RB-SiC表面改性Si涂层的制备与性能

 为了获得高质量光学表面的碳化硅反射镜,利用射频磁控溅射方法,在直径70 mm的RB-SiC基片上沉积了厚约100 μm的Si改性涂层,对改性层进行超光滑加工,并对改性层的表面形貌及性能进行了测试。ZYGO表面粗糙度仪测试结果表明,抛光后Si改性涂层表面粗糙度均方根值达到了0.496 nm;X射线衍射仪测试显示,制备Si改性涂层为多晶结构;使用拉力机做附着力测试,结果表明膜基附着力大于10.7 MPa。证明采用磁控溅射技术制备的Si改性涂层均匀、致密、附着力好,能够满足RB-SiC材料表面改性要求。     

空间用SiC反射镜表面改性的性能和可靠性评估

根据空间应用项目需求,采用等离子辅助电子束蒸发方法对RB-SiC基底进行了表面改性,并对表面改性的性能和可靠性进行了相关评估.经测试,改性后RB-SiC基底表面粗糙度(rms)降低到0.632 nm;散射系数降低到2.81%,500～1 000 nm范围的平均反射率提高到97.05%,已经接近于抛光良好的微晶玻璃的水平;改性涂层温度稳定性高,与基底结合牢固;加工后,面形精度达到0.119λ(PV)和0.014λ(rms),λ=632.8 nm.评估结果表明,这种SiC基底表面改性的工艺是可靠的,其光学性能满足空间高质量光学系统的要求,适宜空间环境应用.     

空间反射镜基底材料碳化硅表面改性研究

直接抛光后的SiC反射镜表面光学散射仍较大,无法满足高质量空间光学系统的心用需求.为此必须对SiC反射镜进行表而改性,以获得高质量的光学表面.目前国际上较为流行的足制备Si或SiC改性层进行表面改性.分别采用离子辅助电子束蒸发方法制备Si和SiC改性层进行改性,相关测试结果表明:Si改性层结构为立方相,改性后基底表面粗糙度(rms)降到0.620 nm,散射系数减小到1.52%;SiC改性层结构为非晶相,改性后基底表面粗糙度(rms)降到0.743 nm,散射系数减小到2.79%.两种改性层均与基底结合牢固,温度稳定性较高.从可靠性方面考虑,目前在国内第一种方法更适于实际工程应用.该工艺改性后SiC基底表面散射损耗大大降低,表面质量得到明显改善.镀Ag后表面反射率接近于抛光良好的微晶玻璃的水平,已能够满足高质量空间光学系统的应用需要.     

大口径轻质SiC反射镜的研究与应用

介绍了大口径轻质碳化硅反射镜镜坯的基本结构、性能测试指标、国内应用及发展前景;阐述了碳化硅凝胶注模成型（Gel-casting）、反应烧结SiC（RB-SiC）与压力成型、常压烧结SiC（SSiC）两种国内主要制备大口径轻质碳化硅反射镜的方法;并对两种方法制备得到的ø1.45 m碳化硅镜坯的性能、测试数据及光学加工后的光学特性进行分析和比对,提出存在的问题,以供商榷,进而促进国内大口径轻质碳化硅反射镜的研究和发展。     

表面改性碳化硅基底反射镜加工技术现状

针对表面改性SiC基底反射镜在空间光学系统中的应用,总结了该类反射镜在国内外的研究现状。概括了碳化硅基底反射镜的发展趋势。介绍了常用的碳化硅材料,分析了它们的性质。给出了几种常用的碳化硅镜坯制备工艺,包括成型、改性和不同的抛光技术。通过对国内现有加工工艺和改性技术的分析,总结出了适应我国的表面改性碳化硅反射镜加工的发展方向。     

碳化硅基底改性硅表面的磁流变抛光

为克服传统抛光方法在硅改性的碳化硅表面抛光存在的不足,采用磁流变抛光在精抛光阶段实现面形误差高效去除和快速收敛。基于实际应用中的对磁流变抛光液的需求,提出了磁流变液的性能要求,并配制了适合改性硅表面抛光的磁流变抛光液,检测所配制的抛光液体的流变特性和分散稳定性,证明了液体具有良好的性能。对口径为130 mm(有效口径为120 mm)的硅改性的同轴非球面碳化硅工件进行实际抛光。经过两个周期约3 h的抛光,面形误差均方根(RMS)从0.051λ(λ=632.8 nm)快速收敛至0.012λ,粗糙度Ra达0.618 nm。验证了所配制的磁流变抛光液满足碳化硅基底改性硅表面的抛光需求,证明了磁流变抛光技术在镜面硅改性后精抛光阶段具有独特的优势。     

碳化硅基底改性硅表面的磁流变抛光EI北大核心CSCD

为克服传统抛光方法在硅改性的碳化硅表面抛光存在的不足,采用磁流变抛光在精抛光阶段实现面形误差高效去除和快速收敛。基于实际应用中的对磁流变抛光液的需求,提出了磁流变液的性能要求,并配制了适合改性硅表面抛光的磁流变抛光液,检测所配制的抛光液体的流变特性和分散稳定性,证明了液体具有良好的性能。对口径为130 mm(有效口径为120 mm)的硅改性的同轴非球面碳化硅工件进行实际抛光。经过两个周期约3 h的抛光,面形误差均方根(RMS)从0.051λ(λ=632.8 nm)快速收敛至0.012λ,粗糙度Ra达0.618 nm。验证了所配制的磁流变抛光液满足碳化硅基底改性硅表面的抛光需求,证明了磁流变抛光技术在镜面硅改性后精抛光阶段具有独特的优势。     

应用碳化硅表面改性技术降低全息-离子束刻蚀光栅刻槽的粗糙度

采用具有良好比刚度和热稳定性的碳化硅材料作为基底,使用全息-离子束刻蚀技术制作了光栅。碳化硅材料表面固有缺陷导致制作的光栅刻槽表面粗糙度高,槽底和槽顶粗糙度分别达到了29.6 nm和65.3 nm (R_q)。通过等离子辅助沉积技术在碳化硅表面镀制一层均匀的硅改性层,经过抛光可以获得无缺陷的超光滑表面。XRD测试表明制备的硅改性层为无定形结构。原子力显微镜的测试结果表明:经过抛光后,表面粗糙度为0.64 nm(R_q)。在此表面上制作的光栅刻槽表面粗糙度明显降低,槽底和槽顶粗糙度分别为2.96 nm和7.21 nm,相当于改性前的1/10和1/9。     

非球面碳化硅反射镜的加工与检测

为了获得高精度非球面碳化硅(SiC)反射镜,对非球面碳化硅反射镜基底以及改性后碳化硅反射镜表面的加工与检测技术进行了研究。介绍了非球面计算机控制光学表面成型（CCOS）技术及FSGJ-2非球面数控加工设备。采用轮廓检测法和零位补偿干涉检测法分别对碳化硅反射镜研磨和抛光阶段的面形精度进行了检测,并采用零位补偿干涉检测法及表面粗糙度测量仪对最终加工完毕的碳化硅反射镜的面形精度和表面粗糙度进行检测。测量结果表明：各项技术指标均满足设计要求,其中非球面碳化硅(SiC)反射镜实际使用口径内的面形精度（RMS值）为0.016λ(λ=0.6328μm）,表面粗糙度（RMS值）为0.85nm。     

基于磁控溅射和ICP刻蚀的RB-SiC表面平坦化工艺

采用射频磁控溅射技术在RB-SiC表面沉积Si平坦化层,通过正交试验研究了射频功率、Ar流量和工作气压三个因素对薄膜表面质量和形貌的影响规律,以获取最佳的薄膜沉积参数.射频功率120 W、工作气压1.2Pa和Ar流量40sccm条件下获得了最佳质量的平坦化样品,利用电感耦合等离子体对平坦化膜层进行刻蚀抛光,通过Lambda950分光光度计测试不同工艺阶段样品表面的反射率.结果表明,相比于未处理的RB-SiC初始样品,经过平坦化和等离子体刻蚀的样品表面粗糙度标准差值由1.819nm减小至0.919nm,样品表面反射率相应地提高了2%.由此说明射频磁控溅射平坦化沉积与电感耦合等离子体刻蚀的组合工艺可实现RB-SiC表面的高质量加工.     

X-ray photoelectron spectroscopy study of the growth kinetics of biomimetically grown hydroxyapatite thin-film coatings

Hydroxyapatite (HA) thin-film coatings grown biomimetically using simulated body fluid (SBF) are desirable for a range of applications such as improved fixation of fine- and complex-shaped orthopedic and dental implants, tissue engineering scaffolds and localized and sustained drug delivery. There is a dearth of knowledge on two key aspects of SBF-grown HA coatings: (i) the growth kinetics over short deposition periods, hours rather than weeks; and (ii) possible difference between the coatings deposited with and without periodic SBF replenishment. A study centred on these aspects is reported. X-ray photoelectron spectroscopy (XPS) has been used to study the growth kinetics of SBF-grown HA coatings for deposition periods ranging from 0.5 h to 21 days. The coatings were deposited with and without periodic replenishment of SBF. The XPS studies revealed that: (i) a continuous, stable HA coating fully covered the titanium substrate after a growth period of 13 h without SBF replenishment; (ii) thicker HA coatings about 1 μm in thickness resulted after a growth period of 21 days, both with and without SBF replenishment; and (iii) the Ca/P ratio at the surface of the HA coating was significantly lower than that in its bulk. No significant difference between HA grown with and without periodic replenishment of SBF was found. The coatings were determined to be carbonated, a characteristic desirable for improved implant fixation. The atomic force and scanning electron microscopies results suggested that heterogeneous nucleation and growth are the primary deposition mode for these coatings. Primary osteoblast cell studies demonstrated the biocompatibility of these coatings, i.e., osteoblast colony coverage of approximately 80%, similar to the control substrate (tissue culture polystyrene).     

非均匀性对增透膜增透特性的影响

通过对基底与膜层、膜层之间界面处非均匀性对增透膜增透性能影响的讨论,得到以下结论:在沉积初期,由于基底表面特性和沉积参数的波动,从而在基底与膜层之间产生过渡层,使增透性能减弱,对增透膜的增透效果影响较大;在膜层之间的过渡层,正余弦过渡使增透性能变强,双曲、指数使增透性能减弱,但影响较小,线性渐变基本没有影响。实验镀制了增透膜并对其进行拟合分析,发现基底与膜层以及膜层之间的过渡层按正余弦变化时与实验结果比较吻合,并给予了解释。     

Mo离子注入对金刚石涂层附着性能的影响

采用Mo离子注入工艺对YG6硬质合金基体表面进行处理,用微波等离子体CVD(MPCVD)法沉积金刚石涂层,研究了Mo离子注入工艺对金刚石涂层附着性能的影响.结果表明,Mo离子注入后,硬质合金基体表面的化学成分发生了明显变化;采用适当剂量的Mo离子注入基体,可使CVD金刚石涂层的附着性能显著提高. 关键词： 金刚石涂层 Mo离子注入 硬质合金基体 附着性能     

Influence of laser remelting on the microstructure and phases constitution of plasma sprayed hydroxyapatite coatings

In this paper, the plasma sprayed coatings were treated by laser remelting. The morphologies, elements analysis and phases of both sprayed and remelted coatings were studied by means of electron probe microanalysis (EPMA), X-ray diffraction (XRD) and so on. The results show that the structure of the sprayed coatings is coarse, the amorphization of HA is tremendous, and the bonding state between the coating and the substrate is mechanical combination. After the sprayed coatings were treated by laser remelting in a proper conditions, the properties of the coatings are improved greatly. The microstructure of remelted coatings is columnar and cellular dendritic crystal which is homogeneous and compact, and the coating consists of HA, -TCP and CaO phases, the Ca/P ratio of transition layer is close to 1.67, but the Ca/P ratio of surface layer is higher than that of HA because of the loss of P.     

LBO晶体上1 064，532 nm倍频增透膜的镀制及性能分析

 用电子束蒸发沉积方法在X切LBO（X-LBO）晶体上镀制了两种不同膜系结构的1 064和532 nm倍频增透膜，其中一种膜系结构为基底/ZrO₂/Y₂O₃/Al₂O₃/SiO₂/空气，另一种为基底/0.5Al₂O₃/ZrO₂/Y₂O₃/Al₂O₃/SiO₂/空气，两种膜系结构的主要差别在于有无氧化铝过渡层。测量了薄膜的反射率光谱曲线，发现两种增透膜在1 064和532 nm处的反射率均小于0.5％，实际镀制结果与理论设计曲线的差异主要是由材料折射率的变化引起的。且对样品在空气环境中进行了温度为473 K的退火处理，结果发现两种膜系结构均表现了较优异的光学性能，氧化铝过渡层的加入使薄膜具有强的热应力性能。     

激光熔覆原位合成Nb(C,N)陶瓷颗粒增强铁基金属涂层

采用预涂粉末激光熔覆技术,在42CrMo基体上制备出原位合成Nb(C, N)颗粒增强的铁基复合涂层。X射线及扫描电镜分析结果表明:激光熔覆获得的涂层基体为耐氧化、耐蚀性良好的Fe-Cr细晶组织及少量的-Fe相,原位合成的Nb（C, N）呈块状弥散分布在基体上。进一步的磨损试验表明:这些颗粒增强相极大增强了抗磨损性能,与未熔覆的母材相比,其磨损失重仅为母材的1/9左右; 涂层在750 ℃恒温氧化条件下具有较好的抗氧化性能,氧化层主要由NbO1.1,Cr2O3相组成; 母材的氧化产物为Fe2O3,容易脱落,保护性能较差; 激光熔覆涂层的氧化膜厚度仅为未涂层的1/5。     

Theoretical analysis of optical properties of dielectric coatings dependence on substrate subsurface defects

A model for refractive index of stratified dielectric substrate was put forward according to theories of inhomogeneous coatings. The substrate was divided into surface layer, subsurface layer and bulk layer along the normal direction of its surface. Both the surface layer (separated into N₁ sublayers of uniform thickness) and subsurface layer (separated into N₂ sublayers of uniform thickness), whose refractive indices have different statistical distributions, are equivalent to inhomogeneous coatings, respectively. And theoretical deduction was carried out by employing characteristic matrix method of optical coatings. An example of mathematical calculation for optical properties of dielectric coatings had been presented. The computing results indicate that substrate subsurface defects can bring about additional bulk scattering and change propagation characteristic in thin film and substrate. Therefore, reflectance, reflective phase shift and phase difference of an assembly of coatings and substrate deviate from ideal conditions. The model will provide some beneficial theory directions for improving optical properties of dielectric coatings via substrate surface modification.     

短波段光学减反膜的溶胶-凝胶法制备及性能分析

 随着大型激光器的发展，对短波段减反膜的要求日益提高，其中钕玻璃激光三倍频（355nm）的减反射成为新的技术要点。采用溶胶-凝胶工艺合成SiO₂溶胶，采用提拉镀膜法制备纳米多孔SiO₂薄膜，薄膜厚度为75nm，折射率控制在1.22，镀制在石英基底上的薄膜其355nm波长的反射率仅为0.2%。通过氨处理工艺和薄膜的表面修饰，薄膜的抗磨擦性能和疏水性能大大提高，薄膜经过蘸有灰尘、乙醇的棉花球擦洗20次和50次后，透射率最大值仅分别降低0.13% 和 0.39%，与水珠的接触角达到110°。     

Study and simulation of the growth of solid lubricant MoSe<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript> coatings during pulsed laser deposition

The chemical composition and tribological properties of the thin-film diselenide molybdenum coatings deposited by pulsed laser deposition in vacuum and a rarefied inert gas (argon) atmosphere are studied. Upon deposition in a gas at a pressure of ∼2 Pa, stoichiometric coatings with improved antifriction properties as compared vacuum-deposited coatings form. However, a too strong increase in the argon pressure (to ∼10 Pa) degrades the tribological properties of the coating. Structure formation in the MoSe _x coatings grown by pulsed laser deposition on an unheated substrate is investigated. Deposition in vacuum or argon at a pressure of 2 Pa leads to formation of rather smooth coatings with a dense amorphous structure containing molybdenum nanoinclusions. Deposition at a high argon pressure results in a developed surface relief and a loose coating structure. A mathematical model is developed using the kinetic Monte Carlo method in order to describe structure formation in the coatings that grow during physical deposition of an atomic flux. A comparative analysis demonstrates satisfactory agreement between the simulated and experimentally studied structures in the coatings created by pulsed laser deposition at various gas pressures.     

Preparation and characteristics of three-layer YSZ-(YSZ/Al2O3)-YSZ TBCs

Novel three-layer YSZ-(YSZ/Al₂O₃)-YSZ (6 wt.% Y₂O₃ partially stabilized ZrO₂) thermal barrier coatings (TBCs) were successfully prepared on Ni-based superalloy substrate using composite sol-gel and pressure filtration microwave sintering (PFMS) techniques. The coatings were evaluated for the cyclic oxidation resistance, thermal barrier effect and the presences of phases and microstructures. FE-SEM results indicate that the coatings were dense and crack-free. The coatings maintained their structural integrity when they were exposed at 1100 for 100 h. They exhibited superior oxidation resistance, spallation resistance and thermal insulation property compared with single-layer YSZ coatings. Moreover, the detailed mechanisms were discussed in order to understand the improved performance of the three-layer TBCs.