RB-SiC表面改性Si涂层的制备与性能

 为了获得高质量光学表面的碳化硅反射镜，利用射频磁控溅射方法，在直径70 mm的RB-SiC基片上沉积了厚约100 μm的Si改性涂层，对改性层进行超光滑加工，并对改性层的表面形貌及性能进行了测试。ZYGO表面粗糙度仪测试结果表明，抛光后Si改性涂层表面粗糙度均方根值达到了0.496 nm；X射线衍射仪测试显示，制备Si改性涂层为多晶结构；使用拉力机做附着力测试，结果表明膜基附着力大于10.7 MPa。证明采用磁控溅射技术制备的Si改性涂层均匀、致密、附着力好，能够满足RB-SiC材料表面改性要求。

Preparation and performance of Si coating on RB-SiC mirror for surface modification

In order to manufacture reaction bonded silicon carbide(RB-SiC) mirrors of fine optical surface, 100 μm thick Si coatings were prepared by RF magnetron sputtering on RB-SiC substrates of 70 mm diameter and then polished. Tests with ZYGO surface profilometer show that the RMS surface roughness of the surface-modified RB-SiC achieves 0.496 nm. X-ray diffraction analyses reveal the polycrystalline structure of the Si coatings. Moreover, the adhesion between Si coating and RB-SiC substrate measured by direct pull-off method is more than 10.7 MPa. Therefore, the magnetron sputtered Si coating can satisfy the requirements of RB-SiC surface modification．