Investigation of the quantum dot infrared photodetectors dark current

Quantum dot infrared photodetectors (QDIPs) are more efficient than other types of semiconductor based photodetectors; so it has become an actively developed field of research. In this paper quantum dot infrared photodetector dark current is evaluated theoretically. This evaluation is based on the model that was developed by Ryzhii et al. Here it is assumed that both thermionic emission and field-assisted tunneling mechanisms determine the dark current of QDIPs; moreover we have considered Richardson effect, which has not been taken into account in previous research. Then a new formula for estimating average number of electrons in a quantum dot infrared photodetector is derived. Considering the Richardson effect and field-assisted tunneling mechanisms in the dark current improves the accuracy of algorithm and causes the theoretical data to fit better in the experiment. The QDIPs dark current temperature and biasing voltage dependency, contribution of thermionic emission and field-assisted tunneling at various temperatures and biasing voltage in the QDIPs dark current are investigated. Moreover, the other parameter effects like quantum dot (QD) density and QD size effect on the QDIPs dark current are investigated.     

采用Al/TaN叠层电极提高Si基Ge PIN光电探测器的性能

金属与Ge材料接触由于存在强烈的费米钉扎效应, 导致金属电极与n型Ge接触引入较大的接触电阻, 限制了Si基Ge探测器响应带宽. 本文报道了在SOI衬底上外延Ge单晶薄膜并制备了不同台面尺度的Ge PIN光电探测器. 对比了电极分别为金属Al和Al/TaN叠层的具有相同器件结构的SOI基Ge PIN光电探测器的暗电流、响应度以及响应带宽等参数. 发现在Al与Ge之间增加一薄层TaN可有效减小n型Ge的接触电阻, 将台面直径为24 μ的探测器在1.55 μ的波 长和-1 V偏压下的3 dB响应带宽提高了4倍. 同时, 器件暗电流减小一个数量级, 而响应度提高了2倍. 结果表明, 采用TaN薄层制作金属与Ge接触电极, 可有效钝化金属与Ge界面, 减轻费米钉扎效应, 降低金属与n-Ge接触的势垒高度, 因而减小接触电阻和界面复合电流, 提高探测器的光电性能.     

片上制备横向结构ZnO纳米线阵列紫外探测器件

将纳米技术与传统的微电子工艺相结合, 片上制备了横向结构氧化锌(ZnO)纳米线阵列紫外探测器件, 纳米线由水热法直接自组织横向生长于叉指电极之间, 再除去斜向的多余纳米线, 其余工艺步骤与传统工艺相同. 分别尝试了铬(Cr)和金(Au)两种金属电极的器件结构: 由于Cr电极对其上纵向生长的纳米线有抑制作用, 导致横向生长纳米线长度可到达对侧电极, 光电响应方式为受表面氧离子吸附控制的光电导效应, 光电流大但增益低, 响应速度慢, 经二次电极加固, 纳米线根部与电极金属直接形成肖特基接触, 光电响应方式变为光伏效应, 增益和速度得到了极大改善; 由于Au电极对其上纵向生长的纳米线有催化作用, 导致溶质资源的竞争, 相同时间内横向生长的纳米线不能到达对侧, 而是交叉桥接, 但却形成了紫外光诱导的纳米线间势垒结高度调控机理, 得到的器件特性为最优, 在波长为365 nm的20 mW/cm²紫外光照下, 1 V电压时暗电流为10^-9 A, 光增益可达8×10⁵, 响应时间和恢复时间分别为1.1 s和1.3 s.     

Electrical characteristics of UV photodetectors based on ZnO/diamond film structure

Ultraviolet photodetectors based on ZnO/diamond film structure were fabricated. The properties of Au/ZnO contacts and effects of grain sizes on the electrical characteristics of photodetectors were discussed. Due to the bombardment with Au atoms and the annealing process, fine ohmic contacts were formed between Au electrodes and ZnO films. Dark currents and photocurrents of the photodetectors were related to sputtering time and the grain size of ZnO films. For the photodetector with a bigger grain size, a lower dark current and a higher photocurrent were obtained under 10 V bias voltage. The time-dependent photocurrent confirmed the carrier trapping effect.     

Dual-wavelength ultraviolet photodetector based on vertical(Al,Ga)N nanowires and graphene

Due to the wide application of UV-A(320 nm–400 nm) and UV-C(200 nm–280 nm) photodetectors, dual-wavelength(UV-A/UV-C) photodetectors are promising for future markets. A dual-wavelength UV photodetector based on vertical(Al,Ga)N nanowires and graphene has been demonstrated successfully, in which graphene is used as a transparent electrode.Both UV-A and UV-C responses can be clearly detected by the device, and the rejection ratio(R254 nm/R450 nm) exceeds35 times at an applied bias of-2 V. The short response time of the device is less than 20 ms. Furthermore, the underlying mechanism of double ultraviolet responses has also been analyzed systematically. The dual-wavelength detections could mainly result from the appropriate ratio of the thicknesses and the enough energy band difference of(Al,Ga)N and Ga N sections.     

悬空氧化铟纳米线晶体管制备与光电性能表征

一维(1D)半导体纳米线在纳米电子学和纳米光子学中表现出色。然而,纳米线晶体管的电特性对纳米线与衬底之间的相互作用非常敏感,而优化器件结构可以改善纳米线晶体管的电学和光电检测性能。本文报道了通过一步式光刻技术制造的悬浮式In₂O₃纳米线晶体管,显示出54.6 cm²V^?1s^?1的高迁移率和241.5 mVdec^?1的低亚阈值摆幅。作为紫外光电探测器,光电晶体管显示出极低的暗电流(~10?13 A)和高响应度1.6×10⁵ A?W^?1。悬浮晶体管的沟道材料的这种简单而有效的制备方法可广泛用于制造高性能微纳米器件。     

Effect of surface oxygen vacancy defects on the performance of ZnO quantum dots ultraviolet photodetector

The slower response speed is the main problem in the application of ZnO quantum dots (QDs) photodetector, which has been commonly attributed to the presence of excess oxygen vacancy defects and oxygen adsorption/desorption processes. However, the detailed mechanism is still not very clear. Herein, the properties of ZnO QDs and their photodetectors with different amounts of oxygen vacancy (V_O) defects controlled by hydrogen peroxide (H₂O₂) solution treatment have been investigated. After H₂O₂ solution treatment, V_O concentration of ZnO QDs decreased. The H₂O₂ solution-treated device has a higher photocurrent and a lower dark current. Meanwhile, with the increase in V_O concentration of ZnO QDs, the response speed of the device has been improved due to the increase of oxygen adsorption/desorption rate. More interestingly, the response speed of the device became less sensitive to temperature and oxygen concentration with the increase of V_O defects. The findings in this work clarify that the surface V_O defects of ZnO QDs could enhance the photoresponse speed, which is helpful for sensor designing.     

Drop‐cast and dye‐sensitized ZnO nanorod‐based visible‐light photodetectors

We report the facile fabrication of metal–semiconductor–metal (MSM) photodetectors with dye‐sensitized ZnO nanorods (NRs) operating at wavelengths of ～405–638 nm by a simple drop casting method. The ZnO NRs were synthesized by the hydrothermal synthesis method at 75 °C. The droplet of ethanol solution containing ZnO NRs was dropped between two metal electrodes and dried at 65 °C, which allows the ZnO NRs to be adhered and contacted to both metal electrodes. When a violet light of 405 nm was illuminated into the MSM ZnO NRs‐based photodetector, the photocurrent gain was obtained as ～3.9 × 10³ at the applied bias voltage of 5 V. By increasing the bias voltage from 10 V to 15 V, the device exhibited good recovery performance with a largely reduced reset time from 85.68 s to 2.47 s and an increased on–off ratio from 17.9 to 77.4. To extend the photodetection range towards the long visible spectral region, the ZnO NRs were sensitized by the N719 dye and then drop‐cast. The dye‐sensitized ZnO NRs‐based photodetector also exhibited good photocurrent switching under 638 nm of light illumination. (© 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

包埋Pt纳米粒子对金属-半导体-金属结构ZnO紫外光电探测器性能的影响

利用射频磁控溅射设备制备ZnO薄膜, 最终制备ZnO/Pt纳米粒子/ZnO 结构的金属-半导体-金属型紫外光电探测器. 研究了Pt纳米粒子处在ZnO薄膜层中的不同深度对金属-半导体-金属型紫外光电探测器响应性能的影响. 结果表明, 探测器的响应度随着Pt纳米粒子在ZnO薄膜层中所处深度的增大而升高. 在60 V偏压下, 包埋Pt最深的探测器在波长365 nm处取得响应度最大值1.4 A·W^-1, 包埋有Pt探测器的响应度最大值为无Pt 纳米粒子探测器响应度最大值的7倍. 结合对ZnO薄膜表面的表征及探测器各项性能的测试, 得出包埋Pt纳米粒子增强器件的响应性能可归因于表面等离子体增强散射.     

一维纳米氧化锌自驱动紫外探测器的构建与性能研究

本文通过化学气相沉积法制备了ZnO纳米材料, 利用扫描电镜、光致发光谱、X衍射光谱及拉曼光谱等方法对制备的材料进行了表征. 基于制备的单根ZnO线分别构建了三种不同结构的紫外探测器件: Ag-ZnO-Ag肖特基型、PEDOT:PSS/n-ZnO结型和p-Si/n-ZnO结型紫外探测器, 并对器件的性能进行了研究. 结果表明: 三种不同结构的器件都表现出良好的整流特性, 对紫外线均有明显的光响应; 在零偏压下, 都有明显的自驱动特性. 三种器件中, p-Si/n-ZnO型紫外探测器性能最为优异: 在零偏压下, 暗电流约在1.2×10^-3 nA, 光电流在5.4 nA左右, 光暗电流比为4.5×10³, 上升和下降时间分别为0.7 s和1 s. 通过三类器件性能比较, 表明无机p-Si更适合与ZnO构建pn结型自驱动紫外探测器.     

基于电场调控的高性能紫外无机-有机复合结构光电探测器

通过溶液旋涂制备了结构为ITO/ZnO/P3HT:ITIC/Ag的紫外无机-有机复合结构光电探测器,混合膜中聚合物给体(P3HT)和非富勒烯小分子受体(ITIC)的质量比为100:1.由于载流子传输通道不连续,器件在零偏压下的暗电流密度很小,为5.8×10-10 A·cm-2,为器件实现外加电场可调和光电流倍增提供了条...     

Performance Improvement of GaN Based Schottky Barrier Ultraviolet Photodetector by Adding a Thin A1GaN Window Layer

We propose a new structure of GaN based Schottky barrier ultraviolet photodetector, in which a thin n-type A1GaN window layer is added on the conventional n^--GaN/n^＋-GaN device structure. The performance of the Schottky barrier ultraviolet photodetector is found to be improved by the new structure. The simulation result shows that the new structure can reduce the negative effect of surface states on the performance of Schottky barrier GaN photodetectors, improving the quantum efficiency and decreasing the dark current. The investigations suggest that the new photodetector can exhibit a better responsivity by choosing a suitably high carrier concentration and thin thickness for the A1GaN window layer.     

一种减小GaN基肖特基结构紫外探测器暗电流的方法

提出了一种减小GaN肖特基结构紫外探测器暗电流的方法.该方法是在普通的GaN肖特基结构的表面增加一层薄的p-GaN.模拟计算结果表明,该层p-GaN能增加肖特基势垒高度,从而减小了器件的暗电流,提高了器件性能.进一步的计算还发现,对于p型载流子浓度较高的情况下,只需要很薄的一层p-GaN就能显著增加肖特基势垒高度,对于p型载流子浓度较低的情况下,则需要较厚的一层p-GaN才能有较好的肖特基势垒高度增加效果. 关键词： GaN 肖特基结构 紫外探测器 暗电流     

结构参数对GaN肖特基紫外探测器性能的影响及器件设计

研究了GaN肖特基结构(n^--GaN /n⁺-GaN)紫外探测器的结构参数对器件性能的影响机理。模拟计算结果表明:提高肖特基势垒高度和减小表面复合速率,不仅可以增加器件的量子效率,而且可以极大地减小器件的暗电流;适当地增加n^--GaN层厚度和载流子浓度可以提高器件的量子效率,但减小n^--GaN层的载流子浓度却有利于减小器件的暗电流。我们针对实际应用的需要,提出了一个优化器件结构参数的设计方案,特别是如果实际应用中对器件的量子效率和暗电流都有较高的要求,肖特基势垒高度应该≥0.8 eV,n^--GaN层的厚度≥200 nm,载流子浓度1×10¹⁷ cm^-3 左右,表面复合速率＜1×10⁷ cm/s。     

Localized electric-field-enhanced low-light detection by a 2D SnS visible-light photodetector

Due to their excellent carrier mobility, high absorption coefficient and narrow bandgap, most 2 D IVA metal chalcogenide semiconductors(GIVMCs, metal = Ge, Sn, Pb;chalcogen = S, Se) are regarded as promising candidates for realizing high-performance photodetectors. We synthesized high-quality two-dimensional(2 D) tin sulfide(Sn S) nanosheets using the physical vapor deposition(PVD) method and fabricated a 2 D Sn S visible-light photodetector. The photodetector exhibits a high photoresponsivity of 161 A·W~(-1) and possesses an external quantum efficiency of 4.45 × 10~4%, as well as a detectivity of 1.15 × 10~9 Jones under 450 nm blue light illumination. Moreover, under poor illumination at optical densities down to 2 m W·cm~(-2), the responsivity of the device is higher than that at stronger optical densities. We suggest that a photogating effect in the 2 D Sn S photodetector is mainly responsible for its low-light responsivity. Defects and impurities in 2 D Sn S can trap carriers and form localized electric fields, which can delay the recombination process of electron-hole pairs,prolong carrier lifetimes, and thus improve the low-light responsivity. This work provides design strategies for detecting low levels of light using photodetectors made of 2 D materials.     

背入射Au/ZnO/Al结构肖特基紫外探测器

设计制作了一种Au/ZnO/Al结构的紫外探测器,光的入射方式采用背入射式。ZnO薄膜是用磁控溅射在蓝宝石衬底上制备的。I-V测试表明:Au与ZnO形成了肖特基接触。得到探测器的光响应峰值在352nm,截止边为382nm,可见抑制比达一个量级。由于该探测器是一种垂直结构器件,对于进一步实现ZnO紫外探测器阵列及单光子探测有很好的研究价值。     

单根ZnO纳米线低温条件下的电子输运及光敏性质

用化学气相沉积的方法合成了ZnO纳米线，采用微栅模板法制得电极从而获得欧姆接触的单根ZnO纳米线半导体器件。通过研究60~300 K范围内的电阻变化情况，发现在整个温度区间内存在热激活和近程跳跃两种传输机制。在300，200，100 K的条件下分别测试了器件的紫外光响应和恢复情况，结果表明：低温下器件对紫外光的敏感性提高，电流的恢复时间随着温度的降低而延长。     

Thermal annealing effects on the dynamic photoresponse properties of Al-doped ZnO nanowires network

In this study, UV photodetectors based on a network of aluminium-doped zinc oxide (AZO) nanowires were manufactured at a low cost; for this purpose, a fast and simple fabrication process that involved dropping nanowires dispersion solution was employed instead of the conventional e-beam lithography process that is used to manufacture single nanowire–based UV photodetectors. It was demonstrated that nanowire network–based UV photodetectors provide a much faster UV photoresponse than conventional single nanowire–based UV photodetectors. The fast UV photoresponse of the fabricated UV photodetector can be attributed to the fact that the potential barriers formed in the nanowire network junctions effectively block the flow of electrons during the process of photocurrent decay. Furthermore, the UV photoresponse under illumination by a 254 nm UV source was studied as a function of the annealing temperature of the AZO nanowires network at a bias of 5 V. The fabricated UV photodetector showed the fastest response of 2 s to UV illumination in air when the sample was annealed in air for 1 h at 300 °C.     

Ultraviolet detectors based on ZnO films by thermal oxidation of Zn metallic films

Metallic Zn films were deposited on glass substrates by electron-beam evaporation. ZnO films were synthesized by thermal oxidation of Zn metallic films in air. At the annealing temperature of 550 °C, ZnO nanowires appeared on the surface, which mainly result from the decrease of oxidation rate. A ZnO ultraviolet photodetector was fabricated based on a metal-semiconductor-metal planar structure. The detector showed a large UV photoresponse with an increase of two orders of magnitude. It is concluded that promising UV detectors can be obtained on ZnO films by thermal oxidation of Zn metallic films. The ways of performing spectral response measurements for polycrystalline ZnO films are also discussed.      

GaN基MIS紫外探测器的电学及光电特性

制备了GaN基金属-绝缘层-半导体(MIS)结构紫外探测器,并测量了其暗电流和光谱响应。通过分析其暗电流,发现在反偏情况下,其主要电流输运机制为隧穿复合机制;在正偏情况下,随着偏压的增大,电流输运机制从隧穿机制变为空间电荷限制电流机制。光谱响应测试结果显示,该探测器在-5 V的偏压下,在315 nm处获得了最大响应度170 mA/W,探测度为2.3×10¹² cm·Hz^1/2·W^-1。此外,还研究了不同厚度I层对器件光电压的影响,结果表明,光电压受隧穿机制与漏电流机制的共同制约。