用射频溅射法制备立方氮化硼薄膜

利用射频溅射方法在n型Si(111)衬底上制备出立方相含量接近100%且粘附性较高的立方氮化硼(c-BN)薄膜.傅里叶变换红外谱(FTIR)的结果表明，基底负偏压对薄膜立方相含量和薄膜压应力有很大影响，另外，衬底的电阻率对c-BN生长和薄膜的压应力也有一定的影响. 关键词： 立方氮化硼 射频溅射 压应力 基底负偏压     

衬底材料对制备立方氮化硼薄膜的影响

较系统地研究了不同衬底材料对制备氮化硼薄膜的影响。用热丝增强射频等离子体CVD法,以NH3,B2H6和H2为反应气体,在Si,Ni,Co和不锈钢等衬底材料上,成功生长出高质量的立方氮化硼薄膜,还用13.56MHz的射频溅射系统将c-BN薄膜沉积在Si衬底上,靶材为h-BN(纯度为99.99％）,溅射气体为氩气和氮气的混合气体,所得到的氮化硼薄膜中立方相含量高于90%,用X射线衍射谱和傅里叶变换红谱对样品进行了分析表明,衬底材料与c-BN的晶格匹配情况,对于CVD生长立方氮化硼薄膜影响很大,而对溅射生长立方氮化硼薄膜影响不大。     

高质量宽带隙立方氮化硼薄膜的研究进展

文章着重介绍了最近研制出的高质量宽带隙立方氮化硼薄膜的三种制备方法和结构特性 :(1)用射频溅射法在Si衬底上制备出立方相含量在 90 %以上 ,Eg>6 .0eV的c-BN薄膜 ;(2 )用离子束辅助的化学气相沉积法(CVD) ,在金刚石上外延生长出立方含量达 10 0 %的单晶c -BN薄膜 ;(3)用微波电子回旋共振CVD法 (MW -ECR-CVD)在金刚石上外延生长出高纯c-BN薄膜 .这些高纯c -BN薄膜 ,可应用于制作各种半导体 (主要是高温、高频大功率 )电子器件 .     

立方氮化硼薄膜沉积过程的相变研究

从能量和结构两个角度分析了BN四种相的转变过程，以及杂质和缺陷对立方氮化硼(c-BN)薄膜制备的影响.研究了从六角氮化硼(h-BN)到c-BN转变的一个可能的过程，即h-BN→菱形氮化硼(r-BN)→c-BN过程.对纯的h-BN到r-BN的转变需要克服一个很高的能量势垒，在实验室条件下很难能够提供能量来越过这个势垒.而从r-BN到c-BN的转变只需要克服一个很低的能量势垒.这个能量势垒要低于从h-BN到纤锌矿氮化硼(w-BN)转变所需要克服的能量势垒.c-BN薄膜的制备过程中，薄膜在高能粒子轰击下，会产生大量的缺陷，这些缺陷对立方相的形成起到了重要的作用，缺陷和杂质的存在大大降低了从h-BN到r-BN转变的能量势垒.根据这个理论模型，在两步法制备c-BN薄膜的基础上，调整实验参数，形成三步法制备高质量c-BN薄膜.主要研究了三步法中第一步的时间和衬底负偏压对c-BN薄膜制备的影响，找到合适的沉积时间和衬底负偏压分别为5min和-180V.采用三步法制备薄膜，可以重复得到高立方相体积分数(立方相体积分数超过80%)的BN薄膜，并且实验重复性达到70%以上. 关键词： 立方氮化硼 能量势垒 缺陷 衬底偏压     

立方氮化硼薄膜的生长特性与粘附性研究

用X射线衍射技术、红外吸收光谱、扫描电子显微镜、X射线光电子能谱对热丝辅助射频等离子体化学汽相沉积法制备的立方氮化硼(c-BN)薄膜的生长特性和粘附性进行了研究.改变生长条件，在Si、不锈钢和Ni衬底上沉积c-BN薄膜，进而研究了c-BN薄膜的质量和生长条件与衬底之间的关系.实验发现，Ni衬底上生长的薄膜c-BN含量较高，且粘附性好.当Si衬底上溅射一层Ni过渡层，再生长c-BN薄膜，薄膜中c-BN含量提高，与Si衬底的粘附性也显著增强. 关键词：     

用气相沉积方法在低气压下制备BN的高压相：E-BN、c-BN、w-BN

 用射频磁控溅射方法得到了低应力立方氮化硼薄膜。红外光谱结果表明,薄膜具有很好的附着力,且含有少量的E-BN和w-BN。电子衍射谱表明薄膜表层是纯立方相。同时利用此方法得到了E-BN薄膜。认为在薄膜生长过程中可能经历了一个从E-BN到c-BN的相转变过程。     

电子回旋共振等离子体增强沉积氟化非晶碳薄膜的光学性质

用紫外可见光透射光谱(UV-VIS)并结合键结构的X射线光电子能谱(XPS)和红外谱(FTIR)分析,研究了电子回旋共振等离子体增强化学气相沉积法制备的氟化非晶碳薄膜的光吸收和光学带隙性质.在微波功率为140—700W、源气体CHF₃∶C₆H₆比例为1∶1—10∶1条件下沉积的薄膜,光学带隙在1.76—2.85eV之间.薄膜中氟的引入对吸收边和光学带隙产生较大的影响,吸收边随氟含量的提高而增大,光学带隙则主要取决于CF键的含量,是由于强电负 关键词： 氟化非晶碳薄膜 光吸收与光学带隙 电子回旋共振等离子体     

高温高压下立方氮化硼和六方氮化硼的结构、力学、热力学、电学以及光学性质的第一性原理研究

本文采用基于密度泛函理论的第一性原理平面波赝势和局域密度近似方法,优化了立方和六方氮化硼的几何结构,系统地研究了零温高压下立方和六方氮化硼的几何结构、力学、电学以及光学性质.结构与力学性质研究表明:立方氮化硼的结构更加稳定,两种结构的氮化硼均表现出一定的脆性,而六方氮化硼的热稳定性则相对较差;电学性质研究表明:立方氮化硼和六方氮化硼均为间接带隙半导体,且立方氮化硼比六方氮化硼局域性更强;光学性质结果显示:立方氮化硼和六方氮化硼对入射光的通过性都很好,在高能区立方氮化硼对入射光的表现更加敏感.此外,还研究了高温高压下立方氮化硼的热力学性质,并得到其热膨胀系数、热容、德拜温度和格林艾森系数随温度和压力的变化关系.本文的理论研究阐述了高压下立方氮化硼和六方氮化硼的相关性质,为今后的实验研究提供了比较可靠的理论依据.     

Pulsed Laser Deposition ZnS Buffer Layers for CIGS Solar Cells

采用脉冲激光沉积(PLD)技术,在20、200、400和600 oC下制备出了高质量的ZnS薄膜．XRD分析结果表明,PLD法制备的ZnS多晶薄膜为立方闪锌矿结构而并非Murali报道的六方的纤锌矿结构,并沿(111)方向择优取向生长．Raman光谱进一步证明了在350 cm-1出现了立方相ZnS薄膜的A1振动模式．通过ZnS薄膜的SEM平面和断面图可观察到采用PLD技术生长出了非常密实、光滑、均匀的薄膜．PLD生长的ZnS薄膜的颗粒远小于化学浴沉积的CdS颗粒,这也是影响其电池效率的主要原因．XRF化学组成分析结果表明ZnS薄膜符合化学计量比,但略微富S．最后通过光吸收谱测得不同温度下的ZnS薄膜的光学带隙在3.2～3.7 eV,并随薄膜沉积温度的升高,光学带隙反而增加．采用宽带隙的ZnS缓冲层材料,与CdS(2.4 eV)相比,可以增加电池蓝波段的响应．     

薄膜物理及其应用讲座：第四讲 立方氮化硼薄膜的研究现状及其应用…

立方氮化硼具有一系列优异的物理化学性质，如高的硬度，宽的带隙，高的电阻率，高的热导率，高的热稳定性，化学稳定性，在力学，光学和电子学等方面有广泛的应用前景，从立方氮化硼薄膜的性质，制备方法，目前研究工作的进展，存在的主要问题，以及应用前景等方面介绍这种新型功能材料。     

Effect of magnetic field on the IR optical properties of dielectrics

Magnetic-field induced changes revealed in reflectance spectra R(λ) of nonmagnetic dielectrics Al₂O₃, LiF, and MgO in the IR range (λ = 2.5–25 μm) are reported. The reflectance spectra are shown to have specific features in the vicinity of the wavelengths corresponding to optical phonon mode excitation in these crystals, with the magnetic field giving rise to a noticeable change of reflectance ΔR/R(λ) at these wavelengths. The value of ΔR/R(λ) for p-(s-) polarized IR radiation in a magnetic field of ～13 kOe is ～0.6% (～0.4%) for Al₂O₃ at λ ≈ 9.6 μm, ～1.63% (～1.15) for LiF at λ ≈ 11.1 μm, and ～ 0.07 (～0.2%) for MgO at λ ≈ 11.7 μm, respectively. These changes can be increased substantially by irradiating the dielectric crystals by x-ray radiation. It is shown that the optical and magnetooptical properties of the above dielectrics in the IR spectral region can be described in terms of the polaron excitation theory.     

Structural and optical properties of thermally evaporated 2-(2,3-dihydro-1,5-dimethyl-3-oxo-2-phenyl-1H-pyrazol-4-ylimino)-2-(4-nitrophenyl)acetonitrile thin films

The structural and optical properties of as-deposited and γ-rays irradiated 2-(2,3-dihydro-1,5dimethyl-3-oxo-2-phenyl-1H-pyrazol-4-ylimino)-2-(4-nitrophenyl)acetonitrile (DOPNA) thin films have been reported. The structural properties of as-deposited and γ-rays irradiated DOPNA thin films are characterized by Fourier transformation infrared, X-ray diffraction and transmission electron microscope techniques. The transmittance, T(λ), and reflectance, R(λ), are measured at the normal incidence of light by a double beam spectrophotometer in the wavelength range 200-2200 nm. The refractive and absorption indices have been calculated. The dispersion parameters such as dispersion energy, oscillator energy and dielectric constant at high frequency are evaluated. The data of the absorption coefficient are analyzed in order to determine the type of inter-band electronic transitions and the optical band gap of the films. Other optical absorption parameters, namely, the extinction molar coefficient, oscillator strength and the electric dipole strength, are also calculated.     

Influence of surface roughness on the reflection of gold films in the region of surface plasmon excitation

The reflection (R) of light at rough gold films has been measured in the region of surface plasmon (SP) excitation and compared with a smooth gold film. The SP resonance minima are shifted to larger wavevectors and their halfwidth is enlarged with increasing surface roughness. Different positions of the reflection minima were observed measuring R(Θ) at constant wavelength λ, and measuring R(λ) at constant angle of incidence Θ. The calculated values prove this observation.     

混合漫射近似模型的漫反射理论及其模拟实验研究

研究了一个改进的漫射近似模型.该模型将漫射近似中的漫射系数D用描述P₃近似的漫射系数D_asym替代.推导了这个混合的漫射近似模型在单点源近似和外推边界条件下的反射率R_Hybrid(ρ)的解析表达式,比较了有效反照率a′对标准漫射近似R_DA(ρ)和R_Hybrid(ρ关键词： 漫射近似 P₃近似')" href="#">P₃近似 混合漫反射模型 强吸收     

基于金银合金薄膜的近红外表面等离子体共振传感器研究

利用淀积在玻璃衬底上的金银合金薄膜作为表面等离子体共振(SPR)芯片, 构建了Kretschmann结构的近红外波长检测型SPR传感器. 采用不同浓度的葡萄糖水溶液测试了金银合金薄膜SPR传感器的折射率灵敏度. 实验结果表明随着入射角从7.5°增大到 9.5°, SPR吸收峰的半高峰宽从292.8 nm 减小到 131.4 nm, 共振波长从 1215 nm蓝移到 767.7 nm, 折射率灵敏度从35648.3 nm/RIU 减小到 9363.6 nm/RIU.在相同的初始共振波长(λ_R)下获得的金银合金薄膜SPR折射率灵敏度高于纯金膜(纯金膜在λ_R=1215 nm下的折射率灵敏度为29793.9 nm/RIU). 利用1 μmol/L的牛血清蛋白(BSA)水溶液测试了传感器对蛋白质吸附的响应.结果表明, BSA分子吸附使得金银合金薄膜SPR吸收峰红移了12.1 nm而纯金膜SPR吸收峰仅红移了9.5 nm. 实验结果还表明, 在相同λ_R下, 金银合金薄膜SPR吸收峰的半高峰宽大于纯金膜的半高峰宽, 因此其光谱分辨率比纯金膜SPR传感器低. 关键词： 金银合金薄膜 表面等离子体共振 波长检测型 高灵敏度     

Electroresistance and field effects in epitaxial thin films of Pr0.7Sr0.3MnO3

Highly epitaxial thin films of Pr_0.7Sr_0.3MnO₃ were grown on (100) SrTiO₃ single crystal substrates by laser ablation. Similar to other manganite compounds, these Pr_0.7Sr_0.3MnO₃ films exhibited remarkable magnetoresistance. Application of electric currents could induce a remarkable reduction in resistivity, demonstrating a strong electroresistance effect. The ratio of the resistance variation, ER=[R(0)−R(I)]/R(I), is about 33% at metal-insulator transition temperature. Using a planar field effect configuration, significant field modulation of the metal-insulator transition was achieved. The observed field effects were discussed based on the strong interactions between carrier spins and localized spins in Mn ions, as well as the percolative mechanism of phase separation.     

Optical constants for Ge30− x Se70Ag x (0 ≤ x ≤ 30 at%) thin films based only on their reflectance spectra

In this paper, different homogenous compositions of Ge_{30? x} Se₇₀Ag _x (0?≤?x?≤?30 at%) thin films were prepared by thermal evaporation. Reflection spectra, R(λ), for the films were measured in the wavelength range 400–2500?nm. A straightforward analysis proposed by Minkov [J. Phys. D: Appl. Phys. 22 (1989) p.1157], based on the maxima and minima of the reflection spectra, allows us to derive the real and imaginary parts of the complex index of refraction and the film thickness of the studied films. Increasing Ag content at the expense of Ge atoms is found to affect the refractive index and the extinction coefficient of the films. The dispersion of the refractive index is discussed in terms of the single-oscillator Wemple–DiDomenico model. Optical absorption measurements were used to obtain the fundamental absorption edge as a function of composition. With increasing Ag content, the refractive index increases while the optical band gap decreases. The compositional dependence of the optical band gap for the Ge_{30? x} Se₇₀Ag _x (0?≤?x?≤?30) thin films is discussed in terms of the chemical bond approach.     

Dielectric properties of nanometer-thick barium-strontium titanate films

Using submillimeter and infrared spectroscopies, the reflectance R(ν) and transmittance T(ν) spectra of heteroepitaxial barium-strontium titanate films of different thicknesses on MgO substrates are taken for the first time in the frequency range 10 < ν < 3000 cm⁻¹. By modeling the experimental spectra by the Fresnel formulas for layered media, the spectra of complex permittivity ɛ*(ν) = ɛ′(ν) + iɛ″(ν) of the films are determined. It is shown that when the film thicknesses decrease down to 10 nm, there appear tensile stresses in the direction parallel to the substrate surface. As a result, the dielectric contribution of a low-frequency soft mode becomes several times larger than before.     

Stability analysis of <Emphasis Type="Italic">f</Emphasis>(<Emphasis Type="Italic">R</Emphasis>)-AdS black holes

We study the stability of the f(R)-AdS (Schwarzschild–AdS) black hole obtained from f(R) gravity. In order to resolve the difficulty of solving fourth-order linearized equations, we transform f(R) gravity into scalar–tensor theory by introducing two auxiliary scalars. In this case, the linearized curvature scalar becomes a dynamical scalaron, showing that all linearized equations are second order. Using the positivity of gravitational potentials and S-deformed technique allows us to guarantee the stability of f(R)-AdS black hole if the scalaron mass squared satisfies the Breitenlohner–Freedman bound. This is confirmed by computing quasinormal frequencies of the scalaron for the f(R)-AdS black hole.     

Effect of gamma irradiation on the optical properties of nano-crystalline InP thin films

Thin films of InP were prepared onto glass and quartz substrates using laser ablation technique. Some of the prepared films were irradiated using a ⁶⁰Co γ -ray source irradiation with a total dose of 100 kGy at room temperature. The as deposited and irradiated films were identified by scanning electron microscopy, SEM and X-ray diffraction, XRD. The SEM images have shown a nano-flower like structure for the as deposited films and influenced by the irradiation dose. The Optical characterizations of the as deposited and irradiated InP films were studied using spectrophotometric measurements of transmittance T(λ) and reflectance, R(λ) at normal incidence of light in the spectral range from 200 nm to 2500 nm. The refractive index, n, and the absorption index, k values were calculated using a modified computer program based on minimizing (ΔT)² and (ΔR)² simultaneously, within the desired accuracy. Analysis of the dispersion of the refractive index in the range 900 ≤ λ ≤ 2500 was discussed in terms of the single oscillator model. The optical parameters, such as the dispersion energy, E_d, the oscillator energy, E_o, the high frequency dielectric constant, _∞ and the lattice dielectric constant, _L were evaluated for the as deposited and irradiated films. The allowed optical transitions were found to be direct for the as deposited and irradiated films with energy gaps of 1.35 eV and 1.54 eV, respectively.