significantly weakened the drain current for composite channel device. Meanwhile, higher barrier height under the gate for composite channel InP-based HEMT is formed after particle strike, and further attenuate the drain current. Therefore, the single event effects can be effectively reduced by designing channel structure. In addition, drain voltage and incident position also show significant impact drain current. With the increase in the drain voltage, the drain current increase and the most sensitive incident position is the gate electrode for the device.     

Active region design of a terahertz GaN/ Al0.15Ga0.85N quantum cascade laser

We propose the idea of developing THz quantum cascade lasers (QCLs) with GaN-based quantum well (QW) structures with significant advantages over the currently demonstrated THz lasers in the GaAs-based material system. While the ultrafast longitudinal optical (LO) phonon scattering in AlGaN/GaN QWs can be used for the rapid depopulation of the lower laser state, the large LO-phonon energy (∼90 meV) can effectively reduce the thermal population of the lasing states at higher temperatures. Our analysis of one particular structure has shown that a relatively low threshold current density of 832 A/cm² can provide a threshold optical gain of 50/cm at room temperature. We have also found that the characteristic temperature in this structure is as high as 136 K.     

Annealing of ion-implanted Ga0.47In0.53As

We have investigated annealing of ion-implanted GaInAs using transmission electron microscopy. We have found that the best condition for the post-implantation anneals for GalnAs is a 30 second anneal at a temperature of 700–800°C. This produces a material similar in character to the untreated GaInAs. Anneals for longer than 30 seconds produce crystal defects becoming increasingly complex with time for similar temperatures.     

三元系和四元系GaN基量子阱结构的显微结构

GaN基量子阱是光电子器件如发光二极管、激光二极管的核心结构。实验表明,采用InGaN/GaN三元和AlInGaN/GaN四元两种不同量子阱结构的激光二极管的发光性质和发光效率有明显差别,研究了这两种不同量子阱结构的显微特征。利用原子力显微镜表征了样品的(001)面;通过高分辨X射线衍射对两种量子阱结构的(002)面作ω/2θ扫描测得其卫星峰并分析了两种不同量子阱结构的界面质量;利用X射线衍射对InGaN/GaN和AlInGaN/GaN这两种量子阱的(002)、(101)、(102)、(103)、(104)、(105)和(201)面做ω扫描,进而得到其摇摆曲线。最后利用PL谱研究了它们的光学性能。通过这些显微结构的分析和研究,揭示了InGaN/GaN三元和AlInGaN/GaN四元两种不同量子阱结构宏观性质不同的结构因素。     

Optical Properties of Strained Wurtzite GaN/Al0.15 Ga0.85 N Cylindrical Quantum Dots: Effects of Hydrostatic Pressure

在有效质量近似下,考虑强的内建电场和应变对材料参量的影响,变分研究了流体静压力对有限高势垒应变纤锌矿GaN/Al0.15Ga0.85 N柱形量子点中重空穴激子的结合能、发光波长和电子空穴复合率的影响.数值结果表明,激子结合能和电子空穴复合率随流体静压力的增大而近线性增大,发光波长随流体静压力的增大而单调减小.在量子点尺寸较小的情况下,流体静压力对激子结合能和电子空穴复合率的影响更明显.由于应变效应,为了获得有效的电子-空穴复合过程,GaN量子点的高度必须小于5.5 nm.     

Investigation of barrier tunneling characteristics of symmetrical double quantum well in In0.25Ga0.75As/GaAs/In0.25Ga0.75As heterostructure

The optical and electrophysical properties of the GaAs/In_0.25Ga_0.75As heterostructure with a symmetric double quantum well have been investigated. The influence of tunneling electrons and holes through an internal barrier of the quantum well on the shift and splitting of the quantum levels is analyzed. The theoretical estimates are compared with the results of the photoluminescence and photoconductivity measurements. The Hall measurements indicate that the barrier strongly affects the mobility of charge carriers.