阵列波导光栅解调系统光电集成中Si纳米线AWG的设计

设计了一种阵列波导光栅解调集成系统中的8通道Si纳米线阵列波导光栅波分复用器。根据材料的折射率设计了单模波导截面尺寸,利用光束传播法对所设计阵列波导光栅进行了模拟。结果表明,器件尺寸为200μm×219μm,远小于目前技术较成熟的硅基SiO2的尺寸,光功率分布符合高斯分布,信道间隔为1.8nm,串扰小于-21dB。对小尺寸AWG的设计具有参考意义。     

基于质子交换和刻蚀工艺的体铌酸锂阵列波导光栅

提出一种将质子交换技术和刻蚀技术结合的体铌酸锂波导和器件加工方案,基于质子交换的铌酸锂晶体相变特性改变,降低了质子交换区直接刻蚀难度,结合质子交换的纵向折射率改变和刻蚀波导的横向结构改变,波导尺寸显著降低,采用粒子群算法优化波导尺寸,最小可达2.5μm。基于该工艺方案设计了中心波长为1550 nm、四通道且通道间隔为400 GHz的阵列波导光栅,该阵列波导光栅的传输损耗约为6 dB,相邻通道间串扰均低于22 dB,整体尺寸仅为850μm×620μm,在高密度铌酸锂光子集成互连等场景具有较大的应用潜力。     

650 nm聚合物阵列波导光栅波分复用器设计

选择在可见光波段具有较低吸收损耗的聚甲基丙烯酸甲酯-甲基丙烯酸环氧丙酯 共聚物作为波导包层材料,使用双酚A型环氧树脂作为折射率调节剂,根据材料的折射率设计了单模波导截面尺寸;然后,采用束传播法优化设计出16信道阵列波导光栅(AWG)器件的版图结构。利用Optiwave软件模拟了AWG器件的光传输特性,结果显示,器件的信道间隔为0.845 01 nm,插入损耗小于14 dB,串扰小于-25 dB。     

阵列波导光栅线性系统理论分析及优化设计

运用线性系统理论分析了阵列波导光栅的模场特性 ,导出器件传输的数学模型即光栅方程。提出了设计阵列波导光栅阵列波导数M的新方法 ,该方法综合考虑了降低器件串扰以及收集发散光场的能力 ,与文献 [1 ]的方法相比简单且准确。分析了造成器件衍射损耗的原因 ,提出了降低器件衍射损耗的方法。给出了 8× 0 .8nm ,中心波长为 1 550nm的阵列波导光栅波分复用器的设计实例 ,并进行了数值模拟计算验证了文中所提方法的准确性。     

基于阵列波导光纤温度特性的分布式光纤布喇格光栅解调法

设计了一种使用阵列波导光栅对分布式光纤布喇格光栅中心波长较大范围变化的解调方法.根据阵列波导光栅各通道的中心波长可随温度变化而改变的特性,通过控制软件循环地在几分钟内使加在阵列波导光栅的芯片温度从30℃线性增加到90℃,同时用微机高速采集各通道的数据并分别找出各通道数据的最大值时刻所对应的阵列波导光栅芯片温度,从而根据其波长-温度关系在微机上报告此时各光纤布喇格光栅的中心波长.实验结果表明,系统有效地解决了分布式解调的问题, 微机以小于10 min的周期报告出每通道0.6 nm范围变化的光纤布喇格光栅中心波长(共40个通道),测量相对误差小于2%.     

基于阵列波导光纤温度特性的分布式光纤布喇格光栅解调法

设计了一种使用阵列波导光栅对分布式光纤布喇格光栅中心波长较大范围变化的解调方法.根据阵列波导光栅各通道的中心波长可随温度变化而改变的特性,通过控制软件循环地在几分钟内使加在阵列波导光栅的芯片温度从30℃线性增加到90℃,同时用微机高速采集各通道的数据并分别找出各通道数据的最大值时刻所对应的阵列波导光栅芯片温度,从而根据其波长-温度关系在微机上报告此时各光纤布喇格光栅的中心波长.实验结果表明,系统有效地解决了分布式解调的问题,微机以小于10min的周期报告出每通道0.6nm范围变化的光纤布喇格光栅中心波长(共40个通道),测量相对误差小于2%.     

49信道绝热低偏振相关全聚合物阵列波导光栅EI北大核心CSCD

研制了一种新型全聚合物49信道绝热低偏振相关阵列波导光栅(AWG)芯片。利用直接紫外光写入技术,实现了波导芯片的设计与制备。利用Matlab软件对AWG的传输特性进行了优化模拟,通过对聚合物衬底的热膨胀系数和聚合物波导的热光系数进行调控,得到了器件良好的绝热低偏振相关特性。测得AWG的中心波长为1550.918 nm,波长间隔为0.8 nm,插入损耗的信道变化范围是5.51 d B^10.62 d B,串扰大于20 d B,偏振漂移和温度变化分别是0.08 nm和0.03 nm/K。这种新技术十分适用于高性能多功能集成光路中,具有广阔的应用前景。     

49信道绝热低偏振相关全聚合物阵列波导光栅

研制了一种新型全聚合物49信道绝热低偏振相关阵列波导光栅(AWG)芯片。利用直接紫外光写入技术,实现了波导芯片的设计与制备。利用Matlab软件对AWG的传输特性进行了优化模拟,通过对聚合物衬底的热膨胀系数和聚合物波导的热光系数进行调控,得到了器件良好的绝热低偏振相关特性。测得AWG的中心波长为1550.918 nm,波长间隔为0.8 nm,插入损耗的信道变化范围是5.51 d B~10.62 d B,串扰大于20 d B,偏振漂移和温度变化分别是0.08 nm和0.03 nm/K。这种新技术十分适用于高性能多功能集成光路中,具有广阔的应用前景。     

O波段8通道硅基二氧化硅平坦化阵列波导光栅的设计及制备

设计并制作了一款应用于IEEE 200/400GbE标准802.3bs的阵列波导光栅.该阵列波导光栅使用2.0%的超高折射率差硅基二氧化硅材料,使得芯片尺寸及损耗较小.为了获得平坦化的接收光谱,将输出波导进行展宽,采用多模波导结构,激发若干个高阶模,数个模式叠加使得原本高斯状的光谱顶部产生平坦化,形成箱形接收光谱.设计的阵列波导光栅的中心波长为1 291.10nm,通道间隔为800GHz,芯片尺寸为11mm×4mm.经过等离子增强化学气相沉积和感应耦合等离子刻蚀工艺制备了芯片,测试结果表明最小的插入损耗为-3.3dB,相邻通道间串扰小于-20dB,单通道1dB带宽在2.12~3.06nm范围,实现了良好的解复用和平坦化效果,在实际光通信系统中有一定的实用价值.     

阵列波导光栅中心波长温度稳定性的研究

阵列波导光栅中心波长的温度不稳定性成为限制其应用的主要原因。为了设计温度不敏感阵列波导光栅,结合弹性多层板热应力理论和应力集中效应给出掩埋波导芯层应力的解析解,利用等效折射率法计算阵列波导的有效折射率及其温度系数,考虑波导材料折射率和波导长度随温度的变化得到了硅基二氧化硅阵列波导光栅中心波长的温度系数。并研究了贴有应力板的阵列波导光栅中心波长的温度特性,结果表明在芯片底部贴有0.37 mm厚的铝板时,TE模和TM模中心波长的温度系数分别是5.9 pm/℃和8.0 pm/℃,下降到传统阵列波导光栅中心波长温度系数的一半。     

A Silicon-Based Arrayed Waveguide Grating Operating in Two Communication Channels

Abstract

This article proposes a silicon-based arrayed waveguide grating operating in two wavelength bands simultaneously with central wavelengths of 1,550.12 nm and 1,310.12 nm. If input light to an arrayed waveguide grating consists of wavelengths around 1,550.12 nm, the proposed system will act as a four-channel demultiplexer with channel spacing of 0.8 nm. On the other hand, when input wavelengths are distributed around 1,310.12 nm, the same arrayed waveguide grating will divide the input to seven channels with channel spacing of 0.33 nm.     

Design and fabrication of wavelength tunable AWGs based on the thermo-optic effect

In this Letter, a 16 channel 200 GHz wavelength tunable arrayed waveguide grating(AWG) is designed and fabricated based on the silicon on insulator platform. Considering that the performance of the AWG, such as central wavelength and crosstalk, is sensitive to the dimension variation of waveguides, the error analysis of the AWG with width fluctuations is worked out using the transfer function method. A heater is designed to realize the wavelength tunability of the AWG based on the thermo-optic effect of silicon. The measured results show that the insertion loss of the AWG is about 6 d B, and the crosstalk is 7.5 d B. The wavelength tunability of 1.1 nm is achieved at 276 m W power consumption, and more wavelength shifts will gain at larger power consumption.     

Crosstalk analysis of silicon-on-insulator nanowire-arrayed waveguide grating

The factors influencing the crosstalk of silicon-on-insulator(SOI) nanowire arrayed waveguide grating(AWG) are analyzed using the transfer function method. The analysis shows that wider and thicker arrayed waveguides, outsider fracture of arrayed waveguide, and larger channel space, could mitigate the deterioration of crosstalk. The SOI nanowire AWGs with different arrayed waveguide widths are fabricated by using deep ultraviolet lithography(DUV) and inductively coupled plasma etching(ICP) technology. The measurement results show that the crosstalk performance is improved by about 7 d B through adopting 800 nm arrayed waveguide width.     

Analysis for fabrication errors of arrayed waveguide grating multiplexers

Based on the transmission theory, parameter optimization is performed, and effects of fabrication errors on transmission characteristics are analyzed for a 33×33 polymer arrayed waveguide grating (AWG) multiplexer around the central wavelength of 1550.918 nm with the wavelength spacing of 0.8 nm. Simulated results show that fabrication errors result in the shift of the transmission spectrum, and lead to the increase of the crosstalk compared with the device theoretically designed. Furthermore, accumulation and compensation of fabrication errors are investigated. In order to realize the normal demultiplexing of the fabricated AWG device, the allowed fabrication errors are discussed.     

Design and fabrication of arrayed waveguide grating using fluoropolymer PFS-co-GMA

A 33×33 polymer arrayed waveguide grating (AWG) multiplexer is optimized and fabricated. This device is made of polymeric materials named 2,3,4,5,6-pentafluorostyrene-co-glycidylmethacrylate (PFS-co-GMA). The central wavelength and wavelength spacing are designed to be 1550.918 and 0.8 nm, respectively. The calculated results are: the 3-dB bandwidth is about 0.24 nm, insertion loss is about 8.4 dB and crosstalk is −33.7 dB. The corresponding measured results are: the center wavelength is about 1550.85 nm, wavelength channel spacing is about 0.81 nm, 3-dB bandwidth is about 0.35 nm, crosstalk is about −20 dB, insertion loss is between 10.4 dB for the central port and 11.9 dB for the edge ports.     

Arrayed waveguide grating-based demultiplexer with two central wavelengths

In this paper we have presented an arrayed waveguide grating with two central wavelengths, 1550.12 nm and 1310.12 nm. Introducing a novel architecture for outputs of system, if input light to arrayed waveguide grating consists of wavelengths around 1550.12 nm, proposed system will act as 16 channels demultiplexer with channel spacing of 1.6 nm. On the other hand when input wavelengths are distributed around 1310.12 nm, the same arrayed waveguide grating will divide the input to 27 channels with channel spacing of 0.68 nm.     

A Distributed Fibre Bragg Grating Sensor Interrogator Employing a Reformative Arrayed Waveguide Grating

We present an interrogating technique employing a reformative arrayed waveguide grating without output waveguides in combination with a linear charge coupled device. A simple and effective data processing method called area equalized point is used to improve the system resolution. The simulation results show that the wavelength shift of a fibre Bragg grating with temperature can be precisely measured by this interrogation technique. The temperature accuracy and wavelength resolution of the sensor system are smaller than 0.08℃ and 0.8pm, respectively. If the FBG 3dB-bandwidth is 0.2nm with the wavelength spacing between two adjacent FBGs of 1.4 nm, the temperature and wavelength errors caused by crosstalk are respectively 0.01℃ and 0. 1 pm.     

32-channel arrayed waveguide grating multiplexer using low loss fluorinated polymer operating around 1550 nm

A 32 × 32 arrayed waveguide grating (AWG) multiplexer operating around the 1550 nm wavelength has been designed and fabricated using highly fluorinated polyethers. The propagation loss of the slab waveguide is about 0.3 dB/cm at 1550 nm wavelength. The channel spacing of the AWG multiplexer is 0.8 nm (100 GHz). The insertion loss of the multiplexer is 10.3-15.3 dB and the crosstalk is less than −20 dB.     

Polymeric arrayed waveguide grating using imprint method incorporating a flexible PDMS stamp

A polymeric arrayed waveguide grating (AWG) has been proposed and demonstrated by employing the nanoimprint method. A flexible PDMS (polydimethylsiloxane) stamp with the device patterns engraved was developed from a rigid master mold made of quartz glass, featuring uniform precision contact with and easy separation from polymer films. The device was fabricated by replicating the pattern on the stamp in a core polymer layer, with no etching process involved. For our device, the number of the output channels is eight and the center wavelength of each output channel is positioned from 1543.7 nm to 1548.3 nm with the spacing of 0.8 nm. The achieved channel crosstalk was about 10 dB and the 3 dB bandwidth approximately 0.8 nm.