Al2O3薄膜/纳米Ag颗粒复合结构的光吸收谱及增强Raman散射光谱研究

Al₂O₃介质薄膜与纳米Ag颗粒构成的复合结构,被应用于表面增强Raman散射探测实验中,其中Al₂O₃介质薄膜对纳米Ag颗粒的吸收谱及增强Raman散射光谱的影响被特别关注.该复合结构的光学特性表征出纳米Ag颗粒的偶极振荡特性.从光吸收谱中可以看到,其共振吸收谱随Al₂O₃介质薄膜厚度增加而在整个谱域上发生红移,表明纳米Ag颗粒的周围介电常数随Al₂O₃介质薄膜厚度的增加而增大.采用罗丹明6G作为探针原子,6个Raman特征峰的平均增益值作为表征表面增强Raman散射衬底增益程度的量度.实验结果表明,Al₂O₃介质薄膜层的引入提高了纳米Ag颗粒的衬底介电常数,并引起了散射共振的增强,从而使表面增强Raman散射强度提高.     

降低表面等离子激元寄生吸收损失的途径研究

从纳米Ag颗粒表面等离子激元光学及表面高能电场特性两方面入手,较为系统地研究了周围介质的导电特性对表面等离子激元的影响.通过对复合薄膜紫外-可见-近红外光谱及表面增强拉曼散射光谱的分析,指出绝缘性的Al₂O₃介质薄膜能够起到良好的表面电场定域效果,且不会引入附加的光吸收损失;而导电性的ITO薄膜则会引入表面价电子的溢出损失,加速了表面电场的衰逝,同时引起长波方向上显著的光吸收损失.研究还表明致密的Al₂O₃介质薄膜能够起到良好的屏蔽作用,且纳米Ag颗粒表面等离子激元特性仅受最近邻材料特性的影响.研究结果为在硅基薄膜太阳电池中实现对纳米Ag颗粒的阻挡、寄生光吸收损失的降低以及表面高能电场的利用,提供了一条有效的解决途径.     

Au/SiO2纳米多层薄膜的制备及其性质表征

利用多靶磁控溅射技术制备了Au/SiO₂纳米颗粒分散氧化物多层复合薄膜.研究了在保持Au单层颗粒膜沉积时间一定时薄膜厚度一定、变化SiO₂的沉积时间及SiO₂的沉积时间一定而改变薄膜厚度时，多层薄膜在薄膜厚度方向的微观结构对吸收光谱的影响.研究结果表明：具有纳米层状结构的Au/SiO₂多层薄膜在560 nm波长附近有明显的表面等离子共振吸收峰，吸收峰的强度随Au颗粒的浓度增加而增强，在Au颗粒浓度相同的情况下，复合薄膜 关键词： 2纳米复合薄膜')" href="#">Au/SiO₂纳米复合薄膜 多靶磁控溅射 吸收光谱 有效介质理论     

金属纳米团簇复合薄膜Au/BaTiO3与Fe/BaTiO3的PLD制备及其光吸收特征

用脉冲激光沉积技术制备了掺杂纳米金属颗粒Au或Fe的BaTiO₃复合薄膜.用透射电子显微镜和x射线光电子能谱表征了金属颗粒的形态和化学态.330—800nm范围的吸收谱研究表明，掺Au颗粒的BaTiO₃薄膜在580nm附近有一个明显的共振吸收峰，而掺Fe颗粒的BaTiO₃薄膜没有这样的吸收峰.用Mie散射理论对结果进行了分析. 关键词： 复合薄膜 金属颗粒 脉冲激光沉积 吸收谱     

微弧等离子喷涂碳纳米管/纳米Al2O3-TiO2复合涂层的吸波性能研究

将碳纳米管与纳米Al₂O₃-TiO₂陶瓷粉末超声共混制备了碳纳米管/纳米Al₂O₃-TiO₂复合粉末,测试了复合粉末在2—18GHz波段的电磁参数.研究表明：随着碳纳米管质量分数的增加,碳纳米管/纳米Al₂O₃-TiO₂复合粉末的复介电常数和损耗角不断增大.当碳纳米管质量分数和厚度增加时,复合粉末对电磁波的反射率峰值先增加后减小,而谐振频率不断向低频移动.采用微弧等离子喷涂制备了7wt%碳纳米管/纳米Al₂O₃-TiO₂复合吸波涂层,当厚度为1.5mm时,涂层最小反射率为-24.0dB,当厚度为2.0mm时,涂层小于-10dB的频带宽为3.60GHz,当温度为500℃高温时,1.0mm厚的涂层最小高温反射率为-12.2dB,小于-10dB频带宽为2.0GHz.复合涂层的实际厚度D与理论厚度d呈线关系：d=0.898D+0.515. 关键词： 等离子喷涂 碳纳米管 2O₃-TiO₂')" href="#">纳米Al₂O₃-TiO₂ 吸波性能     

Ag-SiO2复合薄膜形貌和吸收特性的研究

通过分层镀膜的方式制备Ag和SiO₂的分层结构，经过快速热退火后，Ag颗粒扩散到复合薄膜的表面附近. 通过改变Ag颗粒扩散的距离(SiO₂的膜厚)，可很好地控制Ag颗粒在复合薄膜表面附近的大小，浓度和形貌，进而对共振吸收特性产生影响. 在实验中，根据Ag颗粒扩散的长度来调节退火的时间. 发现经过足够长的时间(17.5min)后，Ag颗粒会形成平行于衬底的平面团簇. 由于Ag原子在平面团簇之间容易扩散，使得Ag颗粒的粒径平均值变小并趋于某一特定的半径，且粒径分布范围变小，导致吸收谱发生蓝移，吸收带变窄，且强度增加. 关键词： 复合薄膜 共振吸收 平面团簇     

TiN/Al2O3纳米多层膜的共格外延生长及超硬效应

采用多靶磁控溅射法制备了一系列具有不同Al₂O₃调制层厚度的TiN/Al₂O₃纳米多层膜. 利用X射线能量色散谱、X射线衍射、扫描电子显微镜、高分辨透射电子显微镜和微力学探针表征了多层膜的成分、微结构和力学性能. 研究结果表明，在TiN/Al₂O₃纳米多层膜中，单层膜时以非晶态存在的Al₂O₃层在厚度小于1.5 nm时因TiN晶体层的模板效应而晶化，并与TiN层形成共格外延生长，相应地，多层膜产生硬度明显升高的超硬效应，最高硬度可达37.9 GPa. 进一步增加多层膜中Al₂O₃调制层的层厚度，Al₂O₃层逐渐形成非晶结构并破坏了多层膜的共格外延生长，使得多层膜的硬度逐步降低. 关键词： 2O₃纳米多层膜')" href="#">TiN/Al₂O₃纳米多层膜 外延生长 非晶晶化 超硬效应     

镶嵌在SiO2薄膜中InAs纳米颗粒的Raman散射

对镶嵌在SiO₂薄膜中纳米InAs颗粒的Raman散射谱进行了研究.与大块InAs晶体相比,InAs纳米颗粒的Raman散射谱具有相似的特征,即由纵光学声子模和横光学声子模组成,但是散射峰宽化并红移.用声子限域效应解释了散射峰的红移现象,并结合InAs纳米颗粒的应力效应解释了红移量与理论值的差异. 关键词： 2薄膜')" href="#">SiO₂薄膜 InAs量子点 Raman散射     

Al2O3-Y2O3-ZrO2三相复合陶瓷的介电谱研究

采用传统的固相反应法,在1400–1500 ℃下烧结,制备得到Al₂O₃-Y₂O₃-ZrO₂三相复合陶瓷.样品的结构、形貌和电性能分别用X射线衍射(XRD)、扫描电子显微镜(SEM)及介电谱表征.XRD表明此三相复合体系无其他杂相,加入Y₂O₃及ZrO₂后使得Al₂O₃成瓷温度降低;SEM表明此体系晶粒直径为200–500 nm,并且样品随烧结温度的升高而变得更加致密,晶界更加清晰;介电损耗谱中出现峰值弛豫现象,根据Cole-Cole复阻抗谱得出其为非德拜弛豫. 关键词： 2O₃-Y₂O₃-ZrO₂三相陶瓷')" href="#">Al₂O₃-Y₂O₃-ZrO₂三相陶瓷 介电弛豫 阻抗谱 热导率     

SHS等离子喷涂制备FeAl2O4-Al2O3-Fe纳米复合涂层的研究

利用SHS等离子喷涂技术，将经过机械团聚法制备的Fe₂O₃-Al复合粉体送入等离子焰流，沉积出厚度约为400 μm的复合涂层.利用XRD，SEM 和TEM等检测手段对涂层的成分和组织进行了分析，测定了涂层的显微硬度、断裂韧性以及耐磨性.结果表明涂层为具有纳米结构的FeAl₂O₄-Al₂O₃-Fe纳米复合组织；涂层的显微硬度为HV_100g870；断裂韧性是普通Al₂O₃涂层的2倍；无润滑磨损的耐磨性是普通Al₂O₃涂层的2.5倍. 关键词： SHS等离子喷涂 纳米涂层 断裂韧性     

Silver macro‐texture substrates fabricated by plasma selective etching for surface‐enhanced Raman scattering

We have demonstrated a novel method to generate the nanostructured substrate that shows a large enhancement with a spatially uniform enhancement factor of approximately 10⁶ in surface enhanced Raman scattering (SERS). The substrates are fabricated using plasma selective etching. First, the Al₂O₃–TiC template which contains mixed Al₂O₃ and TiC grains with the diameters of ~400 nm is selected as a base plate. The Al₂O₃ and TiC grains have different physical properties, such as hardness, which corresponds to different etching rate in a plasma gas. Then, the Al₂O₃–TiC substrate is selectively etched to generate a random macro‐texture (MT) with different depths using the plasma of mixed gas of Ar and C₂H₄. Third, the MT substrate is deposited with a silver film (Ag). We further demonstrate that by varying the thickness of Ag layer, the EF is different which is confirmed by the plasmonic localized electric fields calculations using finite difference time domain. Finally, we combine this novel Ag MT substrate with ultrathin dielectric film, and the prepared substrates are coated with a 10 Å ta‐C film. The 10 Å ta‐C film can protect the oxygen‐free Ag in air and prevent Ag ionizing in aqueous solutions. More importantly, the ultrathin ta‐C can release the strongest plasmonic electric field to the outside of ta‐C layer and get a higher electric field than the uncoated Ag substrate. We expect that this method has more potential applications in analytic assays using SERS technology. Copyright © 2012 John Wiley & Sons, Ltd.     

The film thickness dependent thermal stability of Al<Subscript>2</Subscript>O<Subscript>3</Subscript>:Ag thin films as high-temperature solar selective absorbers

The monolayer Al₂O₃:Ag thin films were prepared by magnetron sputtering. The microstructure and optical properties of thin film after annealing at 700 °C in air were characterized by transmission electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy, and spectrophotometer. It revealed that the particle shape, size, and distribution across the film were greatly changed before and after annealing. The surface plasmon resonance absorption and thermal stability of the film were found to be strongly dependent on the film thickness, which was believed to be associated with the evolution process of particle diffusion, agglomeration, and evaporation during annealing at high temperature. When the film thickness was smaller than 90 nm, the film SPR absorption can be attenuated until extinct with increasing annealing time due to the evaporation of Ag particles. While the film thickness was larger than 120 nm, the absorption can keep constant even after annealing for 64 h due to the agglomeration of Ag particles. On the base of film thickness results, the multilayer Al₂O₃:Ag solar selective thin films were prepared and the thermal stability test illustrated that the solar selectivity of multilayer films with absorbing layer thickness larger than 120 nm did not degrade after annealing at 500 °C for 70 h in air. It can be concluded that film thickness is an important factor to control the thermal stability of Al₂O₃:Ag thin films as high-temperature solar selective absorbers.     

Surface‐enhanced Raman scattering investigations on silver nanoparticles deposited on alumina and titania nanotubes: influence of the substrate material on surface‐enhanced Raman scattering activity of Ag nanoparticles

Silver nanoparticles deposited on various ‘inert’ porous materials (mainly Al₂O₃ and TiO₂) are often used as substrates for surface‐enhanced Raman scattering (SERS) measurements. In this study, we used the sputter deposition technique to cover tubular arrays of Al₂O₃ and TiO₂ with Ag nanoparticles. Raman spectra of pyridine (as a probe molecule) and of two selected dyes (5‐(4‐dimethylaminobenzylidene)rhodanine and 5‐(4‐(dimethylamino)benzylidene)‐3‐(3‐methoxypropyl)rhodanine) adsorbed on fabricated Ag/TiO₂‐n/Ti and Ag/Al₂O₃‐n/Al substrates were measured. We found that the SERS spectra of pyridine adsorbed on Ag nanoparticles deposited on an Al₂O₃‐n/Al substrate are distinctly different from those measured for an Ag/TiO₂‐n/Ti composite. Similar effects were observed for dyes adsorbed on the surface of both composites. The spectral differences between two kinds of composites (Ag/TiO₂‐n/Ti and Ag/Al₂O₃‐n/Al) are discussed in terms of (1) the modified electronic structure of the Ag nanoparticles due to their interaction with different substrate materials and (2) the different atomic topology of the metal particles thus deposited on the surfaces of the substrates. Composite samples were also studied with the aid of scanning electron microscopy (SEM) and Auger electron spectroscopy (AES) to reveal their characteristic morphological and chemical features. Copyright © 2012 John Wiley & Sons, Ltd.     

Plasmonics properties of trimetallic Al@Al2O3@Ag@Au and Al@Al2O3@AuAg nanostructures

Bimetallic and trimetallic nanoparticles have attracted significant attention in recent times due to their enhanced electrochemical and catalytic properties compared to monometallic nanoparticles. The numerical calculations using Mie theory has been carried out for three-layered metal nanoshell dielectric–metal–metal (DMM) system consisting of a particle with a dielectric core (Al@Al₂O₃), a middle metal Ag (Au) layer and an outer metal Au (Ag) shell. The results have been interpreted using plasmon hybridization theory. We have also prepared Al@Al₂O₃@Ag@Au and Al@Al₂O₃@AgAu triple-layered core–shell or alloy nanostructure by two-step laser ablation method and compared with calculated results. The synthesis involves temporal separations of Al, Ag, and Au deposition for step-by-step formation of triple-layered core–shell structure. To form Al@Ag nanoparticles, we ablated silver for 40 min in aluminium nanoparticle colloidal solution. As aluminium oxidizes easily in water to form alumina, the resulting structure is core–shell Al@Al₂O₃. The Al@Al₂O₃ particle acts as a seed for the incoming energetic silver particles for multilayered Al@Al₂O₃@Ag nanoparticles is formed. The silver target was then replaced by gold target and ablation was carried out for different ablation time using different laser energy for generation of Al@Al₂O₃@Ag@Au core–shell or Al@Al₂O₃@AgAu alloy. The formation of core–shell and alloy nanostructure was confirmed by UV–visible spectroscopy. The absorption spectra show shift in plasmon resonance peak of silver to gold in the range 400–520 nm with increasing ablation time suggesting formation of Ag–Au alloy in the presence of alumina particles in the solution.     

Pt–Al2O3 nanocoatings for high temperature concentrated solar thermal power applications

Nano-phased structures based on metal–dielectric composites, also called cermets (ceramic–metal), are considered among the most effective spectral selective solar absorbers. For high temperature applications (stable up to 650 °C) noble metal nanoparticles and refractory oxide host matrices are ideal as per their high temperature chemical inertness and stability: Pt/Al₂O₃ cermet nano-composites are a representative family. This contribution reports on the optical properties of Pt/Al₂O₃ cermet nano-composites deposited in a multilayered tandem structure. The radio-frequency sputtering optimized Pt/Al₂O₃ solar absorbers consist of stainless steel substrate/ Mo coating layer/ Pt–Al₂O₃/ protective Al₂O₃ layer and stainless steel substrate/ Mo coating layer /Pt–Al₂O₃ for different composition and thickness of the Pt–Al₂O₃ cermet coatings. The microstructure, morphology, theoretical modeling and optical properties of the coatings were analyzed by the x-ray diffraction, atomic force, microscopy, effective medium approximation and UV–vis specular and diffuse reflectance.     

Experimental verification of a high performed multiple-band metamaterial absorber

In this paper, a thin-film metamaterial absorber with multiple-band is experimental verified and calculated analysis. Two absorption peaks higher than 99% and 98% are obtained at normal incidence. The resonance of the local surface plasma (LSP) mode and the internal surface plasmon (ISP) mode lead to the two high absorption peaks. The impedance matched condition is obtained behind two high absorption peaks. Measured results indicate that high absorption performed can be observed with different dielectric layer combinations (Al₂O₃–ZnSe, Al₂O₃–Al₂O_3, and ZnSe–ZnSe), which indicates that the designed metamaterial absorber is insensitive to the dielectric layer combination. High absorption performed is obtained under both TE and TM configurations at various incident angles.     

Fabrication of Al<Subscript>2</Subscript>O<Subscript>3</Subscript>/Al structure by nitric acid oxidation at room temperature

A thick Al₂O₃/aluminum (Al) structure has been fabricated by oxidation of Al with 68wt% and 98wt% nitric acid (HNO₃) aqueous solutions at room temperature. Measurements of the Al₂O₃ thickness vs. the oxidation time show that reaction and diffusion are the rate-determining steps for oxidation with 68wt% and 98wt% HNO₃ solutions, respectively. Observation of transmission electron micrographs shows that the Al₂O₃ layer formed with 68wt% HNO₃ has a structure with cylindrically shaped pores vertically aligned from the Al₂O₃ surface to the Al₂O₃/Al interface. Due to the porous structure, diffusion of HNO₃ proceeds easily, resulting in the reaction-limited oxidation mechanism. In this case, the Al₂O₃/Al structure is considerably rough. The Al₂O₃ layer formed with 98wt% HNO₃ solutions, on the other hand, possesses a denser structure without pores, and the Al₂O₃/Al interface is much smoother, but the thickness of the Al₂O₃ layer formed on crystalline Al regions is much smaller than that on amorphous Al regions. Due to the relatively uniform Al₂O₃ thickness, the leakage current density flowing through the Al₂O₃ layer formed with 68wt% HNO₃ is lower than that formed with 98wt% HNO₃.     

Water vapour sorption by mim systems

In studying the properties of the sandwich system Al-Al₂O₃-Au(Al) the capacitance of the system was found to depend on the humidity of the environment. The humidity induced capacitance change is reversible and can be explained assuming a process of physical sorption of water vapours by Al₂O₃ dielectric film. The sorption rate is independent of the oxide film thickness, which leads to a conclusion that mainly the sorption in the surface layer of the oxide is involved in the process. The sorption rate is, however, decreasing with increasing thickness of the upper evaporated electrode, which can be taken as an evidence of the fact that the water molecules penetrate to the oxide films through the upper metal layer whose coverage is not complete due to the porosity of the oxide film underneath.On the basis of our experimental results we come to a conclusion that even when the Al₂O₃ films are prepared by oxidation in a 3% solution of tartaric acid, their structure is porous. Proceeding from a simplified picture of the dielectric structure we propose an equivalent electrical scheme of the Al-Al₂O₃-Au Al system. The frequency characteristics measured at different environment humidities correspond to the dependences calculated for the proposed equivalent circuit.     

Al2O3介质层厚度对AlGaN/GaN金属氧化物半导体-高电子迁移率晶体管性能的影响

在蓝宝石衬底上采用原子层淀积法制作了三种不同Al₂O₃介质层厚度的绝缘栅高电子迁移率晶体管.通过对三种器件的栅电容、栅泄漏电流、输出和转移特性的测试表明：随着Al₂O₃介质层厚度的增加,器件的栅控能力逐渐减弱,但是其栅泄漏电流明显降低,击穿电压相应提高.通过分析认为薄的绝缘层能够提供大的栅电容,因此其阈值电压较小,但是绝缘性能较差,并不能很好地抑制栅电流的泄漏;其次随着介质厚度的增加,可以对栅极施加更高的正偏压,因此获 关键词： 2O₃')" href="#">Al₂O₃ 金属氧化物半导体-高电子迁移率晶体管 介质层厚度 钝化