Al/AlO_x/Al隧道结简化制备技术

研究了一种在高阻硅衬底上Al/Al Ox/Al超导隧道结简化制备技术。通过一次光刻镀膜完成隧道结结区的确定和上引线的制备,工艺流程简单重复。在0.3K温度下测量了隧道结样品的I-V特性,能隙电压Vg为0.37m V,超导临界电流密度约为12A/cm2。     

具有高开启/关断电流比的Al_2O_3/AlGaN/GaN金属氧化物半导体高电子迁移率晶体管（英文）

采用原子层淀积(ALD)方法,制备了Al_2O_3为栅介质的高性能AlG aN/GaN金属氧化物半导体高电子迁移率晶体管(MOS-HEMT)。在栅压为-20 V时,MOS-HEMT的栅漏电比Schottky-gate HEMT的栅漏电低4个数量级以上。在栅压为+2 V时,Schottky-gate HEMT的栅漏电为191μA;在栅压为+20 V时,MOS-HEMT的栅漏电仅为23.6 nA,比同样尺寸的Schottky-gate HEMT的栅漏电低将近7个数量级。AlG aN/GaN MOSHEMT的栅压摆幅达到了±20 V。在栅压Vgs=0 V时,MOS-HEMT的饱和电流密度达到了646 mA/mm,相比Schottky-gate HEMT的饱和电流密度(277 mA/mm)提高了133%。栅漏间距为10μm的AlG aN/GaN MOSHEMT器件在栅压为+3 V时的最大饱和输出电流达到680 mA/mm,特征导通电阻为1.47 mΩ·cm2。Schottky-gate HEMT的开启与关断电流比仅为105,MOS-HEMT的开启与关断电流比超过了109,超出了Schottkygate HEMT器件4个数量级,原因是栅漏电的降低提高了MOS-HEMT的开启与关断电流比。在Vgs=-14 V时,栅漏间距为10μm的AlG aN/GaN MOS-HEMT的关断击穿电压为640 V,关断泄露电流为27μA/mm。     

基于Pt/GaN/AlGaN异质结高响应度双波段紫外探测器

提出一种在AlGaN基PIN器件的p-GaN表面上沉积Pt,形成肖特基势垒(SB)-PIN异质结器件,器件的能带和载流子的输运发生了变化,这种新型光电探测器实现了双波段紫外探测,可分别工作在光伏和光电导模式下。器件在275 nm波长的紫外光照射的负偏置电压下,工作模式为光伏探测,当入射光功率密度为100μW/cm²,偏置电压为-10 V时,器件得到最大响应度(0.12 A/W);当偏置电压为-0.5 V时,器件得到最大探测率(1.0×10¹³ cm·Hz^1/2·W^-1)。器件在正偏置电压工作模式下可作为高响应、高增益的光电导探测器,当偏置电压为+10 V时,用275 nm和365 nm波长的紫外光照射(光功率密度为100μW/cm²),器件的响应度分别为10 A/W和14 A/W,外量子效率分别为4500%和4890%。所设计的双波段多功能器件将极大地扩展基于AlGaN的紫外探测器的用途。     

HL-2A中性束大功率离子源的研制

2007年3月,为HL-2A中性束注入器研制的大功率离子源在核工业西南物理研究院成功通过了测试.该离子源为圆柱结构的桶式离子源型;加速器采用三电极的加减速系统.实验运行参数如下:灯丝加热电流1100A,电压12V,弧放电电压120V,弧放电电流1050A,等离子体密度达2.5×1012/cm3,离子流密度0.44A/cm2;在距等离子体电极5mm的平面上,等离子体的均匀性好于5%,工作脉宽2s.离子源物理设计、工程考虑、实验研究结果等将在本文介绍.     

具有高开启/关断电流比的Al2O3/AlGaN/GaN金属氧化物半导体高电子迁移率晶体管

采用原子层淀积(ALD)方法,制备了Al₂O₃为栅介质的高性能AlGaN/GaN金属氧化物半导体高电子迁移率晶体管(MOS-HEMT)。在栅压为-20 V时,MOS-HEMT的栅漏电比Schottky-gate HEMT的栅漏电低4个数量级以上。在栅压为+2 V时,Schottky-gate HEMT的栅漏电为191μA;在栅压为+20 V时,MOS-HEMT的栅漏电仅为23.6 nA,比同样尺寸的Schottky-gate HEMT的栅漏电低将近7个数量级。AlGaN/GaN MOS-HEMT的栅压摆幅达到了±20 V。在栅压V_gs=0 V时, MOS-HEMT的饱和电流密度达到了646 mA/mm,相比Schottky-gate HEMT的饱和电流密度(277 mA/mm)提高了133%。栅漏间距为10μm的AlGaN/GaN MOS-HEMT器件在栅压为+3 V时的最大饱和输出电流达到680 mA/mm,特征导通电阻为1.47 mΩ·cm²。Schottky-gate HEMT的开启与关断电流比仅为10⁵,MOS-HEMT的开启与关断电流比超过了10⁹,超出了Schottky-gate HEMT器件4个数量级,原因是栅漏电的降低提高了MOS-HEMT的开启与关断电流比。在V_gs=-14 V时,栅漏间距为10μm的AlGaN/GaN MOS-HEMT的关断击穿电压为640 V,关断泄露电流为27μA/mm。     

太赫兹源场致发射电子源

通过粒子模拟(PIC)软件模拟计算了在ps级别下二极与三极结构碳纳米管场致发射的电流密度与电子注聚焦性能。阳极电压在2 kV时,二极结构下电流密度达到1.85 A/cm2;三极结构下,栅压700 V时发射电流密度达到2.3 A/cm2,且在一定的三极结构参数与电极电压下,可以获得较好的电子注聚束效果。通过碳纳米管二极管发射实验,获得了6.6 A/cm2的发射电流密度,总发射电流达到52.1 mA,可以为太赫兹器件提供连续发射的电子注。     

基于ZnSe/Ag/ZnSe可见区透明导电薄膜

利用红外光学材料ZnSe和金属Ag在室温下采用电子束蒸发镀膜技术研制了透明导电薄膜ZnSe/Ag/ZnSe,该薄膜的电子浓度为1.208×1020cm-3,电子迁移率和电阻率分别为17.22 cm2 V1s-1和2.867×10-5Ω·cm,功函数达到5.13 eV,在可见区的平均透过率理论模拟值超过80％,而测量结果...     

CNx纳米管的制备、结构观察及低场致电子发射性能研究

采用高温热解法，以乙二胺为前驱液，在沉积有铁催化剂的p型硅（111）基底上制备出了定向生长的CNx纳米管.利用扫描电子显微镜、高分辨率透射电子显微镜和拉曼光谱对CNx纳米管进行了形貌观察和表征.CNx纳米管的高度在20?μm左右，直径在50—100nm之间，具有明显的“竹节状”结构，结晶有序度较差.对CNx纳米管薄膜进行低场致发射性能测试：外加电场为1.4V/μm，观察到20?μA /cm2发射电流，外电场升至2.54V/μm时发射电流达到1.280mA/cm2，在较高外电场下，没有发现电流“饱和”.这比 关键词： CNx纳米管 高温热解 “竹节状”结构 场致发射     

The fabrication and characterization of 4H SiC power UMOSFETs

The fabrication of 4H-SiC vertical trench-gate metal-oxide-semiconductor field-effect transistors(UMOSFETs) is reported in this paper.The device has a 15-μm thick drift layer with 3×1015 cm-3 N-type doping concentration and a 3.1μm channel length.The measured on-state source-drain current density is 65.4 A/cm2 at Vg = 40 V and VDS = 15 V.The measured threshold voltage(Vth) is 5.5 V by linear extrapolation from the transfer characteristics.A specific on-resistance(Rsp-on) is 181 mΩ·cm2 at Vg = 40 V and a blocking voltage(BV) is 880 V(IDS = 100 μA@880V) at Vg = 0 V.     

掺杂Cs2O的12CaO·7Al2O3型发射材料的制备与特性

研究了掺杂Cs₂O的12CaO·7Al₂O₃(C12A7)型负离子存储发射材料的发射特性、离子发射分支比以及温度对发射强度的影响,同时对该材料的X射线衍射和电子顺磁共振的表征结果进行了分析. C12A7中Cs₂O的掺入不仅降低了发射温度,同时还增强了发射强度. 掺杂Cs₂O后,在800 V/cm的引出场下,发射温度由570 oC降低至500 oC,在700 oC时,发射强度由0.23 μA/cm<     

有机EL器件MEH-PPV/Alq3的光伏特性

制备了ITO/MEH-PPV/Alq3/LiF/Al光伏(PV)器件. MEH-PPV和Alq3分别为电子受体和给体. 光谱响应曲线主要和Alq3的吸收光谱相匹配. 在功率为0.5 mW·cm2的紫外氙灯照射下电池的短路电流为2.4 μA·cm-2, 开路电压为2.6 V, Fill因子为0.71, 电池的能量转换效率达到0.9%. 在直流电的驱动下, 器件具有电致发光的特性并且发出明亮的桔红色光, 在15 V的直流电压驱动下, 最大亮度达到了1 000 cd·cm-2.     

Electroluminescence from Si／SiO2 films deposited on p—Si substrates

The structure of Au/Si/SiO₂/p-Si has been fabricated using the magnetron sputtering technique. It has a very good rectifying behaviour. Visible electroluminescence (EL) has been observed from the Au/Si/SiO₂/p-Si structure at a forward bias of 5V or larger. A broad band with one peak around 650－660 nm appears in all the EL spectra of the structure. The effects of the thickness of the Si layer in the Si/SiO₂ films and of the input electrical power on EL spectra are studied systematically.     

High-field recombination electroluminescence in vacuum-deposited anthracene and doped anthracene films

The electroluminescence (EL) study of anthracene and tetracene-doped anthracene films deposited by a vacuum evaporation onto a substrate at temperatureT ₀=–60 °C is reported. Such films show high resistence to electrical breakdown so that their EL behaviour at high electric fields up to above 10⁶ V/cm could be investigated. The high-field EL is interpreted in terms of electron-hole recombination mechanisms with creation of emitting singlet excitons; the electron and hole concentration being limited by injection at metal contacts and by field-independent carrier velocities. The theoretical expression for current density follows the experimental data for fields above 4×10⁵ V/cm at room temperature and the EL intensity is predicted to be a power function of the measured current. It is suggested that in pure anthracene layers the power is determined by the contact injection conditions, i.e. by barrier heights and the effective masses of holes and electrons. In the doped films a guest molecules-induced energy trap distribution leads to a decrease of the power as confirmed by the experimental plots of the host EL intensity versus current density.The work supported in part by the Polish Academy of Sciences under Program MR.I.9     

Enhanced electroluminescence from nanocrystallite Si based MOSLED by interfacial Si nanopyramids

The interfacial Si nano-pyramid-enhanced electroluminescence (EL) of an ITO/SiOx/p-Si/Al metal-oxidesemiconductor (MOS) diode with turn-on voltage of 50 V, threshold current of 1.23 mA/cm2, output power of 16 nW, and lifetime of 10 h is reported.     

Optical characterization of InGaN/AlGaN/GaN diode grown on silicon carbide

Electroluminescence (EL) properties of In_xGa_1−xN/Al_yGa_1−yN/GaN/SiC diode were studied. The spectral range for which EL spectra were recorded is 1–3.5 eV. Room temperature EL was obtained for forward bias (3.18 V, 220 μA) at 446.067 nm (blue luminescence band), 606.98 nm (yellow luminescence band) and 893.84 nm (Infrared luminescence band). The EL temperature dependence shows that, BL band is mostly given by e–h recombination corresponding to indium composition equal to 0.17 ± 0.01 and 0.14 ± 0.02 obtained theoretically and experimentally, respectively. The yellow band is generally weak and absent at low temperature. The IRL band is more consistent with the DAP recombination and could be explained by the thermal activation of Mg states. The luminescence bands shift to lower energies is due probably to the larger potential fluctuations effect.     

有机电致发光器件中观察到的三重态-三重态湮灭导致的荧光发射

在高浓度DMQA掺杂于Alq₃作为发射层的器件中直接观察到了超线性的发射增强现象.当DMQA的浓度在1.6%~5.6%之间时,电流密度大于300mA/cm²,电致发光效率随电流密度的增大而增加.这是由于在重掺杂器件中,较多的染料有效的转移了Alq₃中的激子,降低了器件中的非辐射损失,同时,三重态-三重态湮灭过程产生了新的单重态激子,贡献了额外发光的结果.当后者的贡献大于器件中的非辐射损失时,器件的发光效率将随电流的增大而上升.     

Influence of thickness of functional layer on performance of organic salt-doped OLED with ITO/PVK:PBD:TBAPF6/Al structure

The effect of thickness of functional layer on the electrical and electroluminescence (EL) properties of single-layer OLED with ITO/PVK:PBD:TBAPF₆/Al structure were investigated where indium tin oxide (ITO) was used as anode, poly(9-vinylcarbazole) (PVK) as polymeric host, 2-(4-biphenylyl)-5-phenyl-1,3,4-oxadiazole (PBD) as electron-transporting molecule, tetrabutylammonium hexafluorophosphate (TBAPF₆) as organic salt dopant and aluminium (Al) as cathode. A unique transition phenomenon at high bias voltage in the devices was observed and the transition was reversible. The transition voltage and turn on voltage decreased with the decrease of functional layer thickness. The turn on voltage was approximately 5.5 V and 6.5 V for 55-nm-thick and 95-nm-thick devices, respectively. However, the current efficiency of 95-nm-thick device was higher than the 55-nm-thick device. More interestingly, the Commission Internationale d’Eclairage (C.I.E.) coordinates of EL spectra of 95-nm-thick device at bias voltage ranging from 7 V to 13 V located in the white light region even without any dye doping. The PL and EL spectra were found completely different. PBD electromer was proposed to dominate the EL spectrum, but the contribution from PVK–PBD electroplex cannot be completely ruled out.     

High-brightness white light-emitting organic electroluminescent devices using poly(N-vinylcarbazole) as a hole-transporter

A white light-emitting organic electroluminescent (EL) device with multilayer thin-film structure, which shows high-brightness and high-efficiency, is demonstrated. The device structure of glass substrate/indium–tin oxide/poly(N-vinylcarbazole) (PVK)/1,1,4,4-tetraphenyl-1,3-butadiene/8-(quinolinolate)-aluminum (Alq) doped with 5,6,11,12-tetraphenylnaphthacene/Alq/Mg/Al was employed. The turn-on voltage is as low as 2.5 V. The white light emission covers a wide range of the visible region, and the Commission Internationale de 1' Eclairage coordinates of the emitted light are (0.319, 0.332) at 10 V. Bright white light, over 20 000 cd/m², was successfully obtained at about 18 V, and the maximum efficiency reaches to 1.24 lm/W at 9 V. The reasons of obtaining high level EL properties of our device have been discussed.     

GaInP2/GaAs/Ge叠层太阳电池材料的低压MOCVD外延生长

本文采用自制的LP-MOCVD设备,外延生长出GaInP₂/GaAs/Ge叠层太阳电池结构片,对电池材料进行了X射线衍射测试分析.另外,采用二次离子质谱仪测试了电池结构的剖面曲线.用此材料做出的叠层太阳电池,AMO条件下光电转换效率η=13.6%,开路电压V_oc=2230mV,短路电流密度J_sc=12.6mA/cm².     

铽配合物Tb(BA)3phen的有机电致发光

合成了一类新型稀土配合物Tb(BA)3phen,将其掺杂到导电聚合物PVK中获得了纯正、明亮的绿光发射.用这种搀杂体系分别制作了单层发光器件和双层器件.对于单层器件,掺杂浓度为15,甩膜转速1000 r·min-1时器件的发光效果最好,起亮电压为10V,最大亮度在21 V时可达26.8cd·m-2.双层器件用AlQ作为电子传输层,通过改变其厚度得到了发光性能较好的用AlQ作为电子传输材料的器件,其最大亮度在22 V时可达322cd·m-2.