ZnO纳米线紫外探测器的制备和快速响应性能的研究

一维ZnO纳米结构由于具有比表面积大、室温下具有大激子结合能等特点而受到广泛关注. 但是如何实现纳米结构的器件一直是目前研究的一个挑战. 文章通过水热方法, 在玻璃衬底上实现了ZnO纳米线横向生长, 并制备出基于ZnO纳米线的金属-半导体-金属紫外探测器. 测量结果显示器件在365 nm处探测器的响应度达到5 A/W, 并且制备的探测器在空气中对紫外光照具有快速的响应, 其上升时间约4 s, 下降时间约5 s, 这与ZnO纳米线中的氧空位吸附和脱附水分子相关.     

表面修饰ZnO纳米线紫外光响应的增强效应

制备了基于单根ZnO纳米线的紫外光探测原型器件,并研究了聚苯乙烯硫酸钠表面修饰对器件紫外响应特性的影响.研究发现,在相同的紫外光照射条件下,表面修饰后的器件对紫外光的探测灵敏度比修饰前提高了3个数量级.I-V特性研究表明,修饰前后器件在光照时的电导没有明显变化,但修饰后器件的暗电导却下降了3个数量级.这说明通过表面修饰降低探测器的暗电导是提高紫外光探测器灵敏度的一条重要途径. 关键词： 紫外光探测器 纳米结构 ZnO 表面修饰     

Growth of ternary ZnCdSe nanowires and the fabrication of ZnCdSe nanowire photodetectors

The authors report the growth of high density ternary ZnCdSe nanowires on an oxidized Si(100) substrate using molecular beam epitaxy and the fabrication of a ZnCdSe nanowire photodetector. It was found that the as-grown ZnCdSe nanowires exhibited a mixture of cubic zinc-blende and hexagonal wurtzite structures. It was also found that average length and width of the ZnCdSe nanowires were ∼1.8 μm and ∼42.7 nm, respectively. Furthermore, it was found that photocurrent to dark current contrast ratio was around 25 for the fabricated photodetector under 5 V applied bias.     

Ultraviolet detectors based on ZnO films by thermal oxidation of Zn metallic films

Metallic Zn films were deposited on glass substrates by electron-beam evaporation. ZnO films were synthesized by thermal oxidation of Zn metallic films in air. At the annealing temperature of 550 °C, ZnO nanowires appeared on the surface, which mainly result from the decrease of oxidation rate. A ZnO ultraviolet photodetector was fabricated based on a metal-semiconductor-metal planar structure. The detector showed a large UV photoresponse with an increase of two orders of magnitude. It is concluded that promising UV detectors can be obtained on ZnO films by thermal oxidation of Zn metallic films. The ways of performing spectral response measurements for polycrystalline ZnO films are also discussed.      

High performance photodetectors based on high quality InP nanowires

In this paper,small diameter InP nanowires with high crystal quality were synthesized through a chemical vapor deposition method.Benefitting from the high crystallinity and large specific surface area of InP nanowires,the simply constructed photodetector demonstrates a high responsivity of up to 1170 A·W ~(-1) and an external quantum efficiency of2.8 × 10~5% with a fast rise time of 110 ms and a fall time of 130 ms,even at low bias of 0.1 V.The effect of back-gate voltage on photoresponse of the device was systematically investigated,confirming that the photocurrent dominates over thermionic and tunneling currents in the whole operation.A mechanism based on energy band theory at the junction between metal and semiconductor was proposed to explain the back-gate voltage dependent performance of the photodetectors.These convincing results indicate that fine InP nanowires will have a brilliant future in smart optoelectronics.     

High performance AlxGa1−xN-based avalanche photodiodes

We report high performance solar-blind photodetectors with reproducible avalanche gain as high as 820 under ultraviolet illumination. The solar-blind photodetectors have a sharp cut-off around 276 nm. We improved the device performance by designing different epitaxial wafer structure with thinner active multiplication layer. We compare the resulting fabricated devices from these wafers in terms of dark current, photoresponse, avalanche gain performances.     

ZnO nanowire array ultraviolet photodetectors with self-powered properties

A ZnO nanowire (NW) array ultraviolet photodetector (PD) with Pt Schottky contacts has been fabricated on a glass substrate. Under UV light illumination, this PD showed a high photo-to-dark current ratio of 892 at 30 V bias. Interestingly, it was also found that this PD had a high sensitivity of 475 without external bias. This phenomenon could be explained by the asymmetric Schottky barrier height (SBH) at the two ends causing different separation efficiency of photogenerated electron–hole pairs, which resulted in the formation of photocurrent. It is anticipated to have potential applications in self-powered UV detection field.     

包埋Pt纳米粒子对金属-半导体-金属结构ZnO紫外光电探测器性能的影响

利用射频磁控溅射设备制备ZnO薄膜, 最终制备ZnO/Pt纳米粒子/ZnO 结构的金属-半导体-金属型紫外光电探测器. 研究了Pt纳米粒子处在ZnO薄膜层中的不同深度对金属-半导体-金属型紫外光电探测器响应性能的影响. 结果表明, 探测器的响应度随着Pt纳米粒子在ZnO薄膜层中所处深度的增大而升高. 在60 V偏压下, 包埋Pt最深的探测器在波长365 nm处取得响应度最大值1.4 A·W^-1, 包埋有Pt探测器的响应度最大值为无Pt 纳米粒子探测器响应度最大值的7倍. 结合对ZnO薄膜表面的表征及探测器各项性能的测试, 得出包埋Pt纳米粒子增强器件的响应性能可归因于表面等离子体增强散射.     

Enhancing photoresponse time of low cost Pd/ZnO nanorods prepared by thermal evaporation techniques for UV detection

High quality undoped ZnO nanorods have been synthesized at 850 °C by vapor-solid (VS) technique without a catalyst through a low cost process on silicon substrates. Then, ZnO nanorods have been characterized by using scanning electron microscopy (SEM), X-ray diffractometer (XRD), and photoluminescence (PL) spectroscopy. Metal-semiconductor-metal (MSM) photodetectors with palladium (Pd) as contact electrodes have been successfully constructed for ultraviolet (UV) detection. Under dark and UV illumination, the load resistance of the Pd/ZnO junction was found to be 80.4 kΩ, and 23.5 kΩ referring to the maximum allowed bias voltage; the barrier height was estimated to be about 0.8 eV, and 0.76 eV, at 5 V applied bias voltage, respectively. It was found that the maximum responsivity of the Pd/ZnO MSM photodetector was 0.106 A/W at 300 nm which corresponds to a quantum efficiency of 43.8% at 5 V applied bias voltage. The transient photoresponse of the fabricated device is reported under different applied biases at 1 V, 3 V, and 5 V.     

Hybrid Integration of 1 × 12 Metal-Semiconductor-Metal Photodetector and Polyimide Waveguide Array

We report here a demonstration of hybrid integration of a 1 × 12 metal-semiconductor-metal (MSM) photodetector array and polyimide channel waveguides via 45° total-internal-reflection (TIR) micro-couplers. The two-layer polyimide waveguide array was constructed using Ultradel 9120D for the core and Ultradel 9020 for the lower cladding layer. The coupling loss and propagation loss of the waveguide are 0.2dB and 0.21 dB/cm, respectively. The cross talk of the adjacent channels is -32 dB. The MSM photodetector array was fabricated on a semi-insulated GaAs wafer. The photodetectors are integrated to operate in the conventional vertical illumination mode. We measured the external quantum-efficiency and 3 dB bandwidth of the integrated MSM photodetectors at 0.4 A/W and 2.648 GHz, respectively. The aggregate 3 dB bandwidth of the 12-channel integrated system is 32 GHz.     

The mechanism of photocurrent enhancement of ZnO ultraviolet photodetector by reduced graphene oxide

An ultraviolet (UV) photodetector based on ZnO-reduced graphene oxide (ZnO-rGO) composites have been successfully fabricated. A pure ZnO photodetector was also fabricated by similar method. In comparison with the pure ZnO UV photodetector, the ZnO-rGO photodetector exhibits a much larger photocurrent and a better light-to-dark-current-ratio. The mechanism of photocurrent enhancement was investigated using I-V characteristics, photoluminescence (PL) spectra, transmittance spectra and time-dependent photocurrent analysis. Results show that the photocurrent enhancement of the ultraviolet photodetector is due to the improvement of the carrier lifetime, because the carrier recombination of ZnO were reduced by rGO. It provides a potential way to fabricate high-response UV photodetectors.     

Effect of surface states on electron transport in individual ZnO nanowires

The current–voltage (I–V$I\text{–}V$) characteristics of single ZnO nanowires have been studied in the humid air, dry air, vacuum, and under ultraviolet (UV) irradiation. A model of a single ZnO nanowire connected with two opposite diodes was proposed to calculate the observed I–V$I\text{–}V$ behaviors. The results show that the electrical characteristics are dominated by the reverse barrier height, and the barrier height can be adjusted by surface adsorption, which is ascribed to the effect of surface states on surface band bending and Fermi level pining. Furthermore, the nanowire exhibited an enormous increase of conductance upon UV irradiation and a considerable persistent photocurrent after withdraw of the UV excitation, which further confirms the surface states have a pronounced effect on the electronic transport in single ZnO nanowires.     

退火处理对ZnO纳米线紫外探测器性能的改善

通过介电泳方法定向排列了ZnO纳米线,制作了自组装有序的纳米线紫外探测器.为了适合在金叉指电极上排列,用水热方法设计生长了超长的ZnO纳米线,并通过700℃的热退火处理,使得可利用的表面缺陷增多.通过研究器件的光致发光光谱和光响应,发现光、暗电流比和响应恢复时间有显著提高,并分析了其中可能的机理.     

一维纳米氧化锌自驱动紫外探测器的构建与性能研究

本文通过化学气相沉积法制备了ZnO纳米材料, 利用扫描电镜、光致发光谱、X衍射光谱及拉曼光谱等方法对制备的材料进行了表征. 基于制备的单根ZnO线分别构建了三种不同结构的紫外探测器件: Ag-ZnO-Ag肖特基型、PEDOT:PSS/n-ZnO结型和p-Si/n-ZnO结型紫外探测器, 并对器件的性能进行了研究. 结果表明: 三种不同结构的器件都表现出良好的整流特性, 对紫外线均有明显的光响应; 在零偏压下, 都有明显的自驱动特性. 三种器件中, p-Si/n-ZnO型紫外探测器性能最为优异: 在零偏压下, 暗电流约在1.2×10^-3 nA, 光电流在5.4 nA左右, 光暗电流比为4.5×10³, 上升和下降时间分别为0.7 s和1 s. 通过三类器件性能比较, 表明无机p-Si更适合与ZnO构建pn结型自驱动紫外探测器.     

Ultraviolet photoconductive detector based on Al doped ZnO films prepared by sol-gel method

We report a study on the fabrication and characterization of ultraviolet photodetectors based on ZnO:Al films. Using sol-gel technique, highly c-axis oriented ZnO films with 5 mol% Al doping were deposited on Si(1 1 1) substrates. The photoconductive UV detectors based on ZnO:Al thin films, having a metal-semiconductor-metal (MSM) structure with interdigital (IDT) configuration, were fabricated by using Au as a contact metal. The characteristics of dark and photocurrent of the UV detector and the UV photoresponse of the detector were investigated. The linear current-voltage (I-V) characteristics under both forward and reverse bias exhibit ohmic metal-semiconductor contacts. Under illumination using monochromatic light with a wavelength of 350 nm, photo-generated current was measured at 58.05 μA at a bias of 6 V. The detector exhibits an evident wide-range spectral responsivity and shows a trend similar to that in transmittance and photoluminescence spectrum.     

Increased spectral sensitivity of Si photodetector by surface plasmon effect of Ag nanowires

Highly-sensitive Si photodetectors were prepared by using Ag nanowires (AgNWs). A transparent indium-tin-oxide (ITO) coating was coated on a Si substrate followed by spin-coating of AgNWs-containing solution. AgNWs having average length of 5–20 μm with a diameter of about 40–60 nm were observed in FESEM images. The haze effect of AgNWs was totally avoided because of the optimum value of diameter. The transmittance of above 85% was shown by AgNWs over a broad spectral range due to surface plasmon resonance effect. The AgNW-coated device showed an excellent rectifying ratio of 288. Under light illumination, AgNWs-coated device exhibited a significant photoresponse ratio of 5373. This advanced feature of AgNWs-templated method would be applied in broadband wavelength photodetection devices.     

Defect-Related Photoresponse and Polarization-Sensitive Photodetection of Single ZnO Nanowires

Defect-related photoconductivity of single ZnO nanowires is investigated. The photoconductivity shows powerlaw dependence with incident green laser intensity due to the defect mechanisms including both recombination centres and traps. The device based on single ZnO nanowire shows a sensitive photoresponse to green light with significant on/off ratios. In addition, the photocurrent ＆ highly sensitive to the polarization of the incident illumination. Therefore, the nanowire may act as a polarized photodetector.     

Scalable silicon nanowire photodetectors

This paper presents photodetectors having vertically stacked electrodes with sub-micron (300 nm) separation based on silicon nanowire (SiNW) nanocomposites. The thin-film-like devices are made using standard photolithography instead of electron beam lithography and thus are amenable to scalable low-cost manufacturing. The processing technique is not limited to SiNWs and can be extended to different nanowires (NWs) (e.g., ZnO, CdSe) and substrates. The current–voltage characteristics show Schottky behaviour that is dependent on the properties of the contact metal and that of the pristine SiNWs. This makes these devices suitable for examination of electronic transport in SiNWs. Preliminary results for light sensitivity show promising photoresponse that is a function of effective NW density.     

超长氧化锌纳米线的制备及其气敏性能和紫外传感应用研究

采用一种无需催化剂和载气的简便碳热还原法制得长度约为100 μm、直径约为500 nm、长径比达到200的超长ZnO纳米线,讨论了Si基底位置、沉积时间以及反应物原料的量对ZnO纳米线形貌的影响。对ZnO纳米线的气敏性能进行研究,结果表明：在工作温度为350 ℃时,ZnO纳米线传感器能够很好地检测酒精气体,具有选择性好、响应恢复快的优点,且最低检测体积分数为5×10^-6。另外,通过一种简单、实用的介电泳法制得基于ZnO纳米线的紫外传感器。在365 nm紫外灯照射下,光电流增加了13%;而在254 nm紫外灯照射时,光电流则没发生变化,说明该传感器对不同波长的紫外光有一定的选择性。     

Surface plasmon polariton coupling between a metal nanowire and a metal helix

The transmittance and steady-state electrical field distribution of a silver nanowire–helix system are investigated using the finite-difference time-domain method. In the nanowire–helix system, surface plasmon polaritons are coupled into the helix or squeezed into the space between the nanowire and helix. The transmittance strongly depends on the topologic shapes of the helix, especially the pitch height. Thus, the nanowire–helix system enables the detection of the displacement associated with helical deformation.