CVD金刚石薄膜探测器性能研究

通过实验测量和理论分析, 从载流子动力学角度研究了用于脉冲辐射探测的CVD金刚石薄膜探测器的适用结构、电荷收集效率和时间响应性能. 结果表明, CVD金刚石薄膜可以制成均匀型结构的探测器; 薄膜中的缺陷会降低探测器的电荷收集效率, 探测器的电荷收集效率随场强增大而增大直至饱和. 已研制的CVD金刚石探测器电荷收集时间可达719ps, 在2.5V/μm场强下达到饱和, 电荷收集效率 达60.5%; 晶格散射是影响探测器时间响应的主要因素, 选用大晶粒甚至单晶金刚石薄膜可以提高探测器时间响应.     

新型CVD金刚石X射线探测器时间性能初步研究

在微带结构化学气相沉积(CVD)探测器的基础上,利用同轴结构输出部件结合隔离直流电路制作了单端连接同轴探测器,该探测器主要用于激光等离子体的X射线测量。探测器采用直径为4mm的圆柱体CVD金刚石,金刚石一个端面镀有网格状电极,另一端镀有圆盘状电极。网格状电极既可保证正常施加偏压,也可使X射线直接照射至金刚石表面。在短脉冲激光装置上开展了探测器的时间响应特性实验,结果显示探测器上升时间为61ps。CVD金刚石探测器的时间性能研究为探测器的优化改进奠定了基础。     

同质与异质外延掺杂CVD金刚石薄膜的结构与性能

采用化学气相沉积(CVD)技术,以高温高压(HTHP)合成的(100)金刚石和p型(100)Si为衬底制备了硫掺杂和硼-硫共掺杂金刚石薄膜,利用原子力显微镜(AFM)、扫描隧道显微镜(STM)及隧道电流谱(CITS)等手段分析同质和异质外延CVD掺杂金刚石薄膜的结构和性能.结果表明:异Si衬底上CVD金刚石的形核密度低,薄膜表面比较粗糙,粗糙度达到18.5nm;同质HTHP金刚石衬底上CVD金刚石薄膜晶粒尺寸约为10—50nm,表面平整,表面粗糙度为1.8nm.拉曼测试和电阻测量的结果显示,在HTHP金刚 关键词： 金刚石 掺杂 外延     

金刚石膜α粒子探测器的电学性能研究

从外加偏压、预辐照处理等方面对三明治结构金刚石膜探测器在α粒子辐照下的电学性能进行了研究.电流-电压特性和脉冲高度分布测试和分析表明，金刚石膜探测器在能量为5.5MeV的²⁴¹Am α粒子辐照一定时间后，其暗电流有所增加.探测器顶电极施加负偏压时，在α粒子辐照下得到的净电流和信噪比均较大.Raman光谱测试表明，造成上述现象的原因很可能是金刚石膜厚度方向的不均匀性分布.负偏压下探测器对α粒子的能量分辨率为25.0%，优于正偏压下的能量分辨率(38.4%).随着α粒子辐照时间的延长，探测器的净电流和电荷收集效率均有明显增加. 关键词： 金刚石薄膜 辐射探测器 电学性能 脉冲高度分布     

掺杂CVD金刚石薄膜的应力分析

在不同实验条件下，用微波等离子体化学气相沉积(MPCVD)技术在Si基体上制备了S掺杂和B-S共掺杂CVD金刚石薄膜，利用X射线衍射仪和拉曼光谱仪研究掺杂对CVD金刚石薄膜的应力影响.研究结果发现，随着S掺杂浓度的增加，薄膜中sp²杂化碳含量和缺陷增多，CVD金刚石薄膜压应力增加；小尺寸的B原子与大尺寸的S原子共掺杂时，微量B的加入改变了CVD金刚石薄膜的应力状态，共掺杂形成B-S复合体进入金刚石晶体后降低金刚石晶体的晶格畸变程度，减少S原子在晶界上偏聚数量和晶体中非金刚石结构相含量，降低由于杂质、缺陷及sp²杂化碳含量产生的晶格畸变和薄膜压应力，提高晶格完整性. 关键词： 金刚石薄膜 掺杂 应力     

快响应化学气相沉积金刚石软X射线探测器的研制

利用高品质化学气相沉积(CVD)金刚石,采用微带线结构研制了CVD金刚石软X射线探测器。利用脉宽为10 ps的激光器进行了探测器响应时间的测量,获得半宽度为115 ps的信号,经过计算得到CVD金刚石探测器的上升时间为49 ps。在激光原型装置实验中,通过与软X射线能谱仪测量结果的相互比对,证实所研制的CVD金刚石探测器是一种响应时间快、信噪比高、性能可靠的软X射线探测器。     

沉积工艺条件对金刚石薄膜红外椭偏光学性质的影响

采用红外椭圆偏振光谱仪对不同工艺条件下制备的CVD金刚石薄膜在红外波长范围内的光学参量进行了测量，分析了工艺条件对金刚石薄膜红外光学性质的影响.获得了最佳的沉积工艺参数，优化了薄膜的制备工艺.结果表明薄膜的折射率和消光系数与薄膜质量密切相关，当温度为750℃，碳源浓度为0.9%和压强为4.0 kPa时，金刚石薄膜的红外椭偏光学性质最佳，折射率平均值为2.385，消光系数在10^-4范围内，在红外波段具有良好的透过性. 关键词： 薄膜光学 红外光学性质 工艺条件 金刚石薄膜     

用于n,γ混合场的新型脉冲中子探测器研究

新型脉冲中子探测器采用特殊工艺将两个PIN半导体组合而成.利用脉冲γ辐射研究了探测器对γ的响应；利用脉冲中子源研究了探测器对DT中了的响应，并与闪烁探测器进行了比较 .结果表明：脉冲中子探测器对脉冲γ辐射基本不灵敏，对脉冲中子辐射的灵敏程度依赖于中子辐射体，是一种用于n，γ混合脉冲辐射场中子测量的新型探测器. 关键词： 硅半导体 差分补偿 脉冲中子探测器 n γ混合场     

化学气相沉积金刚石探测器测量软X射线能谱

金刚石具备高热导率、高电阻率、高击穿电场、大的禁带宽度、介电系数小、载流子迁移率高以及抗辐射能力强等特性,可作为已应用于惯性约束聚变(ICF)实验X射线测量的硅与X射线二极管的较好替代品.随着化学气相沉积(CVD)技术的发展,CVD金刚石受到人们越来越多的关注.文中利用拉曼谱仪和X射线衍射仪对1mm×1mm×2mm,1mm×1mm×3mm两种规格CVD金刚石完成品质检测后,完成了CVD金刚石X射线探测器的集成制作,并在8ps激光器和神光III原型装置上开展了探测器时间特性等性能研究.实验结果表明,整个探测器系统前沿响应时间可达60ps,半高全宽可达120ps,与X射线二极管探测系统时间特性一致.在神光Ⅲ原型装置实验中,没有观察到探测器对3ω0激光的响应,说明探测器具有好的抗干扰能力.其测得的温度曲线与软X射线能谱仪测量结果一致,实现了X射线能谱测量的初步应用.     

金刚石薄膜对硝酸钾红外吸收特性的影响

利用热丝化学气相沉积(CVD)方法在硅片基底上生长金刚石薄膜,以硝酸钾为研究对象,采用浸泡吸附连续测量的方式,研究了金刚石薄膜对硝酸盐红外吸收特性的影响。实验结果表明,金刚石薄膜与硝酸钾紧密结合,产生短距离作用,使得硝酸根的反对称伸缩振动产生明显的红移,ν₁及ν₂振动模式峰位分别红移30和13 cm-1;其中ν₁振动模式的红移可能主要来自金刚石薄膜与硝酸钾的结合以及声子共振的影响,而ν₂振动模式的红移可能主要来自硝酸钾内应力的影响。     

Films of Mn12-acetate by pulsed laser evaporation

Films of the molecular nanomagnet, Mn₁₂-acetate, have been deposited using pulsed laser deposition and its novel variant, matrix assisted pulsed laser evaporation. The films have been characterized by X-ray photoelectron spectroscopy, mass spectrometry and magnetic hysteresis. The results indicate that an increase in laser energy and/or pulse frequency leads to fragmentation of Mn₁₂-acetate, whereas its chemical and magnetic integrity is preserved at low laser energy (200 mJ). This technique allows for the fabrication of patterned thin films of molecular nanomagnets for fundamental and applied experiments.     

Structural and phase composition of fullerene films deposited by high-power ion beams

Deposition of carbon films containing C₆₀ and C₇₀ fullerenes is an urgent problem, related to development of nanotechnologies and new nanomaterials. Such films have been obtained by ultrafast deposition of dense ablation plasma on a substrate; the plasma was generated as a result of irradiation of a graphite target by pulsed high-power ion beams. The structural and phase composition of the deposited films has been investigated.     

Growth and characterizations of ZnO and Co-doped ZnO films for their use in spintronic

Diluted Magnetic Semiconductors offer potential applications for spintronics. In this respect, Co-doped ZnO films are particularly interesting due to their Curie temperature. However, the origin of ferromagnetism is controversial. High quality Co-doped ZnO thin films have thusly been grown using the pulsed laser deposition technique on (001) Al₂O₃ substrates. Two series were made. In the first one, the films are grown using metallic targets whereas in the second one, the films are synthesized from ceramic targets. Detailed characterizations have been performed and a comparison have been made, in light of the literature.     

La0.5Sr0.5CoO3薄膜的外延生长及其机理研究

利用脉冲激光制膜法,在多种衬底和温度条件下,系统研究了La_0.5Sr_0.5CoO₃(LSCO)薄膜的结构和外延生长特性,在LaAlO₃,SrTiO₃和MgO衬底上实现了LSCO薄膜的外延生长.外延生长的薄膜具有低的电阻率和金属性导电特征.研究表明,外延生长的最佳温度范围为700—800℃,最佳衬底为LaAlO₃.并着重探讨了衬底材料和淀积温度等多种因素对LSCO薄膜的生长与性 关键词：     

Induction of superconductivity of a La<Subscript>2</Subscript>CuO<Subscript>4</Subscript> thin film chemically oxidized by NaClO

High-quality, c-axis-oriented La₂CuO₄ thin films have been fabricated by the pulsed laser ablation technique. Superconductivity has been successfully induced in the films after chemical oxidation using sodium hypochlorite solution as oxidizing agent. The structural properties, surface morphology, and electrical resistivity before and after oxidation are compared. In addition, the oxidation mechanism is discussed. PACS 68.55.Jk; 74.76.Bz; 82.40.-g     

脉冲激光淀积BaTiO3薄膜的介电与铁电特性

用脉冲激光淀积方法在SrTiO₃衬底上制备了BaTiO₃/YBa₂Cu₃O_7-δ（铁电/超导）双层膜，X射线分析表明BaTiO₃薄膜是高度c取向的．对BaTiO₃薄膜的介电和铁电性能进行了实验研究．观察到铁电薄膜特有的电滞线和蝶型C-V曲线，薄膜呈现出较好的铁电性，在铁电随机存储等领域有重要的应用前景 关键词：     

Room-temperature pulsed laser deposition and dielectric properties of amorphous Bi3.95Er0.05Ti3O12 thin films on conductive substrates

Bi_3.95Er_0.05Ti₃O₁₂ (BErT) thin films were prepared on Pt/Ti/SiO₂/Si and indium-tin-oxide (ITO)-coated glass substrates at room temperature by pulsed laser deposition. These thin films were amorphous with uniform thickness. Excellent dielectric characteristics have been confirmed. The amorphous BErT thin films deposited on the Pt/Ti/SiO₂/Si and ITO-coated glass substrates exhibited almost the same dielectric constant of 52 with a low dielectric loss of less than 0.02 at 1 kHz. Meanwhile, the dielectric properties of the thin films had an excellent bias voltage stability and thermal stability. The amorphous BErT thin films might have potential applications in microelectronic and optoelectronic devices.     

Heteroepitaxial film growth of layered compounds with the ZrCuSiAs-type and ThCr2Si2-type structures: From Cu-based semiconductors to Fe-based superconductors

FeAs-based layered superconductors such as F-doped LaFeAsO have recently been investigated intensively because of their high superconducting transition temperatures. Epitaxial films of these compounds are important to examine their intrinsic materials properties as well as to transfer them to device applications. In this review, we first present our research route from transparent p-type oxides semiconductors to the Fe-based superconductors. Then we review growth of epitaxial thin films for the layered oxychalcogenides and oxypnictides. Reactive solid-phase epitaxy technique was inevitable to prepare epitaxial thin films of the oxychalcogenides and Zn-based oxypnictides. On the other hand, epitaxial thin films of Mn-based oxypnictides were grown by standard pulsed laser deposition. These techniques, however, did not grow epitaxial thin films for LaFeAsO. Thus, we developed a modified pulsed laser deposition process and succeeded in obtaining epitaxial thin films of FeAs-based superconductors, LaFeAsO and cobalt-doped SrFe₂As₂.     

Deposition of fullerene films from the ablation plasma generated by high-power ion beams on graphite targets

A possibility of deposing carbon films with a high content of C₆₀ and C₇₀ fullerenes from an ablation plasma generated as a result of irradiation of graphite targets by pulsed high-power ion beams is shown. The relative contents of the crystalline diamond-like carbon phase, crystalline fullerene phase, and amorphous carbon phase have been determined by X-ray diffraction analysis for different deposition conditions. The nanohardness and Young’s modulus of the deposited films and their adhesion to the single-crystal silicon substrate have been measured.     

Photoluminescence behavior of pulsed laser deposited ZnGa<Subscript>2</Subscript>O<Subscript>4</Subscript> thin-film phosphors grown on various substrates

ZnGa₂O₄ thin-film phosphors have been grown on Si(100), Al₂O₃(0001) and MgO(100) substrates using pulsed laser deposition. The structural characterization was carried out on a series of ZnGa₂O₄ films grown on various substrates under various substrate temperatures and oxygen pressures. The films grown on these substrates not only have different crystallinity and surface morphology, but also different Zn/Ga composition ratio. The crystallinity and photoluminescence (PL) of the ZnGa₂O₄ films are highly dependent on the deposition conditions, in particular the stoichiometry ratio of Zn/Ga and the kind of substrate. The variation of Zn/Ga in the films also depends on not only the oxygen pressure but also the substrate temperature during deposition. The PL properties of pulsed laser deposited ZnGa₂O₄ thin films have indicated that Al₂O₃(0001) and MgO(100) are promising substrates for the growth of high-quality ZnGa₂O₄ thin films and that the luminescence brightness depends on the substrate. The luminescence spectra show a broad band extending from 350 to 600 nm and peaking at 460 nm. Received: 11 July 2002 / Accepted: 31 July 2002 / Published online: 28 October 2002 RID="*" ID="*"Corresponding author. Fax: +82-51-6206356, E-mail: jhjeong@pknu.ac.kr